US6148644A
(en)
|
1995-03-06 |
2000-11-21 |
Lever Brothers Company, Division Of Conopco, Inc. |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US5783082A
(en)
*
|
1995-11-03 |
1998-07-21 |
University Of North Carolina |
Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
|
GB2311992A
(en)
*
|
1996-04-10 |
1997-10-15 |
Bespak Plc |
A method of cleaning or purifying elastomers and elastomeric articles which are intended for medical or pharmaceutical uses
|
US7338563B2
(en)
*
|
1996-10-16 |
2008-03-04 |
Clark Steve L |
Process for cleaning hydrocarbons from soils
|
US5860467A
(en)
*
|
1996-12-03 |
1999-01-19 |
The University Of North Carolina At Chapel Hill |
Use of CO2 -soluble materials in making molds
|
US6500605B1
(en)
*
|
1997-05-27 |
2002-12-31 |
Tokyo Electron Limited |
Removal of photoresist and residue from substrate using supercritical carbon dioxide process
|
US6306564B1
(en)
|
1997-05-27 |
2001-10-23 |
Tokyo Electron Limited |
Removal of resist or residue from semiconductors using supercritical carbon dioxide
|
US6287640B1
(en)
|
1997-05-30 |
2001-09-11 |
Micell Technologies, Inc. |
Surface treatment of substrates with compounds that bind thereto
|
US6344243B1
(en)
|
1997-05-30 |
2002-02-05 |
Micell Technologies, Inc. |
Surface treatment
|
US6165560A
(en)
*
|
1997-05-30 |
2000-12-26 |
Micell Technologies |
Surface treatment
|
EP0986667B1
(de)
|
1997-05-30 |
2009-01-07 |
Micell Integrated Systems, Inc. |
Oberflächebehandlung
|
US6200352B1
(en)
|
1997-08-27 |
2001-03-13 |
Micell Technologies, Inc. |
Dry cleaning methods and compositions
|
US5858022A
(en)
*
|
1997-08-27 |
1999-01-12 |
Micell Technologies, Inc. |
Dry cleaning methods and compositions
|
US6218353B1
(en)
|
1997-08-27 |
2001-04-17 |
Micell Technologies, Inc. |
Solid particulate propellant systems and aerosol containers employing the same
|
US6010542A
(en)
*
|
1997-08-29 |
2000-01-04 |
Micell Technologies, Inc. |
Method of dyeing substrates in carbon dioxide
|
WO1999010587A1
(en)
*
|
1997-08-29 |
1999-03-04 |
Micell Technologies |
End functionalized polysiloxane surfactants in carbon dioxide formulations
|
US6127000A
(en)
*
|
1997-10-10 |
2000-10-03 |
North Carolina State University |
Method and compositions for protecting civil infrastructure
|
US6846789B2
(en)
*
|
1998-03-30 |
2005-01-25 |
The Regents Of The University Of California |
Composition and method for removing photoresist materials from electronic components
|
AU3360399A
(en)
*
|
1998-03-30 |
1999-10-18 |
Leisa B. Davenhall |
Composition and method for removing photoresist materials from electronic components
|
US6120613A
(en)
*
|
1998-04-30 |
2000-09-19 |
Micell Technologies, Inc. |
Carbon dioxide cleaning and separation systems
|
US6506259B1
(en)
|
1998-04-30 |
2003-01-14 |
Micell Technologies, Inc. |
Carbon dioxide cleaning and separation systems
|
US5977045A
(en)
*
|
1998-05-06 |
1999-11-02 |
Lever Brothers Company |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US6200943B1
(en)
*
|
1998-05-28 |
2001-03-13 |
Micell Technologies, Inc. |
Combination surfactant systems for use in carbon dioxide-based cleaning formulations
|
US6010729A
(en)
|
1998-08-20 |
2000-01-04 |
Ecolab Inc. |
Treatment of animal carcasses
|
US6277753B1
(en)
|
1998-09-28 |
2001-08-21 |
Supercritical Systems Inc. |
Removal of CMP residue from semiconductors using supercritical carbon dioxide process
|
CA2255413A1
(en)
|
1998-12-11 |
2000-06-11 |
Fracmaster Ltd. |
Foamed nitrogen in liquid co2 for fracturing
|
DE60018044T2
(de)
*
|
1999-02-18 |
2005-12-29 |
Commonwealth Scientific And Industrial Research Organisation |
Neue biomaterialien
|
EP1171567A1
(de)
*
|
1999-04-26 |
2002-01-16 |
3M Innovative Properties Company |
Stabilisierte fluide kohlendioxidzusammensetzung und ihre verwendung
|
US6558622B1
(en)
|
1999-05-04 |
2003-05-06 |
Steris Corporation |
Sub-critical fluid cleaning and antimicrobial decontamination system and process
|
US6602349B2
(en)
|
1999-08-05 |
2003-08-05 |
S.C. Fluids, Inc. |
Supercritical fluid cleaning process for precision surfaces
|
US6747179B1
(en)
|
1999-08-20 |
2004-06-08 |
North Carolina State University |
Carbon dioxide-soluble polymers and swellable polymers for carbon dioxide applications
|
US6403663B1
(en)
|
1999-09-20 |
2002-06-11 |
North Carolina State University |
Method of making foamed materials using surfactants and carbon dioxide
|
US6309425B1
(en)
*
|
1999-10-12 |
2001-10-30 |
Unilever Home & Personal Care, Usa, Division Of Conopco, Inc. |
Cleaning composition and method for using the same
|
US6355072B1
(en)
|
1999-10-15 |
2002-03-12 |
R.R. Street & Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US6755871B2
(en)
*
|
1999-10-15 |
2004-06-29 |
R.R. Street & Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US6558432B2
(en)
*
|
1999-10-15 |
2003-05-06 |
R. R. Street & Co., Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US7097715B1
(en)
*
|
2000-10-11 |
2006-08-29 |
R. R. Street Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
EP1234322A2
(de)
*
|
1999-11-02 |
2002-08-28 |
Tokyo Electron Limited |
Verfahren und vorrichtungen zur überkritischen verarbeitung von werkstücken
|
US6748960B1
(en)
*
|
1999-11-02 |
2004-06-15 |
Tokyo Electron Limited |
Apparatus for supercritical processing of multiple workpieces
|
US6248136B1
(en)
|
2000-02-03 |
2001-06-19 |
Micell Technologies, Inc. |
Methods for carbon dioxide dry cleaning with integrated distribution
|
DE50107279D1
(de)
*
|
2000-02-18 |
2005-10-06 |
Eco2 Sa Mezzovico |
Autoklav zur präzisionsreinigung von stücken und verwendung des autoklavs
|
TW558736B
(en)
*
|
2000-02-26 |
2003-10-21 |
Shipley Co Llc |
Method of reducing defects
|
US6313079B1
(en)
|
2000-03-02 |
2001-11-06 |
Unilever Home & Personal Care Usa, Division Of Conopco |
Heterocyclic dry-cleaning surfactant and method for using the same
|
AU2001255656A1
(en)
*
|
2000-04-25 |
2001-11-07 |
Tokyo Electron Limited |
Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
|
US6855173B2
(en)
|
2000-06-05 |
2005-02-15 |
Procter & Gamble Company |
Use of absorbent materials to separate water from lipophilic fluid
|
US6840963B2
(en)
|
2000-06-05 |
2005-01-11 |
Procter & Gamble |
Home laundry method
|
US6706076B2
(en)
|
2000-06-05 |
2004-03-16 |
Procter & Gamble Company |
Process for separating lipophilic fluid containing emulsions with electric coalescence
|
US6840069B2
(en)
|
2000-06-05 |
2005-01-11 |
Procter & Gamble Company |
Systems for controlling a drying cycle in a drying apparatus
|
US6670317B2
(en)
|
2000-06-05 |
2003-12-30 |
Procter & Gamble Company |
Fabric care compositions and systems for delivering clean, fresh scent in a lipophilic fluid treatment process
|
US6691536B2
(en)
|
2000-06-05 |
2004-02-17 |
The Procter & Gamble Company |
Washing apparatus
|
US6673764B2
(en)
|
2000-06-05 |
2004-01-06 |
The Procter & Gamble Company |
Visual properties for a wash process using a lipophilic fluid based composition containing a colorant
|
US6930079B2
(en)
|
2000-06-05 |
2005-08-16 |
Procter & Gamble Company |
Process for treating a lipophilic fluid
|
US6828292B2
(en)
*
|
2000-06-05 |
2004-12-07 |
Procter & Gamble Company |
Domestic fabric article refreshment in integrated cleaning and treatment processes
|
US6939837B2
(en)
*
|
2000-06-05 |
2005-09-06 |
Procter & Gamble Company |
Non-immersive method for treating or cleaning fabrics using a siloxane lipophilic fluid
|
US6706677B2
(en)
|
2000-06-05 |
2004-03-16 |
Procter & Gamble Company |
Bleaching in conjunction with a lipophilic fluid cleaning regimen
|
US6564591B2
(en)
|
2000-07-21 |
2003-05-20 |
Procter & Gamble Company |
Methods and apparatus for particulate removal from fabrics
|
CN1246888C
(zh)
*
|
2000-08-14 |
2006-03-22 |
东京毅力科创株式会社 |
用超临界二氧化碳工艺从半导体上去除光致抗蚀剂和光致抗蚀残留物
|
KR100501559B1
(ko)
*
|
2000-08-30 |
2005-07-18 |
마쯔시다덴기산교 가부시키가이샤 |
저항기 및 그 제조 방법
|
CN1246429C
(zh)
*
|
2000-09-26 |
2006-03-22 |
北卡罗来纳-查佩尔山大学 |
用于二氧化碳的磷酸酯氟表面活性剂
|
US20020077435A1
(en)
*
|
2000-10-09 |
2002-06-20 |
Desimone Joseph M. |
Methods for preparing polymers in carbon dioxide having reactive functionality
|
US6623355B2
(en)
|
2000-11-07 |
2003-09-23 |
Micell Technologies, Inc. |
Methods, apparatus and slurries for chemical mechanical planarization
|
US20020123452A1
(en)
*
|
2001-01-25 |
2002-09-05 |
Desimone Joseph M. |
Zwitterionic gemini surfactants for use in carbon dioxide
|
JP2004528404A
(ja)
*
|
2001-01-30 |
2004-09-16 |
ナノゲート テクノロジーズ ゲゼルシャフト ミット ベシュレンクテル ハフツング |
方法、物質および物品
|
US6602351B2
(en)
|
2001-02-15 |
2003-08-05 |
Micell Technologies, Inc. |
Methods for the control of contaminants following carbon dioxide cleaning of microelectronic structures
|
US6641678B2
(en)
|
2001-02-15 |
2003-11-04 |
Micell Technologies, Inc. |
Methods for cleaning microelectronic structures with aqueous carbon dioxide systems
|
US6905555B2
(en)
|
2001-02-15 |
2005-06-14 |
Micell Technologies, Inc. |
Methods for transferring supercritical fluids in microelectronic and other industrial processes
|
KR20030075185A
(ko)
*
|
2001-02-15 |
2003-09-22 |
미셀 테크놀로지즈, 인코포레이티드 |
마이크로 전자 소자를 세정하는 방법
|
US6613157B2
(en)
|
2001-02-15 |
2003-09-02 |
Micell Technologies, Inc. |
Methods for removing particles from microelectronic structures
|
US6562146B1
(en)
*
|
2001-02-15 |
2003-05-13 |
Micell Technologies, Inc. |
Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide
|
US6596093B2
(en)
|
2001-02-15 |
2003-07-22 |
Micell Technologies, Inc. |
Methods for cleaning microelectronic structures with cyclical phase modulation
|
US7658989B2
(en)
*
|
2001-03-28 |
2010-02-09 |
North Carolina State University |
Nano-and micro-cellular foamed thin-walled material, and processes and apparatuses for making the same
|
US20020189543A1
(en)
*
|
2001-04-10 |
2002-12-19 |
Biberger Maximilian A. |
High pressure processing chamber for semiconductor substrate including flow enhancing features
|
US20030116176A1
(en)
*
|
2001-04-18 |
2003-06-26 |
Rothman Laura B. |
Supercritical fluid processes with megasonics
|
US20030162685A1
(en)
*
|
2001-06-05 |
2003-08-28 |
Man Victor Fuk-Pong |
Solid cleaning composition including stabilized active oxygen component
|
US6457480B1
(en)
*
|
2001-06-27 |
2002-10-01 |
International Business Machines Corporation |
Process and apparatus for cleaning filters
|
US6454869B1
(en)
*
|
2001-06-27 |
2002-09-24 |
International Business Machines Corporation |
Process of cleaning semiconductor processing, handling and manufacturing equipment
|
US6653233B2
(en)
*
|
2001-06-27 |
2003-11-25 |
International Business Machines Corporation |
Process of providing a semiconductor device with electrical interconnection capability
|
WO2003053561A2
(en)
*
|
2001-07-12 |
2003-07-03 |
Eastman Kodak Company |
A surfactant assisted nanomaterial generation process
|
US20030139310A1
(en)
*
|
2001-08-07 |
2003-07-24 |
Smith Kim R. |
Peroxygen compositions and methods for carpet or upholstery cleaning or sanitizing
|
US6838015B2
(en)
*
|
2001-09-04 |
2005-01-04 |
International Business Machines Corporation |
Liquid or supercritical carbon dioxide composition
|
US6706641B2
(en)
|
2001-09-13 |
2004-03-16 |
Micell Technologies, Inc. |
Spray member and method for using the same
|
US6782900B2
(en)
*
|
2001-09-13 |
2004-08-31 |
Micell Technologies, Inc. |
Methods and apparatus for cleaning and/or treating a substrate using CO2
|
US6666928B2
(en)
|
2001-09-13 |
2003-12-23 |
Micell Technologies, Inc. |
Methods and apparatus for holding a substrate in a pressure chamber
|
US6619304B2
(en)
|
2001-09-13 |
2003-09-16 |
Micell Technologies, Inc. |
Pressure chamber assembly including non-mechanical drive means
|
US6763840B2
(en)
|
2001-09-14 |
2004-07-20 |
Micell Technologies, Inc. |
Method and apparatus for cleaning substrates using liquid carbon dioxide
|
US6841641B2
(en)
*
|
2001-09-27 |
2005-01-11 |
Ppg Industries Ohio, Inc. |
Copolymers comprising low surface tension (meth) acrylates
|
US20030136942A1
(en)
*
|
2001-11-30 |
2003-07-24 |
Smith Kim R. |
Stabilized active oxygen compositions
|
US6737225B2
(en)
|
2001-12-28 |
2004-05-18 |
Texas Instruments Incorporated |
Method of undercutting micro-mechanical device with super-critical carbon dioxide
|
US7326673B2
(en)
*
|
2001-12-31 |
2008-02-05 |
Advanced Technology Materials, Inc. |
Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates
|
US7557073B2
(en)
*
|
2001-12-31 |
2009-07-07 |
Advanced Technology Materials, Inc. |
Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist
|
AU2003235748A1
(en)
*
|
2002-01-07 |
2003-07-24 |
Praxair Technology, Inc. |
Method for cleaning an article
|
US20050227183A1
(en)
*
|
2002-01-11 |
2005-10-13 |
Mark Wagner |
Compositions and methods for image development of conventional chemically amplified photoresists
|
WO2003061860A1
(en)
*
|
2002-01-24 |
2003-07-31 |
S. C. Fluids Inc. |
Supercritical fluid processes with megasonics
|
US6924086B1
(en)
*
|
2002-02-15 |
2005-08-02 |
Tokyo Electron Limited |
Developing photoresist with supercritical fluid and developer
|
US20030213747A1
(en)
*
|
2002-02-27 |
2003-11-20 |
Carbonell Ruben G. |
Methods and compositions for removing residues and substances from substrates using environmentally friendly solvents
|
US6953654B2
(en)
|
2002-03-14 |
2005-10-11 |
Tokyo Electron Limited |
Process and apparatus for removing a contaminant from a substrate
|
US6765030B2
(en)
|
2002-03-22 |
2004-07-20 |
The University Of North Carolina At Chapel Hill |
Methods of forming polymeric structures using carbon dioxide and polymeric structures formed therapy
|
US20030190818A1
(en)
*
|
2002-04-03 |
2003-10-09 |
Ruben Carbonell |
Enhanced processing of performance films using high-diffusivity penetrants
|
US6764552B1
(en)
|
2002-04-18 |
2004-07-20 |
Novellus Systems, Inc. |
Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
|
WO2003091290A1
(en)
*
|
2002-04-23 |
2003-11-06 |
Boehringer Ingelheim Pharmaceuticals, Inc. |
Method for reduction of residual organic solvent in carbomer
|
US6669785B2
(en)
*
|
2002-05-15 |
2003-12-30 |
Micell Technologies, Inc. |
Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide
|
US20030217764A1
(en)
*
|
2002-05-23 |
2003-11-27 |
Kaoru Masuda |
Process and composition for removing residues from the microstructure of an object
|
DE10222943B4
(de)
*
|
2002-05-24 |
2010-08-05 |
Karlsruher Institut für Technologie |
Verfahren zur Reinigung eines Gegenstandes
|
US6846380B2
(en)
*
|
2002-06-13 |
2005-01-25 |
The Boc Group, Inc. |
Substrate processing apparatus and related systems and methods
|
US20040011386A1
(en)
*
|
2002-07-17 |
2004-01-22 |
Scp Global Technologies Inc. |
Composition and method for removing photoresist and/or resist residue using supercritical fluids
|
US20040050406A1
(en)
*
|
2002-07-17 |
2004-03-18 |
Akshey Sehgal |
Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
|
US6905556B1
(en)
|
2002-07-23 |
2005-06-14 |
Novellus Systems, Inc. |
Method and apparatus for using surfactants in supercritical fluid processing of wafers
|
US6962714B2
(en)
*
|
2002-08-06 |
2005-11-08 |
Ecolab, Inc. |
Critical fluid antimicrobial compositions and their use and generation
|
DE10236491B4
(de)
*
|
2002-08-09 |
2012-05-03 |
Air Liquide Deutschland Gmbh |
Reinigung mittels CO2 und N2O
|
AU2002951005A0
(en)
*
|
2002-08-27 |
2002-09-12 |
Shell Internationale Research Maatschappij B.V. |
Method of removing carbon dioxide fouling from cryogenic equipment
|
US7267727B2
(en)
*
|
2002-09-24 |
2007-09-11 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids and ultrasonic energy
|
US20040055621A1
(en)
*
|
2002-09-24 |
2004-03-25 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids and ultrasonic energy
|
US20080000505A1
(en)
*
|
2002-09-24 |
2008-01-03 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids
|
US20080004194A1
(en)
*
|
2002-09-24 |
2008-01-03 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids
|
US6953041B2
(en)
*
|
2002-10-09 |
2005-10-11 |
Micell Technologies, Inc. |
Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof
|
US6943139B2
(en)
*
|
2002-10-31 |
2005-09-13 |
Advanced Technology Materials, Inc. |
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
|
US7485611B2
(en)
*
|
2002-10-31 |
2009-02-03 |
Advanced Technology Materials, Inc. |
Supercritical fluid-based cleaning compositions and methods
|
US6989358B2
(en)
*
|
2002-10-31 |
2006-01-24 |
Advanced Technology Materials, Inc. |
Supercritical carbon dioxide/chemical formulation for removal of photoresists
|
US20060019850A1
(en)
*
|
2002-10-31 |
2006-01-26 |
Korzenski Michael B |
Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations
|
US6880560B2
(en)
*
|
2002-11-18 |
2005-04-19 |
Techsonic |
Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
|
US6683008B1
(en)
*
|
2002-11-19 |
2004-01-27 |
International Business Machines Corporation |
Process of removing ion-implanted photoresist from a workpiece
|
US20040112409A1
(en)
*
|
2002-12-16 |
2004-06-17 |
Supercritical Sysems, Inc. |
Fluoride in supercritical fluid for photoresist and residue removal
|
US20040154647A1
(en)
*
|
2003-02-07 |
2004-08-12 |
Supercritical Systems, Inc. |
Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing
|
AU2003900534A0
(en)
*
|
2003-02-07 |
2003-02-20 |
Shell Internationale Research Maatschappij B.V. |
Process and apparatus for removal of a contaminant from a natural gas feed stream
|
US20040198066A1
(en)
*
|
2003-03-21 |
2004-10-07 |
Applied Materials, Inc. |
Using supercritical fluids and/or dense fluids in semiconductor applications
|
US20040244818A1
(en)
*
|
2003-05-13 |
2004-12-09 |
Fury Michael A. |
System and method for cleaning of workpieces using supercritical carbon dioxide
|
US6951769B2
(en)
|
2003-06-04 |
2005-10-04 |
Texas Instruments Incorporated |
Method for stripping sacrificial layer in MEMS assembly
|
US6806993B1
(en)
|
2003-06-04 |
2004-10-19 |
Texas Instruments Incorporated |
Method for lubricating MEMS components
|
US7119052B2
(en)
*
|
2003-06-24 |
2006-10-10 |
Advanced Technology Materials, Inc. |
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
|
US20050003988A1
(en)
*
|
2003-06-27 |
2005-01-06 |
The Procter & Gamble Company |
Enzyme bleach lipophilic fluid cleaning compositions
|
US20050003987A1
(en)
*
|
2003-06-27 |
2005-01-06 |
The Procter & Gamble Co. |
Lipophilic fluid cleaning compositions
|
US7345016B2
(en)
*
|
2003-06-27 |
2008-03-18 |
The Procter & Gamble Company |
Photo bleach lipophilic fluid cleaning compositions
|
US7365043B2
(en)
*
|
2003-06-27 |
2008-04-29 |
The Procter & Gamble Co. |
Lipophilic fluid cleaning compositions capable of delivering scent
|
US7044376B2
(en)
*
|
2003-07-23 |
2006-05-16 |
Eastman Kodak Company |
Authentication method and apparatus for use with compressed fluid printed swatches
|
US20050029492A1
(en)
*
|
2003-08-05 |
2005-02-10 |
Hoshang Subawalla |
Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols
|
JP2007504306A
(ja)
*
|
2003-09-02 |
2007-03-01 |
ナノン アクティーゼルスカブ |
ゴム含有廃材の処理方法
|
US7887641B2
(en)
*
|
2004-01-09 |
2011-02-15 |
Ecolab Usa Inc. |
Neutral or alkaline medium chain peroxycarboxylic acid compositions and methods employing them
|
US7507429B2
(en)
|
2004-01-09 |
2009-03-24 |
Ecolab Inc. |
Methods for washing carcasses, meat, or meat products with medium chain peroxycarboxylic acid compositions
|
JP2007520479A
(ja)
*
|
2004-01-09 |
2007-07-26 |
イーコラブ インコーポレイティド |
中鎖ペルオキシカルボン酸組成物
|
US7771737B2
(en)
|
2004-01-09 |
2010-08-10 |
Ecolab Inc. |
Medium chain peroxycarboxylic acid compositions
|
US20050183208A1
(en)
*
|
2004-02-20 |
2005-08-25 |
The Procter & Gamble Company |
Dual mode laundry apparatus and method using the same
|
US7553803B2
(en)
*
|
2004-03-01 |
2009-06-30 |
Advanced Technology Materials, Inc. |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
|
US20050288485A1
(en)
*
|
2004-06-24 |
2005-12-29 |
Mahl Jerry M |
Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
|
US7250374B2
(en)
*
|
2004-06-30 |
2007-07-31 |
Tokyo Electron Limited |
System and method for processing a substrate using supercritical carbon dioxide processing
|
US7195676B2
(en)
*
|
2004-07-13 |
2007-03-27 |
Air Products And Chemicals, Inc. |
Method for removal of flux and other residue in dense fluid systems
|
US7307019B2
(en)
*
|
2004-09-29 |
2007-12-11 |
Tokyo Electron Limited |
Method for supercritical carbon dioxide processing of fluoro-carbon films
|
US20060081273A1
(en)
*
|
2004-10-20 |
2006-04-20 |
Mcdermott Wayne T |
Dense fluid compositions and processes using same for article treatment and residue removal
|
US20060102591A1
(en)
*
|
2004-11-12 |
2006-05-18 |
Tokyo Electron Limited |
Method and system for treating a substrate using a supercritical fluid
|
US7491036B2
(en)
*
|
2004-11-12 |
2009-02-17 |
Tokyo Electron Limited |
Method and system for cooling a pump
|
US20060102208A1
(en)
*
|
2004-11-12 |
2006-05-18 |
Tokyo Electron Limited |
System for removing a residue from a substrate using supercritical carbon dioxide processing
|
US20060102590A1
(en)
*
|
2004-11-12 |
2006-05-18 |
Tokyo Electron Limited |
Method for treating a substrate with a high pressure fluid using a preoxide-based process chemistry
|
US20060102204A1
(en)
*
|
2004-11-12 |
2006-05-18 |
Tokyo Electron Limited |
Method for removing a residue from a substrate using supercritical carbon dioxide processing
|
US7375154B2
(en)
*
|
2004-12-06 |
2008-05-20 |
Eastman Chemical Company |
Polyester/polyamide blend having improved flavor retaining property and clarity
|
CN101072820B
(zh)
*
|
2004-12-06 |
2013-01-02 |
伊士曼化工公司 |
用于氧清除组合物的聚酯基钴母料
|
AU2005314117A1
(en)
*
|
2004-12-06 |
2006-06-15 |
Constar International Inc. |
Blends of oxygen scavenging polyamides with polyesters which contain zinc and cobalt
|
US7410751B2
(en)
*
|
2005-01-28 |
2008-08-12 |
Micell Technologies, Inc. |
Compositions and methods for image development of conventional chemically amplified photoresists
|
WO2006081534A1
(en)
*
|
2005-01-28 |
2006-08-03 |
Micell Technologies, Inc. |
Compositions and methods for image development of conventional chemically amplified photoresists
|
US20060180174A1
(en)
*
|
2005-02-15 |
2006-08-17 |
Tokyo Electron Limited |
Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
|
US7291565B2
(en)
*
|
2005-02-15 |
2007-11-06 |
Tokyo Electron Limited |
Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
|
US20060180572A1
(en)
*
|
2005-02-15 |
2006-08-17 |
Tokyo Electron Limited |
Removal of post etch residue for a substrate with open metal surfaces
|
US7008853B1
(en)
*
|
2005-02-25 |
2006-03-07 |
Infineon Technologies, Ag |
Method and system for fabricating free-standing nanostructures
|
US20060255012A1
(en)
*
|
2005-05-10 |
2006-11-16 |
Gunilla Jacobson |
Removal of particles from substrate surfaces using supercritical processing
|
US7789971B2
(en)
|
2005-05-13 |
2010-09-07 |
Tokyo Electron Limited |
Treatment of substrate using functionalizing agent in supercritical carbon dioxide
|
US7361231B2
(en)
*
|
2005-07-01 |
2008-04-22 |
Ekc Technology, Inc. |
System and method for mid-pressure dense phase gas and ultrasonic cleaning
|
US20070012337A1
(en)
*
|
2005-07-15 |
2007-01-18 |
Tokyo Electron Limited |
In-line metrology for supercritical fluid processing
|
US20070059201A1
(en)
*
|
2005-09-15 |
2007-03-15 |
Meenakshi Sundaram |
Dry ice product containing antimicrobial formulation prepared using carrier chemicals
|
US8087926B2
(en)
*
|
2005-12-28 |
2012-01-03 |
Jupiter Oxygen Corporation |
Oxy-fuel combustion with integrated pollution control
|
JP2007225647A
(ja)
*
|
2006-02-21 |
2007-09-06 |
Tokyo Ohka Kogyo Co Ltd |
超臨界現像プロセス用レジスト組成物
|
FR2897786B1
(fr)
*
|
2006-02-24 |
2008-06-27 |
Commissariat Energie Atomique |
Procede de nettoyage d'un substrat contamine par des contaminants inorganiques particulaires, a l'aide d'un fluide dense sous pression
|
WO2007140261A2
(en)
*
|
2006-05-24 |
2007-12-06 |
Jupiter Oxygen Corporation |
Integrated capture of fossil fuel gas pollutants including co2 with energy recovery
|
US7547421B2
(en)
|
2006-10-18 |
2009-06-16 |
Ecolab Inc. |
Apparatus and method for making a peroxycarboxylic acid
|
US8075857B2
(en)
*
|
2006-10-18 |
2011-12-13 |
Ecolab Usa Inc. |
Apparatus and method for making a peroxycarboxylic acid
|
EP2548934A1
(de)
|
2007-05-10 |
2013-01-23 |
Halliburton Energy Services, Inc. |
Verfahren zur Stimulation der Öl- oder Gaserzeugung
|
US7854651B2
(en)
*
|
2008-07-02 |
2010-12-21 |
Ballinger Kenneth E |
Highly bacteriocidal chlorine dioxide, formulation, preparation and use thereof
|
DE102008040486A1
(de)
|
2008-07-17 |
2010-01-21 |
Evonik Goldschmidt Gmbh |
Verwendung von ionischen Flüssigkeiten als Zusatzstoff für Reinigungsverfahren in verflüssigtem und/oder überkritischem Gas
|
US8881820B2
(en)
|
2009-08-31 |
2014-11-11 |
Halliburton Energy Services, Inc. |
Treatment fluids comprising entangled equilibrium polymer networks
|
US8887809B2
(en)
|
2009-08-31 |
2014-11-18 |
Halliburton Energy Services, Inc. |
Treatment fluids comprising transient polymer networks
|
US8813845B2
(en)
|
2009-08-31 |
2014-08-26 |
Halliburton Energy Services, Inc. |
Polymeric additives for enhancement of treatment fluids comprising viscoelastic surfactants and methods of use
|
US8905135B2
(en)
|
2010-03-24 |
2014-12-09 |
Halliburton Energy Services, Inc. |
Zero shear viscosifying agent
|
WO2011158054A1
(en)
|
2010-06-14 |
2011-12-22 |
Sony Ericsson Mobile Communications Ab |
Regulation of audio volume and/or speed responsive to user applied pressure and related methods
|
KR101101098B1
(ko)
|
2010-07-27 |
2012-01-03 |
부경대학교 산학협력단 |
초임계이산화탄소에 적용되는 부분 불소화된 계면활성제의 제조방법 및 이의 용도
|
TW201217045A
(en)
*
|
2010-09-27 |
2012-05-01 |
Sumitomo Electric Industries |
Method for cleaning filter membrane, and membrane filter
|
MX358434B
(es)
|
2011-01-31 |
2018-08-06 |
Halliburton Energy Services Inc |
Incremento de la complejidad de la fractura en formacion subterranea permeable ultra baja usando un material particulado degradable.
|
WO2012146304A1
(en)
|
2011-04-29 |
2012-11-01 |
Ecolab Usa Inc. |
Method for applying a laundry finishing agent to laundry articles
|
WO2012159679A1
(en)
|
2011-05-26 |
2012-11-29 |
Ecolab Usa Inc. |
Method for applying laundry finishing agent to laundry articles using solid carbon dioxide as carrier
|
US8955588B2
(en)
|
2012-09-10 |
2015-02-17 |
Halliburton Energy Services, Inc. |
Electron-poor orthoester for generating acid in a well fluid
|
US20140308162A1
(en)
|
2013-04-15 |
2014-10-16 |
Ecolab Usa Inc. |
Peroxycarboxylic acid based sanitizing rinse additives for use in ware washing
|
US9752105B2
(en)
|
2012-09-13 |
2017-09-05 |
Ecolab Usa Inc. |
Two step method of cleaning, sanitizing, and rinsing a surface
|
CN103130969B
(zh)
*
|
2013-02-06 |
2015-04-15 |
上海维凯光电新材料有限公司 |
含氟聚合物微球
|
US9822328B2
(en)
*
|
2013-09-12 |
2017-11-21 |
Electric Power Research Institute, Inc. |
Cleaner for grease rejuvenation and method of maintaining bearings, bushings, linkage pins, and chains
|
KR102161725B1
(ko)
*
|
2015-02-20 |
2020-10-05 |
나이키 이노베이트 씨.브이. |
초임계 유체 재료 정련
|
CN106606993B
(zh)
*
|
2015-10-26 |
2018-12-21 |
中国石油化工集团公司 |
一种二氧化碳可溶两性离子表面活性剂及其制备方法
|
WO2018219441A1
(en)
*
|
2017-05-31 |
2018-12-06 |
Lafer S.P.A. |
Device to remove fluids, and washing apparatus comprising said device
|
WO2018237027A1
(en)
|
2017-06-22 |
2018-12-27 |
Zimmerman Keith |
TISSUE PROCESSING COMPOSITIONS AND ASSOCIATED METHODS
|
CN111349194B
(zh)
*
|
2020-04-29 |
2021-08-31 |
中海石油(中国)有限公司 |
一种含氟聚乙烯吡咯烷酮天然气水合物抑制剂及其制备方法
|