DE69032277T2 - Optisches Nahfeld-Verfahren für Mikrolithographie und Mikrolithographie-Vorrichtungen unter Verwendung desselben - Google Patents

Optisches Nahfeld-Verfahren für Mikrolithographie und Mikrolithographie-Vorrichtungen unter Verwendung desselben

Info

Publication number
DE69032277T2
DE69032277T2 DE69032277T DE69032277T DE69032277T2 DE 69032277 T2 DE69032277 T2 DE 69032277T2 DE 69032277 T DE69032277 T DE 69032277T DE 69032277 T DE69032277 T DE 69032277T DE 69032277 T2 DE69032277 T2 DE 69032277T2
Authority
DE
Germany
Prior art keywords
microlithography
substrate
near field
optical
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032277T
Other languages
English (en)
Other versions
DE69032277D1 (de
Inventor
Fornel Frederique De
Jean-Pierre Goudonnet
James Mantovani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SIM D INVESTISSEMENT D Ste
Original Assignee
SIM D INVESTISSEMENT D Ste
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9385780&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69032277(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by SIM D INVESTISSEMENT D Ste filed Critical SIM D INVESTISSEMENT D Ste
Publication of DE69032277D1 publication Critical patent/DE69032277D1/de
Application granted granted Critical
Publication of DE69032277T2 publication Critical patent/DE69032277T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Micromachines (AREA)
  • Optical Integrated Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Display Devices Of Pinball Game Machines (AREA)
DE69032277T 1989-09-22 1990-09-21 Optisches Nahfeld-Verfahren für Mikrolithographie und Mikrolithographie-Vorrichtungen unter Verwendung desselben Expired - Fee Related DE69032277T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8912497A FR2652423B1 (fr) 1989-09-22 1989-09-22 Procede de microlithographie pour la realisation de structures superficielles submicrometriques sur un substrat du type d'une plaquette de silicium, ainsi qu'un dispositif le mettant en óoeuvre.

Publications (2)

Publication Number Publication Date
DE69032277D1 DE69032277D1 (de) 1998-06-04
DE69032277T2 true DE69032277T2 (de) 1998-12-17

Family

ID=9385780

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032277T Expired - Fee Related DE69032277T2 (de) 1989-09-22 1990-09-21 Optisches Nahfeld-Verfahren für Mikrolithographie und Mikrolithographie-Vorrichtungen unter Verwendung desselben

Country Status (16)

Country Link
US (1) US5384464A (de)
EP (1) EP0419369B1 (de)
JP (1) JPH05504655A (de)
CN (1) CN1052559A (de)
AT (1) ATE165675T1 (de)
AU (1) AU6416890A (de)
BR (1) BR9007682A (de)
CA (1) CA2066586A1 (de)
DD (1) DD297721A5 (de)
DE (1) DE69032277T2 (de)
FI (1) FI921211A (de)
FR (1) FR2652423B1 (de)
HU (1) HUT62100A (de)
OA (1) OA09538A (de)
WO (1) WO1991004513A1 (de)
ZA (1) ZA907560B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7097974B1 (en) 1998-08-28 2006-08-29 Febit Biotech Gmbh Support for a method for determining an analyte and a method for producing the support
US7470540B2 (en) 2000-10-17 2008-12-30 Febit Ag Method and device for the integrated synthesis and analysis of analytes on a support

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459392B1 (de) * 1990-05-30 1999-08-18 Hitachi, Ltd. Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe
US5226107A (en) * 1992-06-22 1993-07-06 General Dynamics Corporation, Space Systems Division Apparatus and method of using fiber-optic light guide for heating enclosed test articles
US5866911A (en) * 1994-07-15 1999-02-02 Baer; Stephen C. Method and apparatus for improving resolution in scanned optical system
DE19630705A1 (de) 1995-08-30 1997-03-20 Deutsche Telekom Ag Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik
US6232046B1 (en) 1995-08-30 2001-05-15 Deutsche Telekom Ag Process for improving the contrast in the structure of 3-dimensional surfaces
DE19632563A1 (de) * 1996-01-04 1997-07-10 Deutsche Telekom Ag Verfahren und Vorrichtung zur Herstellung strukturierter lambda/4-Plättchen, Spiegel, Gitter und Prismen auf dreidimensionalen Flächen
JP3264824B2 (ja) * 1996-04-11 2002-03-11 セイコーインスツルメンツ株式会社 光伝搬体プローブと走査型近視野顕微鏡及び光伝搬体プローブの透過孔形成方法
AU3222397A (en) 1996-06-10 1998-01-07 Holographic Lithography Systems Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist
US6088505A (en) * 1996-06-10 2000-07-11 Holographic Lithography Systems, Inc. Holographic patterning method and tool for production environments
US6078055A (en) * 1997-03-19 2000-06-20 California Institute Of Technology Proximity lithography device
US6806477B1 (en) 1997-05-23 2004-10-19 Canon Kabushiki Kaisha Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
EP0880078A3 (de) * 1997-05-23 2001-02-14 Canon Kabushiki Kaisha Vorrichtung zur Detektion einer Position, Apparat unter Verwendung derselben, Belichtungsapparat, und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben
DE19726634A1 (de) * 1997-06-18 1998-12-24 Biotools Inst Fuer Computerint Verfahren und Vorrichtung zur Immobilisierung von Makromolekülen
TW460758B (en) 1998-05-14 2001-10-21 Holographic Lithography System A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
US6312876B1 (en) 1999-07-08 2001-11-06 Taiwan Semiconductor Manufacturing Company Method for placing identifying mark on semiconductor wafer
JP4017795B2 (ja) * 1999-08-27 2007-12-05 富士フイルム株式会社 光波長変換素子およびその作製方法
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
TW473823B (en) * 1999-11-18 2002-01-21 Nippon Kogaku Kk Exposure method as well as exposure apparatus, and method for manufacturing device
US20020145113A1 (en) * 2001-04-09 2002-10-10 Applied Materials, Inc. Optical signal transmission for electron beam imaging apparatus
US20020160427A1 (en) * 2001-04-27 2002-10-31 Febit Ag Methods and apparatuses for electronic determination of analytes
FR2827967B1 (fr) * 2001-07-26 2003-10-24 Essilor Int Procede d'impression d'une structure stable photoinduite en champ proche,et pointe de fibre optique pour sa mise en oeuvre
CA2625647A1 (en) * 2005-10-12 2007-04-19 Adelaide Research And Innovation Pty Ltd Fabrication of nanowires
KR101403744B1 (ko) * 2008-04-07 2014-06-03 엘지전자 주식회사 패터닝 장치 및 방법
CN102279556B (zh) * 2011-06-02 2013-07-17 中山大学 相位全息与近场光学显微镜联用制备功能性光子晶体装置及其应用方法
FR3017963B1 (fr) * 2014-02-27 2016-03-25 Essilor Int Instrument optique pour identifier et localiser des microgravures presentes sur une lentille ophtalmique

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH461149A (de) * 1967-05-09 1968-08-15 Conradi G Ag Einrichtung an einer Zeichenmaschine oder einem Koordinatographen zur mindestens angenähert fehlerfreien Auftragung von Punkten, Linien und Symbolen auf eine zur Führungsebene des Arbeitswagens nicht parallele und/oder nicht plane photographische Schicht
JPS5694742A (en) * 1979-12-28 1981-07-31 Jeol Ltd Electronic beam exposure device
JPS5849298A (ja) * 1981-09-18 1983-03-23 旭光学工業株式会社 フォト自動製図機における自動合焦装置
EP0128993B1 (de) * 1983-06-17 1987-06-03 Lasarray Holding Ag Verfahren zum Feststellen von Referenzdaten zum Zwecke der Korrektur von mechanischen Bewegungen beim Schreiben von Linien mit einem Schreiblaserstrahl in einem metallisierten Raster und Vorrichtung zur Durchführung des Verfahrens
EP0283256A3 (de) * 1987-03-18 1990-02-07 Tektronix Inc. Optisches Abtastmikroskop
EP0459392B1 (de) * 1990-05-30 1999-08-18 Hitachi, Ltd. Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7097974B1 (en) 1998-08-28 2006-08-29 Febit Biotech Gmbh Support for a method for determining an analyte and a method for producing the support
US7737088B1 (en) 1998-08-28 2010-06-15 Febit Holding Gmbh Method and device for producing biochemical reaction supporting materials
US7470540B2 (en) 2000-10-17 2008-12-30 Febit Ag Method and device for the integrated synthesis and analysis of analytes on a support

Also Published As

Publication number Publication date
EP0419369B1 (de) 1998-04-29
FR2652423A1 (fr) 1991-03-29
ZA907560B (en) 1991-07-31
FI921211A0 (fi) 1992-03-20
DE69032277D1 (de) 1998-06-04
AU6416890A (en) 1991-04-18
FI921211A (fi) 1992-03-20
ATE165675T1 (de) 1998-05-15
JPH05504655A (ja) 1993-07-15
FR2652423B1 (fr) 1992-05-22
OA09538A (fr) 1992-11-15
CN1052559A (zh) 1991-06-26
CA2066586A1 (fr) 1991-03-23
WO1991004513A1 (fr) 1991-04-04
HU9200910D0 (en) 1992-08-28
US5384464A (en) 1995-01-24
EP0419369A1 (de) 1991-03-27
BR9007682A (pt) 1992-07-07
DD297721A5 (de) 1992-01-16
HUT62100A (en) 1993-03-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee