DE69526568T2 - Optisches Projektionssystem und Belichtungsapparat mit einem solchen - Google Patents

Optisches Projektionssystem und Belichtungsapparat mit einem solchen

Info

Publication number
DE69526568T2
DE69526568T2 DE69526568T DE69526568T DE69526568T2 DE 69526568 T2 DE69526568 T2 DE 69526568T2 DE 69526568 T DE69526568 T DE 69526568T DE 69526568 T DE69526568 T DE 69526568T DE 69526568 T2 DE69526568 T2 DE 69526568T2
Authority
DE
Germany
Prior art keywords
exposure apparatus
projection system
optical projection
optical
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69526568T
Other languages
English (en)
Other versions
DE69526568D1 (de
Inventor
Hitoshi Matsuzawa
Misako Kobayashi
Kazumasa Endo
Yutaka Suenaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69526568D1 publication Critical patent/DE69526568D1/de
Application granted granted Critical
Publication of DE69526568T2 publication Critical patent/DE69526568T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70241Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/22Telecentric objectives or lens systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/24Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/62Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having six components only
DE69526568T 1995-01-06 1995-09-15 Optisches Projektionssystem und Belichtungsapparat mit einem solchen Expired - Lifetime DE69526568T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00087295A JP3454390B2 (ja) 1995-01-06 1995-01-06 投影光学系、投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
DE69526568D1 DE69526568D1 (de) 2002-06-06
DE69526568T2 true DE69526568T2 (de) 2002-10-31

Family

ID=11485769

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69526568T Expired - Lifetime DE69526568T2 (de) 1995-01-06 1995-09-15 Optisches Projektionssystem und Belichtungsapparat mit einem solchen

Country Status (5)

Country Link
US (2) US5835285A (de)
EP (2) EP0721150B1 (de)
JP (1) JP3454390B2 (de)
KR (1) KR100387149B1 (de)
DE (1) DE69526568T2 (de)

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KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
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US7317582B2 (en) * 2002-10-15 2008-01-08 Matsushita Electric Industrial Co., Ltd. Zoom lens, video enlarging/projecting system, video projector, rear projector, and multivision system
WO2005015316A2 (en) * 2003-08-12 2005-02-17 Carl Zeiss Smt Ag Projection objective for microlithography
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US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP4466630B2 (ja) 2006-03-31 2010-05-26 株式会社カシオ日立モバイルコミュニケーションズ ヒンジ装置及び携帯型電子機器
JP5320163B2 (ja) * 2009-05-26 2013-10-23 富士フイルム株式会社 撮像レンズおよび撮像装置
CN102540419B (zh) * 2010-12-31 2014-01-22 上海微电子装备有限公司 一种大视场投影光刻物镜
DE102015218328B4 (de) * 2015-09-24 2019-01-17 Carl Zeiss Smt Gmbh Optisches System zur Feldabbildung und/oder Pupillenabbildung

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Also Published As

Publication number Publication date
EP1162508A2 (de) 2001-12-12
DE69526568D1 (de) 2002-06-06
EP0721150B1 (de) 2002-05-02
JP3454390B2 (ja) 2003-10-06
EP0721150A3 (de) 1997-04-09
JPH08190047A (ja) 1996-07-23
US5835285A (en) 1998-11-10
EP1162508A3 (de) 2002-09-04
EP0721150A2 (de) 1996-07-10
KR100387149B1 (ko) 2003-08-09
USRE37846E1 (en) 2002-09-17
KR960029823A (ko) 1996-08-17

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