DE69707635T2 - Zusammensetzung für Antireflexunterschichten und Verfahren zur Herstellung eines Resistmusters damit - Google Patents
Zusammensetzung für Antireflexunterschichten und Verfahren zur Herstellung eines Resistmusters damitInfo
- Publication number
- DE69707635T2 DE69707635T2 DE69707635T DE69707635T DE69707635T2 DE 69707635 T2 DE69707635 T2 DE 69707635T2 DE 69707635 T DE69707635 T DE 69707635T DE 69707635 T DE69707635 T DE 69707635T DE 69707635 T2 DE69707635 T2 DE 69707635T2
- Authority
- DE
- Germany
- Prior art keywords
- making
- resist pattern
- layer composition
- reflective sub
- pattern therewith
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34373896A JP3632875B2 (ja) | 1996-12-24 | 1996-12-24 | 反射防止膜材料用組成物 |
JP04600197A JP3851402B2 (ja) | 1997-02-28 | 1997-02-28 | 反射防止膜材料組成物及びそれを利用したレジストパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69707635D1 DE69707635D1 (de) | 2001-11-29 |
DE69707635T2 true DE69707635T2 (de) | 2002-08-08 |
Family
ID=26386103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69707635T Expired - Lifetime DE69707635T2 (de) | 1996-12-24 | 1997-12-23 | Zusammensetzung für Antireflexunterschichten und Verfahren zur Herstellung eines Resistmusters damit |
Country Status (4)
Country | Link |
---|---|
US (1) | US6165684A (de) |
EP (1) | EP0851300B1 (de) |
KR (1) | KR100522798B1 (de) |
DE (1) | DE69707635T2 (de) |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4053631B2 (ja) * | 1997-10-08 | 2008-02-27 | Azエレクトロニックマテリアルズ株式会社 | 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体 |
JP3852889B2 (ja) * | 1998-09-24 | 2006-12-06 | 富士写真フイルム株式会社 | フォトレジスト用反射防止膜材料組成物 |
US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
KR100804873B1 (ko) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 sog 반사방지 코팅 |
JP4007569B2 (ja) * | 1999-09-06 | 2007-11-14 | 富士フイルム株式会社 | ポジ型電子線又はx線レジスト組成物 |
KR100604802B1 (ko) * | 2000-03-07 | 2006-07-26 | 삼성전자주식회사 | 백본에 나프탈렌 유도체가 도입된 감광성 폴리머와 이를포함하는 레지스트 조성물 |
US6479879B1 (en) * | 2000-11-16 | 2002-11-12 | Advanced Micro Devices, Inc. | Low defect organic BARC coating in a semiconductor structure |
AU2002223966A1 (en) * | 2000-12-20 | 2002-07-01 | Warner Lambert Company | Non-halogenated naphthol compounds and antimicrobial compositions containing the same |
JP3509760B2 (ja) * | 2001-02-08 | 2004-03-22 | 株式会社半導体先端テクノロジーズ | 半導体装置の製造方法 |
KR101019331B1 (ko) | 2001-04-17 | 2011-03-07 | 브레우어 사이언스 인코포레이션 | 개선된 스핀 보울 상화성을 갖는 반사 방지 코팅 조성물 |
US6893684B2 (en) | 2001-06-05 | 2005-05-17 | Brewer Science Inc. | Anti-reflective coating compositions for use with low k dielectric materials |
US6670425B2 (en) * | 2001-06-05 | 2003-12-30 | Brewer Science, Inc. | Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings |
JP3445584B2 (ja) * | 2001-08-10 | 2003-09-08 | 沖電気工業株式会社 | 反射防止膜のエッチング方法 |
TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
KR100478982B1 (ko) * | 2002-05-02 | 2005-03-25 | 금호석유화학 주식회사 | 신규 산발생제 및 이를 함유한 박막 조성물 |
US7217491B2 (en) * | 2002-06-07 | 2007-05-15 | Battelle Memorial Institute | Antireflective coatings |
US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
JP2004326009A (ja) * | 2003-04-28 | 2004-11-18 | Renesas Technology Corp | 電子デバイスの製造方法及びエネルギー線吸収材料 |
US7361447B2 (en) * | 2003-07-30 | 2008-04-22 | Hynix Semiconductor Inc. | Photoresist polymer and photoresist composition containing the same |
US20050074688A1 (en) * | 2003-10-03 | 2005-04-07 | Toukhy Medhat A. | Bottom antireflective coatings |
KR100570206B1 (ko) * | 2003-10-15 | 2006-04-12 | 주식회사 하이닉스반도체 | 유기 반사방지막용 광 흡수제 중합체 및 이의 제조 방법과상기 중합체를 포함하는 유기 반사 방지막 조성물 |
KR100570208B1 (ko) * | 2003-10-15 | 2006-04-12 | 주식회사 하이닉스반도체 | 유기 반사방지막용 광 흡수제 중합체 및 이의 제조 방법과상기 중합체를 포함하는 유기 반사 방지막 조성물 |
KR100570209B1 (ko) * | 2003-10-15 | 2006-04-12 | 주식회사 하이닉스반도체 | 유기 반사방지막용 광 흡수제 중합체 및 이의 제조 방법과상기 중합체를 포함하는 유기 반사 방지막 조성물 |
KR100570207B1 (ko) * | 2003-10-15 | 2006-04-12 | 주식회사 하이닉스반도체 | 유기 반사방지막용 광 흡수제 중합체 및 이의 제조 방법과상기 중합체를 포함하는 유기 반사 방지막 조성물 |
KR100611391B1 (ko) * | 2003-11-06 | 2006-08-11 | 주식회사 하이닉스반도체 | 유기 난반사 방지막 조성물 및 이를 이용한 패턴 형성 방법 |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US7534555B2 (en) * | 2003-12-10 | 2009-05-19 | Hitachi Global Storage Technologies Netherlands B.V. | Plating using copolymer |
JP2005236062A (ja) * | 2004-02-20 | 2005-09-02 | Nec Electronics Corp | 不揮発性半導体記憶装置の製造方法 |
KR100574490B1 (ko) * | 2004-04-27 | 2006-04-27 | 주식회사 하이닉스반도체 | 상부 반사방지막 중합체, 이의 제조방법 및 이를 함유하는상부 반사방지막 조성물 |
KR101216403B1 (ko) | 2004-07-02 | 2012-12-28 | 닛산 가가쿠 고교 가부시키 가이샤 | 할로겐 원자를 갖는 나프탈렌환을 포함하는 리소그라피용 하층막 형성 조성물 |
US7691556B2 (en) * | 2004-09-15 | 2010-04-06 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
US7279793B2 (en) * | 2004-12-08 | 2007-10-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for manufacturing semiconductor devices using an anti-reflective coating layer |
JP4753046B2 (ja) * | 2005-01-21 | 2011-08-17 | 日産化学工業株式会社 | 保護されたカルボキシル基を有する化合物を含むリソグラフィー用下層膜形成組成物 |
US7785768B2 (en) * | 2005-06-07 | 2010-08-31 | Tokyo Ohka Kogyo Co. Ltd. | Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom |
US7375172B2 (en) * | 2005-07-06 | 2008-05-20 | International Business Machines Corporation | Underlayer compositions containing heterocyclic aromatic structures |
KR100671114B1 (ko) | 2005-07-28 | 2007-01-17 | 제일모직주식회사 | 반사방지성을 갖는 하드마스크 조성물 |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8017296B2 (en) * | 2007-05-22 | 2011-09-13 | Az Electronic Materials Usa Corp. | Antireflective coating composition comprising fused aromatic rings |
KR100886314B1 (ko) * | 2007-06-25 | 2009-03-04 | 금호석유화학 주식회사 | 유기반사방지막용 공중합체 및 이를 포함하는유기반사방지막 조성물 |
US20090042133A1 (en) * | 2007-08-10 | 2009-02-12 | Zhong Xiang | Antireflective Coating Composition |
US7989144B2 (en) | 2008-04-01 | 2011-08-02 | Az Electronic Materials Usa Corp | Antireflective coating composition |
US7932018B2 (en) * | 2008-05-06 | 2011-04-26 | Az Electronic Materials Usa Corp. | Antireflective coating composition |
US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
US8221965B2 (en) * | 2008-07-08 | 2012-07-17 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
US20100119980A1 (en) * | 2008-11-13 | 2010-05-13 | Rahman M Dalil | Antireflective Coating Composition Comprising Fused Aromatic Rings |
US20100151392A1 (en) * | 2008-12-11 | 2010-06-17 | Rahman M Dalil | Antireflective coating compositions |
US20100316949A1 (en) * | 2009-06-10 | 2010-12-16 | Rahman M Dalil | Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8486609B2 (en) * | 2009-12-23 | 2013-07-16 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
US8507191B2 (en) | 2011-01-07 | 2013-08-13 | Micron Technology, Inc. | Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same |
JP5988050B2 (ja) | 2011-05-20 | 2016-09-07 | 日産化学工業株式会社 | アクリルアミド構造を含むポリマーを含むリソグラフィー用有機ハードマスク層形成用組成物 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
JP6160068B2 (ja) * | 2011-12-16 | 2017-07-12 | Jsr株式会社 | レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法 |
EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3575925A (en) * | 1968-06-17 | 1971-04-20 | Nat Starch Chem Corp | Photosensitive coating systems |
US4614703A (en) * | 1984-10-31 | 1986-09-30 | Allied Corporation | Negative photoresists of α-chlorovinyl methyl ketone copolymers |
JP2694097B2 (ja) * | 1992-03-03 | 1997-12-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 反射防止コーティング組成物 |
US5294680A (en) * | 1992-07-24 | 1994-03-15 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
US5607824A (en) * | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
US5525457A (en) * | 1994-12-09 | 1996-06-11 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
US5693691A (en) * | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
US5919599A (en) * | 1997-09-30 | 1999-07-06 | Brewer Science, Inc. | Thermosetting anti-reflective coatings at deep ultraviolet |
-
1997
- 1997-12-23 DE DE69707635T patent/DE69707635T2/de not_active Expired - Lifetime
- 1997-12-23 EP EP97122819A patent/EP0851300B1/de not_active Expired - Lifetime
- 1997-12-23 US US08/997,393 patent/US6165684A/en not_active Expired - Fee Related
- 1997-12-24 KR KR1019970073784A patent/KR100522798B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100522798B1 (ko) | 2006-01-12 |
EP0851300B1 (de) | 2001-10-24 |
DE69707635D1 (de) | 2001-11-29 |
KR19980064630A (ko) | 1998-10-07 |
EP0851300A1 (de) | 1998-07-01 |
US6165684A (en) | 2000-12-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |