DE69010368D1 - Photochemisches Verfahren zur Substratbehandlung unter Verwendung eines dichten Fluids. - Google Patents

Photochemisches Verfahren zur Substratbehandlung unter Verwendung eines dichten Fluids.

Info

Publication number
DE69010368D1
DE69010368D1 DE69010368T DE69010368T DE69010368D1 DE 69010368 D1 DE69010368 D1 DE 69010368D1 DE 69010368 T DE69010368 T DE 69010368T DE 69010368 T DE69010368 T DE 69010368T DE 69010368 D1 DE69010368 D1 DE 69010368D1
Authority
DE
Germany
Prior art keywords
substrate
dense fluid
substrate treatment
photochemical method
undesired material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69010368T
Other languages
English (en)
Other versions
DE69010368T2 (de
Inventor
David P Jackson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of DE69010368D1 publication Critical patent/DE69010368D1/de
Application granted granted Critical
Publication of DE69010368T2 publication Critical patent/DE69010368T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S210/00—Liquid purification or separation
    • Y10S210/902—Materials removed
    • Y10S210/908—Organic
DE69010368T 1989-04-03 1990-02-08 Photochemisches Verfahren zur Substratbehandlung unter Verwendung eines dichten Fluids. Expired - Lifetime DE69010368T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/332,124 US5068040A (en) 1989-04-03 1989-04-03 Dense phase gas photochemical process for substrate treatment

Publications (2)

Publication Number Publication Date
DE69010368D1 true DE69010368D1 (de) 1994-08-11
DE69010368T2 DE69010368T2 (de) 1994-11-03

Family

ID=23296806

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69010368T Expired - Lifetime DE69010368T2 (de) 1989-04-03 1990-02-08 Photochemisches Verfahren zur Substratbehandlung unter Verwendung eines dichten Fluids.

Country Status (8)

Country Link
US (3) US5068040A (de)
EP (1) EP0391035B1 (de)
JP (1) JP2770883B2 (de)
AT (1) ATE108224T1 (de)
CA (1) CA2009748A1 (de)
DE (1) DE69010368T2 (de)
DK (1) DK0391035T3 (de)
NO (1) NO901480L (de)

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ATE108224T1 (de) 1994-07-15
EP0391035B1 (de) 1994-07-06
US5068040A (en) 1991-11-26
US5215592A (en) 1993-06-01
EP0391035A2 (de) 1990-10-10
CA2009748A1 (en) 1990-10-03
EP0391035A3 (de) 1991-07-31
US5236602A (en) 1993-08-17
DK0391035T3 (da) 1994-08-01
JPH0368139A (ja) 1991-03-25
NO901480L (no) 1990-10-04
NO901480D0 (no) 1990-04-02
DE69010368T2 (de) 1994-11-03
JP2770883B2 (ja) 1998-07-02

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