DE69734104D1 - Kupplungsanordnung für die geschlossene übertragung von einem flachen substrat von einem geschlossenen behälter zu einer behandlungseinrichtung - Google Patents

Kupplungsanordnung für die geschlossene übertragung von einem flachen substrat von einem geschlossenen behälter zu einer behandlungseinrichtung

Info

Publication number
DE69734104D1
DE69734104D1 DE69734104T DE69734104T DE69734104D1 DE 69734104 D1 DE69734104 D1 DE 69734104D1 DE 69734104 T DE69734104 T DE 69734104T DE 69734104 T DE69734104 T DE 69734104T DE 69734104 D1 DE69734104 D1 DE 69734104D1
Authority
DE
Germany
Prior art keywords
closed
treatment device
clutch assembly
flat substrate
transmission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69734104T
Other languages
English (en)
Other versions
DE69734104T2 (de
Inventor
Claude Doche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE69734104D1 publication Critical patent/DE69734104D1/de
Application granted granted Critical
Publication of DE69734104T2 publication Critical patent/DE69734104T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
DE69734104T 1996-04-03 1997-04-02 Kupplungsanordnung für die geschlossene übertragung von einem flachen substrat von einem geschlossenen behälter zu einer behandlungseinrichtung Expired - Fee Related DE69734104T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9604170A FR2747111B1 (fr) 1996-04-03 1996-04-03 Systeme d'accouplement pour un transfert confine d'un objet plat d'une boite de confinement vers une unite de traitement de l'objet
FR9604170 1996-04-03
PCT/FR1997/000588 WO1997038440A1 (fr) 1996-04-03 1997-04-02 Systeme d'accouplement pour un transfert confine d'un objet plat d'une boite de confinement vers une unite de traitement de l'objet

Publications (2)

Publication Number Publication Date
DE69734104D1 true DE69734104D1 (de) 2005-10-06
DE69734104T2 DE69734104T2 (de) 2006-06-29

Family

ID=9490858

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69734104T Expired - Fee Related DE69734104T2 (de) 1996-04-03 1997-04-02 Kupplungsanordnung für die geschlossene übertragung von einem flachen substrat von einem geschlossenen behälter zu einer behandlungseinrichtung

Country Status (6)

Country Link
US (1) US6273664B1 (de)
EP (1) EP0891629B1 (de)
JP (1) JP2001515655A (de)
DE (1) DE69734104T2 (de)
FR (1) FR2747111B1 (de)
WO (1) WO1997038440A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2779421B1 (fr) * 1998-06-08 2000-08-18 Incam Solutions Dispositif adaptateur pour des boites de confinement d'au moins un objet plat sous atmosphere ultrapropre
JP2000286319A (ja) * 1999-03-31 2000-10-13 Canon Inc 基板搬送方法および半導体製造装置
JP4628530B2 (ja) * 2000-08-25 2011-02-09 株式会社ライト製作所 搬送容器の蓋着脱装置
JP3581310B2 (ja) * 2000-08-31 2004-10-27 Ｔｄｋ株式会社 防塵機能を備えた半導体ウェーハ処理装置
US6793766B2 (en) * 2001-01-04 2004-09-21 Applied Materials Inc. Apparatus having platforms positioned for precise centering of semiconductor wafers during processing
KR101233101B1 (ko) * 2004-08-19 2013-02-14 브룩스 오토메이션 인코퍼레이티드 저용량 캐리어 및 그 사용방법
US7771150B2 (en) 2005-08-26 2010-08-10 Jusung Engineering Co., Ltd. Gate valve and substrate-treating apparatus including the same
DE102005040741B4 (de) * 2005-08-26 2007-06-14 Asys Automatic Systems Gmbh & Co. Kg Bearbeitungsanlage modularen Aufbaus für flächige Substrate
US8097084B2 (en) * 2006-01-24 2012-01-17 Vat Holding Ag Vacuum chamber system for semiconductor processing
JP2008060513A (ja) * 2006-09-04 2008-03-13 Tokyo Electron Ltd 処理装置及び処理方法
JP4343241B2 (ja) * 2007-07-30 2009-10-14 Ｔｄｋ株式会社 収容容器の蓋開閉システム及び当該システムを用いた基板処理方法
JP4438966B2 (ja) * 2007-11-29 2010-03-24 Ｔｄｋ株式会社 収容容器の蓋開閉システム及び当該システムを用いた基板処理方法
JP4488255B2 (ja) * 2008-05-27 2010-06-23 Ｔｄｋ株式会社 密閉容器の蓋開閉システム、当該蓋開閉システムを含む収容物挿脱システム、及び当該蓋開閉システムを用いた基板処理方法
CN101685788B (zh) * 2008-09-23 2012-05-09 家登精密工业股份有限公司 具门闩及气密结构的前开式晶圆盒
JP4523661B1 (ja) * 2009-03-10 2010-08-11 三井造船株式会社 原子層堆積装置及び薄膜形成方法
JP5279576B2 (ja) * 2009-03-27 2013-09-04 大日本スクリーン製造株式会社 基板処理装置
WO2011151041A1 (en) * 2010-06-04 2011-12-08 Oc Oerlikon Balzers Ag Vacuum processing device
JP5729148B2 (ja) * 2011-06-07 2015-06-03 東京エレクトロン株式会社 基板搬送容器の開閉装置、蓋体の開閉装置及び半導体製造装置
JP6063716B2 (ja) 2012-11-14 2017-01-18 東京エレクトロン株式会社 基板処理装置及び基板搬送方法
DE102013104030A1 (de) 2013-04-22 2014-10-23 Aixtron Se Transportmodul für eine Halbleiterfertigungseinrichtung
US20150118012A1 (en) * 2013-10-31 2015-04-30 Lam Research Corporation Wafer entry port with gas concentration attenuators
DE102017123231A1 (de) 2017-10-06 2019-04-11 Aixtron Se Verschlusselement zum Verschlließen einer Beladeöffnung eines Innengehäuses eines CVD-Reaktors
KR102496315B1 (ko) * 2021-06-15 2023-02-08 주식회사 테크엑스 로드포트모듈

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884439A (ja) * 1981-11-16 1983-05-20 Hitachi Ltd 半導体製造装置
JP2525284B2 (ja) * 1990-10-22 1996-08-14 ティーディーケイ株式会社 クリ―ン搬送方法及び装置
DE69205571T2 (de) * 1992-08-04 1996-06-13 Ibm Unter Druck stehende Koppelsysteme zum Transferieren von einem Halbleiterwafer zwischen einem tragbaren abdichtbaren unter druckstehenden Behälter und einer Bearbeitungsanlage.
US5291923A (en) * 1992-09-24 1994-03-08 Internatinal Business Machines Corporation Door opening system and method
EP0591706B1 (de) * 1992-10-06 2002-04-24 Unaxis Balzers Aktiengesellschaft Kammer für den Transport von Werkstücken
FR2697000B1 (fr) * 1992-10-16 1994-11-25 Commissariat Energie Atomique Boîte plate de confinement d'un objet plat sous atmosphère spéciale.
ES2229247T3 (es) * 1995-03-28 2005-04-16 Brooks Automation Gmbh Estacion de carga y descarga para instalaciones de tratamiento de semiconductores.
US5961269A (en) * 1996-11-18 1999-10-05 Applied Materials, Inc. Three chamber load lock apparatus

Also Published As

Publication number Publication date
EP0891629B1 (de) 2005-08-31
US6273664B1 (en) 2001-08-14
JP2001515655A (ja) 2001-09-18
DE69734104T2 (de) 2006-06-29
EP0891629A1 (de) 1999-01-20
FR2747111A1 (fr) 1997-10-10
FR2747111B1 (fr) 1998-04-30
WO1997038440A1 (fr) 1997-10-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee