DE69013790T2 - Verfahren und Vorrichtung zur Positionsbestimmung. - Google Patents

Verfahren und Vorrichtung zur Positionsbestimmung.

Info

Publication number: DE69013790T2
Authority: DE; Germany
Prior art keywords: determining position; determining
Prior art date: 1989-08-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69013790T

Other languages

English (en)

Other versions

DE69013790D1 (de

Inventor

Masakazu Matsugu

Kenji Saitoh

Mitsutoshi Ohwada

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-08-04

Filing date

1990-08-03

Publication date

1995-05-04

1989-08-04 Priority claimed from JP1203053A external-priority patent/JP2791120B2/ja

1990-05-25 Priority claimed from JP2136827A external-priority patent/JP2874284B2/ja

1990-08-03 Application filed by Canon Inc filed Critical Canon Inc

1994-12-08 Publication of DE69013790D1 publication Critical patent/DE69013790D1/de

1995-05-04 Application granted granted Critical

1995-05-04 Publication of DE69013790T2 publication Critical patent/DE69013790T2/de

2010-08-04 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

DE69013790T 1989-08-04 1990-08-03 Verfahren und Vorrichtung zur Positionsbestimmung. Expired - Fee Related DE69013790T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP1203053A JP2791120B2 (ja)	1989-08-04	1989-08-04	位置検出装置及び方法
JP2136827A JP2874284B2 (ja)	1990-05-25	1990-05-25	間隔測定装置

Publications (2)

Publication Number	Publication Date
DE69013790D1 DE69013790D1 (de)	1994-12-08
DE69013790T2 true DE69013790T2 (de)	1995-05-04

Family

ID=26470322

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69013790T Expired - Fee Related DE69013790T2 (de)	1989-08-04	1990-08-03	Verfahren und Vorrichtung zur Positionsbestimmung.

Country Status (3)

Country	Link
US (1)	US5114236A (de)
EP (1)	EP0411966B1 (de)
DE (1)	DE69013790T2 (de)

Families Citing this family (52)

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US5319444A (en) *	1988-02-16	1994-06-07	Canon Kabushiki Kaisha	Position detecting method and apparatus
JP2890943B2 (ja) *	1990-11-30	1999-05-17	キヤノン株式会社	位置検出方法及びそれを用いた位置検出装置
JP2796899B2 (ja) *	1991-02-16	1998-09-10	住友重機械工業株式会社	色収差２重焦点装置における帯域光および複色光照明方法
JPH0540013A (ja) *	1991-08-05	1993-02-19	Canon Inc	ずれ測定方法及びこの方法を用いた露光装置
CA2078732A1 (en) *	1991-09-27	1993-03-28	Koichi Sentoku	Displacement measuring device and displacement measuring method
JP3187093B2 (ja) *	1991-09-27	2001-07-11	キヤノン株式会社	位置ずれ測定装置
JPH0590126A (ja) *	1991-09-27	1993-04-09	Canon Inc	位置検出装置
JP3008654B2 (ja) *	1992-02-21	2000-02-14	キヤノン株式会社	位置検出装置
JP2833908B2 (ja) *	1992-03-04	1998-12-09	山形日本電気株式会社	露光装置における位置決め装置
US5585923A (en) *	1992-11-14	1996-12-17	Canon Kabushiki Kaisha	Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means
US5455679A (en) *	1993-02-22	1995-10-03	Canon Kabushiki Kaisha	Position detecting system
JPH06311315A (ja) *	1993-04-26	1994-11-04	Canon Inc	画像読取装置
JP3428705B2 (ja) *	1993-10-20	2003-07-22	キヤノン株式会社	位置検出装置及びそれを用いた半導体素子の製造方法
US5625453A (en) *	1993-10-26	1997-04-29	Canon Kabushiki Kaisha	System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating
JP3379200B2 (ja)	1994-03-25	2003-02-17	株式会社ニコン	位置検出装置
US5469263A (en) *	1994-07-01	1995-11-21	Motorola, Inc.	Method for alignment in photolithographic processes
KR0132269B1 (ko) *	1994-08-24	1998-04-11	이대원	노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법
JPH0886612A (ja) *	1994-09-19	1996-04-02	Canon Inc	光ヘテロダイン干渉を利用した位置ずれ検出装置
JPH1022213A (ja) *	1996-06-28	1998-01-23	Canon Inc	位置検出装置及びそれを用いたデバイスの製造方法
JPH11241908A (ja) *	1997-12-03	1999-09-07	Canon Inc	位置検出装置及びそれを用いたデバイスの製造方法
US5939611A (en) *	1998-02-24	1999-08-17	Data I/O Corporation	Method and system for calibrating a device handler
US6130902A (en) *	1998-05-26	2000-10-10	Shimoji; Yutaka	Solid state laser chip
US6312373B1 (en) *	1998-09-22	2001-11-06	Nikon Corporation	Method of manufacturing an optical system
JP3019095B1 (ja) *	1998-12-22	2000-03-13	日本電気株式会社	有機薄膜ｅｌデバイスの製造方法
JP2003007601A (ja) *	2001-06-26	2003-01-10	Canon Inc	２つの物体の間隔測定方法とそれを用いた半導体露光方法、および間隔測定装置、半導体露光装置
DE10151216A1 (de) *	2001-10-16	2003-04-24	Zeiss Carl Jena Gmbh	Verfahren zur optischen Erfassung von charakteristischen Größen einer beleuchteten Probe
CN1506768B (zh) *	2002-09-20	2011-01-26	Asml荷兰有限公司	用于光刻系统的对准系统和方法
CN100390502C (zh) *	2003-03-12	2008-05-28	中国科学院沈阳自动化研究所	一种精密平行度测量方法
EP1630857A4 (de) *	2003-05-28	2008-04-16	Nikon Corp	Positions-informationsmessverfahren und -einrichtung und belichtungsverfahren und -system
US7247952B2 (en) *	2003-10-30	2007-07-24	Hewlett-Packard Development Company, L.P.	Optical targets
US7573580B2 (en) *	2003-11-17	2009-08-11	Asml Holding N.V.	Optical position measuring system and method using a low coherence light source
US8422027B2 (en) *	2010-06-08	2013-04-16	Nikon Corporation	Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane
DE102012221566A1 (de) *	2012-11-26	2014-05-28	Dr. Johannes Heidenhain Gmbh	Optische Positionsmesseinrichtung
JP2014220263A (ja) *	2013-04-30	2014-11-20	キヤノン株式会社	リソグラフィ装置、及び物品の製造方法
WO2015008365A1 (ja) *	2013-07-18	2015-01-22	ギガフォトン株式会社	露光装置
FR3014212B1 (fr) *	2013-12-04	2017-05-26	Fogale Nanotech	Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact
US10678412B2 (en)	2014-07-31	2020-06-09	Microsoft Technology Licensing, Llc	Dynamic joint dividers for application windows
US10592080B2 (en)	2014-07-31	2020-03-17	Microsoft Technology Licensing, Llc	Assisted presentation of application windows
US10254942B2 (en)	2014-07-31	2019-04-09	Microsoft Technology Licensing, Llc	Adaptive sizing and positioning of application windows
US10018844B2 (en)	2015-02-09	2018-07-10	Microsoft Technology Licensing, Llc	Wearable image display system
US9513480B2 (en)	2015-02-09	2016-12-06	Microsoft Technology Licensing, Llc	Waveguide
US9372347B1 (en)	2015-02-09	2016-06-21	Microsoft Technology Licensing, Llc	Display system
US9535253B2 (en)	2015-02-09	2017-01-03	Microsoft Technology Licensing, Llc	Display system
US9827209B2 (en)	2015-02-09	2017-11-28	Microsoft Technology Licensing, Llc	Display system
US9429692B1 (en)	2015-02-09	2016-08-30	Microsoft Technology Licensing, Llc	Optical components
US11086216B2 (en)	2015-02-09	2021-08-10	Microsoft Technology Licensing, Llc	Generating electronic components
US9423360B1 (en) *	2015-02-09	2016-08-23	Microsoft Technology Licensing, Llc	Optical components
US10317677B2 (en)	2015-02-09	2019-06-11	Microsoft Technology Licensing, Llc	Display system
JP2018526812A (ja) *	2015-06-15	2018-09-13	ザイゴコーポレーションＺｙｇｏＣｏｒｐｏｒａｔｉｏｎ	変形体の変位測定
JP6686564B2 (ja) *	2016-03-11	2020-04-22	コニカミノルタ株式会社	画像読取装置
NL2018564A (en)	2016-03-30	2017-10-05	Asml Netherlands Bv	Substrate edge detection
DE112021002696T5 (de) *	2020-05-11	2023-02-23	Cognex Corporation	Verfahren und apparate zum extrahieren von profilen aus dreidimensionalen bildern

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4037969A (en) *	1976-04-02	1977-07-26	Bell Telephone Laboratories, Incorporated	Zone plate alignment marks
US4326805A (en) *	1980-04-11	1982-04-27	Bell Telephone Laboratories, Incorporated	Method and apparatus for aligning mask and wafer members
US4355892A (en) *	1980-12-18	1982-10-26	Censor Patent- Und Versuchs-Anstalt	Method for the projection printing
US4398824A (en) *	1981-04-15	1983-08-16	Bell Telephone Laboratories, Incorporated	Wafer tilt compensation in zone plate alignment system
JPS5979527A (ja) *	1982-10-29	1984-05-08	Hitachi Ltd	パタ−ン検出装置
US4514858A (en) *	1983-03-15	1985-04-30	Micronix Partners	Lithography system
JPH0732109B2 (ja) *	1983-10-07	1995-04-10	株式会社日立製作所	光露光方法
US4748333A (en) *	1986-03-31	1988-05-31	Nippon Kogaku K. K.	Surface displacement sensor with opening angle control
FR2598797B1 (fr) *	1986-05-07	1990-05-11	Nippon Telegraph & Telephone	Procede de mesure et/ou d'ajustement du deplacement d'un objet et appareil pour la mise en oeuvre de ce procede
US4814829A (en) *	1986-06-12	1989-03-21	Canon Kabushiki Kaisha	Projection exposure apparatus
JPS63220521A (ja) *	1987-03-10	1988-09-13	Canon Inc	焦点合せ装置
JPS6441805A (en) *	1987-08-07	1989-02-14	Sumitomo Heavy Industries	Position detecting apparatus of two bodies, which are separated by minute distance
US4857744A (en) *	1987-07-29	1989-08-15	Hitachi, Ltd.	Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system
EP0323242A3 (de) *	1987-12-28	1989-10-18	Kabushiki Kaisha Toshiba	Verfahren und Vorrichtung zum Ausrichten von zwei Objekten, und Verfahren und Vorrichtung zum Einstellen eines gewünschten Spaltes zwischen zwei Objekten

1990
- 1990-08-03 US US07/562,656 patent/US5114236A/en not_active Expired - Lifetime
- 1990-08-03 DE DE69013790T patent/DE69013790T2/de not_active Expired - Fee Related
- 1990-08-03 EP EP90308601A patent/EP0411966B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0411966B1 (de)	1994-11-02
DE69013790D1 (de)	1994-12-08
EP0411966A2 (de)	1991-02-06
US5114236A (en)	1992-05-19
EP0411966A3 (en)	1991-04-17

Legal Events

Date	Code	Title	Description
1995-11-30	8364	No opposition during term of opposition
2010-06-24	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE69013790D1 (de)	1994-12-08	Verfahren und Vorrichtung zur Positionsbestimmung.
DE69018838D1 (de)	1995-06-01	Verfahren und Vorrichtung zur Oberflächenanalyse.
DE68928192T2 (de)	1997-11-27	Vorrichtung und Verfahren zur Positionsdetektion
DE69000870D1 (de)	1993-03-18	Verfahren und vorrichtung zur abfallbeseitigung.
DE69009091T2 (de)	1994-09-01	Verfahren und Vorrichtung zur Signalverarbeitung.
DE69009109D1 (de)	1994-06-30	Vorrichtung und Verfahren zur Lichtmessung.
DE68924563D1 (de)	1995-11-23	Verfahren und Vorrichtung zur Oberflächenanalyse.
DE69008477D1 (de)	1994-06-01	Verfahren und Vorrichtung zur Zielerkennung.
DE58904662D1 (de)	1993-07-15	Verfahren und vorrichtung zur glanzmessung.
DE59007108D1 (de)	1994-10-20	Verfahren und Vorrichtung zur Lagebestimmung eines Objektes.
DE69014658T2 (de)	1995-04-20	Verfahren und Vorrichtung zur Signalgewinnung.
DE69017029T2 (de)	1995-06-08	Verfahren und vorrichtung zur nichtzerstörenden prüfung.
DE68924024D1 (de)	1995-10-05	Verfahren und Vorrichtung zur zweidimensionalen Positionsdetektion.
DE69021546D1 (de)	1995-09-14	Verfahren und Vorrichtung zur Photodetektion.
DE69013759D1 (de)	1994-12-08	Verfahren und Vorrichtung zur Reinigung von Gegenständen.
DE59004481D1 (de)	1994-03-17	Verfahren und Vorrichtung zur Fahrgeschwindigkeitsbegrenzung.
DE68905349D1 (de)	1993-04-22	Verfahren und vorrichtung zur drehgeschwindigkeitsbestimmung.
DE69007222D1 (de)	1994-04-14	Verfahren und Vorrichtung zur Elektroplattierung.
DE69017228T2 (de)	1995-06-14	Verfahren und vorrichtung zur entfernungsmessung.
DE69021544D1 (de)	1995-09-14	Verfahren und Vorrichtung zur Photodetektion.
DE69011299T2 (de)	1995-01-26	Verfahren und Vorrichtung zur Filmschneide-Positionsprüfung.
DE3879192T2 (de)	1993-08-12	Verfahren und vorrichtung zur elektrodesionisation.
DE59103793D1 (de)	1995-01-19	Verfahren und Vorrichtung zur Längen- oder Winkelmessung.
DE68929205D1 (de)	2000-06-15	Vorrichtung und Verfahren zur Positionsdetektion
DE69127223D1 (de)	1997-09-18	Verfahren und Vorrichtung zur Positionsdetektion