DE69632722D1 - Gasbondierungsanlage für ein versteifungssubstrat einer keramischen leiterplastte - Google Patents

Gasbondierungsanlage für ein versteifungssubstrat einer keramischen leiterplastte

Info

Publication number
DE69632722D1
DE69632722D1 DE69632722T DE69632722T DE69632722D1 DE 69632722 D1 DE69632722 D1 DE 69632722D1 DE 69632722 T DE69632722 T DE 69632722T DE 69632722 T DE69632722 T DE 69632722T DE 69632722 D1 DE69632722 D1 DE 69632722D1
Authority
DE
Germany
Prior art keywords
ceramic circuit
bonding system
reinforcing substrate
circuit plastic
gas bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69632722T
Other languages
English (en)
Other versions
DE69632722T2 (de
Inventor
Narayan Prabhu
Jay Thaler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sarnoff Corp
Original Assignee
Sarnoff Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sarnoff Corp filed Critical Sarnoff Corp
Publication of DE69632722D1 publication Critical patent/DE69632722D1/de
Application granted granted Critical
Publication of DE69632722T2 publication Critical patent/DE69632722T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/481—Insulating layers on insulating parts, with or without metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/12—Mountings, e.g. non-detachable insulating substrates
    • H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/142—Metallic substrates having insulating layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
    • H05K1/053—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an inorganic insulating layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097—Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701—Low temperature co-fired ceramic [LTCC]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/153—Connection portion
    • H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49128—Assembling formed circuit to base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49163—Manufacturing circuit on or in base with sintering of base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
DE69632722T 1995-01-27 1996-01-29 Gasbondierungsanlage für ein Versteifungssubstrat einer keramischen Leiterplatte Expired - Lifetime DE69632722T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US379263 1995-01-27
US08/379,263 US5581876A (en) 1995-01-27 1995-01-27 Method of adhering green tape to a metal support substrate with a bonding glass
PCT/US1996/000315 WO1996023321A1 (en) 1995-01-27 1996-01-29 Glass bonding layer for a ceramic circuit board support substrate

Publications (2)

Publication Number Publication Date
DE69632722D1 true DE69632722D1 (de) 2004-07-22
DE69632722T2 DE69632722T2 (de) 2005-07-14

Family

ID=23496519

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69632722T Expired - Lifetime DE69632722T2 (de) 1995-01-27 1996-01-29 Gasbondierungsanlage für ein Versteifungssubstrat einer keramischen Leiterplatte

Country Status (7)

Country Link
US (1) US5581876A (de)
EP (1) EP0806056B1 (de)
JP (1) JP3226280B2 (de)
KR (1) KR100307078B1 (de)
CA (1) CA2211533C (de)
DE (1) DE69632722T2 (de)
WO (1) WO1996023321A1 (de)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725808A (en) * 1996-05-23 1998-03-10 David Sarnoff Research Center, Inc. Multilayer co-fired ceramic compositions and ceramic-on-metal circuit board
AU1827097A (en) * 1996-01-11 1997-08-01 Containerless Research, Inc. Fiber drawing from undercooled molten materials
US5858145A (en) * 1996-10-15 1999-01-12 Sarnoff Corporation Method to control cavity dimensions of fired multilayer circuit boards on a support
TW353762B (en) * 1996-10-21 1999-03-01 Dainippon Printing Co Ltd Transfer sheet, and pattern-forming method
EP1016106A4 (de) * 1997-03-06 2007-12-12 Lamina Ceramics Inc Keramische mehrschichtige gedruckte schaltungsplatten mit eingebetteten passiven bauteilen
US6399230B1 (en) * 1997-03-06 2002-06-04 Sarnoff Corporation Multilayer ceramic circuit boards with embedded resistors
US5953203A (en) * 1997-03-06 1999-09-14 Sarnoff Corporation Multilayer ceramic circuit boards including embedded capacitors
US6055151A (en) * 1997-03-06 2000-04-25 Sarnoff Corp Multilayer ceramic circuit boards including embedded components
US5866240A (en) * 1997-03-06 1999-02-02 Sarnoff Corporation Thick ceramic on metal multilayer circuit board
US6120906A (en) * 1997-03-31 2000-09-19 Kyocera Corporation Insulated board for a wiring board
EP0924755A3 (de) * 1997-12-19 1999-12-29 CTS Corporation Leiterplattenherstellung
US6471805B1 (en) * 1998-11-05 2002-10-29 Sarnoff Corporation Method of forming metal contact pads on a metal support substrate
US6352763B1 (en) 1998-12-23 2002-03-05 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6247986B1 (en) * 1998-12-23 2001-06-19 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
JP3656484B2 (ja) * 1999-03-03 2005-06-08 株式会社村田製作所 セラミック多層基板の製造方法
JP3630021B2 (ja) * 1999-07-23 2005-03-16 株式会社村田製作所 結晶化ガラス組成物及びその焼結体、並びに、それを用いた回路基板
JP3687443B2 (ja) * 1999-10-12 2005-08-24 株式会社村田製作所 低温焼成セラミック組成物及びセラミック多層基板
US6712486B1 (en) * 1999-10-19 2004-03-30 Permlight Products, Inc. Mounting arrangement for light emitting diodes
US6455930B1 (en) 1999-12-13 2002-09-24 Lamina Ceramics, Inc. Integrated heat sinking packages using low temperature co-fired ceramic metal circuit board technology
US7183640B2 (en) 1999-12-13 2007-02-27 Lamina Ceramics, Inc. Method and structures for enhanced temperature control of high power components on multilayer LTCC and LTCC-M boards
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US6518502B2 (en) * 2001-05-10 2003-02-11 Lamina Ceramics, In Ceramic multilayer circuit boards mounted on a patterned metal support substrate
US6578986B2 (en) * 2001-06-29 2003-06-17 Permlight Products, Inc. Modular mounting arrangement and method for light emitting diodes
US6553662B2 (en) 2001-07-03 2003-04-29 Max Levy Autograph, Inc. Method of making a high-density electronic circuit
US7176492B2 (en) * 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
US7033534B2 (en) * 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
JP4030285B2 (ja) * 2001-10-10 2008-01-09 株式会社トクヤマ 基板及びその製造方法
US6699571B1 (en) * 2002-03-27 2004-03-02 Morgan Advanced Ceramics, Inc. Devices and methods for mounting components of electronic circuitry
US7300182B2 (en) * 2003-05-05 2007-11-27 Lamina Lighting, Inc. LED light sources for image projection systems
US7633093B2 (en) * 2003-05-05 2009-12-15 Lighting Science Group Corporation Method of making optical light engines with elevated LEDs and resulting product
US7528421B2 (en) * 2003-05-05 2009-05-05 Lamina Lighting, Inc. Surface mountable light emitting diode assemblies packaged for high temperature operation
US7777235B2 (en) * 2003-05-05 2010-08-17 Lighting Science Group Corporation Light emitting diodes with improved light collimation
US7095053B2 (en) * 2003-05-05 2006-08-22 Lamina Ceramics, Inc. Light emitting diodes packaged for high temperature operation
US7138347B2 (en) * 2003-08-14 2006-11-21 E. I. Du Pont De Nemours And Company Thick-film conductor paste for automotive glass
US20050040908A1 (en) * 2003-08-21 2005-02-24 Lamina Ceramics Inc. Low temperature co-fired ceramic-metal circulators and isolators
US7964883B2 (en) * 2004-02-26 2011-06-21 Lighting Science Group Corporation Light emitting diode package assembly that emulates the light pattern produced by an incandescent filament bulb
US20050225222A1 (en) * 2004-04-09 2005-10-13 Joseph Mazzochette Light emitting diode arrays with improved light extraction
US8188503B2 (en) 2004-05-10 2012-05-29 Permlight Products, Inc. Cuttable illuminated panel
US7309540B2 (en) 2004-05-21 2007-12-18 Sarnoff Corporation Electrical power source designs and components
US7387838B2 (en) * 2004-05-27 2008-06-17 Delaware Capital Formation, Inc. Low loss glass-ceramic materials, method of making same and electronic packages including same
US7186461B2 (en) * 2004-05-27 2007-03-06 Delaware Capital Formation, Inc. Glass-ceramic materials and electronic packages including same
US7252408B2 (en) * 2004-07-19 2007-08-07 Lamina Ceramics, Inc. LED array package with internal feedback and control
EP1858078A4 (de) * 2005-01-20 2009-03-04 Almt Corp Element für ein halbleiterbauteil und herstellungsverfahren dafür
JP4905874B2 (ja) * 2005-04-27 2012-03-28 京セラ株式会社 無線通信装置および無線通信装置における制御方法
US20060243700A1 (en) * 2005-04-28 2006-11-02 International Business Machines Corporation Composite electroformed screening mask and method of making the same
WO2007002476A2 (en) * 2005-06-28 2007-01-04 Lamina Ceramics, Inc. Backlight module display with optical coupler and lightguide
US7719021B2 (en) * 2005-06-28 2010-05-18 Lighting Science Group Corporation Light efficient LED assembly including a shaped reflective cavity and method for making same
KR20090087106A (ko) * 2006-11-30 2009-08-14 오스람 게젤샤프트 미트 베쉬랭크터 하프퉁 전자 컴포넌트 모듈 및 상기 전자 컴포넌트 모듈 형성 방법
WO2011122406A1 (ja) * 2010-03-30 2011-10-06 株式会社村田製作所 金属ベース基板およびその製造方法
US9240526B2 (en) * 2010-04-23 2016-01-19 Cree, Inc. Solid state light emitting diode packages with leadframes and ceramic material
JP5693940B2 (ja) * 2010-12-13 2015-04-01 株式会社トクヤマ セラミックスビア基板、メタライズドセラミックスビア基板、これらの製造方法
JP2015129684A (ja) * 2014-01-08 2015-07-16 株式会社アルバック 金属セラミック接合体、隔膜真空計、金属とセラミックとの接合方法、および、隔膜真空計の製造方法
DE102016125348B4 (de) * 2016-12-22 2020-06-25 Rogers Germany Gmbh Trägersubstrat für elektrische Bauteile und Verfahren zur Herstellung eines Trägersubstrats
US11903472B2 (en) * 2019-02-08 2024-02-20 Lexmark International, Inc. Hair iron having a ceramic heater
US11692754B2 (en) 2020-04-21 2023-07-04 Lexmark International, Inc. Ice maker heater assemblies
US11828490B2 (en) 2020-04-24 2023-11-28 Lexmark International, Inc. Ceramic heater for heating water in an appliance

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4712161A (en) * 1985-03-25 1987-12-08 Olin Corporation Hybrid and multi-layer circuitry
US4739443A (en) * 1985-12-30 1988-04-19 Olin Corporation Thermally conductive module
US4997698A (en) * 1987-05-04 1991-03-05 Allied-Signal, Inc. Ceramic coated metal substrates for electronic applications
US4808460A (en) * 1987-06-02 1989-02-28 Corning Glass Works Laminated structures containing an inorganic corrugated or honeycomb member
US4924590A (en) * 1988-01-08 1990-05-15 Siemens Aktiengesellschaft Method for making metal core printed circuit board
US5043222A (en) * 1988-03-17 1991-08-27 Olin Corporation Metal sealing glass composite with matched coefficients of thermal expansion
JPH0227832B2 (ja) * 1989-03-10 1990-06-20 Okuno Chem Ind Co Seramitsukusukiban
US5013360A (en) * 1989-09-15 1991-05-07 Vlsi Packaging Materials, Inc. Sealing glass compositions
US5256469A (en) * 1991-12-18 1993-10-26 General Electric Company Multi-layered, co-fired, ceramic-on-metal circuit board for microelectronic packaging
US5277724A (en) * 1991-12-18 1994-01-11 General Electric Co. Method of minimizing lateral shrinkage in a co-fired, ceramic-on-metal circuit board

Also Published As

Publication number Publication date
CA2211533A1 (en) 1996-08-01
KR100307078B1 (ko) 2001-12-17
EP0806056A1 (de) 1997-11-12
US5581876A (en) 1996-12-10
JPH11504159A (ja) 1999-04-06
DE69632722T2 (de) 2005-07-14
KR19980701656A (ko) 1998-06-25
EP0806056B1 (de) 2004-06-16
WO1996023321A1 (en) 1996-08-01
CA2211533C (en) 2006-10-17
JP3226280B2 (ja) 2001-11-05

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