DE69518178D1 - Dünnfilmtransistor mit einer Drainversatzzone - Google Patents
Dünnfilmtransistor mit einer DrainversatzzoneInfo
- Publication number
- DE69518178D1 DE69518178D1 DE69518178T DE69518178T DE69518178D1 DE 69518178 D1 DE69518178 D1 DE 69518178D1 DE 69518178 T DE69518178 T DE 69518178T DE 69518178 T DE69518178 T DE 69518178T DE 69518178 D1 DE69518178 D1 DE 69518178D1
- Authority
- DE
- Germany
- Prior art keywords
- thin film
- film transistor
- drain offset
- offset zone
- zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78609—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing leakage current
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
- H01L2029/7863—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile with an LDD consisting of more than one lightly doped zone or having a non-homogeneous dopant distribution, e.g. graded LDD
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/205,974 US5401982A (en) | 1994-03-03 | 1994-03-03 | Reducing leakage current in a thin-film transistor with charge carrier densities that vary in two dimensions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69518178D1 true DE69518178D1 (de) | 2000-09-07 |
DE69518178T2 DE69518178T2 (de) | 2001-01-11 |
Family
ID=22764451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69518178T Expired - Lifetime DE69518178T2 (de) | 1994-03-03 | 1995-02-21 | Dünnfilmtransistor mit einer Drainversatzzone |
Country Status (5)
Country | Link |
---|---|
US (1) | US5401982A (de) |
EP (1) | EP0670604B1 (de) |
JP (1) | JPH07263707A (de) |
CA (1) | CA2140403C (de) |
DE (1) | DE69518178T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3540012B2 (ja) * | 1994-06-07 | 2004-07-07 | 株式会社半導体エネルギー研究所 | 半導体装置作製方法 |
US5703382A (en) * | 1995-11-20 | 1997-12-30 | Xerox Corporation | Array having multiple channel structures with continuously doped interchannel regions |
US6083272A (en) * | 1997-06-13 | 2000-07-04 | Advanced Micro Devices, Inc. | Method of adjusting currents on a semiconductor device having transistors of varying density |
US5891782A (en) * | 1997-08-21 | 1999-04-06 | Sharp Microelectronics Technology, Inc. | Method for fabricating an asymmetric channel doped MOS structure |
JP4376979B2 (ja) | 1998-01-12 | 2009-12-02 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US6274887B1 (en) | 1998-11-02 | 2001-08-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method therefor |
US6617644B1 (en) | 1998-11-09 | 2003-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of manufacturing the same |
US7141821B1 (en) * | 1998-11-10 | 2006-11-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having an impurity gradient in the impurity regions and method of manufacture |
US6909114B1 (en) | 1998-11-17 | 2005-06-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having LDD regions |
US6365917B1 (en) * | 1998-11-25 | 2002-04-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
US6277679B1 (en) | 1998-11-25 | 2001-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing thin film transistor |
JP3408762B2 (ja) * | 1998-12-03 | 2003-05-19 | シャープ株式会社 | Soi構造の半導体装置及びその製造方法 |
JP2000216388A (ja) * | 1999-01-21 | 2000-08-04 | Mitsubishi Electric Corp | 半導体装置 |
US6255162B1 (en) * | 1999-03-16 | 2001-07-03 | United Microelectronics Corp. | Method of gap filling |
TW480554B (en) * | 1999-07-22 | 2002-03-21 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
US6313489B1 (en) | 1999-11-16 | 2001-11-06 | Philips Electronics North America Corporation | Lateral thin-film silicon-on-insulator (SOI) device having a lateral drift region with a retrograde doping profile, and method of making such a device |
US6646287B1 (en) | 1999-11-19 | 2003-11-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device with tapered gate and insulating film |
SG138468A1 (en) * | 2001-02-28 | 2008-01-28 | Semiconductor Energy Lab | A method of manufacturing a semiconductor device |
TWI397184B (zh) * | 2009-04-29 | 2013-05-21 | Ind Tech Res Inst | 氧化物半導體薄膜電晶體 |
DE102014116773A1 (de) * | 2014-11-17 | 2016-05-19 | Infineon Technologies Ag | Halbleitervorrichtung und Bipolartransistor mit isoliertem Gate mit Transistorzellen und Sensorzelle |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2834724A1 (de) * | 1978-08-08 | 1980-02-14 | Siemens Ag | Mos-feldeffekttransistoren fuer hoehere spannungen |
US4394182A (en) * | 1981-10-14 | 1983-07-19 | Rockwell International Corporation | Microelectronic shadow masking process for reducing punchthrough |
JP2507567B2 (ja) * | 1988-11-25 | 1996-06-12 | 三菱電機株式会社 | 絶縁体基板上の半導体層に形成されたmos型電界効果トランジスタ |
EP0493113B1 (de) * | 1990-12-28 | 1997-03-19 | Sharp Kabushiki Kaisha | Ein Verfahren zum Herstellen eines Dünnfilm-Transistors und eines Aktive-Matrix-Substrates für Flüssig-Kristall-Anzeige-Anordnungen |
US5185280A (en) * | 1991-01-29 | 1993-02-09 | Texas Instruments Incorporated | Method of fabricating a soi transistor with pocket implant and body-to-source (bts) contact |
JP3293039B2 (ja) * | 1991-10-28 | 2002-06-17 | カシオ計算機株式会社 | 薄膜トランジスタの製造方法 |
JP2650543B2 (ja) * | 1991-11-25 | 1997-09-03 | カシオ計算機株式会社 | マトリクス回路駆動装置 |
US5293052A (en) * | 1992-03-23 | 1994-03-08 | Harris Corporation | SOT CMOS device having differentially doped body extension for providing improved backside leakage channel stop |
US5359219A (en) * | 1992-12-04 | 1994-10-25 | Texas Instruments Incorporated | Silicon on insulator device comprising improved substrate doping |
-
1994
- 1994-03-03 US US08/205,974 patent/US5401982A/en not_active Expired - Lifetime
-
1995
- 1995-01-17 CA CA002140403A patent/CA2140403C/en not_active Expired - Fee Related
- 1995-02-21 DE DE69518178T patent/DE69518178T2/de not_active Expired - Lifetime
- 1995-02-21 EP EP95301100A patent/EP0670604B1/de not_active Expired - Lifetime
- 1995-02-23 JP JP7034787A patent/JPH07263707A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH07263707A (ja) | 1995-10-13 |
CA2140403C (en) | 1999-03-16 |
EP0670604A2 (de) | 1995-09-06 |
EP0670604A3 (de) | 1996-09-25 |
EP0670604B1 (de) | 2000-08-02 |
DE69518178T2 (de) | 2001-01-11 |
CA2140403A1 (en) | 1995-09-04 |
US5401982A (en) | 1995-03-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |