DE69013267T2 - Integrierte Halbleiterschaltungsanordnung. - Google Patents

Integrierte Halbleiterschaltungsanordnung.

Info

Publication number
DE69013267T2
DE69013267T2 DE69013267T DE69013267T DE69013267T2 DE 69013267 T2 DE69013267 T2 DE 69013267T2 DE 69013267 T DE69013267 T DE 69013267T DE 69013267 T DE69013267 T DE 69013267T DE 69013267 T2 DE69013267 T2 DE 69013267T2
Authority
DE
Germany
Prior art keywords
circuit arrangement
semiconductor circuit
integrated semiconductor
integrated
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69013267T
Other languages
English (en)
Other versions
DE69013267D1 (de
Inventor
Hiroshi Takamoto
Matokot Segawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE69013267D1 publication Critical patent/DE69013267D1/de
Application granted granted Critical
Publication of DE69013267T2 publication Critical patent/DE69013267T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
DE69013267T 1989-08-11 1990-08-10 Integrierte Halbleiterschaltungsanordnung. Expired - Fee Related DE69013267T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1209167A JPH065705B2 (ja) 1989-08-11 1989-08-11 半導体集積回路装置

Publications (2)

Publication Number Publication Date
DE69013267D1 DE69013267D1 (de) 1994-11-17
DE69013267T2 true DE69013267T2 (de) 1995-03-16

Family

ID=16568442

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69013267T Expired - Fee Related DE69013267T2 (de) 1989-08-11 1990-08-10 Integrierte Halbleiterschaltungsanordnung.

Country Status (5)

Country Link
US (1) US5079612A (de)
EP (1) EP0412561B1 (de)
JP (1) JPH065705B2 (de)
KR (1) KR930011797B1 (de)
DE (1) DE69013267T2 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS633055A (ja) * 1986-06-24 1988-01-08 Mitsubishi Chem Ind Ltd インサ−ト成形品
JP2742735B2 (ja) * 1991-07-30 1998-04-22 三菱電機株式会社 半導体集積回路装置およびそのレイアウト設計方法
KR940009605B1 (ko) * 1991-09-16 1994-10-15 삼성전자 주식회사 반도체 메모리의 정전방전 보호장치
EP0610430B1 (de) * 1991-10-30 1999-03-10 Harris Corporation Analog/digitalwanlder und herstellungsverfahren
US5272371A (en) * 1991-11-19 1993-12-21 Sgs-Thomson Microelectronics, Inc. Electrostatic discharge protection structure
US5535084A (en) * 1992-07-24 1996-07-09 Kawasaki Steel Corporation Semiconductor integrated circuit having protection circuits
JP2972494B2 (ja) 1993-06-30 1999-11-08 日本電気株式会社 半導体装置
US5372951A (en) * 1993-10-01 1994-12-13 Advanced Micro Devices, Inc. Method of making a semiconductor having selectively enhanced field oxide areas
JP2636773B2 (ja) * 1995-01-25 1997-07-30 日本電気株式会社 半導体集積回路装置
ATE229230T1 (de) * 1995-04-06 2002-12-15 Infineon Technologies Ag Integrierte halbleiterschaltung mit einem schutzmittel
JP2636804B2 (ja) * 1995-05-30 1997-07-30 日本電気株式会社 半導体装置
JP2834034B2 (ja) * 1995-06-22 1998-12-09 日本電気アイシーマイコンシステム株式会社 半導体装置
WO1997010615A1 (en) * 1995-09-11 1997-03-20 Analog Devices, Inc. (Adi) Electrostatic discharge protection network and method
KR100211539B1 (ko) 1995-12-29 1999-08-02 김영환 반도체소자의 정전기방전 보호장치 및 그 제조방법
US5721658A (en) * 1996-04-01 1998-02-24 Micron Technology, Inc. Input/output electrostatic discharge protection for devices with multiple individual power groups
JP3017083B2 (ja) * 1996-04-10 2000-03-06 日本電気株式会社 入出力保護回路
US5875089A (en) * 1996-04-22 1999-02-23 Mitsubishi Denki Kabushiki Kaisha Input protection circuit device
US5757208A (en) * 1996-05-01 1998-05-26 Motorola, Inc. Programmable array and method for routing power busses therein
EP0976190A1 (de) * 1997-04-16 2000-02-02 The Board Of Trustees Of The Leland Stanford Junior University Verteilter esd-schutz für hochgeschwindigkeitsintegrierte schaltungen
US6445039B1 (en) * 1998-11-12 2002-09-03 Broadcom Corporation System and method for ESD Protection
US8405152B2 (en) 1999-01-15 2013-03-26 Broadcom Corporation System and method for ESD protection
US7687858B2 (en) * 1999-01-15 2010-03-30 Broadcom Corporation System and method for ESD protection
WO2000042659A2 (en) * 1999-01-15 2000-07-20 Broadcom Corporation System and method for esd protection
EP1301972B1 (de) * 2000-07-13 2016-03-23 Broadcom Corporation Methoden und systeme zur verbesserung der antwortzeit einer esd-klemmschaltung
DE10102354C1 (de) * 2001-01-19 2002-08-08 Infineon Technologies Ag Halbleiter-Bauelement mit ESD-Schutz
US6947273B2 (en) * 2001-01-29 2005-09-20 Primarion, Inc. Power, ground, and routing scheme for a microprocessor power regulator
FR2831328A1 (fr) * 2001-10-23 2003-04-25 St Microelectronics Sa Protection d'un circuit integre contre des decharges electrostatiques et autres surtensions
JP3908669B2 (ja) * 2003-01-20 2007-04-25 株式会社東芝 静電気放電保護回路装置
WO2005053028A1 (ja) * 2003-11-27 2005-06-09 Matsushita Electric Industrial Co., Ltd. 静電破壊保護素子を備えた半導体装置
US20070158817A1 (en) * 2004-03-12 2007-07-12 Rohm Co., Ltd. Semiconductor device
US7439592B2 (en) * 2004-12-13 2008-10-21 Broadcom Corporation ESD protection for high voltage applications
US7505238B2 (en) * 2005-01-07 2009-03-17 Agnes Neves Woo ESD configuration for low parasitic capacitance I/O
JP2006237101A (ja) 2005-02-23 2006-09-07 Nec Electronics Corp 半導体集積回路装置
JP5337173B2 (ja) * 2011-01-07 2013-11-06 ルネサスエレクトロニクス株式会社 半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124262A (ja) * 1982-01-20 1983-07-23 Nec Corp 集積回路装置
US4819047A (en) * 1987-05-15 1989-04-04 Advanced Micro Devices, Inc. Protection system for CMOS integrated circuits
US4990802A (en) * 1988-11-22 1991-02-05 At&T Bell Laboratories ESD protection for output buffers

Also Published As

Publication number Publication date
EP0412561A3 (en) 1991-05-29
DE69013267D1 (de) 1994-11-17
JPH065705B2 (ja) 1994-01-19
KR910005468A (ko) 1991-03-30
US5079612A (en) 1992-01-07
EP0412561B1 (de) 1994-10-12
EP0412561A2 (de) 1991-02-13
JPH0372666A (ja) 1991-03-27
KR930011797B1 (ko) 1993-12-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee