DE69610294T2 - Durch energie aktivierbare salze mit fluorkohlenstoffanionen - Google Patents

Durch energie aktivierbare salze mit fluorkohlenstoffanionen

Info

Publication number
DE69610294T2
DE69610294T2 DE69610294T DE69610294T DE69610294T2 DE 69610294 T2 DE69610294 T2 DE 69610294T2 DE 69610294 T DE69610294 T DE 69610294T DE 69610294 T DE69610294 T DE 69610294T DE 69610294 T2 DE69610294 T2 DE 69610294T2
Authority
DE
Germany
Prior art keywords
fluorocanese
sales
activated
energy
sales activated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69610294T
Other languages
English (en)
Other versions
DE69610294D1 (de
Inventor
M Lamanna
C Palazzotto
S Mahoney
A Kropp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69610294D1 publication Critical patent/DE69610294D1/de
Publication of DE69610294T2 publication Critical patent/DE69610294T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00Sulfones; Sulfoxides
    • C07C317/02Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms
    • C07C317/04Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18Polycyclic aromatic halogenated hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00Metallocenes
    • C07F17/02Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
DE69610294T 1995-03-06 1996-02-05 Durch energie aktivierbare salze mit fluorkohlenstoffanionen Expired - Lifetime DE69610294T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US39860695A 1995-03-06 1995-03-06
US08/558,245 US5554664A (en) 1995-03-06 1995-11-17 Energy-activatable salts with fluorocarbon anions
PCT/US1996/001634 WO1996027584A1 (en) 1995-03-06 1996-02-05 Energy-activatable salts with fluorocarbon anions

Publications (2)

Publication Number Publication Date
DE69610294D1 DE69610294D1 (de) 2000-10-19
DE69610294T2 true DE69610294T2 (de) 2001-04-12

Family

ID=27016295

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69610294T Expired - Lifetime DE69610294T2 (de) 1995-03-06 1996-02-05 Durch energie aktivierbare salze mit fluorkohlenstoffanionen

Country Status (9)

Country Link
US (1) US5554664A (de)
EP (1) EP0813521B1 (de)
JP (1) JP3985020B2 (de)
KR (1) KR100436804B1 (de)
CN (1) CN1177346A (de)
AU (1) AU4776696A (de)
CA (1) CA2213465A1 (de)
DE (1) DE69610294T2 (de)
WO (1) WO1996027584A1 (de)

Families Citing this family (192)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652280A (en) * 1991-11-12 1997-07-29 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
US5858545A (en) * 1996-03-26 1999-01-12 Minnesota Mining And Manufacturing Company Electrosprayable release coating
US5962546A (en) * 1996-03-26 1999-10-05 3M Innovative Properties Company Cationically polymerizable compositions capable of being coated by electrostatic assistance
DE69618019T2 (de) * 1996-03-26 2002-08-01 Minnesota Mining & Mfg Kationisch polymerisierbare zusmmensetzungen, die zur beschichtung in einem elektrostatischen verfahren verwendet werden können
US5817376A (en) * 1996-03-26 1998-10-06 Minnesota Mining And Manufacturing Company Free-radically polymerizable compositions capable of being coated by electrostatic assistance
EP0844255A1 (de) * 1996-06-12 1998-05-27 Nippon Kayaku Kabushiki Kaisha Photopolymerisationsinitiator und aktinische strahlungshärtbare zusammensetzung die diesen enthält
CA2187046A1 (fr) * 1996-10-03 1998-04-03 Alain Vallee Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
WO1998040388A1 (fr) * 1997-03-11 1998-09-17 New Japan Chemical Co., Ltd. Complexes a terre rare
WO1998040439A1 (en) 1997-03-14 1998-09-17 Minnesota Mining And Manufacturing Company Cure-on-demand, moisture-curable compositions having reactive silane functionality
US6858260B2 (en) 1997-05-21 2005-02-22 Denovus Llc Curable sealant composition
US6174932B1 (en) * 1998-05-20 2001-01-16 Denovus Llc Curable sealant composition
US6277898B1 (en) * 1997-05-21 2001-08-21 Denovus Llc Curable sealant composition
JP4939679B2 (ja) * 1997-07-25 2012-05-30 アセップ・インク 非局在化アニオン電荷を有するイオン化合物、及びそれらのイオン伝導性成分又は触媒としての使用
DE19743985A1 (de) * 1997-10-06 1999-04-08 Merck Patent Gmbh Verwendung von Tris(trifluoromethylsulfonyl)methan und dessen Alkali- und Erdalkalimetallsalzen als Katalysatoren bei C-C verknüpfenden Synthesen und das neue Mg-Salz von Tris(trifluoromethylsulfonyl)methan
US5973020A (en) * 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US6518362B1 (en) * 1998-02-18 2003-02-11 3M Innovative Properties Company Melt blending polyphenylene ether, polystyrene and curable epoxy
US6046368A (en) * 1998-03-17 2000-04-04 3M Innovative Properties Company Catalytic process for making hydrofluoroethers
US6437090B1 (en) * 1998-06-17 2002-08-20 Kabushiki Kaisha Toshiba Curing catalyst, resin composition, resin-sealed semiconductor device and coating material
US7005394B1 (en) 1998-07-10 2006-02-28 3M Innovative Properties Company Tackified thermoplastic-epoxy pressure sensitive adhesives
JP3739211B2 (ja) * 1998-08-28 2006-01-25 積水化学工業株式会社 光硬化型粘接着シート、光硬化型粘接着シートの製造方法及び接合方法
JP3737285B2 (ja) * 1998-08-28 2006-01-18 積水化学工業株式会社 光硬化性組成物、光硬化性接着シート、及び接合方法
US6294270B1 (en) 1998-12-23 2001-09-25 3M Innovative Properties Company Electronic circuit device comprising an epoxy-modified aromatic vinyl-conjugated diene block copolymer
US6489042B2 (en) 1998-12-23 2002-12-03 3M Innovative Properties Company Photoimageable dielectric material for circuit protection
US6133335A (en) * 1998-12-31 2000-10-17 3M Innovative Properties Company Photo-polymerizable compositions and articles made therefrom
US6265459B1 (en) 1998-12-31 2001-07-24 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6482868B1 (en) 1998-12-31 2002-11-19 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
DE19919346A1 (de) * 1999-04-28 2000-11-02 Merck Patent Gmbh Verfahren zur Aufreinigung von Methanid-Elektrolyten (I)
US6664380B1 (en) * 1999-08-18 2003-12-16 The Institute Of Applied Catalysis Perfluorosulfonylmethide compounds; use thereof for carbon-carbon bond formation
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6461419B1 (en) 1999-11-01 2002-10-08 3M Innovative Properties Company Curable inkjet printable ink compositions
US6587628B1 (en) 1999-11-22 2003-07-01 3M Innovative Properties Company Optical fiber with improved strength in high humidity/high temperature environments
US6592988B1 (en) * 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition
US6369242B2 (en) 2000-03-17 2002-04-09 Roche Vitamins Inc. Tocopherol manufacture by tris(perfluorohydrocarbylsulphonyl) methane or metal methides thereof
US6706403B1 (en) * 2000-05-12 2004-03-16 3M Innovative Properties Company Rigid substrate lamination adhesive
US6635689B1 (en) 2000-06-26 2003-10-21 3M Innovative Properties Company Accelerators for cationic polymerization catalyzed by iron-based catalysts
EP1307287A2 (de) * 2000-07-12 2003-05-07 MERCK PATENT GmbH An funktionalisierte plastikkugeln oder sio2 angelagerter katalysator für die zweiphasenkatalyse mit fluorhaltigem lösungsmittel
DK1180517T3 (da) 2000-08-18 2003-11-17 Roche Vitamins Ag Fremgangsmåde til fremstilling af (all-rac)-alfa-tocopherol
US6518347B1 (en) * 2000-12-27 2003-02-11 3M Innovative Properties Company Flame retardant carbonate polymers and use thereof
JP4102032B2 (ja) * 2001-03-12 2008-06-18 富士フイルム株式会社 ポジ型レジスト組成物
US6777160B2 (en) 2001-03-12 2004-08-17 Fuji Photo Film Co., Ltd. Positive-working resist composition
JP4067284B2 (ja) * 2001-03-12 2008-03-26 富士フイルム株式会社 ポジ型レジスト組成物
US20030054172A1 (en) * 2001-05-10 2003-03-20 3M Innovative Properties Company Polyoxyalkylene ammonium salts and their use as antistatic agents
US6895156B2 (en) 2001-10-09 2005-05-17 3M Innovative Properties Company Small diameter, high strength optical fiber
US6740413B2 (en) 2001-11-05 2004-05-25 3M Innovative Properties Company Antistatic compositions
US6924329B2 (en) * 2001-11-05 2005-08-02 3M Innovative Properties Company Water- and oil-repellent, antistatic compositions
US6818379B2 (en) * 2001-12-03 2004-11-16 Sumitomo Chemical Company, Limited Sulfonium salt and use thereof
JP2003215791A (ja) * 2002-01-18 2003-07-30 Central Glass Co Ltd 超強酸オニウム塩化合物および感放射線性樹脂組成物
US6808657B2 (en) 2002-02-12 2004-10-26 3M Innovative Properties Company Process for preparing a K-type polarizer
WO2003082884A1 (en) * 2002-03-26 2003-10-09 Photon-X, Inc. Halogenated phosphinic acids and their active metal derivatives
US20050256230A1 (en) * 2002-04-01 2005-11-17 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
US7087194B2 (en) * 2002-04-04 2006-08-08 3M Innovative Properties Company K-type polarizer and preparation thereof
US6949207B2 (en) * 2002-04-04 2005-09-27 3M Innovative Properties Company K-type polarizer and preparation thereof
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7147767B2 (en) * 2002-12-16 2006-12-12 3M Innovative Properties Company Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
US6777460B2 (en) * 2002-12-23 2004-08-17 3M Innovative Properties Company Curing agents for cationically curable compositions
WO2004096790A1 (en) * 2003-04-28 2004-11-11 Dsm Ip Assets B.V. Process for the manufacture of tocyl and tocopheryl acylates
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US20040241323A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method for applying adhesive to a substrate
US6969166B2 (en) 2003-05-29 2005-11-29 3M Innovative Properties Company Method for modifying the surface of a substrate
EP1636648B1 (de) 2003-06-05 2015-08-12 FujiFilm Electronic Materials USA, Inc. Neuartige positiv-lichtempfindliche harzzusammensetzungen
JP4772288B2 (ja) * 2003-06-05 2011-09-14 東京応化工業株式会社 ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法
US20040265733A1 (en) * 2003-06-30 2004-12-30 Houlihan Francis M. Photoacid generators
JP4188265B2 (ja) 2003-10-23 2008-11-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US7192991B2 (en) * 2003-11-26 2007-03-20 3M Innovative Properties Company Cationically curable composition
JP2005172949A (ja) * 2003-12-08 2005-06-30 Tokyo Ohka Kogyo Co Ltd ホトレジスト組成物およびレジストパターン形成方法
US20050126697A1 (en) * 2003-12-11 2005-06-16 International Business Machines Corporation Photochemically and thermally curable adhesive formulations
US7282324B2 (en) 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
JP4448705B2 (ja) * 2004-02-05 2010-04-14 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
WO2005089355A2 (en) * 2004-03-16 2005-09-29 Cornell Research Foundation, Inc. Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos)
US20050250929A1 (en) * 2004-05-10 2005-11-10 3M Innovative Properties Company Ferrocenium-derived catalyst for cationically polymerizable monomers
JP4469692B2 (ja) * 2004-09-14 2010-05-26 富士フイルム株式会社 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法
JP4452632B2 (ja) 2005-01-24 2010-04-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4562537B2 (ja) 2005-01-28 2010-10-13 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
US7960087B2 (en) * 2005-03-11 2011-06-14 Fujifilm Corporation Positive photosensitive composition and pattern-forming method using the same
JP4724465B2 (ja) * 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
WO2006132906A2 (en) * 2005-06-03 2006-12-14 Fujifilm Electronic Materials U.S.A., Inc. Pretreatment compositions
US7785768B2 (en) * 2005-06-07 2010-08-31 Tokyo Ohka Kogyo Co. Ltd. Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
JP2007003619A (ja) 2005-06-21 2007-01-11 Fujifilm Holdings Corp 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いる化合物
US7521170B2 (en) * 2005-07-12 2009-04-21 Az Electronic Materials Usa Corp. Photoactive compounds
EP1923431A4 (de) 2005-09-08 2010-08-04 Kaneka Corp Härtbare zusammensetzung
JP4562628B2 (ja) 2005-09-20 2010-10-13 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US8026296B2 (en) 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
US7896650B2 (en) 2005-12-20 2011-03-01 3M Innovative Properties Company Dental compositions including radiation-to-heat converters, and the use thereof
US7776940B2 (en) 2005-12-20 2010-08-17 3M Innovative Properties Company Methods for reducing bond strengths, dental compositions, and the use thereof
US8426101B2 (en) 2005-12-21 2013-04-23 Fujifilm Corporation Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition
JP4866605B2 (ja) 2005-12-28 2012-02-01 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
US8404427B2 (en) 2005-12-28 2013-03-26 Fujifilm Corporation Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition
JP4682057B2 (ja) 2006-02-20 2011-05-11 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP4682064B2 (ja) 2006-03-09 2011-05-11 富士フイルム株式会社 感光性組成物、該組成物を用いたパターン形成方法及び該組成物に用いる化合物
CN101466804B (zh) 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
WO2007124092A2 (en) 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US20080003420A1 (en) * 2006-06-29 2008-01-03 3M Innovative Properties Company Transfer hardcoat films for graphic substrates
GB2439734A (en) 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof
ATE461255T1 (de) * 2006-09-08 2010-04-15 3M Innovative Properties Co Farbwechselnde cyanoacrylatkleber
US7390613B1 (en) 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
US7491482B2 (en) * 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
JP5186910B2 (ja) * 2006-12-20 2013-04-24 セントラル硝子株式会社 トリス(パーフルオロアルカンスルホニル)メチド酸塩の製造方法
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
US8182975B2 (en) 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
US7498116B2 (en) 2007-03-30 2009-03-03 Fujifilm Corporation Resist composition and pattern formation method using the same
CN101657522B (zh) * 2007-04-13 2014-05-07 3M创新有限公司 防静电光学透明的压敏粘合剂
EP3378867B1 (de) 2007-04-17 2020-03-25 Kaneka Corporation Modifiziertes polyhedrales polysiloxanprodukt und zusammensetzung, in der das modifizierte produkt verwendet wird
US7651830B2 (en) * 2007-06-01 2010-01-26 3M Innovative Properties Company Patterned photoacid etching and articles therefrom
JP5101930B2 (ja) 2007-06-08 2012-12-19 マブチモーター株式会社 多角形状外形の小型モータ
US8345345B2 (en) 2007-06-27 2013-01-01 Gentex Corporation Electrochromic device having an improved fill port plug
US7884995B2 (en) * 2007-06-27 2011-02-08 Gentex Corporation Electrochromic device having an improved fill port plug
US20090000727A1 (en) * 2007-06-29 2009-01-01 Kanta Kumar Hardcoat layers on release liners
US20090004478A1 (en) * 2007-06-29 2009-01-01 3M Innovative Properties Company Flexible hardcoat compositions, articles, and methods
JP5449675B2 (ja) 2007-09-21 2014-03-19 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
US8491681B2 (en) * 2007-09-24 2013-07-23 Saint-Gobain Abrasives, Inc. Abrasive products including active fillers
JP4911469B2 (ja) 2007-09-28 2012-04-04 富士フイルム株式会社 レジスト組成物及びこれを用いたパターン形成方法
WO2009047152A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
US20090111050A1 (en) * 2007-10-16 2009-04-30 Naiini Ahmad A Novel Photosensitive Resin Compositions
KR101800015B1 (ko) 2007-12-10 2017-11-21 카네카 코포레이션 알칼리 현상성을 갖는 경화성 조성물 및 그것을 사용한 절연성 박막 및 박막 트랜지스터
US9519216B2 (en) * 2008-02-04 2016-12-13 Fujifilm Electronic Materials U.S.A., Inc. Positive photosensitive resin compositions
WO2009114580A2 (en) * 2008-03-11 2009-09-17 3M Innovative Properties Company Hardcoat composition
WO2009113508A1 (ja) 2008-03-13 2009-09-17 セントラル硝子株式会社 新規含フッ素カルバニオン構造を有する塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5216573B2 (ja) 2008-03-31 2013-06-19 富士フイルム株式会社 感活性光線または感放射線性樹脂組成物及びそれを用いたパターン形成方法
US8163461B2 (en) * 2008-04-09 2012-04-24 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
JP5137673B2 (ja) * 2008-04-26 2013-02-06 日本化薬株式会社 Mems用感光性樹脂組成物及びその硬化物
WO2009140088A1 (en) * 2008-05-15 2009-11-19 3M Innovative Properties Company Multi-layer articles capable of forming color images
EP2280823A4 (de) * 2008-05-15 2011-05-04 3M Innovative Properties Co Erzeugung von farbbildern
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Mems用感光性樹脂組成物及びその硬化物
CN102186815B (zh) 2008-10-20 2014-07-30 巴斯夫欧洲公司 锍衍生物及其作为潜酸的用途
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
KR20100121427A (ko) * 2009-05-07 2010-11-17 제이에스알 가부시끼가이샤 감방사선성 수지 조성물
US8389758B2 (en) 2009-06-05 2013-03-05 3M Innovative Properties Company Benzoxazine-thiol adducts
US8383706B2 (en) 2009-06-05 2013-02-26 3M Innovative Properties Company Benzoxazine-thiol adducts
US8753790B2 (en) * 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
US8920019B2 (en) * 2009-07-17 2014-12-30 Vita-Mix Corporation Method and apparatus for making food products
EP2456823A4 (de) 2009-07-21 2012-12-26 3M Innovative Properties Co Härtbare zusammensetzung, verfahren zur beschichtung eines lichtwerkzeugs und beschichtetes lichtwerkzeug
US8420281B2 (en) * 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
WO2011034845A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
WO2011034847A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
KR101813298B1 (ko) 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
KR20140108701A (ko) * 2010-04-22 2014-09-12 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치
US20110300367A1 (en) 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
US8975012B2 (en) 2010-06-30 2015-03-10 3M Innovative Properties Company Multi-layer articles capable of forming color images and methods of forming color images
BR112012033429A2 (pt) 2010-06-30 2016-11-22 3M Innovative Properties Co artigo multicamadas e método de geração de uma imagem
JP5802369B2 (ja) 2010-07-29 2015-10-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜及びパターン形成方法
JP5684275B2 (ja) * 2010-09-24 2015-03-11 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
WO2012071144A1 (en) 2010-11-22 2012-05-31 3M Innovative Properties Company Electronic display including an obscuring layer and method of making same
US8785517B2 (en) 2011-05-25 2014-07-22 3M Innovative Properties Company Pressure-sensitive adhesives with onium-epdxy crosslinking system
JP2014523465A (ja) 2011-06-23 2014-09-11 スリーエム イノベイティブ プロパティズ カンパニー オニウム−エポキシ樹脂架橋系を備えた感圧性接着剤
JP5993626B2 (ja) * 2011-06-24 2016-09-14 住友化学株式会社 塩及び着色硬化性組成物
KR20140106618A (ko) * 2011-11-30 2014-09-03 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 잉크 조성물 및 유기 일렉트로닉스 소자
KR102241659B1 (ko) 2012-02-03 2021-04-20 쓰리엠 이노베이티브 프로퍼티즈 컴파니 광학 필름용 프라이머 조성물
KR102004260B1 (ko) * 2012-03-29 2019-07-26 디아이씨 가부시끼가이샤 도전성 잉크 조성물, 도전성 패턴의 제조 방법 및 도전성 회로
WO2013191762A1 (en) 2012-06-21 2013-12-27 3M Innovative Properties Company A static dissipating laser engravable film
JP5764589B2 (ja) 2012-10-31 2015-08-19 富士フイルム株式会社 化学増幅型レジスト膜のパターニング用有機系処理液の収容容器、並びに、これらを使用したパターン形成方法及び電子デバイスの製造方法
WO2014105422A1 (en) 2012-12-27 2014-07-03 3M Innovative Properties Company Polymerizable composition including a benzoxazine and an acid-forming peroxide catalyst, article, and method
US9434866B2 (en) 2013-03-13 2016-09-06 3M Innovative Properties Company Adhesives comprising epoxy-acid crosslinked groups and methods
WO2014151083A1 (en) 2013-03-15 2014-09-25 Gentex Corporation Fill port plugs for electrochromic devices
US9896599B2 (en) 2013-04-30 2018-02-20 3M Innovative Properties Company Process for preparing poly(benzoxazines)
US9322986B2 (en) 2013-06-24 2016-04-26 Corning Incorporated Optical fiber coating for short data network
US10118060B2 (en) 2013-09-18 2018-11-06 The United States Of America As Represented By The Secretary Of The Air Force Select Schiff base compounds for chemical agent detoxification
JP6419172B2 (ja) 2013-10-16 2018-11-07 スリーエム イノベイティブ プロパティズ カンパニー ベンゾオキサジン重合
US9454054B2 (en) 2013-11-18 2016-09-27 Magna Mirrors Of America, Inc. Electro-optic mirror element and process of making same
CN106459300B (zh) 2014-04-24 2020-01-10 3M创新有限公司 包含可裂解交联剂的组合物及其制备方法
WO2016036701A1 (en) 2014-09-05 2016-03-10 3M Innovative Properties Company Heat conformable curable adhesive films
EP3253735B1 (de) 2015-02-02 2021-03-31 Basf Se Latente säuren und ihre verwendung
KR20170132890A (ko) 2015-04-16 2017-12-04 쓰리엠 이노베이티브 프로퍼티즈 캄파니 티올-알켄-에폭시 매트릭스를 갖는 양자점 물품
KR20170137882A (ko) 2015-04-16 2017-12-13 쓰리엠 이노베이티브 프로퍼티즈 캄파니 티올-에폭시 매트릭스를 갖는 양자점 물품
US10768528B2 (en) 2015-09-28 2020-09-08 3M Innovative Properties Company Patterned film article comprising cleavable crosslinker and methods
TWI619699B (zh) 2015-12-31 2018-04-01 Rohm And Haas Electronic Materials Llc 光酸產生劑
TWI662364B (zh) 2015-12-31 2019-06-11 Rohm And Haas Electronic Materials Llc 光致抗蝕劑組合物、包含光致抗蝕劑組合物的經塗佈基板及形成電子裝置的方法
EP3478783A1 (de) 2016-06-29 2019-05-08 3M Innovative Properties Company Haftartikel und verfahren zur herstellung davon
US10731054B2 (en) 2016-06-29 2020-08-04 3M Innovative Properties Company Compound, adhesive article, and methods of making the same
US10703940B2 (en) 2016-09-08 2020-07-07 3M Innovative Properties Company Adhesive article and method of making the same
CN111630125B (zh) * 2017-11-21 2022-04-26 日东电工株式会社 碱性离子液体组合物及包含该组合物的元件
EP3731016A4 (de) 2017-12-22 2021-02-24 FUJIFILM Corporation Aktive lichtempfindliche oder strahlungsempfindliche harzzusammensetzung, resistfilm, verfahren zur herstellung eines musters, maskenrohling mit resistfilm, verfahren zur herstellung einer fotomaske und verfahren zur herstellung einer elektronischen vorrichtung
JP7024744B2 (ja) * 2018-02-22 2022-02-24 信越化学工業株式会社 レジスト材料及びこれを用いたパターン形成方法
CN108441201A (zh) * 2018-05-11 2018-08-24 中国石油天然气股份有限公司 一种含双全氟辛基的氟硅表面活性剂以及油基泡沫驱油剂
US20210332269A1 (en) 2018-12-19 2021-10-28 3M Innovative Properties Company Release layers and articles containing them
EP3725820B1 (de) 2019-04-16 2022-04-06 Henkel AG & Co. KGaA Verwendung von funktionalisierten alpha-angelica-lactonen
EP3798246B1 (de) 2019-09-27 2024-01-31 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von modifiziertem epoxidharz
EP3831863B1 (de) 2019-12-04 2023-07-05 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf der basis von epoxidharz
EP3831862B1 (de) 2019-12-04 2023-06-28 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von epoxidharz
CN114929776A (zh) 2019-12-20 2022-08-19 3M创新有限公司 包含聚合物和可聚合环状烯烃的粘合剂制品、粘合剂组合物和方法
WO2021124156A1 (en) 2019-12-20 2021-06-24 3M Innovative Properties Company Method of pattern coating adhesive composition comprising unpolymerized cyclic olefin and latent catalyst, adhesive compositions and articles
EP3916033A1 (de) 2020-05-28 2021-12-01 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von epoxidharz
US20220111582A1 (en) 2020-10-13 2022-04-14 Cabot Corporation Conductive photo-curable compositions for additive manufacturing
EP4012000A1 (de) 2020-12-11 2022-06-15 Bostik SA Lichthärtbare klebstoffzusammensetzung
EP4050061A1 (de) 2021-02-26 2022-08-31 Henkel AG & Co. KGaA Im nahinfrarotbereich (nir) sensibilisierte kleb- und dichtstoffzusammensetzungen
EP4050060A1 (de) 2021-02-26 2022-08-31 Henkel AG & Co. KGaA Photohärtbare klebe- oder dichtungsmasse
WO2023091407A1 (en) 2021-11-16 2023-05-25 3M Innovative Properties Company Release composition, articles prepared from the release composition, and related methods
EP4183807A1 (de) 2021-11-18 2023-05-24 Henkel AG & Co. KGaA Copolymer und heissschmelzzusammensetzungen mit diesem copolymer
WO2023111715A1 (en) 2021-12-16 2023-06-22 3M Innovative Properties Company Compositions comprising cleavable crosslinkers
CN115057779B (zh) * 2022-05-23 2024-01-05 苏州大学 一种y型含氟两亲性聚合物及其制备和应用
EP4332144A1 (de) 2022-09-05 2024-03-06 Henkel AG & Co. KGaA Einkomponentige (1k) härtbare klebstoffzusammensetzung

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL127400C (de) * 1965-11-22
US4039521A (en) * 1973-04-23 1977-08-02 Minnesota Mining And Manufacturing Company Aromatic diazonium bis(fluorinated alkylsulfonyl) methides
US4049861A (en) * 1975-03-07 1977-09-20 Minnesota Mining And Manufacturing Company Abrasion resistant coatings
US4031036A (en) * 1975-06-09 1977-06-21 Minnesota Mining And Manufacturing Company Use of bis(fluoroaliphaticsulfonyl) imides in cationic polymerization
US4115295A (en) * 1976-04-26 1978-09-19 Minnesota Mining And Manufacturing Company Polymerizable compositions containing highly fluorinated aliphatic sulfonyl protonic acid catalyst
US4472479A (en) * 1979-12-10 1984-09-18 Recognition Equipment Incorporated Light barrier fluorescent ribbon
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4889792A (en) * 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
US4920182A (en) * 1987-12-18 1990-04-24 Ciba-Geigy Corporation Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator
JP2552550B2 (ja) * 1989-07-24 1996-11-13 富士写真フイルム株式会社 感光性組成物
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5273840A (en) * 1990-08-01 1993-12-28 Covalent Associates Incorporated Methide salts, formulations, electrolytes and batteries formed therefrom
FR2683524A1 (fr) * 1991-11-08 1993-05-14 Centre Nat Rech Scient Derives des bis(perfluorosulfonyl)methanes, leur procede de preparation, et leurs utilisations .

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CA2213465A1 (en) 1996-09-12
WO1996027584A1 (en) 1996-09-12
CN1177346A (zh) 1998-03-25
JP3985020B2 (ja) 2007-10-03
KR19980702788A (ko) 1998-08-05
EP0813521B1 (de) 2000-09-13
DE69610294D1 (de) 2000-10-19
US5554664A (en) 1996-09-10
JPH11501909A (ja) 1999-02-16
AU4776696A (en) 1996-09-23
KR100436804B1 (ko) 2004-09-16

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