DE69504534D1 - Verfahren zur herstellung von profilierungseinrichtungen für reliefartige oberflächen - Google Patents

Verfahren zur herstellung von profilierungseinrichtungen für reliefartige oberflächen

Info

Publication number
DE69504534D1
DE69504534D1 DE69504534T DE69504534T DE69504534D1 DE 69504534 D1 DE69504534 D1 DE 69504534D1 DE 69504534 T DE69504534 T DE 69504534T DE 69504534 T DE69504534 T DE 69504534T DE 69504534 D1 DE69504534 D1 DE 69504534D1
Authority
DE
Germany
Prior art keywords
relief
profiling devices
producing
producing profiling
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69504534T
Other languages
English (en)
Other versions
DE69504534T2 (de
Inventor
J Cox
Robert Wilke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell Inc
Original Assignee
Honeywell Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Inc filed Critical Honeywell Inc
Application granted granted Critical
Publication of DE69504534D1 publication Critical patent/DE69504534D1/de
Publication of DE69504534T2 publication Critical patent/DE69504534T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1002—Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
    • Y10T156/1039—Surface deformation only of sandwich or lamina [e.g., embossed panels]
    • Y10T156/1041—Subsequent to lamination
DE69504534T 1994-11-30 1995-11-30 Verfahren zur herstellung von profilierungseinrichtungen für reliefartige oberflächen Expired - Lifetime DE69504534T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/347,544 US5575878A (en) 1994-11-30 1994-11-30 Method for making surface relief profilers
PCT/US1995/015557 WO1996017266A1 (en) 1994-11-30 1995-11-30 Method for making surface relief profilers

Publications (2)

Publication Number Publication Date
DE69504534D1 true DE69504534D1 (de) 1998-10-08
DE69504534T2 DE69504534T2 (de) 1999-02-18

Family

ID=23364171

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69504534T Expired - Lifetime DE69504534T2 (de) 1994-11-30 1995-11-30 Verfahren zur herstellung von profilierungseinrichtungen für reliefartige oberflächen

Country Status (7)

Country Link
US (1) US5575878A (de)
EP (1) EP0795139B1 (de)
JP (1) JP3714560B2 (de)
KR (1) KR100367148B1 (de)
CA (1) CA2198132C (de)
DE (1) DE69504534T2 (de)
WO (1) WO1996017266A1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6096155A (en) * 1996-09-27 2000-08-01 Digital Optics Corporation Method of dicing wafer level integrated multiple optical elements
US20080136955A1 (en) * 1996-09-27 2008-06-12 Tessera North America. Integrated camera and associated methods
US8153957B2 (en) * 1996-09-27 2012-04-10 Digitaloptics Corporation East Integrated optical imaging systems including an interior space between opposing substrates and associated methods
US6124076A (en) 1998-07-01 2000-09-26 Lucent Technologies Inc. Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom
US6027595A (en) * 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby
FR2792628B1 (fr) * 1999-04-22 2001-06-15 Saint Gobain Vitrage Substrat texture susceptible de constituer un vitrage, procede pour son obtention
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
JP2001217245A (ja) * 2000-02-04 2001-08-10 Sharp Corp 電子部品およびその製造方法
FR2811316B1 (fr) * 2000-07-06 2003-01-10 Saint Gobain Substrat texture transparent et procedes pour l'obtenir
WO2003032305A1 (fr) * 2001-10-02 2003-04-17 Bridgestone Corporation Feuille de transfert photo-durcissable, substrat d'enregistrement d'informations optique lamine, procede de fabrication correspondant, et support d'enregistrement d'informations optique
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US6869754B2 (en) * 2001-10-23 2005-03-22 Digital Optics Corp. Transfer of optical element patterns on a same side of a substrate already having a feature thereon
US6775839B1 (en) 2002-03-15 2004-08-10 O'brien Patrick J. Optical storage device with print layer surface feature
US6875695B2 (en) * 2002-04-05 2005-04-05 Mems Optical Inc. System and method for analog replication of microdevices having a desired surface contour
EP1362682A1 (de) * 2002-05-13 2003-11-19 ZBD Displays Ltd, Verfahren und Vorrichtung zum Ausrichten von Flüssigkristallen
US6957608B1 (en) 2002-08-02 2005-10-25 Kovio, Inc. Contact print methods
DE10260819A1 (de) * 2002-12-23 2004-07-01 Carl Zeiss Smt Ag Verfahren zur Herstellung von mikrostrukturierten optischen Elementen
DE10318105B4 (de) * 2003-03-21 2007-09-20 Ovd Kinegram Ag Verfahren zur Herstellung von Mikrostrukturen
US7618564B2 (en) * 2003-03-21 2009-11-17 Ovd Kinegram Ag Microstructure and method for producing microstructures
CA2423531A1 (en) * 2003-03-26 2004-09-26 Shawcor Ltd. Method of imparting patterns of surface relief to rigid substrates
GB2403682A (en) * 2003-07-10 2005-01-12 Suisse Electronique Microtech Moulding of optical coupling devices
US20070110361A1 (en) * 2003-08-26 2007-05-17 Digital Optics Corporation Wafer level integration of multiple optical elements
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
JP6067954B2 (ja) 2003-12-19 2017-01-25 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルＴｈｅ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｎｏｒｔｈ Ｃａｒｏｌｉｎａ Ａｔ Ｃｈａｐｅｌ Ｈｉｌｌ ナノサイズ物品、及びソフトリソグラフィー又はインプリントリソグラフィーを用いる分離構造の作製方法によって製造されたナノサイズ物品
US20060249246A1 (en) * 2005-05-06 2006-11-09 Ealey Mark A Method of fabricating replicated optics
FR2893610B1 (fr) * 2005-11-23 2008-07-18 Saint Gobain Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations
KR100831046B1 (ko) * 2006-09-13 2008-05-21 삼성전자주식회사 나노 임프린트용 몰드 및 그 제조 방법
KR100772441B1 (ko) * 2006-10-12 2007-11-01 삼성전기주식회사 임프린팅용 스탬퍼 제조방법
US10877192B2 (en) 2017-04-18 2020-12-29 Saudi Arabian Oil Company Method of fabricating smart photonic structures for material monitoring
US10649141B1 (en) * 2018-04-23 2020-05-12 Facebook Technologies, Llc Gratings with variable etch heights for waveguide displays
US10732351B2 (en) 2018-04-23 2020-08-04 Facebook Technologies, Llc Gratings with variable depths formed using planarization for waveguide displays
US11067726B2 (en) 2018-04-23 2021-07-20 Facebook Technologies, Llc Gratings with variable depths for waveguide displays

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491486A (en) * 1981-09-17 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Method for manufacturing a semiconductor device
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US5279689A (en) * 1989-06-30 1994-01-18 E. I. Du Pont De Nemours And Company Method for replicating holographic optical elements
JP3268929B2 (ja) * 1993-04-19 2002-03-25 オリンパス光学工業株式会社 光学素子の製造方法

Also Published As

Publication number Publication date
JPH10512059A (ja) 1998-11-17
KR970705767A (ko) 1997-10-09
EP0795139A1 (de) 1997-09-17
WO1996017266A1 (en) 1996-06-06
DE69504534T2 (de) 1999-02-18
CA2198132A1 (en) 1996-06-06
US5575878A (en) 1996-11-19
EP0795139B1 (de) 1998-09-02
KR100367148B1 (ko) 2003-04-08
JP3714560B2 (ja) 2005-11-09
CA2198132C (en) 2007-04-24

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