DE69313351T2 - Gasförderer - Google Patents
GasfördererInfo
- Publication number
- DE69313351T2 DE69313351T2 DE69313351T DE69313351T DE69313351T2 DE 69313351 T2 DE69313351 T2 DE 69313351T2 DE 69313351 T DE69313351 T DE 69313351T DE 69313351 T DE69313351 T DE 69313351T DE 69313351 T2 DE69313351 T2 DE 69313351T2
- Authority
- DE
- Germany
- Prior art keywords
- gas conveyor
- conveyor
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4162225A JP2703694B2 (ja) | 1992-05-28 | 1992-05-28 | ガス供給装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69313351D1 DE69313351D1 (de) | 1997-10-02 |
DE69313351T2 true DE69313351T2 (de) | 1998-03-12 |
Family
ID=15750353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69313351T Expired - Fee Related DE69313351T2 (de) | 1992-05-28 | 1993-03-12 | Gasförderer |
Country Status (4)
Country | Link |
---|---|
US (1) | US5354516A (de) |
EP (1) | EP0572108B1 (de) |
JP (1) | JP2703694B2 (de) |
DE (1) | DE69313351T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06295862A (ja) * | 1992-11-20 | 1994-10-21 | Mitsubishi Electric Corp | 化合物半導体製造装置及び有機金属材料容器 |
TW338174B (en) * | 1995-01-06 | 1998-08-11 | Tokyo Electron Co Ltd | Apparatus for supplying a treatment material |
NL1003973C2 (nl) * | 1996-09-06 | 1998-03-09 | Berkin Bv | Werkwijze voor het momentaan identificeren van een gas- of vloeistofstroom en inrichting voor het uitvoeren van de werkwijze. |
CA2318771A1 (en) * | 1998-01-26 | 1999-07-29 | Scimed Life Systems, Inc. | Catheter assembly with distal end inductive coupler and embedded transmission line |
US6810201B1 (en) * | 1998-03-06 | 2004-10-26 | Samsung Electronics Co., Ltd. | Storage medium storing catalog information and apparatus and method for recording and/or playing back catalog information |
US6136725A (en) * | 1998-04-14 | 2000-10-24 | Cvd Systems, Inc. | Method for chemical vapor deposition of a material on a substrate |
US6296711B1 (en) | 1998-04-14 | 2001-10-02 | Cvd Systems, Inc. | Film processing system |
CA2328295A1 (en) | 1998-04-14 | 1999-10-21 | Jack P. Salerno | Film deposition system |
DE10059386A1 (de) * | 2000-11-30 | 2002-06-13 | Aixtron Ag | Verfahren und Vorrichtung zur dosierten Abgabe kleiner Flüssigkeitsvolumenströme |
US7186385B2 (en) | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
GB0227109D0 (en) * | 2002-11-20 | 2002-12-24 | Air Prod & Chem | Volume flow controller |
KR20070005547A (ko) * | 2003-09-22 | 2007-01-10 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 디스플레이 모니터를 위한 좌표 검출 시스템 |
US20060113687A1 (en) * | 2004-11-29 | 2006-06-01 | Mark Castellano | Remote control HVAC air freshener |
US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
JP4525728B2 (ja) * | 2007-10-24 | 2010-08-18 | トヨタ自動車株式会社 | ガス残量表示制御装置、ガス残量表示装置、および、ガス残量表示制御方法 |
KR100962044B1 (ko) * | 2007-12-06 | 2010-06-08 | 성균관대학교산학협력단 | 저유전 플라즈마 중합체 박막 및 그 제조 방법 |
US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
CN102326129A (zh) * | 2009-03-04 | 2012-01-18 | 株式会社堀场Stec | 气体供给装置 |
US20130305807A1 (en) * | 2012-05-16 | 2013-11-21 | Hon Hai Precision Industry Co., Ltd. | Gas detector test system and apparatus |
JP2014145115A (ja) * | 2013-01-29 | 2014-08-14 | Tokyo Electron Ltd | 原料ガス供給装置、成膜装置、流量の測定方法及び記憶媒体 |
JP6135475B2 (ja) * | 2013-11-20 | 2017-05-31 | 東京エレクトロン株式会社 | ガス供給装置、成膜装置、ガス供給方法及び記憶媒体 |
CN109724667B (zh) * | 2017-10-30 | 2022-08-05 | 诺信公司 | 容器内液体体积百分比的检测方法和系统以及具有该系统的分配器 |
CN110836946B (zh) * | 2019-11-19 | 2024-03-29 | 中国科学技术大学 | 一种可定量及可控制蒸气浓度的鼓泡装置及浓度测量方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4033171A (en) * | 1975-02-14 | 1977-07-05 | The Foxboro Company | Pneumatic detector for chromatographic analyzer |
US4276243A (en) * | 1978-12-08 | 1981-06-30 | Western Electric Company, Inc. | Vapor delivery control system and method |
US4436674A (en) * | 1981-07-30 | 1984-03-13 | J.C. Schumacher Co. | Vapor mass flow control system |
SU1089460A1 (ru) * | 1982-07-28 | 1984-04-30 | Предприятие П/Я В-8495 | Устройство дл измерени и регулировани количества реагента в газовой смеси |
JPS611014A (ja) * | 1985-05-22 | 1986-01-07 | Hitachi Ltd | 半導体プロセス装置 |
JPH0222472A (ja) * | 1988-07-12 | 1990-01-25 | Nec Corp | 気相成長用液体原料ガス供給装置 |
JPH0642938B2 (ja) * | 1989-04-10 | 1994-06-08 | 日本タイラン株式会社 | 気化ガスの流量制御装置 |
JPH0784662B2 (ja) * | 1989-12-12 | 1995-09-13 | アプライドマテリアルズジャパン株式会社 | 化学的気相成長方法とその装置 |
-
1992
- 1992-05-28 JP JP4162225A patent/JP2703694B2/ja not_active Expired - Lifetime
-
1993
- 1993-03-12 EP EP93301886A patent/EP0572108B1/de not_active Expired - Lifetime
- 1993-03-12 US US08/030,864 patent/US5354516A/en not_active Expired - Fee Related
- 1993-03-12 DE DE69313351T patent/DE69313351T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05329357A (ja) | 1993-12-14 |
DE69313351D1 (de) | 1997-10-02 |
US5354516A (en) | 1994-10-11 |
EP0572108A3 (en) | 1994-09-21 |
JP2703694B2 (ja) | 1998-01-26 |
EP0572108A2 (de) | 1993-12-01 |
EP0572108B1 (de) | 1997-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |