DE69520687D1 - Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten - Google Patents

Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten

Info

Publication number
DE69520687D1
DE69520687D1 DE69520687T DE69520687T DE69520687D1 DE 69520687 D1 DE69520687 D1 DE 69520687D1 DE 69520687 T DE69520687 T DE 69520687T DE 69520687 T DE69520687 T DE 69520687T DE 69520687 D1 DE69520687 D1 DE 69520687D1
Authority
DE
Germany
Prior art keywords
pressure liquid
liquid solvents
treating pressure
cleaning substrates
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69520687T
Other languages
English (en)
Other versions
DE69520687T2 (de
Inventor
F Stucker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RR Street and Co Inc
Original Assignee
RR Street and Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RR Street and Co Inc filed Critical RR Street and Co Inc
Application granted granted Critical
Publication of DE69520687D1 publication Critical patent/DE69520687D1/de
Publication of DE69520687T2 publication Critical patent/DE69520687T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/08—Associated apparatus for handling and recovering the solvents
    • D06F43/081—Reclaiming or recovering the solvent from a mixture of solvent and contaminants, e.g. by distilling
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/08—Associated apparatus for handling and recovering the solvents
DE69520687T 1994-11-09 1995-11-08 Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten Expired - Fee Related DE69520687T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33658894A 1994-11-09 1994-11-09
US50650895A 1995-07-25 1995-07-25
PCT/US1995/014643 WO1996015304A1 (en) 1994-11-09 1995-11-08 Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates

Publications (2)

Publication Number Publication Date
DE69520687D1 true DE69520687D1 (de) 2001-05-17
DE69520687T2 DE69520687T2 (de) 2001-08-23

Family

ID=26990280

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69520687T Expired - Fee Related DE69520687T2 (de) 1994-11-09 1995-11-08 Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten

Country Status (5)

Country Link
US (3) US5772783A (de)
EP (1) EP0791093B1 (de)
AU (1) AU4106696A (de)
DE (1) DE69520687T2 (de)
WO (1) WO1996015304A1 (de)

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JP4248989B2 (ja) * 2003-10-10 2009-04-02 大日本スクリーン製造株式会社 高圧処理装置および高圧処理方法
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US7076969B2 (en) * 2004-01-19 2006-07-18 Air Products And Chemicals, Inc. System for supply and delivery of high purity and ultrahigh purity carbon dioxide
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JP4267604B2 (ja) * 2004-09-01 2009-05-27 三洋電機株式会社 洗浄装置
JP4644565B2 (ja) * 2004-09-01 2011-03-02 三洋電機株式会社 洗浄装置
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US8293105B2 (en) * 2008-05-29 2012-10-23 Perry Equipment Corporation Contaminant adsorption filtration media, elements, systems and methods employing wire or other lattice support
DE102009035389A1 (de) * 2009-07-30 2011-02-03 Siemens Aktiengesellschaft Verfahren zur Schadstoffentfernung aus Kohlendioxid und Vorrichtung zur dessen Durchführung
CN102753747B (zh) * 2010-01-05 2015-04-08 Co2奈克萨斯公司 采用稠密的清洁液并使用流体位移装置的洗涤物品的系统和方法
WO2018069778A1 (es) * 2016-09-20 2018-04-19 Universidad Industrial De Santander Sistema de recirculación de dióxido de carbono supercrítico que usa un dispositivo integrado de licuado y almacenamiento del fluido
CN107583925A (zh) * 2017-08-29 2018-01-16 湖北工程学院 试剂瓶清洗方法、试剂瓶试剂回收方法及试剂瓶清洗系统
US20200355431A1 (en) 2019-05-06 2020-11-12 Messer Industries Usa, Inc. Impurity Control For A High Pressure CO2 Purification And Supply System
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Also Published As

Publication number Publication date
DE69520687T2 (de) 2001-08-23
WO1996015304A1 (en) 1996-05-23
US5937675A (en) 1999-08-17
AU4106696A (en) 1996-06-06
EP0791093A1 (de) 1997-08-27
US6082150A (en) 2000-07-04
EP0791093B1 (de) 2001-04-11
US5772783A (en) 1998-06-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee