DE69636162D1 - Struktur mit biachsialer textur und verfahren zu deren herstellung - Google Patents

Struktur mit biachsialer textur und verfahren zu deren herstellung

Info

Publication number
DE69636162D1
DE69636162D1 DE69636162T DE69636162T DE69636162D1 DE 69636162 D1 DE69636162 D1 DE 69636162D1 DE 69636162 T DE69636162 T DE 69636162T DE 69636162 T DE69636162 T DE 69636162T DE 69636162 D1 DE69636162 D1 DE 69636162D1
Authority
DE
Germany
Prior art keywords
alloy
biaxially textured
biachsial
texture
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69636162T
Other languages
English (en)
Other versions
DE69636162T2 (de
Inventor
Amit Goyal
D Budai
M Kroeger
P Norton
D Specht
K Christen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UT Battelle LLC
Original Assignee
UT Battelle LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UT Battelle LLC filed Critical UT Battelle LLC
Publication of DE69636162D1 publication Critical patent/DE69636162D1/de
Application granted granted Critical
Publication of DE69636162T2 publication Critical patent/DE69636162T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0801Processes peculiar to the manufacture or treatment of filaments or composite wires
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/12Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/028Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • C30B29/225Complex oxides based on rare earth copper oxides, e.g. high T-superconductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming superconductor layers
    • H10N60/0521Processes for depositing or forming superconductor layers by pulsed laser deposition, e.g. laser sputtering; laser ablation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming superconductor layers
    • H10N60/0576Processes for depositing or forming superconductor layers characterised by the substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming superconductor layers
    • H10N60/0576Processes for depositing or forming superconductor layers characterised by the substrate
    • H10N60/0632Intermediate layers, e.g. for growth control
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D2201/00Treatment for obtaining particular effects
    • C21D2201/04Single or very large crystals
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D2201/00Treatment for obtaining particular effects
    • C21D2201/05Grain orientation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/922Static electricity metal bleed-off metallic stock
    • Y10S428/9265Special properties
    • Y10S428/93Electric superconducting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/70High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701Coated or thin film device, i.e. active or passive
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49014Superconductor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12611Oxide-containing component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12611Oxide-containing component
    • Y10T428/12618Plural oxides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
DE69636162T 1995-04-10 1996-04-10 Struktur mit biachsialer textur und verfahren zu deren herstellung Expired - Lifetime DE69636162T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/419,583 US5741377A (en) 1995-04-10 1995-04-10 Structures having enhanced biaxial texture and method of fabricating same
US419583 1995-04-10
PCT/US1996/004934 WO1996032201A1 (en) 1995-04-10 1996-04-10 Structures having enhanced biaxial texture and method of fabricating same

Publications (2)

Publication Number Publication Date
DE69636162D1 true DE69636162D1 (de) 2006-06-29
DE69636162T2 DE69636162T2 (de) 2007-03-15

Family

ID=23662879

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69636162T Expired - Lifetime DE69636162T2 (de) 1995-04-10 1996-04-10 Struktur mit biachsialer textur und verfahren zu deren herstellung

Country Status (10)

Country Link
US (5) US5741377A (de)
EP (1) EP0830218B1 (de)
JP (1) JP3601830B2 (de)
KR (1) KR100418279B1 (de)
AT (1) ATE327049T1 (de)
AU (1) AU713892B2 (de)
CA (1) CA2217822C (de)
DE (1) DE69636162T2 (de)
ES (1) ES2268703T3 (de)
WO (1) WO1996032201A1 (de)

Families Citing this family (200)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6316391B1 (en) 1994-09-20 2001-11-13 Hitachi, Ltd. Oxide superconducting wire and method of manufacturing the same
US5741377A (en) * 1995-04-10 1998-04-21 Martin Marietta Energy Systems, Inc. Structures having enhanced biaxial texture and method of fabricating same
US6077344A (en) * 1997-09-02 2000-06-20 Lockheed Martin Energy Research Corporation Sol-gel deposition of buffer layers on biaxially textured metal substances
US6451450B1 (en) 1995-04-10 2002-09-17 Ut-Battelle, Llc Method of depositing a protective layer over a biaxially textured alloy substrate and composition therefrom
US6716795B2 (en) 1999-09-27 2004-04-06 Ut-Battelle, Llc Buffer architecture for biaxially textured structures and method of fabricating same
JP3587956B2 (ja) * 1997-06-10 2004-11-10 古河電気工業株式会社 酸化物超電導線材およびその製造方法
JP4223076B2 (ja) 1997-06-18 2009-02-12 マサチューセッツ・インスティテュート・オブ・テクノロジー 金属オキシフッ化物の超伝導性酸化物への制御された変換
US6270908B1 (en) 1997-09-02 2001-08-07 Ut-Battelle, Llc Rare earth zirconium oxide buffer layers on metal substrates
US6440211B1 (en) * 1997-09-02 2002-08-27 Ut-Battelle, Llc Method of depositing buffer layers on biaxially textured metal substrates
US6256521B1 (en) * 1997-09-16 2001-07-03 Ut-Battelle, Llc Preferentially oriented, High temperature superconductors by seeding and a method for their preparation
DE19740964A1 (de) * 1997-09-17 1999-03-18 Access Ev Verfahren zum Herstellen eines Substrates als Träger für eine, insbesondere supraleitende, Funktionsschicht sowie einer Struktur mit einem Supraleiter
US5964966A (en) * 1997-09-19 1999-10-12 Lockheed Martin Energy Research Corporation Method of forming biaxially textured alloy substrates and devices thereon
US6022832A (en) 1997-09-23 2000-02-08 American Superconductor Corporation Low vacuum vapor process for producing superconductor articles with epitaxial layers
US6027564A (en) * 1997-09-23 2000-02-22 American Superconductor Corporation Low vacuum vapor process for producing epitaxial layers
US6458223B1 (en) 1997-10-01 2002-10-01 American Superconductor Corporation Alloy materials
AU740508B2 (en) * 1997-10-01 2001-11-08 American Superconductor Corporation Substrates with improved oxidation resistance
US6428635B1 (en) * 1997-10-01 2002-08-06 American Superconductor Corporation Substrates for superconductors
GB2336849B (en) 1998-04-27 2003-02-26 Telcon Ltd Substrate materials
US6150034A (en) * 1998-06-12 2000-11-21 Ut-Battelle, Llc Buffer layers on rolled nickel or copper as superconductor substrates
US6159610A (en) * 1998-06-12 2000-12-12 Ut-Battelle, Llc Buffer layers on metal surfaces having biaxial texture as superconductor substrates
US6261704B1 (en) 1998-06-12 2001-07-17 Ut-Battelle, Llc MgO buffer layers on rolled nickel or copper as superconductor substrates
IT1302855B1 (it) * 1998-06-15 2000-10-10 Enea Ente Nuove Tec Substrato metallico non magnetico per superconduttori ad altatemperatura e relativo procedimento di produzione.
US6180570B1 (en) * 1998-07-09 2001-01-30 Ut-Battelle, Llc Biaxially textured articles formed by plastic deformation
US6114287A (en) * 1998-09-30 2000-09-05 Ut-Battelle, Llc Method of deforming a biaxially textured buffer layer on a textured metallic substrate and articles therefrom
US6296701B1 (en) * 1998-09-30 2001-10-02 Ut-Battelle, Llc Method of depositing an electrically conductive oxide film on a textured metallic substrate and articles formed therefrom
KR100276003B1 (ko) * 1998-09-30 2000-12-15 윤덕용 띠형 기판 상의 박막 형성장치 및 박막 형성방법
DE19859452C1 (de) * 1998-12-22 2000-02-10 Siemens Ag Verfahren zur Herstellung eines bandförmigen Hoch-T¶c¶-Supraleiters sowie Vorrichtung zur Durchführung des Verfahrens
AU774828B2 (en) * 1999-01-12 2004-07-08 Ngimat Co. Epitaxial thin films
US7033637B1 (en) * 1999-01-12 2006-04-25 Microcoating Technologies, Inc. Epitaxial thin films
DE29923162U1 (de) 1999-02-01 2000-04-27 Siemens Ag Langgestreckter Supraleiteraufbau mit Hoch-T¶c¶·-Supraleitermaterial und metallischem Träger
JP3521182B2 (ja) * 1999-02-26 2004-04-19 株式会社東芝 酸化物超電導線材及び超電導装置
US6475311B1 (en) * 1999-03-31 2002-11-05 American Superconductor Corporation Alloy materials
WO2000060132A1 (de) * 1999-04-03 2000-10-12 Institut für Festkörper- und Werkstofforschung Dresden e.V. Metallischer werkstoff auf nickelbasis und verfahren zu dessen herstellung
CN1076126C (zh) * 1999-05-21 2001-12-12 北京工业大学 多晶织构银基带的制造方法
US6312819B1 (en) * 1999-05-26 2001-11-06 The Regents Of The University Of California Oriented conductive oxide electrodes on SiO2/Si and glass
US6436317B1 (en) 1999-05-28 2002-08-20 American Superconductor Corporation Oxide bronze compositions and textured articles manufactured in accordance therewith
US6562761B1 (en) 2000-02-09 2003-05-13 American Superconductor Corporation Coated conductor thick film precursor
JP2003526905A (ja) 1999-07-23 2003-09-09 アメリカン スーパーコンダクター コーポレイション 多層体及びその製造方法
US6828507B1 (en) 1999-07-23 2004-12-07 American Superconductor Corporation Enhanced high temperature coated superconductors joined at a cap layer
US6765151B2 (en) * 1999-07-23 2004-07-20 American Superconductor Corporation Enhanced high temperature coated superconductors
WO2001015245A1 (en) * 1999-08-24 2001-03-01 Electric Power Research Institute, Inc. Surface control alloy substrates and methods of manufacture therefor
US6921497B2 (en) * 1999-10-13 2005-07-26 Electromagnetics Corporation Composition of matter tailoring: system I
US6974501B1 (en) 1999-11-18 2005-12-13 American Superconductor Corporation Multi-layer articles and methods of making same
DE60045370D1 (de) * 1999-11-29 2011-01-27 Fujikura Ltd Polykristalliner dünner film und verfahren zu dessen herstellung, und supraleitendes oxid und verfahren zu dessen herstellung
KR100352976B1 (ko) * 1999-12-24 2002-09-18 한국기계연구원 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법
EP1122799A1 (de) * 2000-02-01 2001-08-08 Zentrum für Funktionswerkstoffe, Gemeinnützige Gesellschaft mbH Substrat aus rostfreiem Stahl für Supraleiterschichten
JP3489525B2 (ja) * 2000-02-22 2004-01-19 住友電気工業株式会社 超電導線材およびその製造方法
US6531945B1 (en) * 2000-03-10 2003-03-11 Micron Technology, Inc. Integrated circuit inductor with a magnetic core
US7381492B2 (en) * 2000-03-24 2008-06-03 University Of Houston Thin film solid oxide fuel cell and method for forming
GB0010494D0 (en) * 2000-04-28 2000-06-14 Isis Innovation Textured metal article
US6455166B1 (en) 2000-05-11 2002-09-24 The University Of Chicago Metallic substrates for high temperature superconductors
US6447714B1 (en) * 2000-05-15 2002-09-10 Ut-Battelle, Llc Method for forming biaxially textured articles by powder metallurgy
US6331199B1 (en) 2000-05-15 2001-12-18 Ut-Battelle, Llc Biaxially textured articles formed by powder metallurgy
US6624122B1 (en) * 2000-06-21 2003-09-23 The Regents Of The University Of California High critical current superconducting tapes
US6784139B1 (en) 2000-07-10 2004-08-31 Applied Thin Films, Inc. Conductive and robust nitride buffer layers on biaxially textured substrates
US6673387B1 (en) 2000-07-14 2004-01-06 American Superconductor Corporation Control of oxide layer reaction rates
US6361598B1 (en) 2000-07-20 2002-03-26 The University Of Chicago Method for preparing high temperature superconductor
US6410487B1 (en) 2000-07-20 2002-06-25 The University Of Chicago Large area bulk superconductors
KR100422333B1 (ko) * 2000-07-31 2004-03-10 이노스텍 (주) 단결정 거대 입자로 구성된 금속 박막 제조 방법 및 그 금속 박막
US6517944B1 (en) 2000-08-03 2003-02-11 Teracomm Research Inc. Multi-layer passivation barrier for a superconducting element
US6985761B2 (en) * 2000-08-14 2006-01-10 Pirelli S.P.A. Superconducting cable
JP2002075091A (ja) * 2000-08-29 2002-03-15 Sumitomo Electric Ind Ltd 酸化物超電導線材の製造方法
US6730851B2 (en) 2000-10-06 2004-05-04 Pirelli Cavi E Sistemi S.P.A. Superconducting cable and current transmission and/or distribution network including the superconducting cable
EP1195819A1 (de) * 2000-10-09 2002-04-10 Nexans Pufferschicht-Struktur basierend auf dotiertem Ceroxyd für optimale Gitteranpassung einer YBCO-Schicht in einem Leiter und zugehöriges Herstellungsverfahren
US6573209B1 (en) * 2000-10-13 2003-06-03 Applied Thin Films, Inc. Zirconium nitride and yttrium nitride solid solution composition
US6645639B1 (en) * 2000-10-13 2003-11-11 Applied Thin Films, Inc. Epitaxial oxide films via nitride conversion
US20020056401A1 (en) * 2000-10-23 2002-05-16 Rupich Martin W. Precursor solutions and methods of using same
US7041204B1 (en) * 2000-10-27 2006-05-09 Honeywell International Inc. Physical vapor deposition components and methods of formation
JP4713012B2 (ja) * 2000-10-31 2011-06-29 財団法人国際超電導産業技術研究センター テープ状酸化物超電導体
DE10061399C1 (de) * 2000-12-07 2002-06-27 Dresden Ev Inst Festkoerper Metallband, bestehend aus einem Schichtverbund, und Verfahren zu dessen Herstellung
US7009104B2 (en) * 2000-12-27 2006-03-07 Pirelli Cavi E Sistemi S.P.A. Superconducting cable
ES2170727B1 (es) * 2001-01-25 2003-06-16 Farga Lacambra S A Substratos para superconductores y procedimiento para su fabricacion.
GB2374557A (en) * 2001-04-19 2002-10-23 Imperial College Producing superconductors by epitaxial growth
US6500568B1 (en) * 2001-06-06 2002-12-31 3M Innovative Properties Company Biaxially textured metal substrate with palladium layer
US6617283B2 (en) * 2001-06-22 2003-09-09 Ut-Battelle, Llc Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom
US6743531B2 (en) * 2001-06-22 2004-06-01 Fujikura Ltd. Oxide superconducting conductor and its production method
US20030130129A1 (en) * 2001-07-13 2003-07-10 Massachusetts Institute Of Technology Vacuum processing for fabrication of superconducting films fabricated by metal-organic processing
US6579360B2 (en) * 2001-07-13 2003-06-17 The University Of Chicago Fabrication of high temperature superconductors
DE10136890B4 (de) * 2001-07-25 2006-04-20 Siemens Ag Verfahren und Vorrichtung zum Erzeugen eines kristallstrukturell texturierten Bandes aus Metall sowie Band
DE10136891B4 (de) * 2001-07-25 2004-07-22 Siemens Ag Verfahren zum Erzeugen eines flächenhaften Basismaterials aus Metall
JP2003055095A (ja) * 2001-08-07 2003-02-26 Sumitomo Electric Ind Ltd 薄膜形成方法
US6610414B2 (en) 2001-08-16 2003-08-26 Ut-Battelle, Llc Biaxially textured articles formed by power metallurgy
GB0120697D0 (en) * 2001-08-24 2001-10-17 Coated Conductors Consultancy Superconducting coil fabrication
DE10140956A1 (de) * 2001-08-27 2003-03-27 Univ Braunschweig Tech Carolo Wilhelmina Verfahren zur Beschichtung von oxidierbaren Materialien mit Oxide aufweisenden Schichten
DE10143680C1 (de) * 2001-08-30 2003-05-08 Leibniz Inst Fuer Festkoerper Verfahren zur Herstellung von Metallbändern mit hochgradiger Würfeltextur
US6794339B2 (en) * 2001-09-12 2004-09-21 Brookhaven Science Associates Synthesis of YBa2CU3O7 using sub-atmospheric processing
DE10148889A1 (de) * 2001-09-21 2003-06-26 Leibniz Inst Fuer Festkoerper Trägermaterial auf Nickelbasis und Verfahren zu dessen Herstellung
US20040132624A1 (en) * 2001-12-10 2004-07-08 Mitsunobu Wakata Metal base material for oxide superconducting thick films and manufacturing method thereof
DE10200445B4 (de) * 2002-01-02 2005-12-08 Leibniz-Institut für Festkörper- und Werkstoffforschung e.V. Metallband für epitaktische Beschichtungen und Verfahren zu dessen Herstellung
US6645313B2 (en) * 2002-02-22 2003-11-11 Ut-Battelle, Llc Powder-in-tube and thick-film methods of fabricating high temperature superconductors having enhanced biaxial texture
US6670308B2 (en) 2002-03-19 2003-12-30 Ut-Battelle, Llc Method of depositing epitaxial layers on a substrate
US6925316B2 (en) * 2002-04-08 2005-08-02 Christopher M. Rey Method of forming superconducting magnets using stacked LTS/HTS coated conductor
US20040129559A1 (en) * 2002-04-12 2004-07-08 Misner Josh W. Diffusion bonded assemblies and fabrication methods
US6946428B2 (en) * 2002-05-10 2005-09-20 Christopher M. Rey Magnesium -boride superconducting wires fabricated using thin high temperature fibers
DE10226392C1 (de) * 2002-06-13 2003-08-28 Siemens Ag Langgestreckter Supraleiteraufbau mit Hoch-Tc-Supraleitermaterial, oxidischen Zwischenschichtsystem und Nickel-Träger sowie Verfahren zur Herstellung dieses Aufbaus
US7087113B2 (en) * 2002-07-03 2006-08-08 Ut-Battelle, Llc Textured substrate tape and devices thereof
US20040016401A1 (en) * 2002-07-26 2004-01-29 Metal Oxide Technologies, Inc. Method and apparatus for forming superconductor material on a tape substrate
US20040023810A1 (en) * 2002-07-26 2004-02-05 Alex Ignatiev Superconductor material on a tape substrate
US20040020430A1 (en) * 2002-07-26 2004-02-05 Metal Oxide Technologies, Inc. Method and apparatus for forming a thin film on a tape substrate
JP3854551B2 (ja) * 2002-08-06 2006-12-06 財団法人国際超電導産業技術研究センター 酸化物超電導線材
US6764770B2 (en) 2002-12-19 2004-07-20 Ut-Battelle, Llc Buffer layers and articles for electronic devices
WO2004059041A1 (en) * 2002-12-20 2004-07-15 Midwest Research Institute Electrodeposition of biaxial textured films
WO2004073024A2 (en) * 2003-02-06 2004-08-26 Brown University Method and apparatus for making continuous films ofa single crystal material
US20040157747A1 (en) * 2003-02-10 2004-08-12 The University Of Houston System Biaxially textured single buffer layer for superconductive articles
WO2004088677A1 (ja) * 2003-03-31 2004-10-14 The Furukawa Electric Co., Ltd. 酸化物超電導線材用金属基板、酸化物超電導線材及びその製造方法
US6849580B2 (en) * 2003-06-09 2005-02-01 University Of Florida Method of producing biaxially textured buffer layers and related articles, devices and systems
US8153281B2 (en) * 2003-06-23 2012-04-10 Superpower, Inc. Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US6740421B1 (en) 2003-07-14 2004-05-25 Ut-Battelle, Llc Rolling process for producing biaxially textured substrates
US20050014653A1 (en) * 2003-07-16 2005-01-20 Superpower, Inc. Methods for forming superconductor articles and XRD methods for characterizing same
US20050016759A1 (en) * 2003-07-21 2005-01-27 Malozemoff Alexis P. High temperature superconducting devices and related methods
US7711088B2 (en) * 2003-07-22 2010-05-04 X-Ray Optical Systems, Inc. Method and system for X-ray diffraction measurements using an aligned source and detector rotating around a sample surface
US7025826B2 (en) * 2003-08-19 2006-04-11 Superpower, Inc. Methods for surface-biaxially-texturing amorphous films
DE10339867B4 (de) * 2003-08-25 2007-12-27 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Verfahren zur Herstellung von metallischen Flachdrähten oder Bändern mit Würfeltextur
US20050048329A1 (en) * 2003-08-26 2005-03-03 The University Of Chicago Layered structure of Cu-containing superconductor and Ag or Ag alloys with Cu
DE10342965A1 (de) * 2003-09-10 2005-06-02 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Halbzeug auf Nickelbasis mit einer Rekristallisationswürfeltextur und Verfahren zu dessen Herstellung
US20050092253A1 (en) * 2003-11-04 2005-05-05 Venkat Selvamanickam Tape-manufacturing system having extended operational capabilites
US7510819B2 (en) * 2003-11-10 2009-03-31 Board Of Regents, University Of Houston Thin film solid oxide fuel cell with lithographically patterned electrolyte and anode layers
JP2005166781A (ja) * 2003-12-01 2005-06-23 Seiko Epson Corp 圧電体デバイス及び液体吐出ヘッド並びにこれらの製造方法、薄膜形成装置。
US7146034B2 (en) * 2003-12-09 2006-12-05 Superpower, Inc. Tape manufacturing system
CN100365839C (zh) * 2003-12-15 2008-01-30 北京有色金属研究总院 多层双轴取向隔离层结构及高温超导涂层导体和制备方法
US7432229B2 (en) * 2004-03-23 2008-10-07 Ut-Battelle, Llc Superconductors on iridium substrates and buffer layers
US6872988B1 (en) 2004-03-23 2005-03-29 Ut-Battelle, Llc Semiconductor films on flexible iridium substrates
US20050223984A1 (en) * 2004-04-08 2005-10-13 Hee-Gyoun Lee Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
US20050223983A1 (en) * 2004-04-08 2005-10-13 Venkat Selvamanickam Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
US7387811B2 (en) * 2004-09-21 2008-06-17 Superpower, Inc. Method for manufacturing high temperature superconducting conductors using chemical vapor deposition (CVD)
US7569521B2 (en) * 2004-12-01 2009-08-04 University Of Florida Research Foundation, Inc. Method of producing biaxially textured substrates and related articles, devices and systems
US7619272B2 (en) * 2004-12-07 2009-11-17 Lsi Corporation Bi-axial texturing of high-K dielectric films to reduce leakage currents
KR100624665B1 (ko) * 2005-01-20 2006-09-19 한국기계연구원 자기이력 손실이 적은 이축 배향성 금속 테이프 및 그제조방법
DE102005013368B3 (de) * 2005-03-16 2006-04-13 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Verfahren zur Herstellung und Verwendung von Halbzeug auf Nickelbasis mit Rekristallisationswürfeltextur
CN100368597C (zh) * 2005-04-22 2008-02-13 中国科学院物理研究所 在无织构的金属基带上制备ybco高温超导薄膜的方法
JP2009503269A (ja) * 2005-08-01 2009-01-29 ミッドウエスト リサーチ インスティチュート 基材上への双軸組織層の電着
US20070044832A1 (en) * 2005-08-25 2007-03-01 Fritzemeier Leslie G Photovoltaic template
KR100691061B1 (ko) * 2005-08-30 2007-03-09 엘에스전선 주식회사 초전도 선재용 기판 및 그 제조방법과 초전도 선재
US7859374B2 (en) * 2005-10-03 2010-12-28 Massachusetts Institute Of Technology Annular magnet system for magnetic resonance spectroscopy
JP2007311194A (ja) * 2006-05-18 2007-11-29 Sumitomo Electric Ind Ltd 超電導薄膜材料および超電導薄膜材料の製造方法
CN100374596C (zh) * 2006-05-19 2008-03-12 北京工业大学 Ni基合金复合基带及其粉末冶金制备方法
US20080146452A1 (en) * 2006-10-26 2008-06-19 Dae Yeong Jeong (113) [121] Textured Ag substrate and Tl-1223 high temperature superconducting coated conductor using the same
ATE418794T1 (de) * 2006-10-27 2009-01-15 Nexans Verfahren zur herstellung eines supraleitfähigen elektrischen leiters
US7879763B2 (en) * 2006-11-10 2011-02-01 Superpower, Inc. Superconducting article and method of making
EP1923926B1 (de) 2006-11-17 2011-01-12 Nexans Verfahren zur Herstellung eines supraleitfähigen elektrischen Leiters
KR100807640B1 (ko) * 2006-12-22 2008-02-28 한국기계연구원 저온 열처리에 의해 이축배향성 완충층을 형성하는전구용액
US8741158B2 (en) 2010-10-08 2014-06-03 Ut-Battelle, Llc Superhydrophobic transparent glass (STG) thin film articles
DE102007024166B4 (de) * 2007-05-24 2011-01-05 Zenergy Power Gmbh Verfahren zum Bearbeiten eines Metallsubstrats und Verwendung dessen für einen Hochtemperatur-Supraleiter
JP2008303082A (ja) * 2007-06-05 2008-12-18 Kagoshima Univ エピタキシャル膜形成用配向基板の中間層及びエピタキシャル膜形成用配向基板
US7879161B2 (en) * 2007-08-08 2011-02-01 Ut-Battelle, Llc Strong, non-magnetic, cube textured alloy substrates
JP5324763B2 (ja) * 2007-08-21 2013-10-23 中部電力株式会社 エピタキシャル膜形成用配向基板及びエピタキシャル膜形成用配向基板の表面改質方法
US8227082B2 (en) * 2007-09-26 2012-07-24 Ut-Battelle, Llc Faceted ceramic fibers, tapes or ribbons and epitaxial devices therefrom
CN102017127A (zh) * 2008-03-06 2011-04-13 阿米特·戈亚尔 在{110}<100>取向的衬底上的基于半导体的大面积的柔性电子器件
US20100015340A1 (en) * 2008-07-17 2010-01-21 Zenergy Power Inc. COMPOSITIONS AND METHODS FOR THE MANUFACTURE OF RARE EARTH METAL-Ba2Cu3O7-delta THIN FILMS
US7919435B2 (en) 2008-09-30 2011-04-05 Ut-Battelle, Llc Superconductor films with improved flux pinning and reduced AC losses
JP5382911B2 (ja) 2008-11-12 2014-01-08 東洋鋼鈑株式会社 酸化物超電導線材用金属積層基板の製造方法及び該基板を用いた酸化物超電導線材
US20110290378A1 (en) 2008-11-12 2011-12-01 Hironao Okayama Polymer laminate substrate for formation of epitaxially grown film, and manufacturing method therefor
JP5448425B2 (ja) * 2008-11-21 2014-03-19 公益財団法人国際超電導産業技術研究センター 超電導膜成膜用基板、超電導線材及びそれらの製造方法
JP5474339B2 (ja) 2008-11-28 2014-04-16 住友電気工業株式会社 超電導線材の前駆体の製造方法、超電導線材の製造方法
US8664163B2 (en) * 2009-01-15 2014-03-04 Ramot At Tel-Aviv University Ltd. High temperature superconductive films and methods of making them
US9349935B2 (en) * 2009-01-15 2016-05-24 Technology Innovation Momentum Fund (Israel) Limited Partnership High temperature superconductive films and methods of making them
WO2010088366A1 (en) * 2009-01-28 2010-08-05 Wakonda Technologies, Inc. Large-grain crystalline thin-film structures and devices and methods for forming the same
WO2010124059A2 (en) * 2009-04-24 2010-10-28 Wakonda Technologies, Inc. Crystalline thin-film photovoltaic structures and methods for forming the same
WO2011017454A1 (en) 2009-08-04 2011-02-10 Ut-Battelle, Llc Critical current density enhancement via incorporation of nanoscale ba2(y,re) tao6 in rebco films
US20110034336A1 (en) * 2009-08-04 2011-02-10 Amit Goyal CRITICAL CURRENT DENSITY ENHANCEMENT VIA INCORPORATION OF NANOSCALE Ba2(Y,RE)NbO6 IN REBCO FILMS
US20120178630A1 (en) * 2009-10-27 2012-07-12 Furukawa Electric Co., Ltd. Tape base material for a superconducting wire rod, and superconducting wire rod
EP2337102B1 (de) 2009-12-15 2013-05-22 Nexans Verfahren zur Herstellung eines supraleitfähigen elektrischen Leiters und supraleitfähiger Leiter
US8221909B2 (en) * 2009-12-29 2012-07-17 Ut-Battelle, Llc Phase-separated, epitaxial composite cap layers for electronic device applications and method of making the same
US8486864B2 (en) * 2009-12-29 2013-07-16 Ut-Battelle, Llc Method for producing microstructured templates and their use in providing pinning enhancements in superconducting films deposited thereon
WO2011120034A1 (en) * 2010-03-26 2011-09-29 Ohio University Engineering of an ultra-thin molecular superconductor by charge transfer
KR100998851B1 (ko) 2010-05-27 2010-12-08 한국기계연구원 초전도 선재용 완충층의 제조방법
DE102010031058A1 (de) 2010-07-07 2012-01-12 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Metallischer Profildraht mit Rekristallisationswürfeltextur und Verfahren zu dessen Herstellung
US8685549B2 (en) 2010-08-04 2014-04-01 Ut-Battelle, Llc Nanocomposites for ultra high density information storage, devices including the same, and methods of making the same
EP2442376A1 (de) 2010-10-05 2012-04-18 Nexans Verfahren zur Herstellung eines supraleitfähigen elektrischen Leiters und supraleitfähiger Leiter
US11292919B2 (en) 2010-10-08 2022-04-05 Ut-Battelle, Llc Anti-fingerprint coatings
US9221076B2 (en) 2010-11-02 2015-12-29 Ut-Battelle, Llc Composition for forming an optically transparent, superhydrophobic coating
US9790574B2 (en) 2010-11-22 2017-10-17 Electromagnetics Corporation Devices for tailoring materials
US8993092B2 (en) 2011-02-18 2015-03-31 Ut-Battelle, Llc Polycrystalline ferroelectric or multiferroic oxide articles on biaxially textured substrates and methods for making same
US8748349B2 (en) 2011-04-15 2014-06-10 Ut-Battelle, Llc Buffer layers for REBCO films for use in superconducting devices
US8748350B2 (en) * 2011-04-15 2014-06-10 Ut-Battelle Chemical solution seed layer for rabits tapes
RU2451766C1 (ru) * 2011-05-16 2012-05-27 Учреждение Российской академии наук Ордена Трудового Красного Знамени Институт физики металлов Уральского отделения РАН (ИФМ УрО РАН) Способ изготовления биаксиально текстурированной подложки из бинарного сплава на основе никеля для эпитаксиального нанесения на нее буферного и высокотемпературного сверхпроводящего слоев для ленточных сверхпроводников
KR20140020999A (ko) * 2011-05-23 2014-02-19 후루카와 덴키 고교 가부시키가이샤 산화물 초전도 박막
RU2481674C1 (ru) * 2011-10-27 2013-05-10 Закрытое акционерное общество "СуперОкс" Способ изготовления подложки для высокотемпературных тонкопленочных сверхпроводников и подложка
JP5531065B2 (ja) * 2012-08-16 2014-06-25 中部電力株式会社 エピタキシャル膜形成用配向基板
USD747228S1 (en) * 2013-11-04 2016-01-12 Fibar Group S.A. Door/window sensor
US10158061B2 (en) * 2013-11-12 2018-12-18 Varian Semiconductor Equipment Associates, Inc Integrated superconductor device and method of fabrication
US9947441B2 (en) 2013-11-12 2018-04-17 Varian Semiconductor Equipment Associates, Inc. Integrated superconductor device and method of fabrication
USD737709S1 (en) * 2014-01-16 2015-09-01 Greg Hulan Personal alert device
US20150239773A1 (en) 2014-02-21 2015-08-27 Ut-Battelle, Llc Transparent omniphobic thin film articles
US10233091B2 (en) 2015-03-02 2019-03-19 Basf Se Process for producing crystalline tantalum oxide particles
US10450199B2 (en) 2015-03-02 2019-10-22 Basf Se Nanoparticles for the use as pinning centers in superconductors
DK3275023T3 (da) 2015-03-26 2019-07-15 Basf Se Fremgangsmåde til fremstilling af ledninger af højtemperatur-superledere
RU2624564C2 (ru) * 2015-11-06 2017-07-04 Федеральное государственное бюджетное учреждение науки Институт физики металлов имени М.Н. Михеева Уральского отделения Российской академии наук (ИФМ УрО РАН) Способ изготовления биаксиально текстурированной подложки из тройного сплава на медно-никелевой основе
US10431729B2 (en) * 2016-07-11 2019-10-01 Ambature, Inc. Josephson junction using molecular beam epitaxy
EP3568377A1 (de) 2017-01-11 2019-11-20 Basf Se Verfahren zur herstellung von nanopartikeln
US20200343652A1 (en) 2017-11-28 2020-10-29 Basf Se Joined superconducting tape
EP3785039B1 (de) 2018-04-25 2023-10-04 Commonwealth Fusion Systems LLC Vorrichtung zur qualitätskontrolle eines supraleitenden bandes
CN109082708B (zh) * 2018-07-25 2020-12-25 上海交通大学 一种制备具有两种a轴晶粒的c轴YBCO高温超导厚膜的方法
WO2020049019A1 (en) 2018-09-07 2020-03-12 Basf Se Process for producing nanoparticles
WO2020212194A1 (en) 2019-04-17 2020-10-22 Basf Se Sealed superconductor tape
US11201273B2 (en) * 2019-09-13 2021-12-14 Microsoft Technology Licensing, Llc Semiconductor-superconductor heterostructure
WO2021063723A1 (en) 2019-09-30 2021-04-08 Basf Se High-temperature superconductor tape with buffer having controlled carbon content
US11501905B2 (en) * 2020-08-31 2022-11-15 Boston Applied Technologies, Inc. Composition and method of making a monolithic heterostructure of multiferroic thin films
CN116516121B (zh) * 2023-05-16 2023-12-01 广东海洋大学 一种片层状晶粒尺寸异构的321奥氏体不锈钢带及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA697916A (en) * 1964-11-17 R. Pflumm Heinz Alloying
DE2014638A1 (de) * 1970-03-26 1971-10-14 Siemens Ag Verfahren zur Herstellung eines Zweischichten Kontaktstuckes
DE3851668T3 (de) * 1987-07-24 1999-03-04 Matsushita Electric Ind Co Ltd Zusammengesetzte supraleitende Schicht.
JPH01100818A (ja) * 1987-10-14 1989-04-19 Fujikura Ltd 高温超電導材
JPH01100820A (ja) * 1987-10-14 1989-04-19 Fujikura Ltd 高温超電導材
DE3816192A1 (de) * 1988-05-11 1989-11-23 Siemens Ag Verfahren zur herstellung einer schicht aus einem metalloxidischen supraleitermaterial mittels laser-verdampfens
US5104456A (en) * 1990-02-15 1992-04-14 Colorado School Of Mines Process for optimizing titanium and zirconium additions to aluminum welding consumables
CA2037481C (en) * 1990-03-08 1998-11-10 Noriki Hayashi Method of preparing oxide superconducting film
JPH04245113A (ja) * 1991-01-31 1992-09-01 Sumitomo Electric Ind Ltd 酸化物超電導材料の製造方法
US5145832A (en) * 1991-05-22 1992-09-08 Bell Communications Research, Inc. Superconducting film on a flexible two-layer zirconia substrate
FR2683086B1 (fr) * 1991-10-29 1997-01-03 Alsthom Cge Alcatel Procede de fabrication d'un conducteur souple supraconducteur a haute temperature critique.
DE69324633T2 (de) * 1992-07-30 1999-12-16 Sumitomo Electric Industries Verfahren zur Herstellung eines einkristallinen Dünnfilmes
US5290761A (en) * 1992-10-19 1994-03-01 E. I. Du Pont De Nemours And Company Process for making oxide superconducting films by pulsed excimer laser ablation
JP3369225B2 (ja) * 1992-10-27 2003-01-20 住友電気工業株式会社 酸化物高温超電導線材の製造方法
US5340797A (en) * 1993-01-29 1994-08-23 Illinois Superconductor Corporation Superconducting 123YBaCu-oxide produced at low temperatures
US5432151A (en) * 1993-07-12 1995-07-11 Regents Of The University Of California Process for ion-assisted laser deposition of biaxially textured layer on substrate
US5741377A (en) * 1995-04-10 1998-04-21 Martin Marietta Energy Systems, Inc. Structures having enhanced biaxial texture and method of fabricating same

Also Published As

Publication number Publication date
CA2217822A1 (en) 1996-10-17
JP3601830B2 (ja) 2004-12-15
KR19980703798A (ko) 1998-12-05
US5968877A (en) 1999-10-19
EP0830218A4 (de) 2000-05-10
CA2217822C (en) 2004-11-23
US5958599A (en) 1999-09-28
US5898020A (en) 1999-04-27
ATE327049T1 (de) 2006-06-15
ES2268703T3 (es) 2007-03-16
DE69636162T2 (de) 2007-03-15
WO1996032201A1 (en) 1996-10-17
US5739086A (en) 1998-04-14
AU5539896A (en) 1996-10-30
EP0830218A1 (de) 1998-03-25
US5741377A (en) 1998-04-21
EP0830218B1 (de) 2006-05-24
AU713892B2 (en) 1999-12-16
KR100418279B1 (ko) 2004-03-19
JPH11504612A (ja) 1999-04-27

Similar Documents

Publication Publication Date Title
DE69636162D1 (de) Struktur mit biachsialer textur und verfahren zu deren herstellung
EP1003207A3 (de) Laserbestrahlungsvorrichtung, Laserbestrahlungsverfahren, Strahlhomogenisierer und Herstellungsverfahren für ein Halbleiterbauelement
MY116313A (en) Method and apparatus for heat-treating an soi substrate and method of preparing an soi substrate by using the same
EP0577399A3 (de) Apparat und Verfahren zur Durchführung von Dickenmessungen einer Dünnfilmschicht mit Verformungen und örtlichen Neigungsveränderungen.
EP0833395A3 (de) Herstellungsverfahren einer Anordnung mit einem Verbindungshalbleiter-Kristall und Herstellungsverfahren einer Verbindungshalbleiterschichten-Struktur
EP1179842A3 (de) Halbleitersubstrat und Herstellungsverfahren
EP0652595A3 (de) Dünnfilm-Halbleiterbauelement zur Sichtanzeige und dessen Herstellungsverfahren.
GB8915530D0 (en) Silicon thin film transistor and method for producing the same
EP0572144A3 (de) Apparat und Verfahren zum Ausführen von Dickemessungen in Dünnschichtfilmen durch Verformung eines Dünnschichtfilms in einen reflektierenden Kondensator.
AU8592391A (en) Process for producing chromiun carbide-nickle base age hardenable alloy coatings and coated articles so produced
ES8404712A1 (es) Metodo para producir un material de superaleacion de niquel en crital columnar con orientacion controlada.
JPS6476715A (en) Manufacture of polycrystalline semiconductor thin film
EP0559986A3 (en) Method for producing semiconductor wafer and substrate used for producing the semiconductor
ATE168327T1 (de) Verfahren und vorrichtung zur herstellung metallischer flächenelemente auf substraten
CA2138736A1 (en) Method of Manufacturing Electron-Emitting Device and Image-Forming Apparatus Comprising Such Devices
EP0491503A3 (de) Verfahren zur Ablagerung von Metall
ATE152853T1 (de) Dauermagnetmaterial, dessen herstellungsverfahren und dauermagnet
DE59009844D1 (de) Magnetooptische Schicht und Verfahren zu ihrer Herstellung.
DE69225395T2 (de) Kaltgewalztes stahlblech und galvanisiertes kaltgewalztes stahlblech mit hervorragender formbarkeit und einbrennhärtbarkeit und verfahren zu deren herstellung
EP0226311A3 (de) Verfahren zur Wärmebehandlung von III-V-Verbindungshalbleitermaterial
EP0341148A3 (en) A semiconductor substrate having a superconducting thin film, and a process for producing the same
ZA969830B (en) Method and device for producing thin continuous metal castings
EP0736612A3 (de) Verfahren zur Beschichtung von Sonnenkollektoren
DE69109947D1 (de) Verfahren zur Herstellung von dünnem Elektrostahlblech mit sehr hohem Siliziumgehalt durch Kaltwalzen.
FI920475A0 (fi) Menetelmä perusaineen seostamiseksi seostusmateriaalilla kemiallisen yhdisteen tai lejeeringin valmistamiseksi käyttäen sputterointikatodia ja laitteisto menetelmän toteuttamiseksi

Legal Events

Date Code Title Description
8364 No opposition during term of opposition