DE69410897D1 - Helicon-Wellen-Plasmaquelle, Antenne für eine solche Plasmaquelle, sowie Verfahren zur Plasmareinigung und zur Plasmaneutralisation von Oberflächen im Weltraum mit einer solchen Plasmaquelle - Google Patents

Helicon-Wellen-Plasmaquelle, Antenne für eine solche Plasmaquelle, sowie Verfahren zur Plasmareinigung und zur Plasmaneutralisation von Oberflächen im Weltraum mit einer solchen Plasmaquelle

Info

Publication number
DE69410897D1
DE69410897D1 DE69410897T DE69410897T DE69410897D1 DE 69410897 D1 DE69410897 D1 DE 69410897D1 DE 69410897 T DE69410897 T DE 69410897T DE 69410897 T DE69410897 T DE 69410897T DE 69410897 D1 DE69410897 D1 DE 69410897D1
Authority
DE
Germany
Prior art keywords
plasma
plasma source
source
antenna
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69410897T
Other languages
English (en)
Other versions
DE69410897T2 (de
Inventor
Weldon S Williamson
Barret Lippey
John D Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DirecTV Group Inc
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of DE69410897D1 publication Critical patent/DE69410897D1/de
Application granted granted Critical
Publication of DE69410897T2 publication Critical patent/DE69410897T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B64—AIRCRAFT; AVIATION; COSMONAUTICS
    • B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
    • B64G1/00—Cosmonautic vehicles
    • B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
    • B64G1/66—Arrangements or adaptations of apparatus or instruments, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B64—AIRCRAFT; AVIATION; COSMONAUTICS
    • B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
    • B64G1/00—Cosmonautic vehicles
    • B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
DE69410897T 1993-08-27 1994-08-24 Helicon-Wellen-Plasmaquelle, Antenne für eine solche Plasmaquelle, sowie Verfahren zur Plasmareinigung und zur Plasmaneutralisation von Oberflächen im Weltraum mit einer solchen Plasmaquelle Expired - Fee Related DE69410897T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/113,144 US5418431A (en) 1993-08-27 1993-08-27 RF plasma source and antenna therefor

Publications (2)

Publication Number Publication Date
DE69410897D1 true DE69410897D1 (de) 1998-07-16
DE69410897T2 DE69410897T2 (de) 1999-03-18

Family

ID=22347794

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69410897T Expired - Fee Related DE69410897T2 (de) 1993-08-27 1994-08-24 Helicon-Wellen-Plasmaquelle, Antenne für eine solche Plasmaquelle, sowie Verfahren zur Plasmareinigung und zur Plasmaneutralisation von Oberflächen im Weltraum mit einer solchen Plasmaquelle

Country Status (4)

Country Link
US (4) US5418431A (de)
EP (1) EP0641151B1 (de)
JP (1) JPH07109000A (de)
DE (1) DE69410897T2 (de)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5418431A (en) * 1993-08-27 1995-05-23 Hughes Aircraft Company RF plasma source and antenna therefor
US6264812B1 (en) 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma
KR100489918B1 (ko) * 1996-05-09 2005-08-04 어플라이드 머티어리얼스, 인코포레이티드 플라즈마발생및스퍼터링용코일
US6368469B1 (en) * 1996-05-09 2002-04-09 Applied Materials, Inc. Coils for generating a plasma and for sputtering
US6254737B1 (en) 1996-10-08 2001-07-03 Applied Materials, Inc. Active shield for generating a plasma for sputtering
US6190513B1 (en) 1997-05-14 2001-02-20 Applied Materials, Inc. Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition
US6514390B1 (en) 1996-10-17 2003-02-04 Applied Materials, Inc. Method to eliminate coil sputtering in an ICP source
US5961793A (en) * 1996-10-31 1999-10-05 Applied Materials, Inc. Method of reducing generation of particulate matter in a sputtering chamber
TW358964B (en) * 1996-11-21 1999-05-21 Applied Materials Inc Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6599399B2 (en) 1997-03-07 2003-07-29 Applied Materials, Inc. Sputtering method to generate ionized metal plasma using electron beams and magnetic field
US6103070A (en) * 1997-05-14 2000-08-15 Applied Materials, Inc. Powered shield source for high density plasma
US6210539B1 (en) 1997-05-14 2001-04-03 Applied Materials, Inc. Method and apparatus for producing a uniform density plasma above a substrate
US5928461A (en) * 1997-05-15 1999-07-27 Kaufman; David A. RF plasma source for cleaning spacecraft surfaces
US6652717B1 (en) 1997-05-16 2003-11-25 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6361661B2 (en) 1997-05-16 2002-03-26 Applies Materials, Inc. Hybrid coil design for ionized deposition
US6579426B1 (en) 1997-05-16 2003-06-17 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6077402A (en) * 1997-05-16 2000-06-20 Applied Materials, Inc. Central coil design for ionized metal plasma deposition
US6375810B2 (en) 1997-08-07 2002-04-23 Applied Materials, Inc. Plasma vapor deposition with coil sputtering
US6345588B1 (en) 1997-08-07 2002-02-12 Applied Materials, Inc. Use of variable RF generator to control coil voltage distribution
US6235169B1 (en) 1997-08-07 2001-05-22 Applied Materials, Inc. Modulated power for ionized metal plasma deposition
US6042700A (en) * 1997-09-15 2000-03-28 Applied Materials, Inc. Adjustment of deposition uniformity in an inductively coupled plasma source
US6565717B1 (en) 1997-09-15 2003-05-20 Applied Materials, Inc. Apparatus for sputtering ionized material in a medium to high density plasma
US6023038A (en) * 1997-09-16 2000-02-08 Applied Materials, Inc. Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system
US6280579B1 (en) 1997-12-19 2001-08-28 Applied Materials, Inc. Target misalignment detector
US6254738B1 (en) 1998-03-31 2001-07-03 Applied Materials, Inc. Use of variable impedance having rotating core to control coil sputter distribution
US6146508A (en) * 1998-04-22 2000-11-14 Applied Materials, Inc. Sputtering method and apparatus with small diameter RF coil
US6660134B1 (en) 1998-07-10 2003-12-09 Applied Materials, Inc. Feedthrough overlap coil
TW434636B (en) 1998-07-13 2001-05-16 Applied Komatsu Technology Inc RF matching network with distributed outputs
US6132566A (en) * 1998-07-30 2000-10-17 Applied Materials, Inc. Apparatus and method for sputtering ionized material in a plasma
US6231725B1 (en) 1998-08-04 2001-05-15 Applied Materials, Inc. Apparatus for sputtering material onto a workpiece with the aid of a plasma
AU757756B2 (en) * 1998-10-06 2003-03-06 Australian National University, The Plasma antenna
AUPP635298A0 (en) 1998-10-06 1998-10-29 Australian National University, The Plasma antenna
US6238528B1 (en) 1998-10-13 2001-05-29 Applied Materials, Inc. Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source
US6217718B1 (en) 1999-02-17 2001-04-17 Applied Materials, Inc. Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma
GB2353293A (en) * 1999-08-18 2001-02-21 Rtc Systems Ltd FeXN deposition process based on helicon sputtering
JP4667553B2 (ja) * 1999-12-01 2011-04-13 株式会社Ｓｅｎ イオン源
US6361836B1 (en) * 1999-12-09 2002-03-26 Johns Manville International, Inc. Method of making spinner discs for rotary fiberization processes
US6537379B1 (en) 2000-01-13 2003-03-25 Hrl Laboratories, Llc Photocatalytic coating and method for cleaning spacecraft surfaces
US6500275B1 (en) * 2000-06-12 2002-12-31 The United States Of America As Represented By The Secretary Of The Air Force Mitigation of spacecraft charging by means of polar molecules
US6463672B1 (en) * 2000-07-03 2002-10-15 The United States Of America As Represented By The Secretary Of The Air Force Mitigation of spacecraft charging by means of ionized water vapor
US6444984B1 (en) 2000-08-11 2002-09-03 Drs Sensors & Targeting Systems, Inc. Solid cryogenic optical filter
US7842252B2 (en) * 2001-06-18 2010-11-30 Coastal Hydrogen Energy, Inc. Reaction vessel including fielding apparatus
JP3789812B2 (ja) * 2001-12-17 2006-06-28 三菱電機株式会社 宇宙航行光学機器及びその汚染物質除去方法
US7452660B1 (en) * 2004-08-11 2008-11-18 Lam Research Corporation Method for resist strip in presence of low K dielectric material and apparatus for performing the same
US7474273B1 (en) 2005-04-27 2009-01-06 Imaging Systems Technology Gas plasma antenna
US7719471B1 (en) 2006-04-27 2010-05-18 Imaging Systems Technology Plasma-tube antenna
US7999747B1 (en) 2007-05-15 2011-08-16 Imaging Systems Technology Gas plasma microdischarge antenna
US8029105B2 (en) * 2007-10-17 2011-10-04 Eastman Kodak Company Ambient plasma treatment of printer components
US20090308729A1 (en) * 2008-06-13 2009-12-17 Gallimore Alec D Hydrogen production from water using a plasma source
US8205838B2 (en) * 2009-08-13 2012-06-26 Moorer Jr Daniel F Electrostatic spacecraft reorbiter
US8210480B2 (en) * 2009-08-13 2012-07-03 Moorer Daniel F Hybrid electrostatic space tug
CN102774511A (zh) * 2012-08-03 2012-11-14 北京卫星环境工程研究所 基于螺旋波等离子体的航天器电位主动控制装置及其应用
US9993852B2 (en) * 2014-08-20 2018-06-12 Elwha Llc Surface cleaning unmanned aerial vehicle
EP3560298A4 (de) 2016-12-21 2020-08-12 Phase Four, Inc. Plasmaproduktion und steuerungsvorrichtung
US20190107103A1 (en) 2017-10-09 2019-04-11 Phase Four, Inc. Electrothermal radio frequency thruster and components
CN109538432A (zh) * 2019-01-24 2019-03-29 河南理工大学 一种无中和器的螺旋波等离子体推进装置
CN111465163A (zh) * 2020-05-11 2020-07-28 北京卫星环境工程研究所 基于星载射频放电的等离子体接触器

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4088926A (en) * 1976-05-10 1978-05-09 Nasa Plasma cleaning device
JPS60124312A (ja) * 1983-12-08 1985-07-03 日立電線株式会社 耐火電線及びその製造方法
JPS60124342A (ja) * 1983-12-09 1985-07-03 Fujitsu Ltd プラズマｘ線発生装置
US4800281A (en) * 1984-09-24 1989-01-24 Hughes Aircraft Company Compact penning-discharge plasma source
JPH0655600B2 (ja) * 1985-10-29 1994-07-27 ヒュ−ズ・エアクラフト・カンパニ− 酸素粒子照射方法、粒子ビーム照射方法、汚染物質フィルムクリーニング方法、及び人工衛星及び宇宙船の寿命を長くする方法
JPS62216638A (ja) * 1986-03-19 1987-09-24 Anelva Corp 表面処理装置
US4786352A (en) * 1986-09-12 1988-11-22 Benzing Technologies, Inc. Apparatus for in-situ chamber cleaning
JPS63297547A (ja) * 1987-05-29 1988-12-05 Nippon Telegr & Teleph Corp <Ntt> 基板清浄化法
US4961820A (en) * 1988-06-09 1990-10-09 Fujitsu Limited Ashing method for removing an organic film on a substance of a semiconductor device under fabrication
US4977352A (en) * 1988-06-24 1990-12-11 Hughes Aircraft Company Plasma generator having rf driven cathode
JPH02183531A (ja) * 1989-01-10 1990-07-18 Osaka Titanium Co Ltd 半導体ウエーハの洗浄方法
US4990229A (en) * 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
JPH0660414B2 (ja) * 1989-09-27 1994-08-10 株式会社芦田 Ｅｃｒプラズマｃｖｄ装置
DE3942964A1 (de) * 1989-12-23 1991-06-27 Leybold Ag Einrichtung fuer die erzeugung eines plasmas
JPH04341591A (ja) * 1991-05-20 1992-11-27 Sumitomo Heavy Ind Ltd スパッタリング洗浄装置
JPH0513394A (ja) * 1991-07-02 1993-01-22 Nissin Electric Co Ltd 基体の膜形成面清浄化方法
US5397962A (en) * 1992-06-29 1995-03-14 Texas Instruments Incorporated Source and method for generating high-density plasma with inductive power coupling
US5418431A (en) * 1993-08-27 1995-05-23 Hughes Aircraft Company RF plasma source and antenna therefor

Also Published As

Publication number Publication date
US5628831A (en) 1997-05-13
JPH07109000A (ja) 1995-04-25
US5418431A (en) 1995-05-23
US5514936A (en) 1996-05-07
EP0641151B1 (de) 1998-06-10
US5696429A (en) 1997-12-09
EP0641151A1 (de) 1995-03-01
DE69410897T2 (de) 1999-03-18

Similar Documents

Publication Publication Date Title
DE69410897D1 (de) Helicon-Wellen-Plasmaquelle, Antenne für eine solche Plasmaquelle, sowie Verfahren zur Plasmareinigung und zur Plasmaneutralisation von Oberflächen im Weltraum mit einer solchen Plasmaquelle
DE69435012D1 (de) Scheibenantenne und Verfahren zum Entwerfen einer derartigen Antenne
BR8901954A (pt) Processo no sistema de antenas e de recepcao de um radioteodolito e aparelho de radioteodolito
DE69407332T2 (de) Verfahren zur Strahlungskeulenkompression in Antennendiagrammen
BR9406028A (pt) Composição e processo de limpeza
BR9607469A (pt) Artigo e processo de junção de duas superficies
BR9400598A (pt) Processo e aparelho para produzir congelamento
SG72915A1 (en) Rf communications system operable in the presence of a repetitive interference source and related methods
DE59308857D1 (de) Verfahren zur Beseitigung von Schadstoffen, insbesondere im Erdbodenbereich
BR9101660A (pt) Processo para fosfatagem de superficies de metal e aplicacao
EP0622897A3 (en) Surface acoustic wave device and method of manufacturing the same.
BR9307861A (pt) Processo para formação de revestimento
DE69434005D1 (de) Vorrichtungen zur Verbesserung von Verbindern und Verfahren zur Verbesserung desselben
BR9307855A (pt) Processo para formação de revestimento
BR9403805A (pt) Elemento abrasivo e processo de formação do mesmo
BR9407425A (pt) Esfregao e processo de limpeza utilizando o mesmo
DE69403592D1 (de) Verfahren zur Zersetzung von Stickstoffoxiden
DE69431942D1 (de) Verfahren zur Herstellung einer ebenen Antenne
DE59410042D1 (de) Verfahren zur beschichtung von oberflächen mit biomolekülen und anderen rezeptormolekülen
DE69304584D1 (de) Verfahren zur Bündelung des Strahlungsdiagrammes von Antennen
BR9300137A (pt) Processo de pontaria em alvo anatomico,e aparelho de tratamento da prostata aplicando o processo
DE69421313T2 (de) Verfahren zur Strahlungskeulenkompression von Radarantennendiagrammen
BR9002318A (pt) Composicao aquosa adequada para fosfatacao de superficies metalicas e processo de fosfatacao
DE69211213T2 (de) Verfahren zur Reduzierung von Nebenkeulen im Sendediagramm einer aktiven Gruppenantenne und Antenne zur Durchführung des Verfahrens
DE69318524T2 (de) Verfahren zur Strahlungskeulenkompression in Radarantennendiagrammen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HUGHES ELECTRONICS CORP., EL SEGUNDO, CALIF., US

8339 Ceased/non-payment of the annual fee