DE69522786T2 - Mit Wasser entwickelbare, lichtempfindliche Harzzusammensetzung - Google Patents

Mit Wasser entwickelbare, lichtempfindliche Harzzusammensetzung

Info

Publication number
DE69522786T2
DE69522786T2 DE69522786T DE69522786T DE69522786T2 DE 69522786 T2 DE69522786 T2 DE 69522786T2 DE 69522786 T DE69522786 T DE 69522786T DE 69522786 T DE69522786 T DE 69522786T DE 69522786 T2 DE69522786 T2 DE 69522786T2
Authority
DE
Germany
Prior art keywords
developable
water
resin composition
photosensitive resin
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69522786T
Other languages
English (en)
Other versions
DE69522786D1 (de
Inventor
Kazunori Kanda
Koichi Ueda
Tadahiro Kakiuchi
Hisaichi Muramoto
Kenji Yasuda
Hozumi Sato
Katsuo Koshimura
Takashi Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE69522786D1 publication Critical patent/DE69522786D1/de
Publication of DE69522786T2 publication Critical patent/DE69522786T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
DE69522786T 1994-12-09 1995-12-05 Mit Wasser entwickelbare, lichtempfindliche Harzzusammensetzung Expired - Lifetime DE69522786T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6306212A JP3011864B2 (ja) 1994-12-09 1994-12-09 水現像性感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69522786D1 DE69522786D1 (de) 2001-10-25
DE69522786T2 true DE69522786T2 (de) 2002-05-23

Family

ID=17954346

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69522786T Expired - Lifetime DE69522786T2 (de) 1994-12-09 1995-12-05 Mit Wasser entwickelbare, lichtempfindliche Harzzusammensetzung

Country Status (6)

Country Link
US (1) US5837421A (de)
EP (1) EP0718695B1 (de)
JP (1) JP3011864B2 (de)
AU (1) AU4029695A (de)
CA (1) CA2164670A1 (de)
DE (1) DE69522786T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000305267A (ja) * 1999-04-22 2000-11-02 Jsr Corp 感光性樹脂組成物
JP2000314961A (ja) * 1999-04-28 2000-11-14 Fuji Photo Film Co Ltd ネガ型画像記録材料
US6312870B1 (en) 2000-07-19 2001-11-06 Arch Specialty Chemicals, Inc. t-butyl cinnamate polymers and their use in photoresist compositions
EP1343049B1 (de) * 2000-11-28 2014-11-19 Asahi Kasei Kabushiki Kaisha Verbessertes, in wasser entwickelbares lichtempfindliches harz für die flexographie
EP1219416B1 (de) * 2000-12-20 2004-08-04 Agfa-Gevaert Druckverfahren mit auf der Druckpresse stattfindende Entwicklung einer negativ arbeitenden wärmeempfindlichen lithographischen Druckplatte
JP2003131001A (ja) * 2001-05-25 2003-05-08 Shipley Co Llc 多孔性光学物質
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
JP4300847B2 (ja) * 2003-04-01 2009-07-22 Ｊｓｒ株式会社 感光性樹脂膜およびこれからなる硬化膜
US7993892B2 (en) * 2004-12-14 2011-08-09 Kawamura Institute Of Chemical Research Production of organic/inorganic composite hydrogel
DE602005017147D1 (de) 2005-08-26 2009-11-26 Agfa Graphics Nv photopolymer Druckplattenvorläufer
JP5526693B2 (ja) * 2009-10-09 2014-06-18 日油株式会社 感光性樹脂組成物およびその用途

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
CA1105758A (en) * 1976-05-06 1981-07-28 Yoshihiro Hosaka PHOTOSENSITIVE COMPOSITIONS CONTAINING A COPOLYMER DERIVED FROM A CONJUGATED DIOLEFIN AND AN .alpha. .beta. ETHYLENICALLY UNSATURATED CARBOXYLIC ACID OR ANHYDRIDE
JPS60179411A (ja) 1984-02-27 1985-09-13 Japan Synthetic Rubber Co Ltd アルカリ水溶性ゴム状アクリル酸エステル共重合体
JPS60219208A (ja) 1984-04-13 1985-11-01 Japan Synthetic Rubber Co Ltd 共役ジエン系ゴム状共重合体およびその製造方法
JPH0239784B2 (ja) * 1984-10-17 1990-09-07 Japan Synthetic Rubber Co Ltd Kankoseijushisoseibutsu
JPS61181811A (ja) 1985-02-08 1986-08-14 Japan Synthetic Rubber Co Ltd ランダム共役ジエン系共重合体およびその製造方法
GB2171107B (en) * 1985-02-12 1989-08-02 Napp Systems Inc Photosensitive resin composition
JPS61228002A (ja) 1985-04-02 1986-10-11 Nippon Paint Co Ltd 高感度光硬化性樹脂組成物
US5175076A (en) * 1986-09-22 1992-12-29 Nippon Paint Co., Ltd. Water-developable photosensitive composition for producing relief plates
JPH01300246A (ja) 1988-05-28 1989-12-04 Nippon Paint Co Ltd フレキソ印刷用感光性樹脂組成物
JP2733672B2 (ja) * 1988-10-24 1998-03-30 東京応化工業株式会社 光重合性樹脂組成物
US5238783A (en) * 1990-04-16 1993-08-24 Toray Industries, Inc. Photosensitive polymer composition for water developable flexographic printing plate
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
EP0675412B1 (de) * 1994-03-30 2001-01-17 Japan Synthetic Rubber Co., Ltd. Fotoempfindliche Harzzusammensetzung

Also Published As

Publication number Publication date
EP0718695A2 (de) 1996-06-26
CA2164670A1 (en) 1996-06-10
EP0718695A3 (de) 1996-07-10
JPH08160617A (ja) 1996-06-21
JP3011864B2 (ja) 2000-02-21
DE69522786D1 (de) 2001-10-25
AU4029695A (en) 1996-06-20
US5837421A (en) 1998-11-17
EP0718695B1 (de) 2001-09-19

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: JSR CORP., TOKIO/TOKYO, JP

8364 No opposition during term of opposition