DE69732310D1 - Halogenierte acrylate und davon abgeleitete polymere - Google Patents
Halogenierte acrylate und davon abgeleitete polymereInfo
- Publication number
- DE69732310D1 DE69732310D1 DE69732310T DE69732310T DE69732310D1 DE 69732310 D1 DE69732310 D1 DE 69732310D1 DE 69732310 T DE69732310 T DE 69732310T DE 69732310 T DE69732310 T DE 69732310T DE 69732310 D1 DE69732310 D1 DE 69732310D1
- Authority
- DE
- Germany
- Prior art keywords
- derived polymers
- halogenated acrylates
- acrylates
- halogenated
- polymers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/62—Oxygen or sulfur atoms
- C07D213/63—One oxygen atom
- C07D213/64—One oxygen atom attached in position 2 or 6
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/65—Halogen-containing esters of unsaturated acids
- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US872235 | 1986-06-09 | ||
| US08/872,235 US6005137A (en) | 1997-06-10 | 1997-06-10 | Halogenated acrylates and polymers derived therefrom |
| PCT/US1997/017437 WO1998056749A1 (en) | 1997-06-10 | 1997-09-29 | Halogenated acrylates and polymers derived therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69732310D1 true DE69732310D1 (de) | 2005-02-24 |
| DE69732310T2 DE69732310T2 (de) | 2005-12-22 |
Family
ID=25359127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69732310T Expired - Lifetime DE69732310T2 (de) | 1997-06-10 | 1997-09-29 | Halogenierte acrylate und davon abgeleitete polymere |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US6005137A (de) |
| EP (1) | EP1009729B1 (de) |
| JP (1) | JP4065932B2 (de) |
| KR (1) | KR100597970B1 (de) |
| CN (1) | CN1125030C (de) |
| AU (1) | AU4739297A (de) |
| DE (1) | DE69732310T2 (de) |
| WO (1) | WO1998056749A1 (de) |
Families Citing this family (65)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
| US6555288B1 (en) | 1999-06-21 | 2003-04-29 | Corning Incorporated | Optical devices made from radiation curable fluorinated compositions |
| US6306563B1 (en) | 1999-06-21 | 2001-10-23 | Corning Inc. | Optical devices made from radiation curable fluorinated compositions |
| WO2001096952A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| AU2001269837A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| EP1292852B1 (de) * | 2000-06-15 | 2005-11-09 | 3M Innovative Properties Company | Mikroherstellungsverfahren für organische optische bauteile |
| JP4786858B2 (ja) | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
| KR100811017B1 (ko) | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| DE60139620D1 (de) | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| US6514434B1 (en) | 2000-06-16 | 2003-02-04 | Corning Incorporated | Electro-optic chromophore bridge compounds and donor-bridge compounds for polymeric thin film waveguides |
| US6584266B1 (en) | 2000-06-16 | 2003-06-24 | Corning Incorporated | Chromophores for polymeric thin films and optical waveguides and devices comprising the same |
| US6444830B1 (en) | 2000-06-16 | 2002-09-03 | Corning Incorporated | Electron acceptors for polymeric thin film waveguide media |
| EP1311637B8 (de) | 2000-08-18 | 2006-06-28 | 3M Innovative Properties Company | Fluoro(meth)acrylat-copolymer-beschichtungsmassen |
| CN1237395C (zh) * | 2000-12-27 | 2006-01-18 | 三井化学株式会社 | 薄膜和薄膜的制造方法以及薄膜用粘合剂 |
| US6929899B2 (en) | 2001-01-25 | 2005-08-16 | E. I. Du Pont De Nemours And Company | Fluorinated photopolymer composition and waveguide device |
| US7078445B2 (en) * | 2001-02-01 | 2006-07-18 | E. I. Du Pont De Nemours And Company | Photosensitive acrylate composition and waveguide device |
| US6689844B2 (en) * | 2001-05-29 | 2004-02-10 | Rohmax Additives Gmbh | Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| DE10257711B4 (de) * | 2001-12-27 | 2019-09-26 | Merck Patent Gmbh | Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen |
| ATE390446T1 (de) * | 2002-02-04 | 2008-04-15 | Ciba Sc Holding Ag | Fluorierte photoinitiatoren in hochfluorierten monomeren |
| JP4222120B2 (ja) * | 2002-10-07 | 2009-02-12 | Ｊｓｒ株式会社 | 光導波路形成用感光性樹脂組成物および光導波路 |
| CN100381411C (zh) * | 2002-11-01 | 2008-04-16 | 嘉吉有限公司 | 制备1,3-丙二醇的方法 |
| JP2004240122A (ja) * | 2003-02-05 | 2004-08-26 | Fuji Photo Film Co Ltd | プラスチック光ファイバケーブルおよび製造方法 |
| US20060056031A1 (en) * | 2004-09-10 | 2006-03-16 | Capaldo Kevin P | Brightness enhancement film, and methods of making and using the same |
| US6833391B1 (en) | 2003-05-27 | 2004-12-21 | General Electric Company | Curable (meth)acrylate compositions |
| TWI254717B (en) * | 2003-08-06 | 2006-05-11 | Chung Shan Inst Of Science | Method for the preparation of pentafluorophenylacrylate polymer |
| US7271283B2 (en) * | 2003-08-29 | 2007-09-18 | General Electric Company | High refractive index, UV-curable monomers and coating compositions prepared therefrom |
| JP2005140909A (ja) * | 2003-11-05 | 2005-06-02 | Omron Corp | 光学部品 |
| WO2005116776A1 (ja) * | 2004-05-26 | 2005-12-08 | Jsr Corporation | 微細パターン形成用樹脂組成物および微細パターン形成方法 |
| US7341784B2 (en) * | 2004-09-10 | 2008-03-11 | General Electric Company | Light management film and its preparation and use |
| WO2006032020A1 (en) * | 2004-09-14 | 2006-03-23 | E.I. Dupont De Nemours And Company | Optical organic polymer |
| WO2006034011A1 (en) * | 2004-09-14 | 2006-03-30 | E.I. Dupont De Nemours And Company | Process for preparing an optical organic polymer |
| WO2006032017A1 (en) * | 2004-09-14 | 2006-03-23 | E.I. Dupont De Nemours And Company | Polymeric optical waveguide |
| US7491441B2 (en) * | 2004-12-30 | 2009-02-17 | 3M Innovative Properties Company | High refractive index, durable hard coats |
| US7264872B2 (en) * | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
| US7297810B2 (en) * | 2004-12-30 | 2007-11-20 | 3M Innovative Properties Company | High refractive index monomers for optical applications |
| US7262230B2 (en) * | 2005-01-21 | 2007-08-28 | Lumera Corporation | Process of preparing crosslinked, low loss polymers with tunable refractive indices |
| US7231127B2 (en) * | 2005-01-21 | 2007-06-12 | Lumera Corporation | Waveguide devices with low loss clads and tunable refractive indices |
| KR20090007757A (ko) * | 2006-05-05 | 2009-01-20 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | 신규한 (메타)크릴산 에스테르 공중합체, 조성물, 광학 부재 및 전기 부재 |
| US8791254B2 (en) * | 2006-05-19 | 2014-07-29 | 3M Innovative Properties Company | Cyclic hydrofluoroether compounds and processes for their preparation and use |
| US8193397B2 (en) * | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| US20080145545A1 (en) * | 2006-12-15 | 2008-06-19 | Bret Ja Chisholm | Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom |
| US8179034B2 (en) | 2007-07-13 | 2012-05-15 | 3M Innovative Properties Company | Light extraction film for organic light emitting diode display and lighting devices |
| US20090015142A1 (en) | 2007-07-13 | 2009-01-15 | 3M Innovative Properties Company | Light extraction film for organic light emitting diode display devices |
| JP5150327B2 (ja) * | 2007-08-03 | 2013-02-20 | 東京応化工業株式会社 | 液浸露光用レジスト組成物およびレジストパターン形成方法 |
| US7914967B2 (en) * | 2007-08-03 | 2011-03-29 | Tokyo Ohka Kogyo Co., Ltd. | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern |
| JP2009098658A (ja) * | 2007-09-25 | 2009-05-07 | Fujifilm Corp | 光学フィルム、偏光板、及び画像表示装置 |
| JP5303142B2 (ja) * | 2007-11-30 | 2013-10-02 | 東京応化工業株式会社 | 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法 |
| US7981986B2 (en) * | 2008-04-29 | 2011-07-19 | 3M Innovative Properties Company | Optical films comprising fluorenol (meth)acrylate monomer |
| US20090275720A1 (en) * | 2008-04-30 | 2009-11-05 | 3M Innovative Properties Company | Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films |
| US7957621B2 (en) | 2008-12-17 | 2011-06-07 | 3M Innovative Properties Company | Light extraction film with nanoparticle coatings |
| TWI503334B (zh) * | 2009-02-19 | 2015-10-11 | Jsr Corp | 聚合物及敏輻射線性組成物、及單體 |
| WO2012022388A1 (de) * | 2010-07-22 | 2012-02-23 | Merck Patent Gmbh | Polymerstabilisierte flüssigkristallmedien und anzeigen |
| US9182662B2 (en) * | 2012-02-15 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| TW201625996A (zh) * | 2014-10-21 | 2016-07-16 | 聖高拜塑膠製品公司 | 用可撓性ｏｌｅｄ的支撐件 |
| US20180050976A1 (en) * | 2015-02-16 | 2018-02-22 | Central Glass Company, Limited | Practical Processes for Producing Fluorinated alpha-Ketocarboxylic Esters and Analogues Thereof |
| EP3465793B1 (de) | 2016-05-27 | 2022-03-30 | 3M Innovative Properties Company | Oled-anzeige mit verbesserter farbuniformität |
| EP3533090A1 (de) | 2016-10-28 | 2019-09-04 | 3M Innovative Properties Company | Nanostrukturierter artikel |
| KR101965194B1 (ko) * | 2017-07-12 | 2019-04-03 | 이화여자대학교 산학협력단 | 불소계 모노머 및 올리고머 화합물, 광중합형 조성물, 및 이들을 이용한 소수성 필름 |
| CN109534968B (zh) * | 2018-11-15 | 2022-07-08 | 广东广山新材料股份有限公司 | 一种不饱和氟碳化合物及其制备方法和应用 |
| WO2020212777A1 (en) | 2019-04-18 | 2020-10-22 | 3M Innovative Properties Company | Organic light emitting diode display with color-correction component |
| CN114391188A (zh) | 2019-09-18 | 2022-04-22 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品及其制备方法 |
| JP2023539263A (ja) | 2020-08-28 | 2023-09-13 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面と囲まれた空隙とを含む物品、それを製造する方法、及び光学素子 |
| JP2023109483A (ja) * | 2022-01-27 | 2023-08-08 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、及び、化合物 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE621655A (de) * | 1961-09-20 | |||
| US3981928A (en) * | 1962-10-30 | 1976-09-21 | Minnesota Mining And Manufacturing Company | Perfluorotertiaryalkyl ethers |
| US3321515A (en) * | 1963-04-24 | 1967-05-23 | Du Pont | Method of making fluorinated carbonyl compounds |
| US3520863A (en) * | 1965-06-24 | 1970-07-21 | Allied Chem | Novel acrylic monomers,polymers and intermediates |
| US3723507A (en) * | 1965-06-24 | 1973-03-27 | Allied Chem | Perfluoro cycloalkyl acrylates |
| US3544535A (en) * | 1965-07-26 | 1970-12-01 | Allied Chem | Novel carbinol and derivatives thereof |
| DE1668395C3 (de) * | 1966-07-11 | 1978-06-15 | Montecatini Edison S.P.A., Mailand (Italien) | Perfluorierte Ketone und Verfahren zu deren Herstellung |
| FR1547223A (fr) * | 1966-12-17 | 1968-11-22 | Dynamit Nobel Ag | Procédé de préparation d'esters phényliques |
| US4010212A (en) * | 1970-04-13 | 1977-03-01 | Minnesota Mining And Manufacturing Company | Perfluorotertiaryalkyl ethers |
| US3668223A (en) * | 1970-08-19 | 1972-06-06 | Merck & Co Inc | 2-oxo-3-benzoxepins |
| JPS5023019B1 (de) * | 1970-12-14 | 1975-08-05 | ||
| US5132455A (en) * | 1982-03-31 | 1992-07-21 | Exfluor Research Corporation | Method for synthesizing perfluorinated ether compounds via polyesters |
| DE3678146D1 (de) * | 1985-12-25 | 1991-04-18 | Tosoh Corp | Halogen enthaltende polyacrylat-derivate. |
| DE3620050A1 (de) * | 1986-06-14 | 1987-12-17 | Hoechst Ag | Substituierte (alpha)-fluoracrylsaeurephenylester |
| US5045397A (en) * | 1987-02-13 | 1991-09-03 | Hughes Aircraft Company | Optical adhesive system having low refractive index |
| DE3707923A1 (de) * | 1987-03-12 | 1988-09-22 | Hoechst Ag | Transparente thermoplastische formmasse |
| FR2623510B1 (fr) * | 1987-11-20 | 1992-10-23 | Ecole Nale Superieure Chimie | Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques |
| US5236919A (en) | 1989-02-28 | 1993-08-17 | Imperial Chemical Industries Plc | Quinoxalinyl derivatives suitable for use in leukotriene mediated disease |
| JP2854669B2 (ja) * | 1990-04-27 | 1999-02-03 | 株式会社 日立製作所 | 光伝送体とそれを用いた光伝送システムおよびエンジンの制御システム |
| US5136117A (en) | 1990-08-23 | 1992-08-04 | Battelle Memorial Institute | Monomeric recovery from polymeric materials |
| US5384374A (en) * | 1991-01-11 | 1995-01-24 | Minnesota Mining And Manufacturing Company | Curing fluorocarbon elastomers |
| US5223593A (en) * | 1991-08-08 | 1993-06-29 | Minnesota Mining And Manufacturing Company | Fluorine containing plastic optical fiber cores |
| DE59306756D1 (de) * | 1992-03-07 | 1997-07-24 | Minnesota Mining & Mfg | Verfahren zum Herstellen von Bauelementen für Lichtwellenleiternetze und nach diesem Verfahren hergestellte Bauelemente |
| US5420359A (en) * | 1992-12-11 | 1995-05-30 | Minnesota Mining And Manufacturing Company | Chlorofluoroether compositions and preparation thereof |
| US5350497A (en) * | 1993-05-21 | 1994-09-27 | E. I. Du Pont De Nemours And Company | Production of perfluoro(alkyl vinyl ethers) |
| US5343544A (en) * | 1993-07-02 | 1994-08-30 | Minnesota Mining And Manufacturing Company | Integrated optical fiber coupler and method of making same |
| US5466877A (en) * | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
-
1997
- 1997-06-10 US US08/872,235 patent/US6005137A/en not_active Expired - Fee Related
- 1997-09-29 WO PCT/US1997/017437 patent/WO1998056749A1/en active IP Right Grant
- 1997-09-29 EP EP97909884A patent/EP1009729B1/de not_active Expired - Lifetime
- 1997-09-29 KR KR1019997011592A patent/KR100597970B1/ko not_active IP Right Cessation
- 1997-09-29 DE DE69732310T patent/DE69732310T2/de not_active Expired - Lifetime
- 1997-09-29 CN CN97182296A patent/CN1125030C/zh not_active Expired - Fee Related
- 1997-09-29 AU AU47392/97A patent/AU4739297A/en not_active Abandoned
- 1997-09-29 JP JP50235299A patent/JP4065932B2/ja not_active Expired - Fee Related
-
1999
- 1999-08-23 US US09/379,156 patent/US6313245B1/en not_active Expired - Fee Related
- 1999-08-24 US US09/382,300 patent/US6288266B1/en not_active Expired - Fee Related
-
2001
- 2001-05-01 US US09/846,739 patent/US6362379B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6313245B1 (en) | 2001-11-06 |
| WO1998056749A1 (en) | 1998-12-17 |
| KR20010013585A (ko) | 2001-02-26 |
| EP1009729B1 (de) | 2005-01-19 |
| US6005137A (en) | 1999-12-21 |
| AU4739297A (en) | 1998-12-30 |
| JP2002514259A (ja) | 2002-05-14 |
| JP4065932B2 (ja) | 2008-03-26 |
| DE69732310T2 (de) | 2005-12-22 |
| US6362379B2 (en) | 2002-03-26 |
| EP1009729A1 (de) | 2000-06-21 |
| CN1125030C (zh) | 2003-10-22 |
| US6288266B1 (en) | 2001-09-11 |
| KR100597970B1 (ko) | 2006-07-13 |
| US20010037028A1 (en) | 2001-11-01 |
| CN1259932A (zh) | 2000-07-12 |
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