DE69718328T2 - Magnetrongerät - Google Patents
Magnetrongerät Download PDFInfo
- Publication number
- DE69718328T2 DE69718328T2 DE69718328T DE69718328T DE69718328T2 DE 69718328 T2 DE69718328 T2 DE 69718328T2 DE 69718328 T DE69718328 T DE 69718328T DE 69718328 T DE69718328 T DE 69718328T DE 69718328 T2 DE69718328 T2 DE 69718328T2
- Authority
- DE
- Germany
- Prior art keywords
- magnetron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68845496A | 1996-07-30 | 1996-07-30 | |
US08/898,158 US5993598A (en) | 1996-07-30 | 1997-07-22 | Magnetron |
PCT/US1997/013473 WO1998005057A1 (en) | 1996-07-30 | 1997-07-28 | Magnetron |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69718328D1 DE69718328D1 (de) | 2003-02-13 |
DE69718328T2 true DE69718328T2 (de) | 2004-01-15 |
Family
ID=27104231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69718328T Expired - Lifetime DE69718328T2 (de) | 1996-07-30 | 1997-07-28 | Magnetrongerät |
Country Status (9)
Country | Link |
---|---|
US (1) | US5993598A (de) |
EP (1) | EP0919066B1 (de) |
JP (1) | JP2002505792A (de) |
KR (1) | KR100454318B1 (de) |
CN (1) | CN1106670C (de) |
AU (1) | AU3902397A (de) |
BR (1) | BR9710719A (de) |
DE (1) | DE69718328T2 (de) |
WO (1) | WO1998005057A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1142577C (zh) | 1997-10-01 | 2004-03-17 | 陶氏化学公司 | 用于磁控管等离子体产生装置的双面簇射头电极 |
GB2332087A (en) * | 1997-12-02 | 1999-06-09 | Superion Ltd | Apparatus and method relating to ion beams and gaseous plasma |
US20020006487A1 (en) * | 2000-06-06 | 2002-01-17 | O'connor Paul J. | Transmission barrier layer for polymers and containers |
KR20050086510A (ko) * | 2002-11-12 | 2005-08-30 | 다우 글로벌 테크놀로지스 인크. | 용기상에 플라즈마 코팅을 퇴적시키기 위한 방법 및 장치 |
US7513953B1 (en) | 2003-11-25 | 2009-04-07 | Nano Scale Surface Systems, Inc. | Continuous system for depositing films onto plastic bottles and method |
CN103108482B (zh) * | 2013-01-11 | 2015-08-05 | 哈尔滨工业大学 | 一种等离子体射流密度大范围调节器 |
JP2018028109A (ja) * | 2014-12-22 | 2018-02-22 | 旭硝子株式会社 | プラズマcvd装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL50072C (de) * | 1935-12-28 | |||
US4013532A (en) * | 1975-03-03 | 1977-03-22 | Airco, Inc. | Method for coating a substrate |
HU179482B (en) * | 1979-02-19 | 1982-10-28 | Mikroelektronikai Valalat | Penning pulverizel source |
US4260647A (en) * | 1979-06-13 | 1981-04-07 | Rca Corporation | Method of depositing an abrasive layer |
JPS59179152A (ja) * | 1983-03-31 | 1984-10-11 | Agency Of Ind Science & Technol | アモルファスシリコン半導体薄膜の製造方法 |
JPS60156547A (ja) * | 1984-01-27 | 1985-08-16 | Tokuyama Soda Co Ltd | プラズマ処理方法 |
DE3521318A1 (de) * | 1985-06-14 | 1986-12-18 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung |
EP0273741B1 (de) * | 1986-12-29 | 1991-10-23 | Sumitomo Metal Industries, Ltd. | Plasmagerät |
DE3721373A1 (de) * | 1987-06-29 | 1989-01-12 | Leybold Ag | Beschichtungsvorrichtung |
JPH01302726A (ja) * | 1988-02-10 | 1989-12-06 | Japan Synthetic Rubber Co Ltd | 反応性イオンエッチング装置 |
US5178743A (en) * | 1989-06-15 | 1993-01-12 | Microelectronics And Computer Technology Corporation | Cylindrical magnetron sputtering system |
JP3033104B2 (ja) * | 1989-11-17 | 2000-04-17 | ソニー株式会社 | エッチング方法 |
US5298587A (en) * | 1992-12-21 | 1994-03-29 | The Dow Chemical Company | Protective film for articles and method |
EP0634778A1 (de) * | 1993-07-12 | 1995-01-18 | The Boc Group, Inc. | Hohlkathoden-Netzwerk |
US5433786A (en) * | 1993-08-27 | 1995-07-18 | The Dow Chemical Company | Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein |
US5364666A (en) * | 1993-09-23 | 1994-11-15 | Becton, Dickinson And Company | Process for barrier coating of plastic objects |
-
1997
- 1997-07-22 US US08/898,158 patent/US5993598A/en not_active Expired - Fee Related
- 1997-07-28 DE DE69718328T patent/DE69718328T2/de not_active Expired - Lifetime
- 1997-07-28 AU AU39023/97A patent/AU3902397A/en not_active Abandoned
- 1997-07-28 JP JP50914798A patent/JP2002505792A/ja active Pending
- 1997-07-28 KR KR10-1999-7000686A patent/KR100454318B1/ko not_active IP Right Cessation
- 1997-07-28 BR BR9710719A patent/BR9710719A/pt not_active Application Discontinuation
- 1997-07-28 EP EP97936321A patent/EP0919066B1/de not_active Expired - Lifetime
- 1997-07-28 WO PCT/US1997/013473 patent/WO1998005057A1/en active IP Right Grant
- 1997-07-28 CN CN97196851A patent/CN1106670C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100454318B1 (ko) | 2004-10-26 |
DE69718328D1 (de) | 2003-02-13 |
AU3902397A (en) | 1998-02-20 |
EP0919066B1 (de) | 2003-01-08 |
JP2002505792A (ja) | 2002-02-19 |
US5993598A (en) | 1999-11-30 |
BR9710719A (pt) | 1999-08-17 |
CN1226339A (zh) | 1999-08-18 |
CN1106670C (zh) | 2003-04-23 |
WO1998005057A1 (en) | 1998-02-05 |
KR20000029621A (ko) | 2000-05-25 |
EP0919066A1 (de) | 1999-06-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: DOW GLOBAL TECHNOLOGIES, INC., MIDLAND, MICH., US |
|
8364 | No opposition during term of opposition |