DE69426163T2 - Verfahren und Einrichtung zur Freigabe einer Halbleiterplatte - Google Patents
Verfahren und Einrichtung zur Freigabe einer HalbleiterplatteInfo
- Publication number
- DE69426163T2 DE69426163T2 DE69426163T DE69426163T DE69426163T2 DE 69426163 T2 DE69426163 T2 DE 69426163T2 DE 69426163 T DE69426163 T DE 69426163T DE 69426163 T DE69426163 T DE 69426163T DE 69426163 T2 DE69426163 T2 DE 69426163T2
- Authority
- DE
- Germany
- Prior art keywords
- releasing
- semiconductor plate
- semiconductor
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/029,154 US5444597A (en) | 1993-01-15 | 1993-03-10 | Wafer release method and apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69426163D1 DE69426163D1 (de) | 2000-11-30 |
DE69426163T2 true DE69426163T2 (de) | 2001-05-23 |
Family
ID=21847544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69426163T Expired - Fee Related DE69426163T2 (de) | 1993-03-10 | 1994-03-08 | Verfahren und Einrichtung zur Freigabe einer Halbleiterplatte |
Country Status (8)
Country | Link |
---|---|
US (1) | US5444597A (de) |
EP (1) | EP0615281B1 (de) |
JP (1) | JPH077074A (de) |
KR (1) | KR100304241B1 (de) |
CN (1) | CN1052112C (de) |
CA (1) | CA2118619C (de) |
DE (1) | DE69426163T2 (de) |
TW (1) | TW312034B (de) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5684669A (en) * | 1995-06-07 | 1997-11-04 | Applied Materials, Inc. | Method for dechucking a workpiece from an electrostatic chuck |
US5467249A (en) * | 1993-12-20 | 1995-11-14 | International Business Machines Corporation | Electrostatic chuck with reference electrode |
US5463525A (en) * | 1993-12-20 | 1995-10-31 | International Business Machines Corporation | Guard ring electrostatic chuck |
JP4079992B2 (ja) * | 1994-10-17 | 2008-04-23 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | 導電性被処理体を載置部材に締め付けるための装置及び静電クランピング方法 |
US5737175A (en) * | 1996-06-19 | 1998-04-07 | Lam Research Corporation | Bias-tracking D.C. power circuit for an electrostatic chuck |
JPH1014266A (ja) * | 1996-06-21 | 1998-01-16 | Sony Corp | 静電チャック装置及び静電チャックを用いたウエハの保持方法及び静電チャックからのウエハの脱着方法 |
US5793192A (en) * | 1996-06-28 | 1998-08-11 | Lam Research Corporation | Methods and apparatuses for clamping and declamping a semiconductor wafer in a wafer processing system |
US5818682A (en) * | 1996-08-13 | 1998-10-06 | Applied Materials, Inc. | Method and apparatus for optimizing a dechucking period used to dechuck a workpiece from an electrostatic chuck |
JP3245369B2 (ja) * | 1996-11-20 | 2002-01-15 | 東京エレクトロン株式会社 | 被処理体を静電チャックから離脱する方法及びプラズマ処理装置 |
US6075375A (en) | 1997-06-11 | 2000-06-13 | Applied Materials, Inc. | Apparatus for wafer detection |
US5933314A (en) * | 1997-06-27 | 1999-08-03 | Lam Research Corp. | Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks |
US5886865A (en) * | 1998-03-17 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for predicting failure of an eletrostatic chuck |
US5969934A (en) * | 1998-04-10 | 1999-10-19 | Varian Semiconductor Equipment Associats, Inc. | Electrostatic wafer clamp having low particulate contamination of wafers |
US6965506B2 (en) * | 1998-09-30 | 2005-11-15 | Lam Research Corporation | System and method for dechucking a workpiece from an electrostatic chuck |
US6790375B1 (en) | 1998-09-30 | 2004-09-14 | Lam Research Corporation | Dechucking method and apparatus for workpieces in vacuum processors |
US6125025A (en) * | 1998-09-30 | 2000-09-26 | Lam Research Corporation | Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors |
US6113165A (en) * | 1998-10-02 | 2000-09-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Self-sensing wafer holder and method of using |
US6238160B1 (en) * | 1998-12-02 | 2001-05-29 | Taiwan Semiconductor Manufacturing Company, Ltd' | Method for transporting and electrostatically chucking a semiconductor wafer or the like |
US6236555B1 (en) * | 1999-04-19 | 2001-05-22 | Applied Materials, Inc. | Method for rapidly dechucking a semiconductor wafer from an electrostatic chuck utilizing a hysteretic discharge cycle |
US6257001B1 (en) * | 1999-08-24 | 2001-07-10 | Lucent Technologies, Inc. | Cryogenic vacuum pump temperature sensor |
US6496053B1 (en) * | 1999-10-13 | 2002-12-17 | International Business Machines Corporation | Corrosion insensitive fusible link using capacitance sensing for semiconductor devices |
US6362946B1 (en) | 1999-11-02 | 2002-03-26 | Varian Semiconductor Equipment Associates, Inc. | Electrostatic wafer clamp having electrostatic seal for retaining gas |
US6538873B1 (en) | 1999-11-02 | 2003-03-25 | Varian Semiconductor Equipment Associates, Inc. | Active electrostatic seal and electrostatic vacuum pump |
US6307728B1 (en) * | 2000-01-21 | 2001-10-23 | Applied Materials, Inc. | Method and apparatus for dechucking a workpiece from an electrostatic chuck |
US6468384B1 (en) * | 2000-11-09 | 2002-10-22 | Novellus Systems, Inc. | Predictive wafer temperature control system and method |
JP3935367B2 (ja) * | 2002-02-06 | 2007-06-20 | キヤノン株式会社 | 表示素子駆動回路用の電源回路、表示装置及びカメラ |
DE10214272B4 (de) * | 2002-03-28 | 2004-09-02 | Forschungszentrum Jülich GmbH | Halterung für einen Wafer |
US6710360B2 (en) | 2002-07-10 | 2004-03-23 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter |
US6774373B2 (en) * | 2002-07-29 | 2004-08-10 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter |
US6900444B2 (en) * | 2002-07-29 | 2005-05-31 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter |
TWI304158B (en) * | 2003-01-15 | 2008-12-11 | Asml Netherlands Bv | Detection assembly and lithographic projection apparatus provided with such a detection assembly |
US6740894B1 (en) | 2003-02-21 | 2004-05-25 | Axcelis Technologies, Inc. | Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor |
US7100954B2 (en) | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
US7072165B2 (en) * | 2003-08-18 | 2006-07-04 | Axcelis Technologies, Inc. | MEMS based multi-polar electrostatic chuck |
US6947274B2 (en) * | 2003-09-08 | 2005-09-20 | Axcelis Technologies, Inc. | Clamping and de-clamping semiconductor wafers on an electrostatic chuck using wafer inertial confinement by applying a single-phase square wave AC clamping voltage |
US7072166B2 (en) * | 2003-09-12 | 2006-07-04 | Axcelis Technologies, Inc. | Clamping and de-clamping semiconductor wafers on a J-R electrostatic chuck having a micromachined surface by using force delay in applying a single-phase square wave AC clamping voltage |
US6946403B2 (en) * | 2003-10-28 | 2005-09-20 | Axcelis Technologies, Inc. | Method of making a MEMS electrostatic chuck |
US6794664B1 (en) | 2003-12-04 | 2004-09-21 | Axcelis Technologies, Inc. | Umbilical cord facilities connection for an ion beam implanter |
US7245357B2 (en) * | 2003-12-15 | 2007-07-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN1655022A (zh) * | 2004-02-14 | 2005-08-17 | 鸿富锦精密工业(深圳)有限公司 | 基板贴合装置 |
US6987272B2 (en) * | 2004-03-05 | 2006-01-17 | Axcelis Technologies, Inc. | Work piece transfer system for an ion beam implanter |
US7030395B2 (en) * | 2004-08-06 | 2006-04-18 | Axcelis Technologies, Inc. | Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough |
US7982195B2 (en) * | 2004-09-14 | 2011-07-19 | Axcelis Technologies, Inc. | Controlled dose ion implantation |
CN101326627B (zh) | 2005-12-06 | 2010-06-09 | 创意科技股份有限公司 | 静电卡盘用电极片以及静电卡盘 |
US7629597B2 (en) * | 2006-08-18 | 2009-12-08 | Axcelis Technologies, Inc. | Deposition reduction system for an ion implanter |
US8013981B2 (en) * | 2007-06-14 | 2011-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101295776B1 (ko) * | 2007-08-02 | 2013-08-12 | 삼성전자주식회사 | 직류 및 교류 전압들을 교대로 사용하는 웨이퍼의 디척킹방법 및 이를 채택하는 반도체 소자의 제조 장치 |
JP5387921B2 (ja) | 2008-09-04 | 2014-01-15 | 株式会社クリエイティブ テクノロジー | 静電チャック装置及び基板の吸着状態判別方法 |
JP5957287B2 (ja) * | 2012-05-10 | 2016-07-27 | 株式会社アルバック | 給電装置 |
US9543110B2 (en) | 2013-12-20 | 2017-01-10 | Axcelis Technologies, Inc. | Reduced trace metals contamination ion source for an ion implantation system |
US20150357151A1 (en) | 2014-06-10 | 2015-12-10 | Axcelis Technologies, Inc. | Ion implantation source with textured interior surfaces |
CN108231515B (zh) * | 2018-01-11 | 2019-10-11 | 上海华虹宏力半导体制造有限公司 | 减薄后的硅片背面注入工艺中的传送方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4184188A (en) * | 1978-01-16 | 1980-01-15 | Veeco Instruments Inc. | Substrate clamping technique in IC fabrication processes |
US4384918A (en) * | 1980-09-30 | 1983-05-24 | Fujitsu Limited | Method and apparatus for dry etching and electrostatic chucking device used therein |
GB2147459A (en) * | 1983-09-30 | 1985-05-09 | Philips Electronic Associated | Electrostatic chuck for semiconductor wafers |
JPS6216540A (ja) * | 1985-07-15 | 1987-01-24 | Canon Inc | ウエハ搬送装置 |
JPS63257481A (ja) * | 1987-04-14 | 1988-10-25 | Abisare:Kk | 静電保持装置 |
DE3879295T2 (de) * | 1987-04-14 | 1993-07-01 | Abisare Kakegawa Kk | Maschine-einheit mit einer statische elektrizitaet benutzenden haltevorrichtung. |
US5103367A (en) * | 1987-05-06 | 1992-04-07 | Unisearch Limited | Electrostatic chuck using A.C. field excitation |
US4962441A (en) * | 1989-04-10 | 1990-10-09 | Applied Materials, Inc. | Isolated electrostatic wafer blade clamp |
JP2779950B2 (ja) * | 1989-04-25 | 1998-07-23 | 東陶機器株式会社 | 静電チャックの電圧印加方法および電圧印加装置 |
US5173834A (en) * | 1989-06-02 | 1992-12-22 | Roland Dg Corporation | Electrostatic attraction apparatus |
US5179498A (en) * | 1990-05-17 | 1993-01-12 | Tokyo Electron Limited | Electrostatic chuck device |
EP0460955A1 (de) * | 1990-06-08 | 1991-12-11 | Varian Associates, Inc. | Spannen eines Werkstückes unter Verwendung einer mehrphasigen Haltespannung |
DE69104128T2 (de) * | 1990-06-08 | 1995-01-19 | Varian Associates | Spannen eines Werkstücks. |
US5325261A (en) * | 1991-05-17 | 1994-06-28 | Unisearch Limited | Electrostatic chuck with improved release |
US5184398A (en) * | 1991-08-30 | 1993-02-09 | Texas Instruments Incorporated | In-situ real-time sheet resistance measurement method |
US5315473A (en) * | 1992-01-21 | 1994-05-24 | Applied Materials, Inc. | Isolated electrostatic chuck and excitation method |
-
1993
- 1993-03-10 US US08/029,154 patent/US5444597A/en not_active Expired - Lifetime
-
1994
- 1994-03-08 EP EP94301606A patent/EP0615281B1/de not_active Expired - Lifetime
- 1994-03-08 DE DE69426163T patent/DE69426163T2/de not_active Expired - Fee Related
- 1994-03-09 KR KR1019940004577A patent/KR100304241B1/ko not_active IP Right Cessation
- 1994-03-09 CA CA002118619A patent/CA2118619C/en not_active Expired - Fee Related
- 1994-03-10 CN CN94102462A patent/CN1052112C/zh not_active Expired - Fee Related
- 1994-03-10 JP JP6674094A patent/JPH077074A/ja active Pending
- 1994-03-28 TW TW083100477A01A patent/TW312034B/zh active
Also Published As
Publication number | Publication date |
---|---|
US5444597A (en) | 1995-08-22 |
EP0615281A1 (de) | 1994-09-14 |
CA2118619C (en) | 2000-04-04 |
EP0615281B1 (de) | 2000-10-25 |
CN1095526A (zh) | 1994-11-23 |
JPH077074A (ja) | 1995-01-10 |
CA2118619A1 (en) | 1994-09-11 |
KR100304241B1 (ko) | 2001-11-30 |
KR940022782A (ko) | 1994-10-21 |
CN1052112C (zh) | 2000-05-03 |
TW312034B (de) | 1997-08-01 |
DE69426163D1 (de) | 2000-11-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |