DE69220393D1 - Doppelschichtige Metallisierungshaube für Photolithographie - Google Patents

Doppelschichtige Metallisierungshaube für Photolithographie

Info

Publication number
DE69220393D1
DE69220393D1 DE69220393T DE69220393T DE69220393D1 DE 69220393 D1 DE69220393 D1 DE 69220393D1 DE 69220393 T DE69220393 T DE 69220393T DE 69220393 T DE69220393 T DE 69220393T DE 69220393 D1 DE69220393 D1 DE 69220393D1
Authority
DE
Germany
Prior art keywords
photolithography
hood
double
layer metallization
metallization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69220393T
Other languages
English (en)
Other versions
DE69220393T2 (de
Inventor
John R Abernathey
Timothy H Daubenspeck
Stephen E Luce
Denis J Poley
Rosemary A Previti-Kelley
Gary P Viens
Jung H Yoon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69220393D1 publication Critical patent/DE69220393D1/de
Publication of DE69220393T2 publication Critical patent/DE69220393T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/902—Capping layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/95—Multilayer mask including nonradiation sensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/952—Utilizing antireflective layer
DE69220393T 1991-02-25 1992-02-04 Doppelschichtige Metallisierungshaube für Photolithographie Expired - Lifetime DE69220393T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/661,561 US5219788A (en) 1991-02-25 1991-02-25 Bilayer metallization cap for photolithography

Publications (2)

Publication Number Publication Date
DE69220393D1 true DE69220393D1 (de) 1997-07-24
DE69220393T2 DE69220393T2 (de) 1998-01-15

Family

ID=24654120

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69220393T Expired - Lifetime DE69220393T2 (de) 1991-02-25 1992-02-04 Doppelschichtige Metallisierungshaube für Photolithographie

Country Status (4)

Country Link
US (1) US5219788A (de)
EP (1) EP0501178B1 (de)
JP (1) JP2846761B2 (de)
DE (1) DE69220393T2 (de)

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JPH07297093A (ja) 1995-11-10
JP2846761B2 (ja) 1999-01-13
DE69220393T2 (de) 1998-01-15
EP0501178B1 (de) 1997-06-18
US5219788A (en) 1993-06-15
EP0501178A1 (de) 1992-09-02

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