DE69620581D1 - Interferometrische messung von oberflächen mit diffraktionsoptik mit streifender inzidenz - Google Patents
Interferometrische messung von oberflächen mit diffraktionsoptik mit streifender inzidenzInfo
- Publication number
- DE69620581D1 DE69620581D1 DE69620581T DE69620581T DE69620581D1 DE 69620581 D1 DE69620581 D1 DE 69620581D1 DE 69620581 T DE69620581 T DE 69620581T DE 69620581 T DE69620581 T DE 69620581T DE 69620581 D1 DE69620581 D1 DE 69620581D1
- Authority
- DE
- Germany
- Prior art keywords
- striping
- incidence
- interferometric measurement
- optics
- differential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02018—Multipass interferometers, e.g. double-pass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37549995A | 1995-01-19 | 1995-01-19 | |
US08/483,737 US5654798A (en) | 1995-01-19 | 1995-06-07 | Interferometric measurement of surfaces with diffractive optics at grazing incidence |
PCT/US1996/000707 WO1996022505A1 (en) | 1995-01-19 | 1996-01-18 | Interferometric measurement of surfaces with diffractive optics at grazing incidence |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69620581D1 true DE69620581D1 (de) | 2002-05-16 |
DE69620581T2 DE69620581T2 (de) | 2002-11-28 |
Family
ID=27007080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69620581T Expired - Fee Related DE69620581T2 (de) | 1995-01-19 | 1996-01-18 | Interferometrische messung von oberflächen mit diffraktionsoptik mit streifender inzidenz |
Country Status (5)
Country | Link |
---|---|
US (2) | US5654798A (de) |
EP (1) | EP0804712B1 (de) |
JP (1) | JPH10512674A (de) |
DE (1) | DE69620581T2 (de) |
WO (1) | WO1996022505A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5793488A (en) * | 1995-07-31 | 1998-08-11 | Tropel Corporation | Interferometer with compound optics for measuring cylindrical objects at oblique incidence |
DE19602445A1 (de) * | 1996-01-24 | 1997-07-31 | Nanopro Luftlager Produktions | Vorrichtung und Verfahren zum Vermessen von zwei einander gegenüberliegenden Oberflächen eines Körpers |
US5719676A (en) * | 1996-04-12 | 1998-02-17 | Tropel Corporation | Diffraction management for grazing incidence interferometer |
DE19643074C2 (de) * | 1996-05-07 | 1999-07-29 | Johannes Prof Dr Schwider | Verfahren zur interferometrischen Prüfung von technischen Oberflächen |
US6100979A (en) * | 1996-09-09 | 2000-08-08 | Robert Bosch Gmbh | Arrangement for the testing of surfaces |
US5889591A (en) * | 1996-10-17 | 1999-03-30 | Tropel Corporation | Interferometric measurement of toric surfaces at grazing incidence |
US5777738A (en) * | 1997-03-17 | 1998-07-07 | Tropel Corporation | Interferometric measurement of absolute dimensions of cylindrical surfaces at grazing incidence |
US7551288B1 (en) | 1997-10-28 | 2009-06-23 | Rockwell Automation Technologies, Inc. | System for monitoring bearing wear |
US6111643A (en) * | 1997-10-28 | 2000-08-29 | Reliance Electric Industrial Company | Apparatus, system and method for determining wear of an article |
US6249351B1 (en) | 1999-06-03 | 2001-06-19 | Zygo Corporation | Grazing incidence interferometer and method |
US7057741B1 (en) | 1999-06-18 | 2006-06-06 | Kla-Tencor Corporation | Reduced coherence symmetric grazing incidence differential interferometer |
DE10195052B3 (de) * | 2000-01-25 | 2015-06-18 | Zygo Corp. | Verfahren und Einrichtungen zur Bestimmung einer geometrischen Eigenschaft eines Versuchsgegenstands sowie optisches Profilmesssystem |
US6304332B1 (en) | 2000-02-17 | 2001-10-16 | Lucent Technologies Inc. | Precision grating period measurement arrangement |
US7433053B2 (en) * | 2002-08-08 | 2008-10-07 | Applied Materials, Israel, Ltd. | Laser inspection using diffractive elements for enhancement and suppression of surface features |
DE102010041556A1 (de) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung |
DE102013203211A1 (de) * | 2012-06-15 | 2013-12-19 | Dr. Johannes Heidenhain Gmbh | Vorrichtung zur interferentiellen Abstandsmessung |
US9651358B2 (en) | 2013-08-19 | 2017-05-16 | Corning Incorporated | Grazing-incidence interferometer with dual-side measurement capability using a common image plane |
TWI486550B (zh) * | 2014-01-20 | 2015-06-01 | Nat Univ Tsing Hua | 厚度線上即時檢測之光學干涉裝置及其方法 |
JP6513697B2 (ja) * | 2014-03-13 | 2019-05-15 | ナショナル ユニバーシティ オブ シンガポール | 光干渉デバイス |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE106769C (de) * | ||||
DE233644C (de) * | ||||
DE215388C (de) * | ||||
DD106769A3 (de) * | 1972-01-04 | 1974-07-05 | Verfahren und anordnung zur pr]fung beliebiger mantelfl[chen rotationssymmetrischer festk\rper mittels synthetischer hologramme | |
US3907438A (en) * | 1973-06-22 | 1975-09-23 | Gen Electric | Contour measuring system for cylinders |
US4436424A (en) * | 1981-07-27 | 1984-03-13 | Gca Corporation | Interferometer using transverse deviation of test beam |
US4391526A (en) * | 1981-08-24 | 1983-07-05 | Itek Corporation | Interferometric surface contour measuring arrangement |
US4606640A (en) * | 1984-04-02 | 1986-08-19 | The Perkin-Elmer Corporation | Method and apparatus for optically testing cylindrical surfaces |
EP0179935B1 (de) * | 1984-10-31 | 1988-05-18 | Ibm Deutschland Gmbh | Interferometrischer Dickenanalysierer und Messmethode |
US4678333A (en) * | 1985-05-10 | 1987-07-07 | Nicolet Instrument Corporation | Double-pass optical interferometer |
JPS62177421A (ja) * | 1986-01-31 | 1987-08-04 | Fuji Photo Optical Co Ltd | 斜入射干渉計装置 |
US4791584A (en) * | 1986-10-15 | 1988-12-13 | Eastman Kodak Company | Sub-nyquist interferometry |
US4898470A (en) * | 1988-07-12 | 1990-02-06 | Eastman Kodak Company | Apparatus and method for testing circular cylindrical or conical surfaces |
US5041726A (en) * | 1990-06-11 | 1991-08-20 | Hughes Aircraft Company | Infrared holographic defect detector |
JP2619566B2 (ja) * | 1990-11-20 | 1997-06-11 | オ−クマ株式会社 | 光学式位置検出器 |
JPH04221704A (ja) * | 1990-12-25 | 1992-08-12 | Matsushita Electric Works Ltd | 位相シフト斜入射干渉計 |
US5220403A (en) * | 1991-03-11 | 1993-06-15 | International Business Machines Corporation | Apparatus and a method for high numerical aperture microscopic examination of materials |
JP2823707B2 (ja) * | 1991-03-15 | 1998-11-11 | 松下電工株式会社 | 位相シフト斜入射干渉計 |
US5210591A (en) * | 1991-08-02 | 1993-05-11 | Hughes Aircraft Company | Interferometric ball bearing test station |
US5268742A (en) * | 1992-06-15 | 1993-12-07 | Hughes Aircraft Company | Full aperture interferometry for grazing incidence optics |
-
1995
- 1995-06-07 US US08/483,737 patent/US5654798A/en not_active Expired - Fee Related
-
1996
- 1996-01-18 JP JP8522391A patent/JPH10512674A/ja active Pending
- 1996-01-18 WO PCT/US1996/000707 patent/WO1996022505A1/en active IP Right Grant
- 1996-01-18 EP EP96903557A patent/EP0804712B1/de not_active Expired - Lifetime
- 1996-01-18 DE DE69620581T patent/DE69620581T2/de not_active Expired - Fee Related
-
1997
- 1997-06-30 US US08/885,419 patent/US5909281A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69620581T2 (de) | 2002-11-28 |
WO1996022505A1 (en) | 1996-07-25 |
EP0804712A1 (de) | 1997-11-05 |
US5909281A (en) | 1999-06-01 |
JPH10512674A (ja) | 1998-12-02 |
US5654798A (en) | 1997-08-05 |
EP0804712B1 (de) | 2002-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |