DE69715952T2 - Poliervorrichtung - Google Patents

Poliervorrichtung

Info

Publication number
DE69715952T2
DE69715952T2 DE69715952T DE69715952T DE69715952T2 DE 69715952 T2 DE69715952 T2 DE 69715952T2 DE 69715952 T DE69715952 T DE 69715952T DE 69715952 T DE69715952 T DE 69715952T DE 69715952 T2 DE69715952 T2 DE 69715952T2
Authority
DE
Germany
Prior art keywords
polisher
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69715952T
Other languages
English (en)
Other versions
DE69715952D1 (de
Inventor
Tetsuji Togawa
Kuniaki Yamaguchi
Kunihiko Sakurai
Hiromi Yajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP13098796A external-priority patent/JPH09295262A/ja
Priority claimed from JP15760896A external-priority patent/JPH09320997A/ja
Application filed by Ebara Corp, Toshiba Corp filed Critical Ebara Corp
Application granted granted Critical
Publication of DE69715952D1 publication Critical patent/DE69715952D1/de
Publication of DE69715952T2 publication Critical patent/DE69715952T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
DE69715952T 1996-04-26 1997-04-25 Poliervorrichtung Expired - Fee Related DE69715952T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13098796A JPH09295262A (ja) 1996-04-26 1996-04-26 ポリッシング装置
JP15760896A JPH09320997A (ja) 1996-05-28 1996-05-28 ポリッシング装置と洗浄装置の配管構造

Publications (2)

Publication Number Publication Date
DE69715952D1 DE69715952D1 (de) 2002-11-07
DE69715952T2 true DE69715952T2 (de) 2003-08-07

Family

ID=26465955

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69715952T Expired - Fee Related DE69715952T2 (de) 1996-04-26 1997-04-25 Poliervorrichtung

Country Status (4)

Country Link
US (1) US6227954B1 (de)
EP (1) EP0803326B1 (de)
KR (1) KR100415406B1 (de)
DE (1) DE69715952T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3770752B2 (ja) 1998-08-11 2006-04-26 株式会社日立製作所 半導体装置の製造方法及び加工装置
US6409580B1 (en) * 2001-03-26 2002-06-25 Speedfam-Ipec Corporation Rigid polishing pad conditioner for chemical mechanical polishing tool
US9245783B2 (en) 2013-05-24 2016-01-26 Novellus Systems, Inc. Vacuum robot with linear translation carriage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63207559A (ja) 1987-02-19 1988-08-26 Disco Abrasive Syst Ltd ウエ−ハ自動研削装置
US5036625A (en) * 1988-12-07 1991-08-06 Anatoly Gosis Lapping plate for a lapping and polishing machine
JPH0615565A (ja) * 1991-12-18 1994-01-25 Shin Etsu Handotai Co Ltd ウエーハ自動ラッピング装置
US5733171A (en) * 1996-07-18 1998-03-31 Speedfam Corporation Apparatus for the in-process detection of workpieces in a CMP environment
US5679059A (en) 1994-11-29 1997-10-21 Ebara Corporation Polishing aparatus and method
KR100390293B1 (ko) 1993-09-21 2003-09-02 가부시끼가이샤 도시바 폴리싱장치
JP3326642B2 (ja) * 1993-11-09 2002-09-24 ソニー株式会社 基板の研磨後処理方法およびこれに用いる研磨装置
US5679060A (en) * 1994-07-14 1997-10-21 Silicon Technology Corporation Wafer grinding machine
US5655954A (en) * 1994-11-29 1997-08-12 Toshiba Kikai Kabushiki Kaisha Polishing apparatus
US5679055A (en) * 1996-05-31 1997-10-21 Memc Electronic Materials, Inc. Automated wafer lapping system

Also Published As

Publication number Publication date
US6227954B1 (en) 2001-05-08
DE69715952D1 (de) 2002-11-07
KR970077251A (ko) 1997-12-12
EP0803326A2 (de) 1997-10-29
EP0803326B1 (de) 2002-10-02
EP0803326A3 (de) 1998-04-15
KR100415406B1 (ko) 2004-06-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EBARA CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee