DE69012813T2 - Schmalbandiger excimerlaser. - Google Patents

Schmalbandiger excimerlaser.

Info

Publication number
DE69012813T2
DE69012813T2 DE69012813T DE69012813T DE69012813T2 DE 69012813 T2 DE69012813 T2 DE 69012813T2 DE 69012813 T DE69012813 T DE 69012813T DE 69012813 T DE69012813 T DE 69012813T DE 69012813 T2 DE69012813 T2 DE 69012813T2
Authority
DE
Germany
Prior art keywords
excimer laser
narrow band
band excimer
narrow
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69012813T
Other languages
English (en)
Other versions
DE69012813D1 (de
Inventor
O K K Komatsu Seis Wakabayashi
M K K Komatsu Seisakush Kowaka
Y K K Komatsu Seisak Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14896836&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69012813(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Publication of DE69012813D1 publication Critical patent/DE69012813D1/de
Application granted granted Critical
Publication of DE69012813T2 publication Critical patent/DE69012813T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
DE69012813T 1989-05-18 1990-05-18 Schmalbandiger excimerlaser. Expired - Fee Related DE69012813T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1124898A JP2531788B2 (ja) 1989-05-18 1989-05-18 狭帯域発振エキシマレ―ザ
PCT/JP1990/000639 WO1990014704A1 (fr) 1989-05-18 1990-05-18 Laser excimer a oscillation a bande etroite

Publications (2)

Publication Number Publication Date
DE69012813D1 DE69012813D1 (de) 1994-10-27
DE69012813T2 true DE69012813T2 (de) 1995-02-16

Family

ID=14896836

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69012813T Expired - Fee Related DE69012813T2 (de) 1989-05-18 1990-05-18 Schmalbandiger excimerlaser.

Country Status (6)

Country Link
US (1) US5596596A (de)
EP (1) EP0472727B1 (de)
JP (1) JP2531788B2 (de)
CA (1) CA2064207A1 (de)
DE (1) DE69012813T2 (de)
WO (1) WO1990014704A1 (de)

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DE19603637C1 (de) 1996-02-01 1997-07-31 Lambda Physik Gmbh Laser zur Erzeugung schmalbandiger Strahlung
US6331994B1 (en) 1996-07-19 2001-12-18 Canon Kabushiki Kaisha Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
CN1061786C (zh) * 1996-12-27 2001-02-07 中国科学院电子学研究所 高功率窄线宽可调谐激光器
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6028879A (en) * 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
ES2195346T3 (es) * 1997-07-01 2003-12-01 Cymer Inc Laser de banda muy estrecha con cavidad de resonancia inestable.
WO1999045613A1 (en) * 1998-03-04 1999-09-10 Cymer, Inc. RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER
US5946337A (en) * 1998-04-29 1999-08-31 Lambda Physik Gmbh Hybrid laser resonator with special line narrowing
US6061382A (en) * 1998-05-04 2000-05-09 Lambda Physik Gmbh Laser system and method for narrow spectral linewidth through wavefront curvature compensation
US6160832A (en) 1998-06-01 2000-12-12 Lambda Physik Gmbh Method and apparatus for wavelength calibration
US6580517B2 (en) 2000-03-01 2003-06-17 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US7006541B2 (en) 1998-06-01 2006-02-28 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6795473B1 (en) 1999-06-23 2004-09-21 Lambda Physik Ag Narrow band excimer laser with a prism-grating as line-narrowing optical element
US6285701B1 (en) 1998-08-06 2001-09-04 Lambda Physik Ag Laser resonator for improving narrow band emission of an excimer laser
US6424666B1 (en) 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US6381256B1 (en) 1999-02-10 2002-04-30 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
US6476987B1 (en) 1999-08-04 2002-11-05 Lambda Physik Ag Excimer laser with line narrowing
US6804285B2 (en) 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US6067197A (en) * 1998-12-23 2000-05-23 Spectronic Instruments, Inc. Difraction grating having enhanced blaze performance at two wavelengths
US6421365B1 (en) 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6678291B2 (en) 1999-12-15 2004-01-13 Lambda Physik Ag Molecular fluorine laser
US6463086B1 (en) 1999-02-10 2002-10-08 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
US6546037B2 (en) 1999-02-10 2003-04-08 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
US6393040B1 (en) 1999-02-24 2002-05-21 Lambda Physik Ag Molecular fluorine (F2) excimer laser with reduced coherence length
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6298080B1 (en) 1999-03-12 2001-10-02 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
DE29907349U1 (de) 1999-04-26 2000-07-06 Lambda Physik Gmbh Laser zur Erzeugung schmalbandiger Strahlung
US6785316B1 (en) 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
US6553050B1 (en) 1999-11-18 2003-04-22 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6603788B1 (en) 1999-11-23 2003-08-05 Lambda Physik Ag Resonator for single line selection
WO2001055684A2 (en) 2000-01-25 2001-08-02 Lambda Physik Ag Energy monitor for molecular fluorine laser
US6542243B2 (en) 2000-01-27 2003-04-01 Lambda Physik Ag Resonator optics monitoring method
US6735232B2 (en) 2000-01-27 2004-05-11 Lambda Physik Ag Laser with versatile output energy
US7075963B2 (en) 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US6941259B2 (en) * 2000-03-01 2005-09-06 Lamda Physik Ag Laser software control system
US6597462B2 (en) 2000-03-01 2003-07-22 Lambda Physik Ag Laser wavelength and bandwidth monitor
US6618403B2 (en) 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
US20010049618A1 (en) * 2000-03-23 2001-12-06 Rainer Patzel Method for allocating predictable costs for consumable items
WO2001084678A2 (en) 2000-04-18 2001-11-08 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
US6862307B2 (en) * 2000-05-15 2005-03-01 Lambda Physik Ag Electrical excitation circuit for a pulsed gas laser
US6577663B2 (en) 2000-06-19 2003-06-10 Lambda Physik Ag Narrow bandwidth oscillator-amplifier system
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
US6807205B1 (en) 2000-07-14 2004-10-19 Lambda Physik Ag Precise monitor etalon calibration technique
US6731666B1 (en) 2000-07-20 2004-05-04 Komatsu Ltd. Laser device
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US6747741B1 (en) 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
US6690703B1 (en) 2001-08-02 2004-02-10 Lambda Physik Ag Molecular fluorine laser system
US6998620B2 (en) * 2001-08-13 2006-02-14 Lambda Physik Ag Stable energy detector for extreme ultraviolet radiation detection
DE20317902U1 (de) * 2003-11-19 2005-03-24 Sacher Joachim Laserdioden-Anordnung mit externem Resonator
JP4527479B2 (ja) * 2004-09-10 2010-08-18 サンテック株式会社 波長走査型ファイバレーザ光源
KR100702845B1 (ko) * 2006-01-20 2007-04-03 삼성전자주식회사 엑시머 레이저 및 그의 협대역 모듈
DE102008035898A1 (de) * 2007-08-06 2009-02-12 Carl Zeiss Meditec Ag Vorrichtung und Verfahren zur Specklereduktion im Bereich der Laseranwendungen

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Also Published As

Publication number Publication date
US5596596A (en) 1997-01-21
EP0472727B1 (de) 1994-09-21
CA2064207A1 (en) 1990-11-19
DE69012813D1 (de) 1994-10-27
EP0472727A1 (de) 1992-03-04
WO1990014704A1 (fr) 1990-11-29
JPH02303178A (ja) 1990-12-17
JP2531788B2 (ja) 1996-09-04
EP0472727A4 (en) 1992-06-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee