DE69316111D1 - Topografische, selektive Muster - Google Patents

Topografische, selektive Muster

Info

Publication number
DE69316111D1
DE69316111D1 DE69316111T DE69316111T DE69316111D1 DE 69316111 D1 DE69316111 D1 DE 69316111D1 DE 69316111 T DE69316111 T DE 69316111T DE 69316111 T DE69316111 T DE 69316111T DE 69316111 D1 DE69316111 D1 DE 69316111D1
Authority
DE
Germany
Prior art keywords
topographic
selective patterns
selective
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69316111T
Other languages
English (en)
Other versions
DE69316111T2 (de
Inventor
Susan Nord Bohlke
Gregory M Jellum
Douglas S Dunn
Andrew J C O Minneso Ouderkirk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69316111D1 publication Critical patent/DE69316111D1/de
Publication of DE69316111T2 publication Critical patent/DE69316111T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
DE69316111T 1992-07-16 1993-07-15 Topografische, selektive Muster Expired - Fee Related DE69316111T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US91498192A 1992-07-16 1992-07-16

Publications (2)

Publication Number Publication Date
DE69316111D1 true DE69316111D1 (de) 1998-02-12
DE69316111T2 DE69316111T2 (de) 1998-08-20

Family

ID=25435040

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69316111T Expired - Fee Related DE69316111T2 (de) 1992-07-16 1993-07-15 Topografische, selektive Muster

Country Status (9)

Country Link
US (1) US5830376A (de)
EP (1) EP0583997B1 (de)
JP (1) JPH06104099A (de)
KR (1) KR940005324A (de)
CA (1) CA2097388A1 (de)
DE (1) DE69316111T2 (de)
HK (1) HK1008141A1 (de)
MX (1) MX9303577A (de)
MY (1) MY131499A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69527962T2 (de) * 1994-06-21 2003-04-10 Minnesota Mining & Mfg Verbundschicht für lichtsteuerung und geheimhaltung
TW348227B (en) * 1994-12-28 1998-12-21 Nisshin Denki Kk Method of orientation treatment of orientation film
US6049419A (en) * 1998-01-13 2000-04-11 3M Innovative Properties Co Multilayer infrared reflecting optical body
US7223364B1 (en) * 1999-07-07 2007-05-29 3M Innovative Properties Company Detection article having fluid control film
JP2003510824A (ja) * 1999-09-28 2003-03-18 ジエテツク，インコーポレーテツド 大きい深さ対幅アスペクト比をもつホールから、ポリマーを制御下にかつ急速に除去するための大気内プロセスおよびシステム
US7365019B2 (en) * 1999-11-01 2008-04-29 Jetek, Llc Atmospheric process and system for controlled and rapid removal of polymers from high aspect ratio holes
US6762136B1 (en) 1999-11-01 2004-07-13 Jetek, Inc. Method for rapid thermal processing of substrates
US6955991B2 (en) * 1999-11-01 2005-10-18 Jetek, Inc. Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes
US6962025B1 (en) 2001-05-29 2005-11-08 H.B. Fuller Licensing & Financing, Inc. Metal plasma surface-modified thermal barrier channel
US7767928B2 (en) * 2001-09-05 2010-08-03 Lasertec Gmbh Depth measurement and depth control or automatic depth control for a hollow to be produced by a laser processing device
TWI245817B (en) * 2003-04-09 2005-12-21 Htc Corp Process for forming interface at plated and un-plated area
US7323699B2 (en) * 2005-02-02 2008-01-29 Rave, Llc Apparatus and method for modifying an object
JP6181463B2 (ja) * 2013-08-20 2017-08-16 株式会社アスカネット 対向する壁面への選択的蒸着方法
EP3724704A4 (de) 2017-12-13 2021-12-22 3M Innovative Properties Company Steuerungsfilm mit hoher lichtdurchlässigkeit
CN111465894A (zh) 2017-12-13 2020-07-28 3M创新有限公司 高透射率光控膜
JP2021533407A (ja) 2018-08-01 2021-12-02 スリーエム イノベイティブ プロパティズ カンパニー 高透過率の光制御フィルム

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3860783A (en) * 1970-10-19 1975-01-14 Bell Telephone Labor Inc Ion etching through a pattern mask
US3873371A (en) * 1972-11-07 1975-03-25 Hughes Aircraft Co Small geometry charge coupled device and process for fabricating same
CA1009607A (en) * 1972-11-29 1977-05-03 Heinz Dimigen Method of manufacturing etched structures in substrates by ion etching
US4016062A (en) * 1975-09-11 1977-04-05 International Business Machines Corporation Method of forming a serrated surface topography
US4126712A (en) * 1976-07-30 1978-11-21 Rca Corporation Method of transferring a surface relief pattern from a wet poly(olefin sulfone) layer to a metal layer
US4097618A (en) * 1977-03-09 1978-06-27 Rca Corporation Method of transferring a surface relief pattern from a poly(1-methyl-1-cyclopropene sulfone) layer to a non-metallic inorganic layer
US4289381A (en) * 1979-07-02 1981-09-15 Hughes Aircraft Company High selectivity thin film polarizer
US4465551A (en) * 1980-05-07 1984-08-14 Horwitz Christopher M Graded microstructured layers formed by vacuum etching
US4388517A (en) * 1980-09-22 1983-06-14 Texas Instruments Incorporated Sublimation patterning process
US4414059A (en) * 1982-12-09 1983-11-08 International Business Machines Corporation Far UV patterning of resist materials
NL8502765A (nl) * 1985-10-10 1987-05-04 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
US4684437A (en) * 1985-10-31 1987-08-04 International Business Machines Corporation Selective metal etching in metal/polymer structures
US4761394A (en) * 1986-10-31 1988-08-02 Shell Oil Company Ethylene oxide catalyst and process for preparing the catalyst
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
DE3733135C1 (de) * 1987-10-01 1988-09-22 Leybold Ag Vorrichtung zum Beschichten oder AEtzen mittels eines Plasmas
GB2212974B (en) * 1987-11-25 1992-02-12 Fuji Electric Co Ltd Plasma processing apparatus
JPH01170558A (ja) * 1987-12-24 1989-07-05 Nippon Steel Corp 注入ノズル直接通電加熱の制御方法
US4822451A (en) * 1988-04-27 1989-04-18 Minnesota Mining And Manufacturing Company Process for the surface modification of semicrystalline polymers
US4918031A (en) * 1988-12-28 1990-04-17 American Telephone And Telegraph Company,At&T Bell Laboratories Processes depending on plasma generation using a helical resonator
US5091626A (en) * 1990-02-02 1992-02-25 Hadassah Medical Organization Method for the ablative reshaping of material surfaces
JPH0785289B2 (ja) * 1990-03-19 1995-09-13 シャープ株式会社 磁気ヘッドの製造方法
JP2932650B2 (ja) * 1990-09-17 1999-08-09 松下電器産業株式会社 微細構造物の製造方法
US5139967A (en) * 1991-02-20 1992-08-18 Micron Technology, Inc. Process for planarizing insulating dielectric material
US5178726A (en) * 1991-03-07 1993-01-12 Minnesota Mining And Manufacturing Company Process for producing a patterned metal surface
GB9114018D0 (en) * 1991-06-28 1991-08-14 Philips Electronic Associated Thin-film transistor manufacture

Also Published As

Publication number Publication date
US5830376A (en) 1998-11-03
CA2097388A1 (en) 1994-01-17
EP0583997B1 (de) 1998-01-07
MY131499A (en) 2007-08-30
KR940005324A (ko) 1994-03-21
MX9303577A (es) 1994-02-28
EP0583997A1 (de) 1994-02-23
DE69316111T2 (de) 1998-08-20
HK1008141A1 (en) 1999-04-30
JPH06104099A (ja) 1994-04-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee