DE69424138T2 - Projektionsbelichtungsvorrichtung - Google Patents
ProjektionsbelichtungsvorrichtungInfo
- Publication number
- DE69424138T2 DE69424138T2 DE69424138T DE69424138T DE69424138T2 DE 69424138 T2 DE69424138 T2 DE 69424138T2 DE 69424138 T DE69424138 T DE 69424138T DE 69424138 T DE69424138 T DE 69424138T DE 69424138 T2 DE69424138 T2 DE 69424138T2
- Authority
- DE
- Germany
- Prior art keywords
- exposure device
- projection exposure
- projection
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/04—Refractors for light sources of lens shape
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
- F21W2131/10—Outdoor lighting
- F21W2131/103—Outdoor lighting of streets or roads
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2101/00—Point-like light sources
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32372193A JP3341269B2 (ja) | 1993-12-22 | 1993-12-22 | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69424138D1 DE69424138D1 (de) | 2000-05-31 |
DE69424138T2 true DE69424138T2 (de) | 2000-09-28 |
Family
ID=18157870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69424138T Expired - Lifetime DE69424138T2 (de) | 1993-12-22 | 1994-12-22 | Projektionsbelichtungsvorrichtung |
Country Status (5)
Country | Link |
---|---|
US (3) | US6262793B1 (de) |
EP (1) | EP0660169B1 (de) |
JP (1) | JP3341269B2 (de) |
KR (4) | KR100396872B1 (de) |
DE (1) | DE69424138T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015115555A1 (de) * | 2015-09-15 | 2017-03-16 | SMR Patents S.à.r.l. | Beleuchtungseinrichtung, Rückblickvorrichtung, Fußraumvorrichtung und Fahrzeug |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3341269B2 (ja) | 1993-12-22 | 2002-11-05 | 株式会社ニコン | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
US6333776B1 (en) | 1994-03-29 | 2001-12-25 | Nikon Corporation | Projection exposure apparatus |
JP3893626B2 (ja) * | 1995-01-25 | 2007-03-14 | 株式会社ニコン | 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法 |
JPH08327895A (ja) * | 1995-05-26 | 1996-12-13 | Nikon Corp | 投影光学装置 |
DE69728126T2 (de) * | 1996-12-28 | 2005-01-20 | Canon K.K. | Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
US6522386B1 (en) * | 1997-07-24 | 2003-02-18 | Nikon Corporation | Exposure apparatus having projection optical system with aberration correction element |
DE19827603A1 (de) | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
JP3459773B2 (ja) | 1998-06-24 | 2003-10-27 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
JP3862446B2 (ja) * | 1998-10-02 | 2006-12-27 | キヤノン株式会社 | 結像レンズ及びそれを用いた画像読取装置 |
US6924937B2 (en) | 1998-11-16 | 2005-08-02 | Canon Kabushiki Kaisha | Aberration correcting optical system |
JP3239881B2 (ja) * | 1998-11-16 | 2001-12-17 | キヤノン株式会社 | 光学系及びそれを用いた投影装置 |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
KR20010006578A (ko) * | 1999-01-20 | 2001-01-26 | 에이에스엠 리소그라피 비.브이. | 광학 보정 플레이트, 및 전사 투영 장치에의 적용 |
EP1022617A3 (de) * | 1999-01-20 | 2003-01-02 | ASML Netherlands B.V. | Optische Korrektionsplatte und deren Verwendung in einem lithographischen Projektionsapparat |
JP3548464B2 (ja) * | 1999-09-01 | 2004-07-28 | キヤノン株式会社 | 露光方法及び走査型露光装置 |
US6710930B2 (en) | 1999-12-01 | 2004-03-23 | Nikon Corporation | Illumination optical system and method of making exposure apparatus |
JP2002175964A (ja) * | 2000-12-06 | 2002-06-21 | Nikon Corp | 観察装置およびその製造方法、露光装置、並びにマイクロデバイスの製造方法 |
JP2002184667A (ja) | 2000-12-14 | 2002-06-28 | Nikon Corp | 補正部材の製造方法、投影光学系の製造方法および露光装置の調整方法 |
US20040042094A1 (en) * | 2000-12-28 | 2004-03-04 | Tomoyuki Matsuyama | Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
KR100579603B1 (ko) * | 2001-01-15 | 2006-05-12 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 |
JP2002287023A (ja) | 2001-03-27 | 2002-10-03 | Nikon Corp | 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法 |
US6937394B2 (en) | 2001-04-10 | 2005-08-30 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component |
US6525805B2 (en) * | 2001-05-14 | 2003-02-25 | Ultratech Stepper, Inc. | Backside alignment system and method |
JP3977038B2 (ja) | 2001-08-27 | 2007-09-19 | 株式会社半導体エネルギー研究所 | レーザ照射装置およびレーザ照射方法 |
US20030081276A1 (en) * | 2001-10-29 | 2003-05-01 | Jen-Shou Tseng | Method for scanning selected target image area of document |
TWI267708B (en) * | 2001-11-21 | 2006-12-01 | Adtec Eng Co Ltd | Optical magnification adjustment system and projection exposure device |
JP2003303751A (ja) * | 2002-04-05 | 2003-10-24 | Canon Inc | 投影光学系、該投影光学系を有する露光装置及び方法 |
JP4289914B2 (ja) * | 2002-05-07 | 2009-07-01 | キヤノン株式会社 | 結像光学系及びそれを用いた画像読取装置 |
JP4005881B2 (ja) * | 2002-08-30 | 2007-11-14 | 株式会社東芝 | 露光装置の検査方法 |
DE10328938A1 (de) * | 2003-06-27 | 2005-01-20 | Carl Zeiss Smt Ag | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie |
JP2005049726A (ja) | 2003-07-31 | 2005-02-24 | Olympus Corp | 光学システムの心立ち調整方法及びその調整システム |
US7388895B2 (en) * | 2003-11-21 | 2008-06-17 | Tsinghua University | Corner-pumping method and gain module for high power slab laser |
US7277231B2 (en) | 2004-04-02 | 2007-10-02 | Carl Zeiss Smt Ag | Projection objective of a microlithographic exposure apparatus |
JP4547714B2 (ja) * | 2004-05-19 | 2010-09-22 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
EP1754110B1 (de) | 2004-06-10 | 2008-07-30 | Carl Zeiss SMT AG | Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung |
WO2006013100A2 (en) | 2004-08-06 | 2006-02-09 | Carl Zeiss Smt Ag | Projection objective for microlithography |
JP4980922B2 (ja) | 2004-11-18 | 2012-07-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法 |
EP1835527A4 (de) * | 2004-12-16 | 2011-01-05 | Nikon Corp | Optisches projektionssystem, belichtungsvorrichtung, belichtungssystem und belichtungsverfahren |
JP4419900B2 (ja) * | 2005-04-08 | 2010-02-24 | ウシオ電機株式会社 | 露光装置 |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
KR100712997B1 (ko) * | 2005-09-30 | 2007-05-02 | 주식회사 하이닉스반도체 | 수직 및 수평 임계치수 차이를 조절하기 위한 노광시스템및 이를 이용한 노광방법 |
KR20080066041A (ko) * | 2005-11-10 | 2008-07-15 | 가부시키가이샤 니콘 | 조명 광학 장치, 노광 장치 및 노광 방법 |
US7372633B2 (en) | 2006-07-18 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus, aberration correction device and device manufacturing method |
DE102006045075A1 (de) | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Steuerbares optisches Element |
WO2008040494A1 (en) * | 2006-10-02 | 2008-04-10 | Carl Zeiss Smt Ag | Method for improving the imaging properties of an optical system, and such an optical system |
DE102007062265A1 (de) | 2006-12-29 | 2008-07-03 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Lithographie |
JP4515473B2 (ja) * | 2007-02-15 | 2010-07-28 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
DE102007022895B9 (de) * | 2007-05-14 | 2013-11-21 | Erich Thallner | Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat |
US20080297912A1 (en) * | 2007-06-01 | 2008-12-04 | Electro Scientific Industries, Inc., An Oregon Corporation | Vario-astigmatic beam expander |
DE102008040218A1 (de) | 2007-07-11 | 2009-01-15 | Carl Zeiss Smt Ag | Drehbares optisches Element |
DE102008040181A1 (de) | 2007-07-27 | 2009-01-29 | Carl Zeiss | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage |
WO2009018911A1 (en) | 2007-08-03 | 2009-02-12 | Carl Zeiss Smt Ag | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
CN101784954B (zh) | 2007-08-24 | 2015-03-25 | 卡尔蔡司Smt有限责任公司 | 可控光学元件以及用热致动器操作光学元件的方法和半导体光刻的投射曝光设备 |
ES2337970B1 (es) * | 2007-09-26 | 2011-05-27 | Indizen Optical Technologies, S.L. | Lentes oftalmicas monofocales con superficies esfericas y/o asfericascombinadas. |
WO2009053001A1 (de) | 2007-10-19 | 2009-04-30 | Carl Zeiss Smt Ag | Optische vorrichtung mit verbessertem abbildungsverhalten sowie verfahren dazu |
NL1036108A1 (nl) | 2007-11-09 | 2009-05-12 | Asml Netherlands Bv | Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product. |
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DE102009011207A1 (de) | 2008-03-26 | 2009-10-01 | Carl Zeiss Smt Ag | Verfahren und Beleuchtungssystem zum Beleuchten einer Maske in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102008001892A1 (de) | 2008-05-21 | 2009-11-26 | Carl Zeiss Smt Ag | Optisches System für die Mikrolithographie |
JP2010039347A (ja) * | 2008-08-07 | 2010-02-18 | Mejiro Precision:Kk | 投影露光装置 |
US8553207B2 (en) * | 2008-12-31 | 2013-10-08 | Asml Holdings N.V. | Optically compensated unidirectional reticle bender |
EP2219077A1 (de) | 2009-02-12 | 2010-08-18 | Carl Zeiss SMT AG | Projektionsbelichtungsverfahren, Projektionsbelichtungssystem und Projektionsobjektiv |
KR200453054Y1 (ko) * | 2009-02-24 | 2011-04-12 | 주식회사 세이프로드 | 승하강식 볼라드 |
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JP6410406B2 (ja) * | 2012-11-16 | 2018-10-24 | キヤノン株式会社 | 投影光学系、露光装置および物品の製造方法 |
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JPH065490A (ja) | 1992-06-17 | 1994-01-14 | Nikon Corp | 投影露光装置 |
JP3037040B2 (ja) | 1993-01-20 | 2000-04-24 | 日本電気株式会社 | 露光装置 |
US5581324A (en) | 1993-06-10 | 1996-12-03 | Nikon Corporation | Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors |
JP3374991B2 (ja) | 1993-06-14 | 2003-02-10 | 株式会社ニコン | 投影光学系の調整方法、露光方法、及び露光装置 |
US5392119A (en) | 1993-07-13 | 1995-02-21 | Litel Instruments | Plate correction of imaging systems |
US5677757A (en) | 1994-03-29 | 1997-10-14 | Nikon Corporation | Projection exposure apparatus |
JP3341269B2 (ja) | 1993-12-22 | 2002-11-05 | 株式会社ニコン | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
-
1993
- 1993-12-22 JP JP32372193A patent/JP3341269B2/ja not_active Expired - Lifetime
-
1994
- 1994-12-21 US US08/360,515 patent/US6262793B1/en not_active Expired - Lifetime
- 1994-12-22 KR KR1019940035903A patent/KR100396872B1/ko not_active IP Right Cessation
- 1994-12-22 EP EP94120399A patent/EP0660169B1/de not_active Expired - Lifetime
- 1994-12-22 DE DE69424138T patent/DE69424138T2/de not_active Expired - Lifetime
-
2002
- 2002-01-02 US US10/032,462 patent/US20020054282A1/en not_active Abandoned
- 2002-07-30 KR KR1020020044969A patent/KR100508215B1/ko not_active IP Right Cessation
- 2002-07-30 KR KR1020020044967A patent/KR100422824B1/ko not_active IP Right Cessation
-
2003
- 2003-07-16 US US10/619,515 patent/US6958803B2/en not_active Expired - Fee Related
- 2003-09-24 KR KR1020030066105A patent/KR100487003B1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015115555A1 (de) * | 2015-09-15 | 2017-03-16 | SMR Patents S.à.r.l. | Beleuchtungseinrichtung, Rückblickvorrichtung, Fußraumvorrichtung und Fahrzeug |
DE102015115555B4 (de) | 2015-09-15 | 2022-07-07 | SMR Patents S.à.r.l. | Beleuchtungseinrichtung, Rückblickvorrichtung, Fußraumvorrichtung und Fahrzeug |
Also Published As
Publication number | Publication date |
---|---|
KR950019953A (ko) | 1995-07-24 |
US6958803B2 (en) | 2005-10-25 |
EP0660169B1 (de) | 2000-04-26 |
JP3341269B2 (ja) | 2002-11-05 |
US20020054282A1 (en) | 2002-05-09 |
KR100487003B1 (ko) | 2005-05-04 |
US6262793B1 (en) | 2001-07-17 |
EP0660169A1 (de) | 1995-06-28 |
DE69424138D1 (de) | 2000-05-31 |
KR100422824B1 (ko) | 2004-03-16 |
JPH07183190A (ja) | 1995-07-21 |
KR100396872B1 (ko) | 2004-05-17 |
US20040046950A1 (en) | 2004-03-11 |
KR100508215B1 (ko) | 2005-08-17 |
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