DE69210650D1 - Vorrichtung und Verfahren zum Elektroplattieren - Google Patents
Vorrichtung und Verfahren zum ElektroplattierenInfo
- Publication number
- DE69210650D1 DE69210650D1 DE69210650T DE69210650T DE69210650D1 DE 69210650 D1 DE69210650 D1 DE 69210650D1 DE 69210650 T DE69210650 T DE 69210650T DE 69210650 T DE69210650 T DE 69210650T DE 69210650 D1 DE69210650 D1 DE 69210650D1
- Authority
- DE
- Germany
- Prior art keywords
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/619—Amorphous layers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9100507A SE467976B (sv) | 1991-02-20 | 1991-02-20 | Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69210650D1 true DE69210650D1 (de) | 1996-06-20 |
DE69210650T2 DE69210650T2 (de) | 1996-09-19 |
Family
ID=20381949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69210650T Expired - Fee Related DE69210650T2 (de) | 1991-02-20 | 1992-02-12 | Vorrichtung und Verfahren zum Elektroplattieren |
Country Status (4)
Country | Link |
---|---|
US (2) | US5244563A (de) |
EP (1) | EP0500513B1 (de) |
DE (1) | DE69210650T2 (de) |
SE (1) | SE467976B (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE467976B (sv) * | 1991-02-20 | 1992-10-12 | Dcm Innovation Ab | Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen |
US5807469A (en) * | 1995-09-27 | 1998-09-15 | Intel Corporation | Flexible continuous cathode contact circuit for electrolytic plating of C4, tab microbumps, and ultra large scale interconnects |
DE19602182C2 (de) * | 1996-01-23 | 1998-08-13 | Technotrans Gmbh | Verfahren und Vorrichtung zur thermischen Prozessteuerung bei der elektrolytischen Beschichtung von Werkzeugen für die Herstellung von CD-Datenträgern |
US6174425B1 (en) * | 1997-05-14 | 2001-01-16 | Motorola, Inc. | Process for depositing a layer of material over a substrate |
US6001235A (en) * | 1997-06-23 | 1999-12-14 | International Business Machines Corporation | Rotary plater with radially distributed plating solution |
US6187164B1 (en) | 1997-09-30 | 2001-02-13 | Symyx Technologies, Inc. | Method for creating and testing a combinatorial array employing individually addressable electrodes |
US6818110B1 (en) * | 1997-09-30 | 2004-11-16 | Symyx Technologies, Inc. | Combinatorial electrochemical deposition and testing system |
US6080288A (en) * | 1998-05-29 | 2000-06-27 | Schwartz; Vladimir | System for forming nickel stampers utilized in optical disc production |
US6228232B1 (en) | 1998-07-09 | 2001-05-08 | Semitool, Inc. | Reactor vessel having improved cup anode and conductor assembly |
US6231743B1 (en) | 2000-01-03 | 2001-05-15 | Motorola, Inc. | Method for forming a semiconductor device |
SE0001368L (sv) * | 2000-04-13 | 2001-10-14 | Obducat Ab | Apparat och förfarande för elektrokemisk bearbetning av substrat |
SE0001367L (sv) * | 2000-04-13 | 2001-10-14 | Obducat Ab | Apparat och förfarande för elektrokemisk bearbetning av substrat |
US6610189B2 (en) * | 2001-01-03 | 2003-08-26 | Applied Materials, Inc. | Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature |
AU2002343330A1 (en) * | 2001-08-31 | 2003-03-10 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US7118658B2 (en) * | 2002-05-21 | 2006-10-10 | Semitool, Inc. | Electroplating reactor |
US20040055873A1 (en) * | 2002-09-24 | 2004-03-25 | Digital Matrix Corporation | Apparatus and method for improved electroforming |
US20070125652A1 (en) * | 2005-12-02 | 2007-06-07 | Buckley Paul W | Electroform, methods of making electroforms, and products made from electroforms |
US20100320081A1 (en) | 2009-06-17 | 2010-12-23 | Mayer Steven T | Apparatus for wetting pretreatment for enhanced damascene metal filling |
US9455139B2 (en) | 2009-06-17 | 2016-09-27 | Novellus Systems, Inc. | Methods and apparatus for wetting pretreatment for through resist metal plating |
US9677188B2 (en) | 2009-06-17 | 2017-06-13 | Novellus Systems, Inc. | Electrofill vacuum plating cell |
ES2606321T3 (es) * | 2010-07-15 | 2017-03-23 | Luxembourg Institute Of Science And Technology (List) | Llenado de una cámara de impresión y mandril correspondiente |
KR102113883B1 (ko) * | 2012-03-13 | 2020-05-22 | 노벨러스 시스템즈, 인코포레이티드 | 관통 레지스트 금속 도금을 위한 웨팅 전처리의 방법들 및 장치 |
US9613833B2 (en) | 2013-02-20 | 2017-04-04 | Novellus Systems, Inc. | Methods and apparatus for wetting pretreatment for through resist metal plating |
US9435049B2 (en) | 2013-11-20 | 2016-09-06 | Lam Research Corporation | Alkaline pretreatment for electroplating |
US9617648B2 (en) | 2015-03-04 | 2017-04-11 | Lam Research Corporation | Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1771680A (en) * | 1927-03-29 | 1930-07-29 | Ishisaka Sansaku | Apparatus for electroplating |
DE2011305A1 (de) * | 1970-03-10 | 1971-10-14 | Deutsche Grammophon Gmbh | Verfahren zur Vorbehandlung von mit Nickeloberflächen versehenen Galvanos, insbesondere Schallplattengalvanos |
JPS5524141Y2 (de) * | 1976-10-16 | 1980-06-09 | ||
DE3067925D1 (en) * | 1979-06-01 | 1984-06-28 | Emi Ltd | High-speed plating arrangement and stamper plate formed using such an arrangement |
JPS57126998A (en) * | 1981-01-28 | 1982-08-06 | Mishima Kosan Co Ltd | Plating apparatus |
EP0076569B1 (de) * | 1981-10-01 | 1986-08-27 | EMI Limited | Elektroplattierungsvorrichtung |
US4534831A (en) * | 1982-09-27 | 1985-08-13 | Inoue-Japax Research Incorporated | Method of and apparatus for forming a 3D article |
NL8300916A (nl) * | 1983-03-14 | 1984-10-01 | Philips Nv | Werkwijze voor het galvanisch neerslaan van een homogeen dikke metaallaag, aldus verkregen metaallaag en toepassing van de aldus verkregen metaallaag, inrichting voor het uitvoeren van de werkwijze en verkregen matrijs. |
US4750981A (en) * | 1986-09-30 | 1988-06-14 | The Boeing Company | Apparatus for electroplating limited surfaces on a workpiece |
DE3736240A1 (de) * | 1987-10-27 | 1989-05-11 | Flachglas Ag | Vorrichtung zur galvanischen verstaerkung einer leiterspur auf einer glasscheibe |
US4964958A (en) * | 1988-10-14 | 1990-10-23 | Philips & Du Pont Optical Company | Method of producing a metal matrix |
SE467976B (sv) * | 1991-02-20 | 1992-10-12 | Dcm Innovation Ab | Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen |
-
1991
- 1991-02-20 SE SE9100507A patent/SE467976B/sv not_active IP Right Cessation
-
1992
- 1992-02-12 DE DE69210650T patent/DE69210650T2/de not_active Expired - Fee Related
- 1992-02-12 EP EP92850030A patent/EP0500513B1/de not_active Expired - Lifetime
- 1992-02-19 US US07/838,556 patent/US5244563A/en not_active Expired - Lifetime
-
1993
- 1993-06-28 US US08/084,543 patent/US5427674A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5244563A (en) | 1993-09-14 |
EP0500513A1 (de) | 1992-08-26 |
SE9100507L (sv) | 1992-08-21 |
SE467976B (sv) | 1992-10-12 |
EP0500513B1 (de) | 1996-05-15 |
DE69210650T2 (de) | 1996-09-19 |
US5427674A (en) | 1995-06-27 |
SE9100507D0 (sv) | 1991-02-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |