DE69609242T2 - Fotopolymerisierbare Zusammensetzungen - Google Patents

Fotopolymerisierbare Zusammensetzungen

Info

Publication number
DE69609242T2
DE69609242T2 DE69609242T DE69609242T DE69609242T2 DE 69609242 T2 DE69609242 T2 DE 69609242T2 DE 69609242 T DE69609242 T DE 69609242T DE 69609242 T DE69609242 T DE 69609242T DE 69609242 T2 DE69609242 T2 DE 69609242T2
Authority
DE
Germany
Prior art keywords
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69609242T
Other languages
English (en)
Other versions
DE69609242D1 (de
DE69609242T3 (de
Inventor
Wojciech A Wilczak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Corp
Original Assignee
Agfa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23728891&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69609242(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Agfa Corp filed Critical Agfa Corp
Publication of DE69609242D1 publication Critical patent/DE69609242D1/de
Publication of DE69609242T2 publication Critical patent/DE69609242T2/de
Application granted granted Critical
Publication of DE69609242T3 publication Critical patent/DE69609242T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00Colour separation; Correction of tonal value
    • G03F3/10Checking the colour or tonal value of separation negatives or positives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/12Esters of monohydric alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/105Esters of polyhydric alcohols or polyhydric phenols of pentaalcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00Polymerisation catalysts
    • C08F4/28Oxygen or compounds releasing free oxygen
    • C08F4/32Organic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/134Brightener containing
DE69609242T 1995-05-05 1996-04-27 Fotopolymerisierbare Zusammensetzungen Expired - Lifetime DE69609242T3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/435,560 US5707781A (en) 1995-05-05 1995-05-05 Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner
US435560 1995-05-05

Publications (3)

Publication Number Publication Date
DE69609242D1 DE69609242D1 (de) 2000-08-17
DE69609242T2 true DE69609242T2 (de) 2001-01-25
DE69609242T3 DE69609242T3 (de) 2007-12-27

Family

ID=23728891

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69609242T Expired - Lifetime DE69609242T3 (de) 1995-05-05 1996-04-27 Fotopolymerisierbare Zusammensetzungen

Country Status (8)

Country Link
US (1) US5707781A (de)
EP (1) EP0741333B2 (de)
JP (1) JPH08305018A (de)
KR (1) KR960041215A (de)
AU (1) AU695703B2 (de)
BR (1) BR9602141A (de)
CA (1) CA2175759A1 (de)
DE (1) DE69609242T3 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6080450A (en) * 1996-02-23 2000-06-27 Dymax Corporation Composition exhibiting improved fluorescent response
GB9605712D0 (en) * 1996-03-19 1996-05-22 Minnesota Mining & Mfg Novel uv-curable compositions
US6106992A (en) * 1996-11-14 2000-08-22 Dai Nippon Printing Co., Ltd. Photoresist film and process for producing back plate of plasma display panel
IT1309578B1 (it) * 1998-02-27 2002-01-24 Ciba Sc Holding Ag Composizione fotoinduribile pigmentata.
DE60006210T2 (de) 1999-12-08 2004-07-15 Ciba Specialty Chemicals Holding Inc. Neues Photoinitiatorsystem aus Phosphinoxidverbindungen und wenig gefärbte härtbare Zusammensetzungen
US6602601B2 (en) 2000-12-22 2003-08-05 Corning Incorporated Optical fiber coating compositions
US6890399B2 (en) * 2002-01-18 2005-05-10 Henkel Corporation (Meth)acrylate compositions having a self-indicator of cure and methods of detecting cure
JP3886813B2 (ja) * 2002-01-24 2007-02-28 富士通株式会社 研磨方法
EP1349006B1 (de) * 2002-03-28 2013-09-25 Agfa Graphics N.V. Fotopolymerisierbare Zusammensetzung, die im Wellenlängenbereich von 300 bis zu 450 nm sensibilisiert ist
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
JP2003313208A (ja) * 2002-04-19 2003-11-06 Meiko:Kk 光硬化性樹脂組成物
US7078157B2 (en) * 2003-02-27 2006-07-18 Az Electronic Materials Usa Corp. Photosensitive composition and use thereof
CN1882879B (zh) * 2003-09-22 2010-08-11 爱克发印艺公司 可光聚合的组合物
MX2007006609A (es) * 2004-12-01 2007-08-14 Henkel Corp Composiciones de silicona curable que incorporan un sistema de deteccion fluorescente.
EP1944173B1 (de) * 2007-01-15 2010-04-21 FUJIFILM Corporation Tintenzusammensetzung und Tintenstrahlaufzeichnungsverfahren damit
EP2053095B2 (de) * 2007-09-28 2017-02-22 FUJIFILM Corporation Tintenzusammensetzung und diese verwendendes Tintenstrahlaufzeichnungsverfahren
JP2010024277A (ja) * 2008-07-16 2010-02-04 Fujifilm Corp インクジェット用インク組成物、及び、インクジェット記録方法
JP5344892B2 (ja) * 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
JP5685849B2 (ja) * 2010-07-29 2015-03-18 セイコーエプソン株式会社 紫外線硬化型インクジェットインク組成物およびインクジェット記録方法
US20220340691A1 (en) * 2019-10-10 2022-10-27 Igm Resins Italia S.R.L. Combination of photoinitiators and uses thereof
WO2023214013A1 (en) * 2022-05-06 2023-11-09 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, coumarin-based sensitizers and amine additives
WO2023214012A1 (en) * 2022-05-06 2023-11-09 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2784183A (en) * 1951-09-06 1957-03-05 Geigy Ag J R Fluorescent monotriazole compounds
BE593834A (de) * 1959-08-05
US3644394A (en) * 1968-06-24 1972-02-22 Ciba Geigy Corp Condensation products of n-coumarin alkylpyrazoles and aldehydes
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
DE3619792A1 (de) * 1986-06-18 1987-12-23 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3633436A1 (de) * 1986-10-01 1988-04-14 Basf Ag Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen
GB8715435D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Forming images
DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
ES2098260T3 (es) * 1989-08-04 1997-05-01 Ciba Geigy Ag Oxidos de mono- y diacilfosfina.
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
US4987051A (en) * 1989-08-09 1991-01-22 E. I. Du Pont De Nemours And Company Image-reversal process using photosensitive peel-apart elements
EP0446175A3 (en) * 1990-03-09 1991-11-21 Ciba-Geigy Ag Mixture of photoinitiators
JPH04178403A (ja) * 1990-11-13 1992-06-25 Mitsubishi Petrochem Co Ltd ジエチレン性不飽和単量体の硬化方法
US5559163A (en) * 1991-01-28 1996-09-24 The Sherwin-Williams Company UV curable coatings having improved weatherability
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
DE59307404D1 (de) * 1992-03-11 1997-10-30 Ciba Geigy Ag Benzoyl substituierte Phosphabicycloalkane und -sulfide als Photoinitiatoren
US5300399A (en) * 1993-01-21 1994-04-05 Hoechst Celanese Corporation Negative working, peel developable, single sheet color proofing system having a crosslinked layer containing a polymer with phenolic moieties
ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators

Also Published As

Publication number Publication date
KR960041215A (ko) 1996-12-19
US5707781A (en) 1998-01-13
EP0741333A1 (de) 1996-11-06
EP0741333B1 (de) 2000-07-12
JPH08305018A (ja) 1996-11-22
AU5071796A (en) 1996-11-14
DE69609242D1 (de) 2000-08-17
AU695703B2 (en) 1998-08-20
CA2175759A1 (en) 1996-11-06
DE69609242T3 (de) 2007-12-27
EP0741333B2 (de) 2007-06-27
BR9602141A (pt) 1998-06-30

Similar Documents

Publication Publication Date Title
DE69618854D1 (de) Fotopolymerisierbare Zusammensetzung
FI974241A0 (fi) BPM-15 -koostumukset
IS4706A (is) Lyfjasamsetningar
DE69515163D1 (de) Fotolackzusammensetzungen
KR970002471A (ko) 포지티브형 포토레지스트조성물
DE69609242D1 (de) Fotopolymerisierbare Zusammensetzungen
DE69607710D1 (de) Lichtempfindliche Zusammensetzung
NO981568D0 (no) Randtennings-tennsatssammensetninger
DE69400062D1 (de) Photopolymerisierbare Zusammensetzung
BR9607058A (pt) Composição
DE69605381D1 (de) Fotoresistzusammensetzung
DE69604601T2 (de) Fotopolymerisierbare Zusammensetzung
BR9606809A (pt) Composição inseticidamente ativa
DE69617029D1 (de) Organoton-zusammensetzungen
DE69503738D1 (de) Fotopolymerisierbare Zusammensetzung
DE69800779D1 (de) Photopolymerisierbare Zusammensetzung
PT728814E (pt) Composicao betuminosa
DE69616104D1 (de) Lichtempfindliche Zusammensetzung
DE69523147D1 (de) Fluorosilikon-Zusammensetzungen
BR9609903A (pt) ComposiçÃo inseticidamente ativa
DE69616374T2 (de) Germizide zusammensetzung
DE69333328D1 (de) Photopolymerisierbare Zusammensetungen
BR9606974A (pt) Composições orais
DE69603228D1 (de) Aluminoxanate-Zusammensetzungen
ATE206150T1 (de) Farbstoffstabilisierte zusammensetzungen

Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings