DE69626782D1 - Verfahren und gerät zur plasmabearbeitung - Google Patents

Verfahren und gerät zur plasmabearbeitung

Info

Publication number
DE69626782D1
DE69626782D1 DE69626782T DE69626782T DE69626782D1 DE 69626782 D1 DE69626782 D1 DE 69626782D1 DE 69626782 T DE69626782 T DE 69626782T DE 69626782 T DE69626782 T DE 69626782T DE 69626782 D1 DE69626782 D1 DE 69626782D1
Authority
DE
Germany
Prior art keywords
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69626782T
Other languages
English (en)
Other versions
DE69626782T2 (de
DE69626782T9 (de
Inventor
R Wei
N Matossian
Peter Mikula
Deborah Clark
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motors Liquidation Co
DirecTV Group Inc
Original Assignee
Motors Liquidation Co
Hughes Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motors Liquidation Co, Hughes Electronics Corp filed Critical Motors Liquidation Co
Application granted granted Critical
Publication of DE69626782D1 publication Critical patent/DE69626782D1/de
Publication of DE69626782T2 publication Critical patent/DE69626782T2/de
Publication of DE69626782T9 publication Critical patent/DE69626782T9/de
Active legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/336—Changing physical properties of treated surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE69626782T 1995-10-12 1996-10-10 Verfahren und gerät zur plasmabearbeitung Active DE69626782T9 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/543,860 US5859404A (en) 1995-10-12 1995-10-12 Method and apparatus for plasma processing a workpiece in an enveloping plasma
US543860 1995-10-12
PCT/US1996/016210 WO1997014172A1 (en) 1995-10-12 1996-10-10 Method and apparatus for plasma processing

Publications (3)

Publication Number Publication Date
DE69626782D1 true DE69626782D1 (de) 2003-04-24
DE69626782T2 DE69626782T2 (de) 2004-02-12
DE69626782T9 DE69626782T9 (de) 2004-07-22

Family

ID=24169830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69626782T Active DE69626782T9 (de) 1995-10-12 1996-10-10 Verfahren und gerät zur plasmabearbeitung

Country Status (6)

Country Link
US (1) US5859404A (de)
EP (1) EP0797838B1 (de)
JP (1) JPH10503554A (de)
KR (1) KR980700675A (de)
DE (1) DE69626782T9 (de)
WO (1) WO1997014172A1 (de)

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EP0872569B1 (de) * 1997-04-18 2003-12-17 Plasma Metal S.A. Verfahren und Ofen zum Nitrieren
JP4643798B2 (ja) * 2000-05-31 2011-03-02 パナソニック株式会社 表面処理装置
EP1288329A1 (de) * 2001-09-03 2003-03-05 C C R GmbH Beschichtungstechnologie Verfahren zur Herstellung dünner Oxid- oder Nitridschichten
US7049539B2 (en) * 2002-04-01 2006-05-23 Nagata Seiki Kabushiki Kaisha Method for surface treating a die by electron beam irradiation and a die treated thereby
EP1361437A1 (de) * 2002-05-07 2003-11-12 Centre National De La Recherche Scientifique (Cnrs) Ein neuer biologischer Tumormarker und Methoden für die Detektion des krebsartigen oder nicht krebsartigen Phenotyps von Zellen
US7465362B2 (en) * 2002-05-08 2008-12-16 Btu International, Inc. Plasma-assisted nitrogen surface-treatment
US7498066B2 (en) * 2002-05-08 2009-03-03 Btu International Inc. Plasma-assisted enhanced coating
US20060233682A1 (en) * 2002-05-08 2006-10-19 Cherian Kuruvilla A Plasma-assisted engine exhaust treatment
US20060237398A1 (en) * 2002-05-08 2006-10-26 Dougherty Mike L Sr Plasma-assisted processing in a manufacturing line
US20060057016A1 (en) * 2002-05-08 2006-03-16 Devendra Kumar Plasma-assisted sintering
US20050233091A1 (en) * 2002-05-08 2005-10-20 Devendra Kumar Plasma-assisted coating
US20060228497A1 (en) * 2002-05-08 2006-10-12 Satyendra Kumar Plasma-assisted coating
US7638727B2 (en) * 2002-05-08 2009-12-29 Btu International Inc. Plasma-assisted heat treatment
US7497922B2 (en) * 2002-05-08 2009-03-03 Btu International, Inc. Plasma-assisted gas production
US7560657B2 (en) * 2002-05-08 2009-07-14 Btu International Inc. Plasma-assisted processing in a manufacturing line
US6870124B2 (en) * 2002-05-08 2005-03-22 Dana Corporation Plasma-assisted joining
US7445817B2 (en) * 2002-05-08 2008-11-04 Btu International Inc. Plasma-assisted formation of carbon structures
US20060062930A1 (en) * 2002-05-08 2006-03-23 Devendra Kumar Plasma-assisted carburizing
US7504061B2 (en) * 2002-05-08 2009-03-17 Leonhard Kurz Gmbh & Co., Kg Method of decorating large plastic 3D objects
US7494904B2 (en) * 2002-05-08 2009-02-24 Btu International, Inc. Plasma-assisted doping
JP4257157B2 (ja) * 2003-06-13 2009-04-22 本田技研工業株式会社 窒化処理方法及び装置
US7261914B2 (en) * 2003-09-02 2007-08-28 Southwest Research Institute Method and apparatus for forming a nitride layer on a biomedical device
WO2006127037A2 (en) * 2004-11-05 2006-11-30 Dana Corporation Atmospheric pressure processing using microwave-generated plasmas
US7591057B2 (en) * 2005-04-12 2009-09-22 General Electric Company Method of repairing spline and seal teeth of a mated component
US7687151B2 (en) * 2005-04-12 2010-03-30 General Electric Company Overlay for repairing spline and seal teeth of a mated component
US20070172689A1 (en) * 2006-01-24 2007-07-26 Standard Aero (San Antonio), Inc. Treatment apparatus and method of treating surfaces
JP5606707B2 (ja) * 2009-09-04 2014-10-15 学校法人 名城大学 窒化処理装置及び窒化処理方法
ES2344981B1 (es) * 2010-03-01 2011-05-06 Asociacion De La Industria Navarra (Ain) Procedimiento para la nitruracion de aleaciones metalicas y dispositivo para llevar a cabo dicho procedimiento.
KR101403989B1 (ko) 2010-11-09 2014-06-10 포항공과대학교 산학협력단 그래핀 피복 강판 및 이의 제조 방법
US8884525B2 (en) * 2011-03-22 2014-11-11 Advanced Energy Industries, Inc. Remote plasma source generating a disc-shaped plasma
JP5956302B2 (ja) * 2012-10-15 2016-07-27 清水電設工業株式会社 プラズマ処理装置、ヘテロ膜の形成方法
DE102013006589A1 (de) * 2013-04-17 2014-10-23 Ald Vacuum Technologies Gmbh Verfahren und Vorrichtung für das thermochemische Härten von Werkstücken
RU2611248C2 (ru) * 2015-06-25 2017-02-21 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" Способ азотирования деталей в тлеющем разряде на различную глубину азотированного слоя
WO2021076934A1 (en) * 2019-10-16 2021-04-22 Us Electron, Inc. Electron beam welding systems employing a plasma cathode
CN115287583B (zh) * 2022-07-11 2024-01-30 华南理工大学 一种适用于钟表圈口强化的离子渗镀夹具装置及方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH611938A5 (de) * 1976-05-19 1979-06-29 Battelle Memorial Institute
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置
US4394234A (en) * 1979-02-02 1983-07-19 Hitachi, Ltd. Method of processing electrically conductive material by glow discharge
US4342631A (en) * 1980-06-16 1982-08-03 Illinois Tool Works Inc. Gasless ion plating process and apparatus
US4600464A (en) * 1985-05-01 1986-07-15 International Business Machines Corporation Plasma etching reactor with reduced plasma potential
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
JP2572438B2 (ja) * 1989-01-30 1997-01-16 ホーヤ株式会社 ガラスプレス成形型の製造方法
US5078847A (en) * 1990-08-29 1992-01-07 Jerry Grosman Ion plating method and apparatus
GB2251631B (en) * 1990-12-19 1994-10-12 Mitsubishi Electric Corp Thin-film forming apparatus
GB2261227B (en) * 1991-11-08 1995-01-11 Univ Hull Surface treatment of metals
US5374456A (en) * 1992-12-23 1994-12-20 Hughes Aircraft Company Surface potential control in plasma processing of materials
US5498290A (en) * 1993-08-27 1996-03-12 Hughes Aircraft Company Confinement of secondary electrons in plasma ion processing
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
DE19746332C2 (de) * 1997-02-19 1999-10-07 Fraunhofer Ges Forschung Vorrichtung zum Beschichten von Bauteilen oder anderen Materialien

Also Published As

Publication number Publication date
DE69626782T2 (de) 2004-02-12
KR980700675A (ko) 1998-03-30
DE69626782T9 (de) 2004-07-22
US5859404A (en) 1999-01-12
JPH10503554A (ja) 1998-03-31
WO1997014172A1 (en) 1997-04-17
MX9704311A (es) 1998-06-28
EP0797838B1 (de) 2003-03-19
EP0797838A1 (de) 1997-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: WITTE, WELLER & PARTNER, 70178 STUTTGART