DE69702422T2 - Grundbeschichtungszusammensetzung für photolithographischen Resist - Google Patents

Grundbeschichtungszusammensetzung für photolithographischen Resist

Info

Publication number
DE69702422T2
DE69702422T2 DE69702422T DE69702422T DE69702422T2 DE 69702422 T2 DE69702422 T2 DE 69702422T2 DE 69702422 T DE69702422 T DE 69702422T DE 69702422 T DE69702422 T DE 69702422T DE 69702422 T2 DE69702422 T2 DE 69702422T2
Authority
DE
Germany
Prior art keywords
base coat
coat composition
photolithographic resist
photolithographic
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69702422T
Other languages
English (en)
Other versions
DE69702422D1 (de
Inventor
Mitsuru Sato
Katsumi Oomori
Etsuko Iguchi
Kiyoshi Ishikawa
Fumitake Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of DE69702422D1 publication Critical patent/DE69702422D1/de
Publication of DE69702422T2 publication Critical patent/DE69702422T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
DE69702422T 1996-04-25 1997-04-18 Grundbeschichtungszusammensetzung für photolithographischen Resist Expired - Fee Related DE69702422T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10592196A JP3436843B2 (ja) 1996-04-25 1996-04-25 リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料

Publications (2)

Publication Number Publication Date
DE69702422D1 DE69702422D1 (de) 2000-08-10
DE69702422T2 true DE69702422T2 (de) 2000-12-14

Family

ID=14420339

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69702422T Expired - Fee Related DE69702422T2 (de) 1996-04-25 1997-04-18 Grundbeschichtungszusammensetzung für photolithographischen Resist

Country Status (7)

Country Link
US (2) US5939510A (de)
EP (1) EP0803777B1 (de)
JP (1) JP3436843B2 (de)
KR (1) KR100266731B1 (de)
DE (1) DE69702422T2 (de)
HK (1) HK1001421A1 (de)
TW (1) TW575793B (de)

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US5948847A (en) * 1996-12-13 1999-09-07 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic patterning
US6682736B1 (en) * 1998-12-23 2004-01-27 Abgenix, Inc. Human monoclonal antibodies to CTLA-4
US6544717B2 (en) 1999-01-28 2003-04-08 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic resist
TW476865B (en) * 1999-01-28 2002-02-21 Tokyo Ohka Kogyo Co Ltd Undercoating composition for photolithographic resist
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6323310B1 (en) 2000-04-19 2001-11-27 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
US6653411B2 (en) 2000-04-19 2003-11-25 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
NL1015524C2 (nl) * 2000-06-26 2001-12-28 Otb Group Bv Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze.
TW576949B (en) 2000-08-17 2004-02-21 Shipley Co Llc Antireflective coatings with increased etch rates
TW565837B (en) * 2001-02-27 2003-12-11 Tdk Corp Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium
US6593055B2 (en) * 2001-09-05 2003-07-15 Kodak Polychrome Graphics Llc Multi-layer thermally imageable element
JP2003085829A (ja) * 2001-09-06 2003-03-20 Tdk Corp 光情報媒体用スタンパの製造方法およびこれに用いるフォトレジスト原盤、ならびに、光情報媒体用スタンパおよび光情報媒体
TW591341B (en) 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
JP2003140347A (ja) * 2001-11-02 2003-05-14 Tokyo Ohka Kogyo Co Ltd 厚膜ホトレジスト層積層体、厚膜レジストパターンの製造方法、および接続端子の製造方法
TWI228718B (en) * 2001-11-05 2005-03-01 Tdk Corp Manufacturing method and device of mold plate for information medium
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
AU2002367345A1 (en) * 2001-12-28 2003-07-24 Tdk Corporation Method for manufacturing stamper for information medium manufacture, stamper, and photoresist original disk
TWI264717B (en) 2002-01-08 2006-10-21 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the photoresist template
TWI258142B (en) * 2002-01-08 2006-07-11 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the stamper spacer with template
US20050118534A1 (en) * 2002-01-08 2005-06-02 Hisaji Oyake Method for manufacturing stamper for information medium manufacture, stamper, and photoresist master disk
JPWO2003077239A1 (ja) 2002-03-11 2005-07-07 Tdk株式会社 フォトレジスト原盤の加工方法、記録媒体用原盤の製造方法、記録媒体の製造方法、フォトレジスト原盤、記録媒体用原盤及び記録媒体
JP2004013973A (ja) * 2002-06-05 2004-01-15 Tdk Corp フォトレジスト原盤の製造方法、光記録媒体製造用スタンパの製造方法、スタンパ、フォトレジスト原盤、スタンパ中間体及び光記録媒体
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
JP4523258B2 (ja) * 2003-10-07 2010-08-11 ハッコールケミカル株式会社 凸版印刷用感光性積層印刷原版に用いる紫外線吸収剤及びその製造方法
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs
US7427466B2 (en) * 2004-11-29 2008-09-23 Imation Corp. Anti-reflection optical data storage disk master
JP2006154570A (ja) * 2004-11-30 2006-06-15 Tokyo Ohka Kogyo Co Ltd レジストパターンおよび導体パターンの製造方法
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
US11262656B2 (en) * 2016-03-31 2022-03-01 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197392A (en) * 1978-08-21 1980-04-08 General Electric Company Melamine coatings
SU1052529A1 (ru) * 1982-02-03 1983-11-07 Киевский Филиал По Специальным Видам Печати Всесоюзного Научно-Исследовательского Института Комплексных Проблем Полиграфии Лак
US4910122A (en) * 1982-09-30 1990-03-20 Brewer Science, Inc. Anti-reflective coating
JPS60223121A (ja) * 1984-04-19 1985-11-07 Matsushita Electric Ind Co Ltd パタ−ン形成方法
DE3736758A1 (de) * 1987-10-30 1989-05-11 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US5234990A (en) * 1992-02-12 1993-08-10 Brewer Science, Inc. Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
US5294680A (en) * 1992-07-24 1994-03-15 International Business Machines Corporation Polymeric dyes for antireflective coatings
JP3024694B2 (ja) * 1993-11-29 2000-03-21 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2953562B2 (ja) * 1994-07-18 1999-09-27 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いた多層レジスト材料
US5498514A (en) * 1994-08-09 1996-03-12 Tokyo Ohka Kogyo Co., Ltd. Lithographic double-coated patterning plate with undercoat levelling layer
US5652317A (en) * 1996-08-16 1997-07-29 Hoechst Celanese Corporation Antireflective coatings for photoresist compositions

Also Published As

Publication number Publication date
US5939510A (en) 1999-08-17
KR100266731B1 (ko) 2000-09-15
DE69702422D1 (de) 2000-08-10
TW575793B (en) 2004-02-11
HK1001421A1 (en) 1998-06-19
JP3436843B2 (ja) 2003-08-18
EP0803777A1 (de) 1997-10-29
KR970072029A (ko) 1997-11-07
JPH09292715A (ja) 1997-11-11
EP0803777B1 (de) 2000-07-05
US6087068A (en) 2000-07-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee