DE69711702T2 - Verfahren und vorrichtung zur herstellung einer kohlenstoffreichen beschichtung auf einem beweglichen substrat - Google Patents
Verfahren und vorrichtung zur herstellung einer kohlenstoffreichen beschichtung auf einem beweglichen substratInfo
- Publication number
- DE69711702T2 DE69711702T2 DE69711702T DE69711702T DE69711702T2 DE 69711702 T2 DE69711702 T2 DE 69711702T2 DE 69711702 T DE69711702 T DE 69711702T DE 69711702 T DE69711702 T DE 69711702T DE 69711702 T2 DE69711702 T2 DE 69711702T2
- Authority
- DE
- Germany
- Prior art keywords
- carbon
- producing
- moving substrate
- rich coating
- rich
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/744,227 US5888594A (en) | 1996-11-05 | 1996-11-05 | Process for depositing a carbon-rich coating on a moving substrate |
US08/938,890 US5948166A (en) | 1996-11-05 | 1997-09-26 | Process and apparatus for depositing a carbon-rich coating on a moving substrate |
PCT/US1997/017733 WO1998020185A1 (en) | 1996-11-05 | 1997-10-01 | A process and apparatus for depositing a carbon-rich coating on a moving substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69711702D1 DE69711702D1 (de) | 2002-05-08 |
DE69711702T2 true DE69711702T2 (de) | 2002-11-21 |
Family
ID=27114284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69711702T Expired - Lifetime DE69711702T2 (de) | 1996-11-05 | 1997-10-01 | Verfahren und vorrichtung zur herstellung einer kohlenstoffreichen beschichtung auf einem beweglichen substrat |
Country Status (8)
Country | Link |
---|---|
US (1) | US5948166A (de) |
EP (1) | EP0953067B1 (de) |
JP (1) | JP4139441B2 (de) |
KR (1) | KR100502124B1 (de) |
CN (1) | CN1109130C (de) |
AU (1) | AU4605897A (de) |
DE (1) | DE69711702T2 (de) |
WO (1) | WO1998020185A1 (de) |
Families Citing this family (51)
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US6015597A (en) | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
US6265068B1 (en) | 1997-11-26 | 2001-07-24 | 3M Innovative Properties Company | Diamond-like carbon coatings on inorganic phosphors |
JP3950537B2 (ja) * | 1997-12-19 | 2007-08-01 | キヤノン株式会社 | 投影露光装置およびデバイス製造方法 |
JP3858437B2 (ja) * | 1998-04-13 | 2006-12-13 | ソニー株式会社 | 真空薄膜形成装置 |
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US6744493B1 (en) | 2000-07-05 | 2004-06-01 | Euv Llc | In-vacuum exposure shutter |
JP2002030447A (ja) * | 2000-07-11 | 2002-01-31 | Canon Inc | プラズマ処理方法及びプラズマ処理装置 |
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US6730174B2 (en) * | 2002-03-06 | 2004-05-04 | Applied Materials, Inc. | Unitary removable shield assembly |
JP3818255B2 (ja) * | 2002-12-16 | 2006-09-06 | 住友電気工業株式会社 | 端部に回折光学膜を有する光ファイバとその製造方法 |
US20050064275A1 (en) * | 2003-09-18 | 2005-03-24 | 3M Innovative Properties Company | Fuel cell gas diffusion layer |
US7361767B2 (en) | 2003-11-14 | 2008-04-22 | 3M Innovative Properties Company | N-sulfonyldicarboximide containing tethering compounds |
WO2005049590A2 (en) * | 2003-11-14 | 2005-06-02 | 3M Innovative Properties Company | N-sulfonylaminocarbonyl containing compounds |
US7423155B2 (en) * | 2003-11-14 | 2008-09-09 | 3M Innovative Properties Company | N-sulfonyldicarboximide containing tethering compounds |
US7943388B2 (en) * | 2003-11-14 | 2011-05-17 | 3M Innovative Properties Company | Acoustic sensors and methods |
US7169933B2 (en) | 2003-11-14 | 2007-01-30 | 3M Innovative Properties Company | N-sulfonylaminocarbonyl containing compounds |
US7134197B2 (en) * | 2003-12-18 | 2006-11-14 | Honeywell International Inc. | Plastic lead frames utilizing reel-to-reel processing |
JP4880478B2 (ja) * | 2003-12-30 | 2012-02-22 | スリーエム イノベイティブ プロパティズ カンパニー | 弾性表面波センサアセンブリ |
US20070281369A1 (en) | 2003-12-30 | 2007-12-06 | Carter Chad J | Acousto-Mechanical Detection Systems and Methods of Use |
US20060131700A1 (en) * | 2004-12-22 | 2006-06-22 | David Moses M | Flexible electronic circuit articles and methods of making thereof |
US7195360B2 (en) * | 2004-12-28 | 2007-03-27 | 3M Innovative Properties Company | Prismatic retroreflective article and method |
AU2005322041B2 (en) * | 2004-12-28 | 2009-10-08 | 3M Innovative Properties Company | Prismatic retroreflective article with fluorine- or silicon-containing prisms |
US7544755B2 (en) * | 2005-09-30 | 2009-06-09 | 3M Innovative Properties Company | Crosslinked polymers with amine binding groups |
US7544756B2 (en) * | 2005-09-30 | 2009-06-09 | 3M Innovative Properties Company | Crosslinked polymers with amine binding groups |
US7544754B2 (en) | 2005-09-30 | 2009-06-09 | 3M Innovative Properties Company | Crosslinked polymers with amine binding groups |
US20070197922A1 (en) * | 2006-02-17 | 2007-08-23 | Honeywell International Inc. | Disposable pressure sensor systems and packages therefor |
JP2007302928A (ja) * | 2006-05-10 | 2007-11-22 | Sumitomo Electric Ind Ltd | 長尺基材連続処理用の搬送機構、それを用いた処理装置およびそれによって得られる長尺部材 |
JP4811108B2 (ja) * | 2006-05-10 | 2011-11-09 | 住友電気工業株式会社 | 被覆層の厚み計量機構およびそれを用いた被覆層形成装置 |
EP2100130A1 (de) * | 2006-12-29 | 2009-09-16 | 3M Innovative Properties Company | Verfahren zur detektion von bioanalyten durch akustisch-mechanische detektionssysteme unter dem zusatz von liposomen |
US8241713B2 (en) * | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
WO2009009188A2 (en) * | 2007-04-19 | 2009-01-15 | 3M Innovative Properties Company | Uses of water-dispersible silica nanoparticles for attaching biomolecules |
EP2140264A1 (de) * | 2007-04-19 | 2010-01-06 | 3M Innovative Properties Company | Verfahren zur verwendung eines festen trägermaterials zur bindung von biomolekülen |
KR200445155Y1 (ko) * | 2007-07-06 | 2009-07-02 | (주) 에이알티 | 이온건챔버의 가스유출 방지가 가능한 롤투롤스퍼터 시스템 |
US8080073B2 (en) * | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
JP5597140B2 (ja) * | 2007-12-31 | 2014-10-01 | スリーエム イノベイティブ プロパティズ カンパニー | プラズマ処理された研磨物品及び同物品の作製方法 |
KR101615787B1 (ko) * | 2008-12-30 | 2016-04-26 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노구조화 표면의 제조 방법 |
BRPI0923760A2 (pt) | 2008-12-30 | 2016-01-26 | 3M Innovative Properties Co | artigos nanoestruturados e métodos para fabricação de artigos nanoestruturados |
US9435916B2 (en) | 2008-12-30 | 2016-09-06 | 3M Innovative Properties Company | Antireflective articles and methods of making the same |
JP5542488B2 (ja) * | 2010-03-18 | 2014-07-09 | 富士フイルム株式会社 | 成膜装置 |
JP5929761B2 (ja) * | 2010-12-15 | 2016-06-08 | 株式会社ニコン | 基板処理システム及び表示素子の製造方法 |
CN105121096B (zh) | 2013-03-29 | 2018-10-16 | 3M创新有限公司 | 非织造磨料制品及其制备方法 |
JP6373982B2 (ja) | 2013-06-24 | 2018-08-15 | スリーエム イノベイティブ プロパティズ カンパニー | 研磨粒子、研磨粒子の作製方法、及び研磨物品 |
DE102013019058B4 (de) * | 2013-11-15 | 2016-03-24 | Cinogy Gmbh | Gerät zur Behandlung einer Fläche mit einem Plasma |
JP6030542B2 (ja) * | 2013-12-26 | 2016-11-24 | エステック株式会社 | プラズマ処理装置 |
KR102292300B1 (ko) | 2014-05-20 | 2021-08-24 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 복수의 연마 요소의 상이한 세트들을 갖는 연마 재료 |
CN105018900A (zh) * | 2015-06-05 | 2015-11-04 | 刘南林 | 气相打印技术与设备 |
KR102439501B1 (ko) * | 2022-07-04 | 2022-09-02 | 주식회사 세미안 | 카본 코팅 장치용 카본 파이버 자동공급 장치 |
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DE3214804A1 (de) * | 1982-04-21 | 1983-10-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum erzeugen einer lyophoben schicht |
JPS59128281A (ja) * | 1982-12-29 | 1984-07-24 | 信越化学工業株式会社 | 炭化けい素被覆物の製造方法 |
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US4645977A (en) * | 1984-08-31 | 1987-02-24 | Matsushita Electric Industrial Co., Ltd. | Plasma CVD apparatus and method for forming a diamond like carbon film |
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JP3189347B2 (ja) * | 1991-12-24 | 2001-07-16 | 住友電気工業株式会社 | 樹脂用金型と樹脂用金型の製造方法および樹脂の成形方法 |
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JPH06299348A (ja) * | 1993-04-15 | 1994-10-25 | I N R Kenkyusho:Kk | プラズマ薄膜製造装置 |
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JP3267810B2 (ja) * | 1993-07-20 | 2002-03-25 | 株式会社半導体エネルギー研究所 | 被膜形成方法 |
JP3419045B2 (ja) * | 1993-10-20 | 2003-06-23 | 松下電器産業株式会社 | 磁気記録媒体の製造方法 |
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GB9405029D0 (en) * | 1994-03-15 | 1994-04-27 | Franks Joseph Dr | Improved catheters and other tubular inserts |
US5464667A (en) * | 1994-08-16 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus |
US5571332A (en) * | 1995-02-10 | 1996-11-05 | Jet Process Corporation | Electron jet vapor deposition system |
JP3295310B2 (ja) * | 1995-08-08 | 2002-06-24 | 三洋電機株式会社 | 回転電極を用いた高速成膜方法及びその装置 |
-
1997
- 1997-09-26 US US08/938,890 patent/US5948166A/en not_active Expired - Lifetime
- 1997-10-01 EP EP97944599A patent/EP0953067B1/de not_active Expired - Lifetime
- 1997-10-01 DE DE69711702T patent/DE69711702T2/de not_active Expired - Lifetime
- 1997-10-01 KR KR10-1999-7003998A patent/KR100502124B1/ko not_active IP Right Cessation
- 1997-10-01 AU AU46058/97A patent/AU4605897A/en not_active Abandoned
- 1997-10-01 CN CN97199346A patent/CN1109130C/zh not_active Expired - Lifetime
- 1997-10-01 WO PCT/US1997/017733 patent/WO1998020185A1/en active IP Right Grant
- 1997-10-01 JP JP52138998A patent/JP4139441B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU4605897A (en) | 1998-05-29 |
DE69711702D1 (de) | 2002-05-08 |
WO1998020185A1 (en) | 1998-05-14 |
KR20000053077A (ko) | 2000-08-25 |
CN1109130C (zh) | 2003-05-21 |
JP4139441B2 (ja) | 2008-08-27 |
US5948166A (en) | 1999-09-07 |
CN1235647A (zh) | 1999-11-17 |
EP0953067A1 (de) | 1999-11-03 |
JP2001508124A (ja) | 2001-06-19 |
EP0953067B1 (de) | 2002-04-03 |
KR100502124B1 (ko) | 2005-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |