DE69120614D1 - Elektrophotonische Vorrichtung mit vertikalem Resonator vom "vertical to surface" Übertragungstyp - Google Patents
Elektrophotonische Vorrichtung mit vertikalem Resonator vom "vertical to surface" ÜbertragungstypInfo
- Publication number
- DE69120614D1 DE69120614D1 DE69120614T DE69120614T DE69120614D1 DE 69120614 D1 DE69120614 D1 DE 69120614D1 DE 69120614 T DE69120614 T DE 69120614T DE 69120614 T DE69120614 T DE 69120614T DE 69120614 D1 DE69120614 D1 DE 69120614D1
- Authority
- DE
- Germany
- Prior art keywords
- vertical
- transmission type
- resonator
- electrophotonic
- electrophotonic device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005540 biological transmission Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035209—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/125—Composite devices with photosensitive elements and electroluminescent elements within one single body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0008—Devices characterised by their operation having p-n or hi-lo junctions
- H01L33/0016—Devices characterised by their operation having p-n or hi-lo junctions having at least two p-n junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18305—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18358—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] containing spacer layers to adjust the phase of the light wave in the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21883390A JP2596195B2 (ja) | 1990-08-20 | 1990-08-20 | 垂直共振器型面入出力光電融合素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69120614D1 true DE69120614D1 (de) | 1996-08-08 |
DE69120614T2 DE69120614T2 (de) | 1997-02-20 |
Family
ID=16726058
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69120614T Expired - Lifetime DE69120614T2 (de) | 1990-08-20 | 1991-08-20 | Elektrophotonische Vorrichtung mit vertikalem Resonator vom "vertical to surface" Übertragungstyp |
Country Status (5)
Country | Link |
---|---|
US (1) | US5229627A (de) |
EP (1) | EP0474018B1 (de) |
JP (1) | JP2596195B2 (de) |
CA (1) | CA2049448C (de) |
DE (1) | DE69120614T2 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5525828A (en) * | 1991-10-31 | 1996-06-11 | International Business Machines Corporation | High speed silicon-based lateral junction photodetectors having recessed electrodes and thick oxide to reduce fringing fields |
JP2874442B2 (ja) * | 1992-04-10 | 1999-03-24 | 日本電気株式会社 | 面入出力光電融合素子 |
JPH0669585A (ja) * | 1992-08-12 | 1994-03-11 | Fujitsu Ltd | 面発光半導体レーザ及びその製造方法 |
JPH0793419B2 (ja) * | 1992-11-04 | 1995-10-09 | 日本電気株式会社 | 受光発光集積素子 |
US5362977A (en) * | 1992-12-28 | 1994-11-08 | At&T Bell Laboratories | Single mirror light-emitting diodes with enhanced intensity |
US5389797A (en) * | 1993-02-24 | 1995-02-14 | The United States Of America As Represented By The Secretary Of The Department Of Energy | Photodetector with absorbing region having resonant periodic absorption between reflectors |
JP3207590B2 (ja) * | 1993-03-15 | 2001-09-10 | 富士通株式会社 | 光半導体装置 |
US5315128A (en) * | 1993-04-30 | 1994-05-24 | At&T Bell Laboratories | Photodetector with a resonant cavity |
US5498863A (en) * | 1993-04-30 | 1996-03-12 | At&T Corp. | Wavelength-sensitive detectors based on absorbers in standing waves |
KR0147589B1 (ko) * | 1994-05-31 | 1998-10-15 | 김광호 | 수직공진기 면발광 레이저 다이오드를 이용한 광픽엎 |
DE19629920B4 (de) * | 1995-08-10 | 2006-02-02 | LumiLeds Lighting, U.S., LLC, San Jose | Licht-emittierende Diode mit einem nicht-absorbierenden verteilten Braggreflektor |
US5701327A (en) * | 1996-04-30 | 1997-12-23 | Lucent Technologies Inc. | Saturable Bragg reflector structure and process for fabricating the same |
US5828088A (en) * | 1996-09-05 | 1998-10-27 | Astropower, Inc. | Semiconductor device structures incorporating "buried" mirrors and/or "buried" metal electrodes |
US6603784B1 (en) * | 1998-12-21 | 2003-08-05 | Honeywell International Inc. | Mechanical stabilization of lattice mismatched quantum wells |
US20030219917A1 (en) * | 1998-12-21 | 2003-11-27 | Johnson Ralph H. | System and method using migration enhanced epitaxy for flattening active layers and the mechanical stabilization of quantum wells associated with vertical cavity surface emitting lasers |
US7435660B2 (en) * | 1998-12-21 | 2008-10-14 | Finisar Corporation | Migration enhanced epitaxy fabrication of active regions having quantum wells |
US7167495B2 (en) * | 1998-12-21 | 2007-01-23 | Finisar Corporation | Use of GaAs extended barrier layers between active regions containing nitrogen and AlGaAs confining layers |
US7257143B2 (en) * | 1998-12-21 | 2007-08-14 | Finisar Corporation | Multicomponent barrier layers in quantum well active regions to enhance confinement and speed |
US7286585B2 (en) * | 1998-12-21 | 2007-10-23 | Finisar Corporation | Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region |
US6384462B1 (en) * | 2000-12-06 | 2002-05-07 | Nova Crystals, Inc. | Planar hetero-interface photodetector |
US6826219B2 (en) * | 2002-03-14 | 2004-11-30 | Gigatera Ag | Semiconductor saturable absorber device, and laser |
KR100576718B1 (ko) * | 2003-12-24 | 2006-05-03 | 한국전자통신연구원 | 실리콘 발광 소자 |
US7860137B2 (en) | 2004-10-01 | 2010-12-28 | Finisar Corporation | Vertical cavity surface emitting laser with undoped top mirror |
CN101432936B (zh) | 2004-10-01 | 2011-02-02 | 菲尼萨公司 | 具有多顶侧接触的垂直腔面发射激光器 |
US7545560B2 (en) * | 2004-10-08 | 2009-06-09 | Finisar Corporation | AlAs/GaAs alloy to enhance n-type doping in AlGaAs distributed bragg reflector |
TWI373851B (en) * | 2008-11-25 | 2012-10-01 | Nexpower Technology Corp | Stacked-layered thin film solar cell and manufacturing method thereof |
KR102496476B1 (ko) * | 2015-11-19 | 2023-02-06 | 삼성전자주식회사 | 전자기파 반사체 및 이를 포함하는 광학소자 |
KR20180065060A (ko) | 2016-12-06 | 2018-06-18 | 삼성디스플레이 주식회사 | 유기발광 표시장치 |
CN112736644B (zh) * | 2021-03-30 | 2021-06-11 | 南昌凯捷半导体科技有限公司 | 一种用于车载雷达的高功率vcsel及其制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0738457B2 (ja) * | 1986-07-18 | 1995-04-26 | 株式会社東芝 | 光・電子双安定素子 |
US5028969A (en) * | 1988-09-13 | 1991-07-02 | Nec Corporation | Semiconductor device for a space modulation matrix and method for driving a space modulation matrix |
US4943970A (en) * | 1988-10-24 | 1990-07-24 | General Dynamics Corporation, Electronics Division | Surface emitting laser |
US4949350A (en) * | 1989-07-17 | 1990-08-14 | Bell Communications Research, Inc. | Surface emitting semiconductor laser |
US5012486A (en) * | 1990-04-06 | 1991-04-30 | At&T Bell Laboratories | Vertical cavity semiconductor laser with lattice-mismatched mirror stack |
-
1990
- 1990-08-20 JP JP21883390A patent/JP2596195B2/ja not_active Expired - Lifetime
-
1991
- 1991-08-19 CA CA002049448A patent/CA2049448C/en not_active Expired - Lifetime
- 1991-08-20 DE DE69120614T patent/DE69120614T2/de not_active Expired - Lifetime
- 1991-08-20 US US07/747,561 patent/US5229627A/en not_active Expired - Lifetime
- 1991-08-20 EP EP91113897A patent/EP0474018B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69120614T2 (de) | 1997-02-20 |
EP0474018B1 (de) | 1996-07-03 |
CA2049448C (en) | 1994-07-26 |
EP0474018A2 (de) | 1992-03-11 |
CA2049448A1 (en) | 1992-02-21 |
US5229627A (en) | 1993-07-20 |
EP0474018A3 (en) | 1992-05-13 |
JPH04101483A (ja) | 1992-04-02 |
JP2596195B2 (ja) | 1997-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69120614T2 (de) | Elektrophotonische Vorrichtung mit vertikalem Resonator vom "vertical to surface" Übertragungstyp | |
DE69129589D1 (de) | Haftflüssigkeit | |
DE69118597T2 (de) | Elektrooptische Vorrichtung | |
DE69319366D1 (de) | Elektrophotonische Vorrichtung mit Übertragung vertikal zur Oberfläche | |
FI913524A (fi) | Med vattenhaltigt zein belagda soetningsmedel och andra ingredienser foer tuggummi. | |
ITGE910067A1 (it) | Dispositivo per l'agugliatura di falde d'ovatta | |
IT9020733A0 (it) | dispositivo per l'applicazione | |
DE69116707D1 (de) | Elektrooptische Vorrichtung | |
DE69117960T2 (de) | Kultivator mit flüssigkeitsspritzsystem | |
DK482488D0 (da) | 3'-demethoxyepipodophyllotoxinglucosidderivater | |
DE59302310D1 (de) | Clathrasil vom Strukturtyp Dodekasil 1 H mit kleiner mittlerer Kristallgrösse | |
FR2660300B1 (fr) | Dispositif pour la production d'ozone. | |
IT9022047A0 (it) | 13-desosso-4'-desossi-4'-iodoantracicline | |
DE3862458D1 (de) | Stranggiessvorrichtung mit endlosen raupenkokillenbaendern. | |
FR2538054B1 (fr) | Piton d'ameublement | |
NO164341C (no) | Anordning for fremstilling av metall-granulat i form av "naaler". | |
ES537504A0 (es) | Procedimiento de preparacion de imidazolinonas substituidas con arilo en posicion 2 | |
KR840006498U (ko) | 경운기 츄레라의 승강장치 | |
FR2527944B1 (fr) | Dispositif d'encollage de surface reglee | |
IT8914502V0 (it) | L'amicorario | |
KR920003757U (ko) | 분무 연막기의 카브레이터 | |
IT8948361A0 (it) | Dispositivo elettronico per evitare l'assopimento | |
IT8118807V0 (it) | Gioco "il rubabandiera" | |
ITRM920076V0 (it) | Dispositivo elettronico per evitare l'assopimento. | |
SE8301391D0 (sv) | Barnseker spisanordning |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |