DE69715592D1 - Sputter-targets sowie verfahren zu deren herstellung - Google Patents
Sputter-targets sowie verfahren zu deren herstellungInfo
- Publication number
- DE69715592D1 DE69715592D1 DE69715592T DE69715592T DE69715592D1 DE 69715592 D1 DE69715592 D1 DE 69715592D1 DE 69715592 T DE69715592 T DE 69715592T DE 69715592 T DE69715592 T DE 69715592T DE 69715592 D1 DE69715592 D1 DE 69715592D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- sputter targets
- sputter
- targets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9600210.0A GB9600210D0 (en) | 1996-01-05 | 1996-01-05 | Improved sputtering targets and method for the preparation thereof |
PCT/EP1997/000020 WO1997025451A1 (en) | 1996-01-05 | 1997-01-03 | Sputtering targets and method for the preparation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69715592D1 true DE69715592D1 (de) | 2002-10-24 |
DE69715592T2 DE69715592T2 (de) | 2003-01-16 |
Family
ID=10786662
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69715592T Revoked DE69715592T2 (de) | 1996-01-05 | 1997-01-03 | Sputter-targets sowie verfahren zu deren herstellung |
DE69723053T Expired - Lifetime DE69723053T2 (de) | 1996-01-05 | 1997-01-03 | Verfahren zur beschichtung eines substrates mit titandioxid |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69723053T Expired - Lifetime DE69723053T2 (de) | 1996-01-05 | 1997-01-03 | Verfahren zur beschichtung eines substrates mit titandioxid |
Country Status (12)
Country | Link |
---|---|
US (11) | US6461686B1 (de) |
EP (2) | EP0871794B1 (de) |
JP (3) | JP3980643B2 (de) |
KR (1) | KR100510609B1 (de) |
CN (2) | CN1208495C (de) |
AU (2) | AU716603B2 (de) |
BR (1) | BR9706954A (de) |
CA (1) | CA2241878C (de) |
DE (2) | DE69715592T2 (de) |
GB (1) | GB9600210D0 (de) |
IL (1) | IL125103A0 (de) |
WO (2) | WO1997025450A1 (de) |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6193856B1 (en) | 1995-08-23 | 2001-02-27 | Asahi Glass Company Ltd. | Target and process for its production, and method for forming a film having a highly refractive index |
GB9600210D0 (en) * | 1996-01-05 | 1996-03-06 | Vanderstraeten E Bvba | Improved sputtering targets and method for the preparation thereof |
US6292302B1 (en) | 1998-11-03 | 2001-09-18 | Cardinal Glass Industries, Inc. | Heat-treatable dichroic mirrors |
US6262850B1 (en) | 1998-11-03 | 2001-07-17 | Cardinal Glass Industries, Inc. | Heat-treatable dichroic mirrors |
ATE236861T1 (de) † | 1998-12-21 | 2003-04-15 | Cardinal Cg Co | Schmutzabweisende beschichtung für glasoberflächen |
DE19958424C2 (de) * | 1999-12-03 | 2002-05-29 | Zentrum Fuer Material Und Umwe | Zerstäubungstarget für die Dünnbeschichtung großflächiger Substrate und Verfahren zu seiner Herstellung |
CN1158403C (zh) * | 1999-12-23 | 2004-07-21 | 西南交通大学 | 一种人工器官表面改性方法 |
JP2004500240A (ja) | 2000-03-22 | 2004-01-08 | 日本板硝子株式会社 | 光触媒膜付き基体およびその製造方法 |
JP3708429B2 (ja) * | 2000-11-30 | 2005-10-19 | Hoya株式会社 | 蒸着組成物の製造方法、蒸着組成物及び反射防止膜を有する光学部品の製造方法 |
WO2002057508A2 (en) * | 2001-01-17 | 2002-07-25 | N.V. Bekaert S.A. | Method for the production of sputtering targets |
DE10140514A1 (de) | 2001-08-17 | 2003-02-27 | Heraeus Gmbh W C | Sputtertarget auf Basis von Titandioxid |
US20040240093A1 (en) * | 2001-10-18 | 2004-12-02 | Masato Yoshikawa | Optical element and production method therefor, and band pass filter, near infrared cut filter and anti-reflection film |
US20040115362A1 (en) * | 2002-01-14 | 2004-06-17 | Klause Hartig | Photocatalytic sputtering targets and methods for the production and use thereof |
US7067195B2 (en) | 2002-04-29 | 2006-06-27 | Cardinal Cg Company | Coatings having low emissivity and low solar reflectance |
KR20020077852A (ko) * | 2002-08-30 | 2002-10-14 | 주식회사 새롬원 | 김서림방지용 유리판 |
KR100995085B1 (ko) * | 2002-10-24 | 2010-11-19 | 허니웰 인터내셔날 인코포레이티드 | 향상된 냉각성과 감소된 편향 및 변형을 위한 타겟 디자인및 관련 방법 |
US20040149307A1 (en) * | 2002-12-18 | 2004-08-05 | Klaus Hartig | Reversible self-cleaning window assemblies and methods of use thereof |
DE10320472A1 (de) * | 2003-05-08 | 2004-12-02 | Kolektor D.O.O. | Plasmabehandlung zur Reinigung von Kupfer oder Nickel |
US6915095B2 (en) * | 2003-06-16 | 2005-07-05 | Xerox Corporation | Charging member having titanium oxide outer coating on grit blasted substrate |
ATE550456T1 (de) * | 2003-10-07 | 2012-04-15 | Deposition Sciences Inc | Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid |
DE10359508B4 (de) * | 2003-12-18 | 2007-07-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Magnetronsputtern |
EP1713736B1 (de) * | 2003-12-22 | 2016-04-27 | Cardinal CG Company | Gradierte photokatalytische beschichtungen und verfahren zur herstellung |
CN1960860B (zh) | 2004-02-25 | 2012-06-27 | 旭硝子北美平板玻璃公司 | 热稳定的亚化学计量电介质 |
EP1733870A1 (de) * | 2004-04-06 | 2006-12-20 | Teijin Dupont Films Japan Limited | Antireflexionsfilm |
KR20070045191A (ko) * | 2004-06-29 | 2007-05-02 | 파이오니아 가부시키가이샤 | 박막 형성용 스퍼터링 타겟, 유전체 박막, 광디스크 및 그제조 방법 |
DE102004032635A1 (de) * | 2004-07-06 | 2006-02-09 | Gfe Metalle Und Materialien Gmbh | Verfahren zur Herstellung eines Titan-Suboxid-basierten Beschichtungswerkstoff, entsprechend hergestellter Beschichtungswerkstoff und damit versehenes Sputtertarget |
JP2008505842A (ja) * | 2004-07-12 | 2008-02-28 | 日本板硝子株式会社 | 低保守コーティング |
CA2575586A1 (en) * | 2004-08-10 | 2006-02-23 | Cardinal Cg Company | Lcd mirror system and method |
EP1797017B1 (de) * | 2004-10-04 | 2010-11-24 | Cardinal CG Company | Dünnfilmbeschichtung und technologie zum zeitweiligen schutz, isolierverglasungseinheiten und dazugehörige verfahren |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US7968216B2 (en) * | 2005-01-08 | 2011-06-28 | Toyoda Gosei Co., Ltd. | Internal gear pump |
US7442933B2 (en) * | 2005-02-03 | 2008-10-28 | Lin Alice L | Bolometer having an amorphous titanium oxide layer with high resistance stability |
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US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
US9099673B2 (en) * | 2006-11-17 | 2015-08-04 | Saint-Gobain Glass France | Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it |
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US7622717B2 (en) * | 2007-08-22 | 2009-11-24 | Drs Sensors & Targeting Systems, Inc. | Pixel structure having an umbrella type absorber with one or more recesses or channels sized to increase radiation absorption |
US7820296B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coating technology |
US7655274B2 (en) † | 2007-11-05 | 2010-02-02 | Guardian Industries Corp. | Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings |
JP4993745B2 (ja) * | 2007-12-28 | 2012-08-08 | 株式会社アルバック | 成膜装置 |
US8951446B2 (en) | 2008-03-13 | 2015-02-10 | Battelle Energy Alliance, Llc | Hybrid particles and associated methods |
US20130026535A1 (en) * | 2011-07-26 | 2013-01-31 | Battelle Energy Alliance, Llc | Formation of integral composite photon absorber layer useful for photoactive devices and sensors |
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US8324414B2 (en) | 2009-12-23 | 2012-12-04 | Battelle Energy Alliance, Llc | Methods of forming single source precursors, methods of forming polymeric single source precursors, and single source precursors and intermediate products formed by such methods |
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US20090272641A1 (en) * | 2008-04-30 | 2009-11-05 | Applied Materials, Inc. | Sputter target, method for manufacturing a layer, particularly a tco (transparent conductive oxide) layer, and method for manufacturing a thin layer solar cell |
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JP5624712B2 (ja) * | 2008-09-01 | 2014-11-12 | 豊田合成株式会社 | TiO2からなる導電性透明層の製造方法及び当該導電性透明層の製造方法を利用した半導体発光素子の製造方法 |
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DE102010048089B4 (de) * | 2010-10-01 | 2016-09-01 | Carl Zeiss Vision International Gmbh | Verfahren zur Erzeugung einer mehrere Schichten aufweisenden antistatischen Beschichtung für ein Linsenelement |
KR101988391B1 (ko) | 2011-06-27 | 2019-06-12 | 솔레라스 리미티드 | 스퍼터링 타겟 |
CN102286717B (zh) * | 2011-09-01 | 2013-07-03 | 基迈克材料科技(苏州)有限公司 | 以等离子喷涂制备圆柱形大面积镀膜靶材及方法 |
DE102011116062A1 (de) * | 2011-10-18 | 2013-04-18 | Sintertechnik Gmbh | Keramisches Erzeugnis zur Verwendung als Target |
EP2613358A2 (de) * | 2012-01-04 | 2013-07-10 | OC Oerlikon Balzers AG | Doppelschichtige Antireflexbeschichtung für siliziumbasierte Solarzellenmodule |
DE102012112739A1 (de) * | 2012-10-23 | 2014-04-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Licht absorbierendes Schichtsystem und dessen Herstellung sowie dafür geeignetes Sputtertarget |
DE102012022237A1 (de) * | 2012-11-14 | 2014-05-15 | Heraeus Materials Technology Gmbh & Co. Kg | Sputtertarget mit optimierten Gebrauchseigenschaften |
WO2014122120A1 (en) | 2013-02-05 | 2014-08-14 | Soleras Advanced Coatings Bvba | (ga) zn sn oxide sputtering target |
RU2013158730A (ru) * | 2013-12-27 | 2015-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Самарский государственный аэрокосмический университет имени академика С.П. Королева" (национальный исследовательский университет)" (СГАУ) | Способ изготовления катодной мишени для распыления керамических материалов |
JP5784849B2 (ja) * | 2015-01-21 | 2015-09-24 | 三井金属鉱業株式会社 | セラミックス円筒形スパッタリングターゲット材およびその製造方法 |
WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
HUE059508T2 (hu) | 2017-03-14 | 2022-11-28 | Materion Advanced Mat Germany Gmbh | Hengeres titán-oxid porlasztási céltárgy és eljárás elõállítására |
DE102017118172A1 (de) * | 2017-08-09 | 2019-02-14 | Forplan AG | Beschichtungsverfahren, Beschichtungsvorrichtung zur Durchführung dieses Verfahrens und Beschichtungsanlage mit einer solchen Beschichtungsvorrichtung |
CN110257790B (zh) * | 2019-07-29 | 2020-07-03 | 福建阿石创新材料股份有限公司 | 一种三氧化二铝-TiOx靶材及其制备方法和应用 |
WO2023097583A1 (zh) * | 2021-12-01 | 2023-06-08 | 宁德时代新能源科技股份有限公司 | 一种掺杂氧化镍靶材及其制备方法和应用 |
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1996
- 1996-01-05 GB GBGB9600210.0A patent/GB9600210D0/en active Pending
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1997
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- 1997-01-03 CN CNB971925933A patent/CN1208495C/zh not_active Expired - Fee Related
- 1997-01-03 CN CNA2005100713029A patent/CN1727514A/zh active Pending
- 1997-01-03 EP EP97900954A patent/EP0871794B1/de not_active Revoked
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- 1997-01-03 BR BR9706954-0A patent/BR9706954A/pt not_active IP Right Cessation
- 1997-01-03 US US09/101,405 patent/US6461686B1/en not_active Expired - Lifetime
- 1997-01-03 EP EP97900563A patent/EP0871792B1/de not_active Expired - Lifetime
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