DE69201734D1 - Halbleiterscheiben-Reinigungsverfahren unter Benutzung eines Mischers und Vorrichtung dafür. - Google Patents

Halbleiterscheiben-Reinigungsverfahren unter Benutzung eines Mischers und Vorrichtung dafür.

Info

Publication number
DE69201734D1
DE69201734D1 DE69201734T DE69201734T DE69201734D1 DE 69201734 D1 DE69201734 D1 DE 69201734D1 DE 69201734 T DE69201734 T DE 69201734T DE 69201734 T DE69201734 T DE 69201734T DE 69201734 D1 DE69201734 D1 DE 69201734D1
Authority
DE
Germany
Prior art keywords
mixer
cleaning method
wafer cleaning
device therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69201734T
Other languages
English (en)
Other versions
DE69201734T2 (de
Inventor
Noriyoshi Mashimo
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69201734D1 publication Critical patent/DE69201734D1/de
Publication of DE69201734T2 publication Critical patent/DE69201734T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027—Cleaning the internal surfaces; Removal of blockages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
DE69201734T 1991-01-28 1992-01-27 Halbleiterscheiben-Reinigungsverfahren unter Benutzung eines Mischers und Vorrichtung dafür. Expired - Fee Related DE69201734T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2680091 1991-01-28

Publications (2)

Publication Number Publication Date
DE69201734D1 true DE69201734D1 (de) 1995-04-27
DE69201734T2 DE69201734T2 (de) 1995-09-21

Family

ID=12203390

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69201734T Expired - Fee Related DE69201734T2 (de) 1991-01-28 1992-01-27 Halbleiterscheiben-Reinigungsverfahren unter Benutzung eines Mischers und Vorrichtung dafür.

Country Status (4)

Country Link
US (2) US5261966A (de)
EP (1) EP0497247B1 (de)
KR (1) KR960000374B1 (de)
DE (1) DE69201734T2 (de)

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KR102447374B1 (ko) * 2016-11-11 2022-09-23 엠케이에스 인스트루먼츠, 인코포레이티드 암모니아 가스가 용해되어 있는 탈이온수를 포함하는 전도성 액체를 생성하기 위한 시스템들 및 방법
KR20230165878A (ko) 2018-08-29 2023-12-05 엠케이에스 인스트루먼츠 인코포레이티드 오존수 전달 시스템 및 사용 방법
KR20210149799A (ko) 2019-04-08 2021-12-09 엠케이에스 인스트루먼츠, 인코포레이티드 감소된 용존 담체 가스 및 산소 함량을 갖는 용존 암모니아 용액을 생성하기 위한 시스템들 및 방법들

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Also Published As

Publication number Publication date
KR960000374B1 (ko) 1996-01-05
EP0497247A1 (de) 1992-08-05
US5415191A (en) 1995-05-16
EP0497247B1 (de) 1995-03-22
DE69201734T2 (de) 1995-09-21
KR920015477A (ko) 1992-08-26
US5261966A (en) 1993-11-16

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8339 Ceased/non-payment of the annual fee