DE69207106D1 - Bildprojektionsverfahren und Herstellungsverfahren von Halbleiterbauteilen unter Verwendung desselben - Google Patents
Bildprojektionsverfahren und Herstellungsverfahren von Halbleiterbauteilen unter Verwendung desselbenInfo
- Publication number
- DE69207106D1 DE69207106D1 DE69207106T DE69207106T DE69207106D1 DE 69207106 D1 DE69207106 D1 DE 69207106D1 DE 69207106 T DE69207106 T DE 69207106T DE 69207106 T DE69207106 T DE 69207106T DE 69207106 D1 DE69207106 D1 DE 69207106D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- same
- semiconductor devices
- image projection
- projection method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/50—Optics for phase object visualisation
- G02B27/52—Phase contrast optics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/701—Off-axis setting using an aperture
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3194132A JPH0536586A (ja) | 1991-08-02 | 1991-08-02 | 像投影方法及び該方法を用いた半導体デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69207106D1 true DE69207106D1 (de) | 1996-02-08 |
DE69207106T2 DE69207106T2 (de) | 1996-05-15 |
Family
ID=16319444
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69207106T Expired - Lifetime DE69207106T2 (de) | 1991-08-02 | 1992-07-31 | Bildprojektionsverfahren und Herstellungsverfahren von Halbleiterbauteilen unter Verwendung desselben |
DE69230443T Expired - Lifetime DE69230443T2 (de) | 1991-08-02 | 1992-07-31 | Bildprojektionsverfahren und Herstellungsverfahren von Halbleiterbauteilen unter Verwendung desselben |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69230443T Expired - Lifetime DE69230443T2 (de) | 1991-08-02 | 1992-07-31 | Bildprojektionsverfahren und Herstellungsverfahren von Halbleiterbauteilen unter Verwendung desselben |
Country Status (5)
Country | Link |
---|---|
US (2) | US5608575A (de) |
EP (2) | EP0614097B1 (de) |
JP (1) | JPH0536586A (de) |
KR (1) | KR960008501B1 (de) |
DE (2) | DE69207106T2 (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3165711B2 (ja) * | 1991-08-02 | 2001-05-14 | キヤノン株式会社 | 像投影方法及び該方法を用いた半導体デバイスの製造方法 |
JPH0547628A (ja) * | 1991-08-09 | 1993-02-26 | Canon Inc | 像投影方法及びそれを用いた半導体デバイスの製造方法 |
JPH0567558A (ja) * | 1991-09-06 | 1993-03-19 | Nikon Corp | 露光方法 |
NL194929C (nl) * | 1992-10-20 | 2003-07-04 | Samsung Electronics Co Ltd | Projectiebelichtingssysteem. |
US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JPH07122478A (ja) * | 1993-10-27 | 1995-05-12 | Sony Corp | パターン投影方法 |
JP3186011B2 (ja) * | 1994-06-24 | 2001-07-11 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
JP3046270U (ja) * | 1995-01-31 | 1998-03-06 | 康司 栗原 | 十字ピン型アンカー |
JPH0950958A (ja) * | 1995-05-29 | 1997-02-18 | Nikon Corp | 照明光学装置及びそれを備えた投影露光装置 |
DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
EP0797121B1 (de) * | 1996-03-18 | 2003-06-11 | Matsushita Electric Industrial Co., Ltd. | Belichtungsapparat |
JPH09320945A (ja) * | 1996-05-24 | 1997-12-12 | Nikon Corp | 露光条件測定方法及び露光装置 |
JPH10153866A (ja) * | 1996-11-22 | 1998-06-09 | Nikon Corp | 照明装置および該照明装置を備えた露光装置 |
US7130129B2 (en) | 1996-12-21 | 2006-10-31 | Carl Zeiss Smt Ag | Reticle-masking objective with aspherical lenses |
US6027865A (en) * | 1997-02-10 | 2000-02-22 | Texas Instruments Incorporated | Method for accurate patterning of photoresist during lithography process |
US6563567B1 (en) * | 1998-12-17 | 2003-05-13 | Nikon Corporation | Method and apparatus for illuminating a surface using a projection imaging apparatus |
EP1139521A4 (de) * | 1999-09-10 | 2006-03-22 | Nikon Corp | Lichtquelle und verfahren zur wellenlängenstabilisation, belichtungsgerät und -verfahren, verfahren zur herstellung eines belichtungsgeräts und vorrichtungsherstellungsverfahren und vorrichtung |
US6468815B1 (en) * | 2000-01-03 | 2002-10-22 | Advanced Micro Devices, Inc. | Overlay radius offset shift engine |
US20020041377A1 (en) * | 2000-04-25 | 2002-04-11 | Nikon Corporation | Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method |
DE10031719A1 (de) * | 2000-06-29 | 2002-01-10 | Leica Microsystems | Beleuchtungseinrichtung und Koordinaten-Meßgerät mit einer Beleuchtungseinrichtung |
US7092073B2 (en) | 2000-07-07 | 2006-08-15 | Asml Netherlands B.V. | Method of illuminating a photomask using chevron illumination |
EP1184727A1 (de) * | 2000-09-01 | 2002-03-06 | Asm Lithography B.V. | Lithographischer Apparat |
US6710856B2 (en) | 2000-09-01 | 2004-03-23 | Asml Netherlands B.V. | Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
US6958806B2 (en) * | 2002-12-02 | 2005-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1426826A3 (de) | 2002-12-02 | 2006-12-20 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
EP1426823A1 (de) * | 2002-12-02 | 2004-06-09 | ASML Netherlands B.V. | Lithgraphischer Apparat, Verfahren zur Herstellung eines Artikel und damit erzeugter Artikel |
AU2002363884A1 (en) * | 2002-12-19 | 2004-07-14 | Carl Zeiss Smt Ag | Method and system for measuring the reproduction quality of an optical reproduction system |
US7196772B2 (en) * | 2003-11-07 | 2007-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7397535B2 (en) * | 2005-12-21 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7589832B2 (en) * | 2006-08-10 | 2009-09-15 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method |
JP4635085B2 (ja) | 2008-03-03 | 2011-02-16 | 株式会社東芝 | 半導体装置の製造方法 |
US20090257043A1 (en) * | 2008-04-14 | 2009-10-15 | Nikon Corporation | Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system |
US9389519B2 (en) * | 2010-02-25 | 2016-07-12 | Nikon Corporation | Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method |
DE102011003066A1 (de) * | 2010-02-26 | 2011-09-01 | Carl Zeiss Smt Gmbh | Verfahren zum belastungsgerechten Betrieb einer Projektionsbelichtungsanlage sowie entsprechende Projektionsbelichtungsanlage |
RU2593952C2 (ru) | 2011-06-15 | 2016-08-10 | Хилл'С Пет Ньютришн, Инк. | Композиции и способы для диагностики и мониторинга гипертиреоза у животных семейства кошачьих |
TWI656409B (zh) | 2015-09-09 | 2019-04-11 | 美商克萊譚克公司 | 基於輔助電磁場之引入之一階散射測量疊加之新方法 |
Family Cites Families (50)
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DE1572805B1 (de) * | 1967-08-05 | 1970-08-27 | Philips Patentverwaltung | Verfahren zur Bildvervielfachung |
IT939738B (it) * | 1970-08-12 | 1973-02-10 | Rank Organisation Ltd | Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti |
GB1391270A (en) * | 1971-12-08 | 1975-04-16 | Rank Organisation Ltd | Photolithography |
US3887816A (en) * | 1973-04-26 | 1975-06-03 | Litton Medical Products | Optical system for x-ray scanning equipment |
US4159164A (en) * | 1973-10-23 | 1979-06-26 | U.S. Philips Corporation | Method of eliminating errors in images derived from patterns which consist of periodically arranged individual images |
DE2835363A1 (de) * | 1978-08-11 | 1980-03-13 | Siemens Ag | Verfahren zum uebertragen von strukturen fuer halbleiterschaltungen |
JPS5762052A (en) * | 1980-09-30 | 1982-04-14 | Nippon Kogaku Kk <Nikon> | Original plate to be projected for use in transmission |
US4547037A (en) * | 1980-10-16 | 1985-10-15 | Regents Of The University Of Minnesota | Holographic method for producing desired wavefront transformations |
JPS5825638A (ja) * | 1981-08-08 | 1983-02-15 | Canon Inc | 露光装置 |
JPS58147708A (ja) * | 1982-02-26 | 1983-09-02 | Nippon Kogaku Kk <Nikon> | 照明用光学装置 |
JPS59100805A (ja) * | 1982-12-01 | 1984-06-11 | Canon Inc | 物体観察装置 |
JPS59141226A (ja) * | 1983-02-02 | 1984-08-13 | Canon Inc | 観察装置 |
JPS59149317A (ja) * | 1983-02-16 | 1984-08-27 | Nippon Kogaku Kk <Nikon> | 投影型露光装置のアライメント光学系 |
JPS6045252A (ja) * | 1983-08-23 | 1985-03-11 | Canon Inc | 投影露光装置の照明系 |
US4799791A (en) * | 1984-02-13 | 1989-01-24 | Canon Kabushiki Kaisha | Illuminance distribution measuring system |
JPS6119129A (ja) * | 1984-07-05 | 1986-01-28 | Nippon Kogaku Kk <Nikon> | 投影光学装置 |
JPS61210627A (ja) * | 1985-03-15 | 1986-09-18 | Canon Inc | 有効光源測定用ピンホ−ル板 |
US5153419A (en) * | 1985-04-22 | 1992-10-06 | Canon Kabushiki Kaisha | Device for detecting position of a light source with source position adjusting means |
US4947030A (en) * | 1985-05-22 | 1990-08-07 | Canon Kabushiki Kaisha | Illuminating optical device |
JPH0616480B2 (ja) * | 1985-06-03 | 1994-03-02 | 株式会社日立製作所 | 縮小投影式アライメント方法およびその装置 |
JPH0782981B2 (ja) * | 1986-02-07 | 1995-09-06 | 株式会社ニコン | 投影露光方法及び装置 |
JPS62298728A (ja) * | 1986-06-18 | 1987-12-25 | Fujitsu Ltd | 照度測定装置 |
JP2571054B2 (ja) * | 1987-04-28 | 1997-01-16 | キヤノン株式会社 | 露光装置及び素子製造方法 |
US4943733A (en) * | 1987-05-15 | 1990-07-24 | Nikon Corporation | Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment |
US4902899A (en) * | 1987-06-01 | 1990-02-20 | International Business Machines Corporation | Lithographic process having improved image quality |
JPS6461716A (en) * | 1987-08-31 | 1989-03-08 | Canon Kk | Illuminator |
EP0646911A3 (de) * | 1988-06-14 | 1995-08-23 | Nec Corp | Optische Kopfanordnung. |
US4947413A (en) * | 1988-07-26 | 1990-08-07 | At&T Bell Laboratories | Resolution doubling lithography technique |
JP2699433B2 (ja) * | 1988-08-12 | 1998-01-19 | 株式会社ニコン | 投影型露光装置及び投影露光方法 |
US4924257A (en) * | 1988-10-05 | 1990-05-08 | Kantilal Jain | Scan and repeat high resolution projection lithography system |
US5191374A (en) * | 1988-11-17 | 1993-03-02 | Nikon Corporation | Exposure control apparatus |
US5121160A (en) * | 1989-03-09 | 1992-06-09 | Canon Kabushiki Kaisha | Exposure method and apparatus |
JPH0812843B2 (ja) * | 1989-03-15 | 1996-02-07 | 日本精工株式会社 | 光学結像装置及び方法 |
EP0730200A3 (de) * | 1990-01-12 | 1997-01-22 | Sony Corp | Phasenverschiebungsmaske und Verfahren zur Herstellung |
JP2893778B2 (ja) * | 1990-01-17 | 1999-05-24 | キヤノン株式会社 | 露光装置 |
US5253040A (en) * | 1990-11-09 | 1993-10-12 | Mitsubishi Denki Kabushiki Kaisha | Projection aligner |
US5144362A (en) * | 1990-11-14 | 1992-09-01 | Mitsubishi Denki Kabushiki Kaisha | Projection aligner |
EP0967524A3 (de) * | 1990-11-15 | 2000-01-05 | Nikon Corporation | Verfahren und Vorrichtung zur Projektionsbelichtung |
JP3360686B2 (ja) * | 1990-12-27 | 2002-12-24 | 株式会社ニコン | 照明光学装置および投影露光装置並びに露光方法および素子製造方法 |
JP2788791B2 (ja) * | 1991-01-08 | 1998-08-20 | 三菱電機株式会社 | フライアイレンズ装置およびそのフライアイレンズ装置を含む照明装置 |
US5305054A (en) * | 1991-02-22 | 1994-04-19 | Canon Kabushiki Kaisha | Imaging method for manufacture of microdevices |
US5097291A (en) * | 1991-04-22 | 1992-03-17 | Nikon Corporation | Energy amount control device |
US5194345A (en) * | 1991-05-14 | 1993-03-16 | Micron Technology, Inc. | Method of fabricating phase shift reticles |
JPH04369209A (ja) * | 1991-06-17 | 1992-12-22 | Nikon Corp | 露光用照明装置 |
JP2924344B2 (ja) * | 1991-08-09 | 1999-07-26 | キヤノン株式会社 | 投影露光装置 |
US5424803A (en) * | 1991-08-09 | 1995-06-13 | Canon Kabushiki Kaisha | Projection exposure apparatus and semiconductor device manufacturing method |
US5264898A (en) * | 1991-08-29 | 1993-11-23 | Mitsubishi Denki Kabushiki Kaisha | Projection exposure apparatus |
JP2803934B2 (ja) * | 1991-12-10 | 1998-09-24 | 三菱電機株式会社 | 投影露光装置及び露光方法 |
JPH05217855A (ja) * | 1992-02-01 | 1993-08-27 | Nikon Corp | 露光用照明装置 |
JP2760931B2 (ja) * | 1993-03-10 | 1998-06-04 | 株式会社 栗本鐵工所 | 注液機構付混練機 |
-
1991
- 1991-08-02 JP JP3194132A patent/JPH0536586A/ja active Pending
-
1992
- 1992-07-31 DE DE69207106T patent/DE69207106T2/de not_active Expired - Lifetime
- 1992-07-31 KR KR92013847A patent/KR960008501B1/ko not_active IP Right Cessation
- 1992-07-31 EP EP94201436A patent/EP0614097B1/de not_active Expired - Lifetime
- 1992-07-31 DE DE69230443T patent/DE69230443T2/de not_active Expired - Lifetime
- 1992-07-31 EP EP92307014A patent/EP0526242B1/de not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/479,387 patent/US5608575A/en not_active Expired - Lifetime
- 1995-06-07 US US08/483,866 patent/US5631773A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0614097A1 (de) | 1994-09-07 |
EP0526242B1 (de) | 1995-12-27 |
KR960008501B1 (en) | 1996-06-26 |
EP0526242A1 (de) | 1993-02-03 |
US5631773A (en) | 1997-05-20 |
DE69230443T2 (de) | 2000-05-18 |
DE69230443D1 (de) | 2000-01-20 |
KR930005116A (ko) | 1993-03-23 |
EP0614097B1 (de) | 1999-12-15 |
DE69207106T2 (de) | 1996-05-15 |
JPH0536586A (ja) | 1993-02-12 |
US5608575A (en) | 1997-03-04 |
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