DE69519955D1 - PH-regulierter alkalischer Reiniger mit nicht ionischem Tensid zur Reinigung mikroelektronischer Substrate - Google Patents

PH-regulierter alkalischer Reiniger mit nicht ionischem Tensid zur Reinigung mikroelektronischer Substrate

Info

Publication number
DE69519955D1
DE69519955D1 DE69519955T DE69519955T DE69519955D1 DE 69519955 D1 DE69519955 D1 DE 69519955D1 DE 69519955 T DE69519955 T DE 69519955T DE 69519955 T DE69519955 T DE 69519955T DE 69519955 D1 DE69519955 D1 DE 69519955D1
Authority
DE
Germany
Prior art keywords
microelectronic substrates
ionic surfactant
alkaline cleaner
cleaning microelectronic
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69519955T
Other languages
English (en)
Other versions
DE69519955T2 (de
Inventor
Joseph M Ilardi
George Schwartzkopf
Gary G Dailey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AVANTOR PERFORMANCE MATERIALS, INC., PHILLIPSB, US
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE69519955D1 publication Critical patent/DE69519955D1/de
Application granted granted Critical
Publication of DE69519955T2 publication Critical patent/DE69519955T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/0005—Other compounding ingredients characterised by their effect
    • C11D3/0047—Other compounding ingredients characterised by their effect pH regulated compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/044—Hydroxides or bases
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C11D2111/22—
DE69519955T 1994-04-20 1995-04-18 PH-regulierter alkalischer Reiniger mit nicht ionischem Tensid zur Reinigung mikroelektronischer Substrate Expired - Lifetime DE69519955T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/230,132 US5466389A (en) 1994-04-20 1994-04-20 PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates

Publications (2)

Publication Number Publication Date
DE69519955D1 true DE69519955D1 (de) 2001-03-01
DE69519955T2 DE69519955T2 (de) 2001-08-23

Family

ID=22864064

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69519955T Expired - Lifetime DE69519955T2 (de) 1994-04-20 1995-04-18 PH-regulierter alkalischer Reiniger mit nicht ionischem Tensid zur Reinigung mikroelektronischer Substrate

Country Status (11)

Country Link
US (1) US5466389A (de)
EP (1) EP0678571B1 (de)
JP (1) JP2670987B2 (de)
KR (1) KR0160372B1 (de)
AT (1) ATE198907T1 (de)
CA (1) CA2146036C (de)
DE (1) DE69519955T2 (de)
ES (1) ES2153442T3 (de)
IL (1) IL113036A (de)
MY (1) MY112282A (de)
TW (1) TW301669B (de)

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CA2146036C (en) 1999-08-17
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MY112282A (en) 2001-05-31
CA2146036A1 (en) 1995-10-21
JP2670987B2 (ja) 1997-10-29
KR0160372B1 (ko) 1998-11-16
KR950032597A (ko) 1995-12-22
US5466389A (en) 1995-11-14
ES2153442T3 (es) 2001-03-01
EP0678571A2 (de) 1995-10-25
TW301669B (de) 1997-04-01
DE69519955T2 (de) 2001-08-23
EP0678571A3 (de) 1997-01-15
ATE198907T1 (de) 2001-02-15

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