DE69218817D1 - In wässriger Lösung entwickelbare, hochempfindliches Photopolymer enthaltende, Zusammensetzungen - Google Patents

In wässriger Lösung entwickelbare, hochempfindliches Photopolymer enthaltende, Zusammensetzungen

Info

Publication number: DE69218817D1
Authority: DE; Germany
Prior art keywords: aqueous solution; solution containing; highly sensitive; containing highly; sensitive photopolymer
Prior art date: 1991-02-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69218817T

Other languages

English (en)

Other versions

DE69218817T2 (de

Inventor

M Zaki Ali

Mahfuza B Ali

Dean M Moren

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

3M Co

Original Assignee

Minnesota Mining and Manufacturing Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-02-21

Filing date

1992-02-18

Publication date

1997-05-15

1992-02-18 Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co

1997-05-15 Application granted granted Critical

1997-05-15 Publication of DE69218817D1 publication Critical patent/DE69218817D1/de

1997-10-02 Publication of DE69218817T2 publication Critical patent/DE69218817T2/de

2012-02-19 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y10T428/31696—Including polyene monomers [e.g., butadiene, etc.]

DE69218817T 1991-02-21 1992-02-18 In wässriger Lösung entwickelbare, hochempfindliches Photopolymer enthaltende, Zusammensetzungen Expired - Fee Related DE69218817T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/658,983 US5235015A (en)	1991-02-21	1991-02-21	High speed aqueous solvent developable photopolymer compositions

Publications (2)

Publication Number	Publication Date
DE69218817D1 true DE69218817D1 (de)	1997-05-15
DE69218817T2 DE69218817T2 (de)	1997-10-02

Family

ID=24643556

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69218817T Expired - Fee Related DE69218817T2 (de)	1991-02-21	1992-02-18	In wässriger Lösung entwickelbare, hochempfindliches Photopolymer enthaltende, Zusammensetzungen

Country Status (6)

Country	Link
US (2)	US5235015A (de)
EP (1)	EP0500321B1 (de)
JP (1)	JPH0588365A (de)
CA (1)	CA2060944A1 (de)
DE (1)	DE69218817T2 (de)
HK (1)	HK1007807A1 (de)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5374501A (en) *	1992-08-17	1994-12-20	Minnesota Mining And Manufacturing Company	Alkali soluble photopolymer in color proofing constructions
US5362812A (en) *	1993-04-23	1994-11-08	Minnesota Mining And Manufacturing Company	Reactive polymeric dyes
JP2608383B2 (ja) *	1994-03-16	1997-05-07	アルテック株式会社	静電誘導防止性接着プライマー
US5460918A (en) *	1994-10-11	1995-10-24	Minnesota Mining And Manufacturing Company	Thermal transfer donor and receptor with silicated surface for lithographic printing applications
US5576146A (en) *	1995-01-17	1996-11-19	Imation Corp.	Photosensitive polymer-containing systems with increased shelf-lives
US5910395A (en)	1995-04-27	1999-06-08	Minnesota Mining And Manufacturing Company	Negative-acting no-process printing plates
US5830545A (en) *	1996-04-29	1998-11-03	Tetra Laval Holdings & Finance, S.A.	Multilayer, high barrier laminate
US5786127A (en) *	1996-08-15	1998-07-28	Western Litho Plate & Supply Co.	Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
EP0980754B1 (de) *	1998-08-14	2005-10-05	Fuji Photo Film Co., Ltd.	Photopolymerzusammensetzung, lithographischer Druckplattenvorläufer und Herstellungsverfahren zu einer lithographischen Druckplatte
US6156478A (en) *	1998-10-30	2000-12-05	3M Innovative Properties Company	Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
AU1339700A (en)	1998-11-02	2000-05-22	Presstek, Inc.	Transparent conductive oxides for plastic flat panel displays
SG116488A1 (en) *	1998-12-16	2005-11-28	Silverbrook Res Pty Ltd	Printer transfer roller with internal drive motor.
WO2001096961A2 (en) *	2000-06-15	2001-12-20	3M Innovative Properties Company	Multipass multiphoton absorption method and apparatus
US7118845B2 (en) *	2000-06-15	2006-10-10	3M Innovative Properties Company	Multiphoton photochemical process and articles preparable thereby
KR100810547B1 (ko) *	2000-06-15	2008-03-18	쓰리엠 이노베이티브 프로퍼티즈 캄파니	캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
US6852766B1 (en) *	2000-06-15	2005-02-08	3M Innovative Properties Company	Multiphoton photosensitization system
DE60139624D1 (de) *	2000-06-15	2009-10-01	3M Innovative Properties Co	Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren
AU2001266905A1 (en) *	2000-06-15	2001-12-24	3M Innovative Properties Company	Microfabrication of organic optical elements
US7381516B2 (en) *	2002-10-02	2008-06-03	3M Innovative Properties Company	Multiphoton photosensitization system
US7265161B2 (en) *	2002-10-02	2007-09-04	3M Innovative Properties Company	Multi-photon reactive compositions with inorganic particles and method for fabricating structures
EP1292861B1 (de) *	2000-06-15	2014-11-19	3M Innovative Properties Company	Mehrstrahliges fotolithographisches absorptionsverfahren
KR100795759B1 (ko) *	2000-06-15	2008-01-21	쓰리엠 이노베이티브 프로퍼티즈 캄파니	미세유체 물품의 제조 방법
US7005229B2 (en) *	2002-10-02	2006-02-28	3M Innovative Properties Company	Multiphoton photosensitization method
US6627309B2 (en)	2001-05-08	2003-09-30	3M Innovative Properties Company	Adhesive detackification
US20040012872A1 (en) *	2001-06-14	2004-01-22	Fleming Patrick R	Multiphoton absorption method using patterned light
US6750266B2 (en) *	2001-12-28	2004-06-15	3M Innovative Properties Company	Multiphoton photosensitization system
US7005031B2 (en) *	2002-01-16	2006-02-28	3M Innovative Properties Company	Pressure sensitive adhesives having quaternary ammonium functionality, articles, and methods
US7147873B2 (en)	2002-01-16	2006-12-12	3M Innovative Properties Company	Antiseptic compositions and methods
US6838078B2 (en)	2002-01-16	2005-01-04	3M Innovative Properties Company	Film-forming compositions and methods
US7232650B2 (en) *	2002-10-02	2007-06-19	3M Innovative Properties Company	Planar inorganic device
US7285576B2 (en) *	2003-03-12	2007-10-23	3M Innovative Properties Co.	Absorbent polymer compositions, medical articles, and methods
US20050070688A1 (en) *	2003-09-26	2005-03-31	3M Innovative Properties Company	Reactive hydrophilic oligomers
US20050123590A1 (en) *	2003-12-05	2005-06-09	3M Innovative Properties Company	Wound dressings and methods
US7745509B2 (en) *	2003-12-05	2010-06-29	3M Innovative Properties Company	Polymer compositions with bioactive agent, medical articles, and methods
US20050123621A1 (en) *	2003-12-05	2005-06-09	3M Innovative Properties Company	Silver coatings and methods of manufacture
US7863485B2 (en) *	2004-12-10	2011-01-04	Omnitech Environmental, Llc	Additive and vehicle for inks, paints, coatings and adhesives
JP4880701B2 (ja)	2005-12-21	2012-02-22	スリーエムイノベイティブプロパティズカンパニー	多光子硬化反応性組成物を処理するための方法及び装置
US7583444B1 (en) *	2005-12-21	2009-09-01	3M Innovative Properties Company	Process for making microlens arrays and masterforms
US8858807B2 (en) *	2006-03-24	2014-10-14	3M Innovative Properties Company	Process for making microneedles, microneedle arrays, masters, and replication tools
US7941013B2 (en) *	2006-05-18	2011-05-10	3M Innovative Properties Company	Process for making light guides with extraction structures and light guides produced thereby
US7939578B2 (en) *	2007-02-23	2011-05-10	3M Innovative Properties Company	Polymeric fibers and methods of making
EP1975706A3 (de) *	2007-03-30	2010-03-03	FUJIFILM Corporation	Lithografiedruckplattenvorläufer
US8513322B2 (en) *	2007-05-31	2013-08-20	3M Innovative Properties Company	Polymeric beads and methods of making polymeric beads
US9102083B2 (en)	2007-09-06	2015-08-11	3M Innovative Properties Company	Methods of forming molds and methods of forming articles using said molds
CN101796443A (zh)	2007-09-06	2010-08-04	3M创新有限公司	具有提供输出光区域控制的光提取结构的光导装置
JP2010537843A (ja) *	2007-09-06	2010-12-09	スリーエムイノベイティブプロパティズカンパニー	微細構造物品を作製するための工具
CN101821659B (zh)	2007-10-11	2014-09-24	3M创新有限公司	色差共聚焦传感器
US8362106B2 (en)	2007-12-04	2013-01-29	E I Du Pont De Nemours And Company	Decarboxylating block copolymers
TW200934449A (en)	2007-12-12	2009-08-16	3M Innovative Properties Co	Hydrophilic gel materials and methods of making
US8318282B2 (en) *	2007-12-12	2012-11-27	3M Innovative Properties Company	Microstructured antimicrobial film
CN101946305B (zh) *	2007-12-12	2014-02-12	3M创新有限公司	用于制备具有改善的边缘清晰度的结构的方法
EP2257854B1 (de) *	2008-02-26	2018-10-31	3M Innovative Properties Company	Mehrphotonenbelichtungssystem
IL196690A0 (en) *	2008-05-29	2011-08-01	Plasan Sasa Ltd	Interchangeable door
US8846160B2 (en)	2008-12-05	2014-09-30	3M Innovative Properties Company	Three-dimensional articles using nonlinear thermal polymerization
EP2552497B1 (de)	2010-03-26	2021-01-13	3M Innovative Properties Company	Verfahren zur sterilisierung von wundverbänden
JP6373007B2 (ja)	2011-02-02	2018-08-15	スリーエムイノベイティブプロパティズカンパニー	ノズル及びノズルを作製する方法
EP2699965A2 (de)	2011-04-22	2014-02-26	3M Innovative Properties Company	Verbessertes multi-photonen-bildgebungsauflösungsverfahren
EP2718766A1 (de)	2011-06-08	2014-04-16	3M Innovative Properties Company	Fotolacke mit polymergebundenen nanopartikeln
JP2015512061A (ja)	2012-02-28	2015-04-23	スリーエムイノベイティブプロパティズカンパニー	陰性造影組成物を用いた多光子硬化方法
JP6377928B2 (ja) *	2014-03-25	2018-08-22	株式会社日本触媒	アルカリ可溶性樹脂を含むレジスト組成物及びその保存方法

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Publication number	Priority date	Publication date	Assignee	Title
US3448089A (en) *	1966-03-14	1969-06-03	Du Pont	Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate
US3598790A (en) *	1966-07-01	1971-08-10	Roehm & Haas Gmbh	Azlactone copolymers
DE1745348A1 (de) *	1967-12-01	1971-09-09	Roehm Gmbh	Azlactongruppen enthaltende Mischpolymerisate
AU494547B2 (en) *	1972-07-10	1977-10-20	Johnson & Johnson	Hydrophilic random interpolymer compositions and method for making same
JPS6029103B2 (ja) *	1976-12-10	1985-07-09	富士写真フイルム株式会社	カラ−拡散転写法用写真要素
US4304923A (en) *	1979-02-27	1981-12-08	Minnesota Mining And Manufacturing Company	Photopolymerizable oligomer
US4378411A (en) *	1980-01-02	1983-03-29	Minnesota Mining And Manufacturing Company	Radiation-curable polymers
US4304705A (en) *	1980-01-02	1981-12-08	Minnesota Mining And Manufacturing Company	Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers
US4288523A (en) *	1980-03-14	1981-09-08	Polaroid Corporation	Diffusion control layers in diffusion transfer photographic products
US4996243A (en) *	1981-10-29	1991-02-26	Minnesota Mining And Manufacturing Company	Curable acrylamido oligomer compositions with initiator, and cured products
US4451619A (en) *	1982-09-30	1984-05-29	Minnesota Mining And Manufacturing Company	Method of hydrophilizing or hydrophobizing polymers
US4547449A (en) *	1983-02-11	1985-10-15	Eastman Kodak Company	Liquid electrographic developers containing quaternary ammonium charge-control polymers having acidic monomers
US4737560A (en) *	1987-03-13	1988-04-12	Minnesota Mining And Manufacturing Company	Polymer beads
US4902569A (en) *	1987-10-29	1990-02-20	Kendall Company	Novel adhesives and tapes including same
US4914165A (en) *	1988-02-03	1990-04-03	Minnesota Mining And Manufacturing Company	Radiation crosslinkable compositions

1991
- 1991-02-21 US US07/658,983 patent/US5235015A/en not_active Expired - Lifetime
1992
- 1992-02-10 CA CA002060944A patent/CA2060944A1/en not_active Abandoned
- 1992-02-18 DE DE69218817T patent/DE69218817T2/de not_active Expired - Fee Related
- 1992-02-18 EP EP92301322A patent/EP0500321B1/de not_active Expired - Lifetime
- 1992-02-20 JP JP4033018A patent/JPH0588365A/ja active Pending
1994
- 1994-05-13 US US08/242,367 patent/US5437932A/en not_active Expired - Lifetime
1998
- 1998-06-26 HK HK98107040A patent/HK1007807A1/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
US5235015A (en)	1993-08-10
HK1007807A1 (en)	1999-04-23
EP0500321B1 (de)	1997-04-09
CA2060944A1 (en)	1992-08-22
DE69218817T2 (de)	1997-10-02
US5437932A (en)	1995-08-01
EP0500321A1 (de)	1992-08-26
JPH0588365A (ja)	1993-04-09

Legal Events

Date	Code	Title	Description
1998-05-07	8364	No opposition during term of opposition
2002-12-19	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE69218817T2 (de)	1997-10-02	In wässriger Lösung entwickelbare, hochempfindliches Photopolymer enthaltende, Zusammensetzungen
DE68921687T2 (de)	1995-08-03	Belichtungseinrichtung.
DE68921867D1 (de)	1995-04-27	Photopolymerisierbare Zusammensetzung.
DE69132434D1 (de)	2000-11-09	Textverarbeitungsgerät
DE68914176D1 (de)	1994-05-05	Photopolymerisierbare Zusammensetzung.
DE68905631T2 (de)	1993-07-15	Superparamagnetische fluessigkeit.
DE69110201T2 (de)	1995-10-19	Verbesserungen an Flüssigkeitsabgabevorrichtungen.
DE68907794D1 (de)	1993-09-02	Positioniermittel.
DE68922237T2 (de)	1995-08-31	Wässrige Bleichmittelzusammensetzung.
DE58904517D1 (de)	1993-07-01	Interferometrische einrichtung.
NO900450D0 (no)	1990-01-31	Skipsbaneindikerende innretning.
DE69114305T2 (de)	1996-06-05	Flüssigkeitsentwicklungssystem.
DE68903504D1 (de)	1992-12-24	Maskenfilm.
DE68921245T2 (de)	1995-10-26	Flüssige Entwicklerzusammensetzungen.
DE68919102T2 (de)	1995-04-20	Photopolymerisierbare Zusammensetzung.
DE68919729T2 (de)	1995-04-20	Wässrige Bleichmittelzusammensetzung.
DE68922945T2 (de)	1995-11-16	Belichtungsvorrichtung.
DE68921096T2 (de)	1995-09-14	Flüssige Entwicklerzusammensetzungen.
DE69010817D1 (de)	1994-08-25	In wässeriger Base entwickelbare negative Schutzschichtzusammensetzungen.
DE68901200D1 (de)	1992-05-21	Badevorrichtung.
NO892728D0 (no)	1989-06-30	Aminoalkyl-aminokarbonyl-aminodiolaminosyre derivater somanti-hypertensive midler.
DE69227966D1 (de)	1999-02-04	Entwicklungsrolle
DK567689A (da)	1990-05-15	Vandig cisplatinoploesning
DE69217557T2 (de)	1997-08-28	Entwicklerlösungen
DE69232524D1 (de)	2002-05-02	Stabilisierte wässrige Lösung