DE69513758D1 - Ätzverfahren und Plasmareaktor zur Durchführung desselben - Google Patents
Ätzverfahren und Plasmareaktor zur Durchführung desselbenInfo
- Publication number
- DE69513758D1 DE69513758D1 DE69513758T DE69513758T DE69513758D1 DE 69513758 D1 DE69513758 D1 DE 69513758D1 DE 69513758 T DE69513758 T DE 69513758T DE 69513758 T DE69513758 T DE 69513758T DE 69513758 D1 DE69513758 D1 DE 69513758D1
- Authority
- DE
- Germany
- Prior art keywords
- carrying
- same
- etching process
- plasma reactor
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
- H01L21/32136—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/307,870 US5783101A (en) | 1994-09-16 | 1994-09-16 | High etch rate residue free metal etch process with low frequency high power inductive coupled plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69513758D1 true DE69513758D1 (de) | 2000-01-13 |
DE69513758T2 DE69513758T2 (de) | 2000-07-06 |
Family
ID=23191520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69513758T Expired - Fee Related DE69513758T2 (de) | 1994-09-16 | 1995-09-07 | Ätzverfahren und Plasmareaktor zur Durchführung desselben |
Country Status (5)
Country | Link |
---|---|
US (1) | US5783101A (de) |
EP (1) | EP0702391B1 (de) |
JP (1) | JPH08172082A (de) |
KR (1) | KR960012358A (de) |
DE (1) | DE69513758T2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6165311A (en) | 1991-06-27 | 2000-12-26 | Applied Materials, Inc. | Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
US6488807B1 (en) | 1991-06-27 | 2002-12-03 | Applied Materials, Inc. | Magnetic confinement in a plasma reactor having an RF bias electrode |
US6077384A (en) | 1994-08-11 | 2000-06-20 | Applied Materials, Inc. | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
US6074512A (en) | 1991-06-27 | 2000-06-13 | Applied Materials, Inc. | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
US6063233A (en) | 1991-06-27 | 2000-05-16 | Applied Materials, Inc. | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
US6036877A (en) * | 1991-06-27 | 2000-03-14 | Applied Materials, Inc. | Plasma reactor with heated source of a polymer-hardening precursor material |
US6514376B1 (en) | 1991-06-27 | 2003-02-04 | Applied Materials Inc. | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
US7174352B2 (en) * | 1993-06-03 | 2007-02-06 | Network Appliance, Inc. | File system image transfer |
US5779926A (en) * | 1994-09-16 | 1998-07-14 | Applied Materials, Inc. | Plasma process for etching multicomponent alloys |
US6270617B1 (en) * | 1995-02-15 | 2001-08-07 | Applied Materials, Inc. | RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
US5710486A (en) * | 1995-05-08 | 1998-01-20 | Applied Materials, Inc. | Inductively and multi-capacitively coupled plasma reactor |
US7294578B1 (en) | 1995-06-02 | 2007-11-13 | Micron Technology, Inc. | Use of a plasma source to form a layer during the formation of a semiconductor device |
US6716769B1 (en) | 1995-06-02 | 2004-04-06 | Micron Technology, Inc. | Use of a plasma source to form a layer during the formation of a semiconductor device |
TW279240B (en) | 1995-08-30 | 1996-06-21 | Applied Materials Inc | Parallel-plate icp source/rf bias electrode head |
US6036878A (en) | 1996-02-02 | 2000-03-14 | Applied Materials, Inc. | Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna |
US6054013A (en) * | 1996-02-02 | 2000-04-25 | Applied Materials, Inc. | Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
US6090717A (en) * | 1996-03-26 | 2000-07-18 | Lam Research Corporation | High density plasma etching of metallization layer using chlorine and nitrogen |
US6008139A (en) * | 1996-06-17 | 1999-12-28 | Applied Materials Inc. | Method of etching polycide structures |
US5849641A (en) * | 1997-03-19 | 1998-12-15 | Lam Research Corporation | Methods and apparatus for etching a conductive layer to improve yield |
US6087266A (en) * | 1997-06-27 | 2000-07-11 | Lam Research Corporation | Methods and apparatus for improving microloading while etching a substrate |
US6132551A (en) * | 1997-09-20 | 2000-10-17 | Applied Materials, Inc. | Inductive RF plasma reactor with overhead coil and conductive laminated RF window beneath the overhead coil |
JPH11176805A (ja) * | 1997-11-14 | 1999-07-02 | Siemens Ag | 半導体装置の製造方法 |
US6028285A (en) * | 1997-11-19 | 2000-02-22 | Board Of Regents, The University Of Texas System | High density plasma source for semiconductor processing |
US6399507B1 (en) | 1999-09-22 | 2002-06-04 | Applied Materials, Inc. | Stable plasma process for etching of films |
US6898561B1 (en) | 1999-12-21 | 2005-05-24 | Integrated Device Technology, Inc. | Methods, apparatus and computer program products for modeling integrated circuit devices having reduced linewidths |
US6401652B1 (en) | 2000-05-04 | 2002-06-11 | Applied Materials, Inc. | Plasma reactor inductive coil antenna with flat surface facing the plasma |
KR100457740B1 (ko) * | 2002-01-09 | 2004-11-18 | 매그나칩 반도체 유한회사 | 반도체소자의 다층 금속배선 형성방법 |
JP3974465B2 (ja) * | 2002-07-10 | 2007-09-12 | Necエレクトロニクス株式会社 | ポリマー除去方法 |
US7008877B2 (en) * | 2003-05-05 | 2006-03-07 | Unaxis Usa Inc. | Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias |
US7208420B1 (en) | 2004-07-22 | 2007-04-24 | Lam Research Corporation | Method for selectively etching an aluminum containing layer |
KR101366181B1 (ko) | 2005-02-28 | 2014-02-24 | 술처 멧코 아게 | 고밀도 저에너지의 플라즈마 인헨스드 기상 에피택시를위한 시스템 및 공정 |
CN104241070A (zh) * | 2013-06-24 | 2014-12-24 | 中微半导体设备(上海)有限公司 | 用于感应耦合等离子体腔室的气体注入装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4253907A (en) * | 1979-03-28 | 1981-03-03 | Western Electric Company, Inc. | Anisotropic plasma etching |
US4505782A (en) * | 1983-03-25 | 1985-03-19 | Lfe Corporation | Plasma reactive ion etching of aluminum and aluminum alloys |
US4464223A (en) * | 1983-10-03 | 1984-08-07 | Tegal Corp. | Plasma reactor apparatus and method |
US4490209B2 (en) * | 1983-12-27 | 2000-12-19 | Texas Instruments Inc | Plasma etching using hydrogen bromide addition |
US4680086A (en) * | 1986-03-20 | 1987-07-14 | Motorola, Inc. | Dry etching of multi-layer structures |
US4717448A (en) * | 1986-10-09 | 1988-01-05 | International Business Machines Corporation | Reactive ion etch chemistry for providing deep vertical trenches in semiconductor substrates |
GB8629634D0 (en) * | 1986-12-11 | 1987-01-21 | Dobson C D | Reactive ion & sputter etching |
US4832787A (en) * | 1988-02-19 | 1989-05-23 | International Business Machines Corporation | Gas mixture and method for anisotropic selective etch of nitride |
US5122251A (en) * | 1989-06-13 | 1992-06-16 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
US5346578A (en) * | 1992-11-04 | 1994-09-13 | Novellus Systems, Inc. | Induction plasma source |
-
1994
- 1994-09-16 US US08/307,870 patent/US5783101A/en not_active Expired - Lifetime
-
1995
- 1995-09-07 EP EP95114046A patent/EP0702391B1/de not_active Expired - Lifetime
- 1995-09-07 DE DE69513758T patent/DE69513758T2/de not_active Expired - Fee Related
- 1995-09-16 KR KR1019950030917A patent/KR960012358A/ko active IP Right Grant
- 1995-09-18 JP JP7238701A patent/JPH08172082A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP0702391B1 (de) | 1999-12-08 |
KR960012358A (ko) | 1996-04-20 |
EP0702391A3 (de) | 1996-09-25 |
JPH08172082A (ja) | 1996-07-02 |
DE69513758T2 (de) | 2000-07-06 |
EP0702391A2 (de) | 1996-03-20 |
US5783101A (en) | 1998-07-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |