DE69121664D1 - Verfahren zur Herstellung von dünnen Glasschichten durch Sol-Gel-Verfahren - Google Patents

Verfahren zur Herstellung von dünnen Glasschichten durch Sol-Gel-Verfahren

Info

Publication number
DE69121664D1
DE69121664D1 DE69121664T DE69121664T DE69121664D1 DE 69121664 D1 DE69121664 D1 DE 69121664D1 DE 69121664 T DE69121664 T DE 69121664T DE 69121664 T DE69121664 T DE 69121664T DE 69121664 D1 DE69121664 D1 DE 69121664D1
Authority
DE
Germany
Prior art keywords
sol
glass
production
thin layers
gel processes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69121664T
Other languages
English (en)
Other versions
DE69121664T2 (de
Inventor
Sumio Hoshino
Masumi Ito
Hiroo Kanamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2285882A external-priority patent/JPH04160020A/ja
Priority claimed from JP3148610A external-priority patent/JPH054839A/ja
Priority claimed from JP3148611A external-priority patent/JPH05805A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69121664D1 publication Critical patent/DE69121664D1/de
Publication of DE69121664T2 publication Critical patent/DE69121664T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere
DE69121664T 1990-10-25 1991-10-25 Verfahren zur Herstellung von dünnen Glasschichten durch Sol-Gel-Verfahren Expired - Fee Related DE69121664T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2285882A JPH04160020A (ja) 1990-10-25 1990-10-25 薄膜の作製方法
JP3148610A JPH054839A (ja) 1991-06-20 1991-06-20 ゾルゲル法による薄膜の作製方法
JP3148611A JPH05805A (ja) 1991-06-20 1991-06-20 ゾルゲル法による薄膜の作製方法

Publications (2)

Publication Number Publication Date
DE69121664D1 true DE69121664D1 (de) 1996-10-02
DE69121664T2 DE69121664T2 (de) 1997-02-13

Family

ID=27319585

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121664T Expired - Fee Related DE69121664T2 (de) 1990-10-25 1991-10-25 Verfahren zur Herstellung von dünnen Glasschichten durch Sol-Gel-Verfahren

Country Status (5)

Country Link
US (1) US5368887A (de)
EP (1) EP0482659B1 (de)
AU (1) AU644229B2 (de)
CA (1) CA2053985A1 (de)
DE (1) DE69121664T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5702630A (en) * 1992-07-16 1997-12-30 Nippon Oil Company, Ltd. Fluid having both magnetic and electrorheological characteristics
GB9300261D0 (en) * 1993-01-08 1993-03-03 British Tech Group Sol-gel composition for producing glassy coatings
US5504042A (en) * 1994-06-23 1996-04-02 Texas Instruments Incorporated Porous dielectric material with improved pore surface properties for electronics applications
CA2153848C (en) * 1994-07-18 2003-05-13 Motoyuki Tanaka Oxide thin film having quartz crystal structure and process for producing the same
US5635120A (en) 1994-07-21 1997-06-03 Caterpillar Inc. Process for forming a mullite-zirconia engine part
US5585136A (en) * 1995-03-22 1996-12-17 Queen's University At Kingston Method for producing thick ceramic films by a sol gel coating process
US6037277A (en) * 1995-11-16 2000-03-14 Texas Instruments Incorporated Limited-volume apparatus and method for forming thin film aerogels on semiconductor substrates
US5807607A (en) 1995-11-16 1998-09-15 Texas Instruments Incorporated Polyol-based method for forming thin film aerogels on semiconductor substrates
US6319852B1 (en) 1995-11-16 2001-11-20 Texas Instruments Incorporated Nanoporous dielectric thin film formation using a post-deposition catalyst
US5753305A (en) * 1995-11-16 1998-05-19 Texas Instruments Incorporated Rapid aging technique for aerogel thin films
US5955140A (en) * 1995-11-16 1999-09-21 Texas Instruments Incorporated Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
US6130152A (en) 1995-11-16 2000-10-10 Texas Instruments Incorporated Aerogel thin film formation from multi-solvent systems
US5736425A (en) * 1995-11-16 1998-04-07 Texas Instruments Incorporated Glycol-based method for forming a thin-film nanoporous dielectric
US6380105B1 (en) 1996-11-14 2002-04-30 Texas Instruments Incorporated Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
WO1997024635A2 (en) * 1995-12-19 1997-07-10 Risen William M Jr Methods and compositions for joining waveguide structures and the resulting joined products
US6319551B1 (en) * 1995-12-19 2001-11-20 William M. Risen, Jr. Methods and compositions for forming silica, germanosilicate and metal silicate films, patterns and multilayers
US5976625A (en) * 1997-04-11 1999-11-02 Lucent Technologies Inc. Process for forming patterned dielectric oxide films
US6446467B1 (en) * 1997-07-29 2002-09-10 Physical Optics Corporation Monolithic glass light shaping diffuser and method for its production
US6158245A (en) * 1997-07-29 2000-12-12 Physical Optics Corporation High efficiency monolithic glass light shaping diffuser and method of making
US5944866A (en) * 1997-09-26 1999-08-31 Lucent Technologies Inc. Fabrication including sol-gel processing
JP2002524849A (ja) * 1998-08-27 2002-08-06 アライドシグナル・インコーポレイテッド ナノ細孔シリカの機械的強度を最適化する方法
AUPQ469699A0 (en) * 1999-12-16 2000-01-20 Australian National University, The Device incorporating sol-gel based films
JP4030243B2 (ja) * 1999-12-20 2008-01-09 日本電気株式会社 強誘電体薄膜形成用溶液及び強誘電体薄膜形成方法
GB0011964D0 (en) 2000-05-18 2000-07-05 Suyal N Thick glass films with controlled refractive indices and their applications
US20040018301A1 (en) * 2002-07-26 2004-01-29 Ackerman John F. Process for improved inorganic polymerization
WO2011075370A1 (en) * 2009-12-18 2011-06-23 3M Innovative Properties Company Systems and methods for making monolithic gel bodies
BR112013002236A2 (pt) 2010-07-30 2016-05-24 Sony Corp "substrato polimérico, métodos para fornecer um substrato polimérico, para fabricar um chip, e para analisar, detectar, separar e/ou transportar analitos, chip feito de dois substratos, kits para a fabricação de um chip e para a análise e/ou detecção e/ou separação e/ou transporte de analitos, e, uso de um substrato polimérico."
US9963786B2 (en) * 2013-03-15 2018-05-08 Henkel Ag & Co. Kgaa Inorganic composite coatings comprising novel functionalized acrylics

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5777044A (en) * 1980-10-30 1982-05-14 Central Glass Co Ltd Manufacture of glass from metallic alcoholate
USRE32107E (en) * 1982-12-23 1986-04-08 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS6027615A (ja) * 1983-07-22 1985-02-12 Hitachi Ltd 光学ガラスの製造方法
JPS6054929A (ja) * 1983-09-01 1985-03-29 Seiko Epson Corp 石英ガラスの製造法
JPS6126525A (ja) * 1984-07-16 1986-02-05 Seiko Epson Corp 石英ガラスの製造方法
JPS6140825A (ja) * 1984-07-31 1986-02-27 Seiko Epson Corp 石英ガラスの製造方法
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
JPS6197137A (ja) * 1984-10-15 1986-05-15 Hitachi Cable Ltd 光学ガラス体の製造方法
US4652467A (en) * 1985-02-25 1987-03-24 The United States Of America As Represented By The United States Department Of Energy Inorganic-polymer-derived dielectric films
US4614673A (en) * 1985-06-21 1986-09-30 The Boeing Company Method for forming a ceramic coating
US4636440A (en) * 1985-10-28 1987-01-13 Manville Corporation Novel process for coating substrates with glass-like films and coated substrates
US4767433A (en) * 1986-05-22 1988-08-30 Asahi Glass Company Ltd. Spherical silica glass powder particles and process for their production
US4851270A (en) * 1987-04-17 1989-07-25 Hoechst Celanese Corporation Inorganic-organic composite compositons exhibiting nonlinear optical response
FR2621030B1 (fr) * 1987-09-29 1990-11-16 Centre Nat Rech Scient Procede de preparation d'oxydes metalliques
US4965091A (en) * 1987-10-01 1990-10-23 At&T Bell Laboratories Sol gel method for forming thin luminescent films
US4847162A (en) * 1987-12-28 1989-07-11 Dow Corning Corporation Multilayer ceramics coatings from the ceramification of hydrogen silsequioxane resin in the presence of ammonia
DE3873512T2 (de) * 1988-02-19 1992-12-03 Tohru Yamamoto Katalysator fuer das ein metallalkoxid verwendendes sol-gel-verfahren und das oxid verwendende sol-gel-verfahren.
US4842888A (en) * 1988-04-07 1989-06-27 Dow Corning Corporation Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors
US4898691A (en) * 1988-05-16 1990-02-06 Hoechst Celanese Corporation Organic nonlinear optical media
US4988800A (en) * 1988-05-31 1991-01-29 Akzo America Inc. Preparation of rare earth alkoxides using catalyst
JPH0764644B2 (ja) * 1988-06-30 1995-07-12 日本特殊陶業株式会社 可塑性を有するゲル状薄板成形体の製造方法
US4957725A (en) * 1988-07-05 1990-09-18 The Johns Hopkins University Vanadium dioxide formed by the sol-gel process
US5049338A (en) * 1989-01-04 1991-09-17 Ppg Industries, Inc. Method of promoting sol gel siliceous-containing reactions
JPH02293333A (ja) * 1989-04-28 1990-12-04 Hoya Corp ガラスの製造方法
US4948843A (en) * 1989-05-30 1990-08-14 Eastman Kodak Company Dye polymer/sol-gel composites
US5262201A (en) * 1990-06-04 1993-11-16 Dow Corning Corporation Low temperature process for converting silica precursor coatings to ceramic silica coatings by exposure to ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added
US5116637A (en) * 1990-06-04 1992-05-26 Dow Corning Corporation Amine catalysts for the low temperature conversion of silica precursors to silica

Also Published As

Publication number Publication date
AU644229B2 (en) 1993-12-02
DE69121664T2 (de) 1997-02-13
US5368887A (en) 1994-11-29
CA2053985A1 (en) 1992-04-26
EP0482659A1 (de) 1992-04-29
EP0482659B1 (de) 1996-08-28
AU8672491A (en) 1992-04-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee