DE69634144D1 - Verfahren und Vorrichtung zum Polieren von Werkstücken - Google Patents

Verfahren und Vorrichtung zum Polieren von Werkstücken

Info

Publication number
DE69634144D1
DE69634144D1 DE69634144T DE69634144T DE69634144D1 DE 69634144 D1 DE69634144 D1 DE 69634144D1 DE 69634144 T DE69634144 T DE 69634144T DE 69634144 T DE69634144 T DE 69634144T DE 69634144 D1 DE69634144 D1 DE 69634144D1
Authority
DE
Germany
Prior art keywords
polishing workpieces
workpieces
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69634144T
Other languages
English (en)
Other versions
DE69634144T2 (de
Inventor
Norio Kimura
Hozumi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69634144D1 publication Critical patent/DE69634144D1/de
Application granted granted Critical
Publication of DE69634144T2 publication Critical patent/DE69634144T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings
DE69634144T 1995-10-09 1996-10-09 Verfahren und Vorrichtung zum Polieren von Werkstücken Expired - Lifetime DE69634144T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP28797695 1995-10-09
JP28797695 1995-10-09
JP5095696A JP3724869B2 (ja) 1995-10-09 1996-02-14 ポリッシング装置および方法
JP5095696 1996-02-14

Publications (2)

Publication Number Publication Date
DE69634144D1 true DE69634144D1 (de) 2005-02-03
DE69634144T2 DE69634144T2 (de) 2005-12-29

Family

ID=26391458

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69620333T Expired - Lifetime DE69620333T2 (de) 1995-10-09 1996-10-09 Verfahren und Vorrichtung zum Polieren von Werkstücken
DE69634144T Expired - Lifetime DE69634144T2 (de) 1995-10-09 1996-10-09 Verfahren und Vorrichtung zum Polieren von Werkstücken

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69620333T Expired - Lifetime DE69620333T2 (de) 1995-10-09 1996-10-09 Verfahren und Vorrichtung zum Polieren von Werkstücken

Country Status (5)

Country Link
US (2) US6033520A (de)
EP (2) EP0768148B1 (de)
JP (1) JP3724869B2 (de)
KR (1) KR100435302B1 (de)
DE (2) DE69620333T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724869B2 (ja) * 1995-10-09 2005-12-07 株式会社荏原製作所 ポリッシング装置および方法
DE69717510T2 (de) * 1996-01-24 2003-10-02 Lam Res Corp Halbleiterscheiben-Polierkopf
JPH10230455A (ja) * 1997-02-17 1998-09-02 Nec Corp 研磨装置
US5857899A (en) * 1997-04-04 1999-01-12 Ontrak Systems, Inc. Wafer polishing head with pad dressing element
US6425812B1 (en) 1997-04-08 2002-07-30 Lam Research Corporation Polishing head for chemical mechanical polishing using linear planarization technology
US6077385A (en) * 1997-04-08 2000-06-20 Ebara Corporation Polishing apparatus
US6244946B1 (en) 1997-04-08 2001-06-12 Lam Research Corporation Polishing head with removable subcarrier
JP3959173B2 (ja) * 1998-03-27 2007-08-15 株式会社東芝 研磨装置及び研磨加工方法
EP0992322A4 (de) * 1998-04-06 2006-09-27 Ebara Corp Schleifvorrichtung
JP2000060091A (ja) * 1998-08-06 2000-02-25 Ebara Corp 回転電機
US6666756B1 (en) 2000-03-31 2003-12-23 Lam Research Corporation Wafer carrier head assembly
JP2001298006A (ja) 2000-04-17 2001-10-26 Ebara Corp 研磨装置
JP2001338901A (ja) * 2000-05-26 2001-12-07 Hitachi Ltd 平坦化加工方法及び、装置並びに，半導体装置の製造方法
EP1177859B1 (de) * 2000-07-31 2009-04-15 Ebara Corporation Substrathalter und Poliervorrichtung
JP2002187060A (ja) 2000-10-11 2002-07-02 Ebara Corp 基板保持装置、ポリッシング装置、及び研磨方法
JP2005034959A (ja) * 2003-07-16 2005-02-10 Ebara Corp 研磨装置及びリテーナリング
US7186651B2 (en) * 2003-10-30 2007-03-06 Texas Instruments Incorporated Chemical mechanical polishing method and apparatus
US7004827B1 (en) 2004-02-12 2006-02-28 Komag, Inc. Method and apparatus for polishing a workpiece
US7338569B2 (en) * 2004-09-29 2008-03-04 Agere Systems Inc. Method and system of using offset gage for CMP polishing pad alignment and adjustment
JP4757580B2 (ja) 2005-09-16 2011-08-24 株式会社荏原製作所 研磨方法及び研磨装置、並びに研磨装置制御用プログラム
US20140273756A1 (en) * 2013-03-14 2014-09-18 Chih Hung Chen Substrate precession mechanism for cmp polishing head
JP6888476B2 (ja) 2016-08-23 2021-06-16 信越化学工業株式会社 基板の製造方法
JP7074606B2 (ja) * 2018-08-02 2022-05-24 株式会社荏原製作所 基板を保持するためのトップリングおよび基板処理装置
CN115091359B (zh) * 2022-05-26 2023-09-05 浙江晶盛机电股份有限公司 抛光载体

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911423B2 (ja) * 1974-04-10 1984-03-15 株式会社日立製作所 ラツピング装置
JPS55157473A (en) * 1979-05-22 1980-12-08 Nippon Telegr & Teleph Corp <Ntt> Polishing method
JPS5727659A (en) * 1980-07-18 1982-02-15 Supiide Fuamu Kk Lapping machine
JPS62213960A (ja) * 1986-03-14 1987-09-19 Hitachi Ltd ラツピング治具
JPS6410642A (en) * 1987-07-02 1989-01-13 Sony Corp Bonding method for semiconductor substrate
EP0383910A4 (en) * 1988-02-17 1991-04-17 Gruzinsky Politekhnichesky Institut Imeni V.I. Lenina Method and cassette for abrasive machining of the surface of parts
US4954142A (en) * 1989-03-07 1990-09-04 International Business Machines Corporation Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
US5205082A (en) * 1991-12-20 1993-04-27 Cybeq Systems, Inc. Wafer polisher head having floating retainer ring
JP3370112B2 (ja) * 1992-10-12 2003-01-27 不二越機械工業株式会社 ウエハーの研磨装置
US5635083A (en) * 1993-08-06 1997-06-03 Intel Corporation Method and apparatus for chemical-mechanical polishing using pneumatic pressure applied to the backside of a substrate
US5449316A (en) * 1994-01-05 1995-09-12 Strasbaugh; Alan Wafer carrier for film planarization
US5651724A (en) * 1994-09-08 1997-07-29 Ebara Corporation Method and apparatus for polishing workpiece
JP3158934B2 (ja) * 1995-02-28 2001-04-23 三菱マテリアル株式会社 ウェーハ研磨装置
US5665656A (en) * 1995-05-17 1997-09-09 National Semiconductor Corporation Method and apparatus for polishing a semiconductor substrate wafer
US6024630A (en) * 1995-06-09 2000-02-15 Applied Materials, Inc. Fluid-pressure regulated wafer polishing head
US5795215A (en) * 1995-06-09 1998-08-18 Applied Materials, Inc. Method and apparatus for using a retaining ring to control the edge effect
JP3724869B2 (ja) * 1995-10-09 2005-12-07 株式会社荏原製作所 ポリッシング装置および方法
JP3072962B2 (ja) * 1995-11-30 2000-08-07 ロデール・ニッタ株式会社 研磨のための被加工物の保持具及びその製法
KR100456803B1 (ko) * 1996-02-05 2005-05-09 가부시키 가이샤 에바라 세이사꾸쇼 폴리싱장치
KR100485002B1 (ko) * 1996-02-16 2005-08-29 가부시키가이샤 에바라 세이사꾸쇼 작업물폴리싱장치및방법

Also Published As

Publication number Publication date
EP0768148B1 (de) 2002-04-03
KR100435302B1 (ko) 2004-10-22
EP0768148A1 (de) 1997-04-16
JPH09168964A (ja) 1997-06-30
DE69620333D1 (de) 2002-05-08
DE69634144T2 (de) 2005-12-29
EP1170090B1 (de) 2004-12-29
EP1170090A1 (de) 2002-01-09
DE69620333T2 (de) 2002-11-14
US6432258B1 (en) 2002-08-13
JP3724869B2 (ja) 2005-12-07
US6033520A (en) 2000-03-07
KR970063545A (ko) 1997-09-12

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Legal Events

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8364 No opposition during term of opposition