DE69824909D1 - Rastersondenmikroskop - Google Patents

Rastersondenmikroskop

Info

Publication number
DE69824909D1
DE69824909D1 DE69824909T DE69824909T DE69824909D1 DE 69824909 D1 DE69824909 D1 DE 69824909D1 DE 69824909 T DE69824909 T DE 69824909T DE 69824909 T DE69824909 T DE 69824909T DE 69824909 D1 DE69824909 D1 DE 69824909D1
Authority
DE
Germany
Prior art keywords
scanning probe
probe microscope
microscope
scanning
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69824909T
Other languages
English (en)
Other versions
DE69824909T2 (de
Inventor
Eisuke Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Science Corp
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Publication of DE69824909D1 publication Critical patent/DE69824909D1/de
Application granted granted Critical
Publication of DE69824909T2 publication Critical patent/DE69824909T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/02Probe holders
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/08Means for establishing or regulating a desired environmental condition within a sample chamber
    • G01Q30/10Thermal environment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/08Means for establishing or regulating a desired environmental condition within a sample chamber
    • G01Q30/12Fluid environment
    • G01Q30/14Liquid environment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22Probes, their manufacture, or their related instrumentation, e.g. holders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86Scanning probe structure
    • Y10S977/872Positioner
DE69824909T 1997-04-09 1998-04-09 Rastersondenmikroskop Expired - Lifetime DE69824909T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP09121697A JP3202646B2 (ja) 1997-04-09 1997-04-09 走査型プローブ顕微鏡
JP9121697 1997-04-09

Publications (2)

Publication Number Publication Date
DE69824909D1 true DE69824909D1 (de) 2004-08-12
DE69824909T2 DE69824909T2 (de) 2005-08-25

Family

ID=14020236

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69824909T Expired - Lifetime DE69824909T2 (de) 1997-04-09 1998-04-09 Rastersondenmikroskop

Country Status (7)

Country Link
US (1) US6201227B1 (de)
EP (1) EP0871006B1 (de)
JP (1) JP3202646B2 (de)
KR (1) KR19980081247A (de)
CA (1) CA2231310A1 (de)
DE (1) DE69824909T2 (de)
TW (1) TW371717B (de)

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US6466537B1 (en) * 1998-03-20 2002-10-15 Seiko Instruments Inc. Recording apparatus
JP3387846B2 (ja) * 1999-03-04 2003-03-17 セイコーインスツルメンツ株式会社 走査型プローブ顕微鏡
TW424155B (en) * 1999-05-03 2001-03-01 Ind Tech Res Inst Beating mode near-field optical microscope
JP2001027596A (ja) * 1999-05-13 2001-01-30 Canon Inc 走査型プローブによる表面特性・電気的特性の検出装置と検出方法、およびこれらにより構成されたマルチプローブによる表面特性・電気的特性の検出装置と検出方法、並びに観察装置と観察方法
US6888135B2 (en) 2000-10-18 2005-05-03 Nec Corporation Scanning probe microscope with probe formed by single conductive material
US20040257561A1 (en) * 2000-11-24 2004-12-23 Takao Nakagawa Apparatus and method for sampling
KR100421375B1 (ko) * 2001-01-15 2004-03-09 제원호 고속 주사탐침 현미경용 고주파 진동 탐침
KR100465086B1 (ko) * 2001-06-25 2005-01-06 학교법인 한양학원 접촉형 원자간력 현미경에 공급되는 구형파의 지속 시간및 진폭을 조절하는 장치 및 방법
US6953930B2 (en) * 2001-08-27 2005-10-11 Nippon Telegraph And Telephone Corporation Conductive transparent probe and probe control apparatus
JP3942869B2 (ja) * 2001-11-14 2007-07-11 エスアイアイ・ナノテクノロジー株式会社 走査型プローブ顕微鏡
US6853724B2 (en) * 2001-12-14 2005-02-08 Adc Dsl Systems, Inc. Cascade low-pass filter to improve xDSL band attenuation for POTS splitter
US20050092907A1 (en) * 2003-11-04 2005-05-05 West Paul E. Oscillating scanning probe microscope
JP2005288672A (ja) * 2004-04-06 2005-10-20 Mitsubishi Heavy Ind Ltd 微小構造体の製造方法及び製造装置
US8694088B2 (en) * 2005-01-07 2014-04-08 Bioelectromed Corp. Hand-held electric field imager for measuring the electric field in mammalian skin and other epithelial structures
US8597187B2 (en) * 2005-01-07 2013-12-03 Bioelectromed Corp. Hand-held electric field imager for measuring the surface topography of mammalian skin and other epithelial structures
KR100866048B1 (ko) * 2005-10-24 2008-10-30 주식회사 케이엔제이 평면 보상 자동 초점장치 및 방법
WO2008131416A1 (en) * 2007-04-24 2008-10-30 The University Of Akron Method and apparatus for performing apertureless near-field scanning optical microscopy
KR100934217B1 (ko) * 2007-12-10 2009-12-29 한국전자통신연구원 진동 측정을 위한 미소센서
KR100904281B1 (ko) * 2008-01-09 2009-06-25 파크시스템스 주식회사 주사 탐침 현미경 및 이를 이용한 측정방법
KR101065981B1 (ko) * 2009-05-20 2011-09-19 인하대학교 산학협력단 소리굽쇠-주사탐침 결합 진동계
MX2011012621A (es) * 2009-05-28 2012-03-06 Univ New York State Res Found Sonda de metrologia y metodo para configurar una sonda de metrologia.
KR101678041B1 (ko) * 2010-02-17 2016-11-21 삼성전자 주식회사 원자간 힘 현미경 및 이를 이용한 시료 측정방법
KR101218177B1 (ko) * 2010-04-05 2013-01-18 (주)나노포커스 원자현미경
US9527732B2 (en) * 2010-09-23 2016-12-27 Seagate Technology Llc Methods and devices for correcting errors in atomic force microscopy
US8695746B2 (en) 2011-03-21 2014-04-15 Polaris Industries Inc. Three wheeled vehicle
CN102506701B (zh) * 2011-10-14 2014-10-08 合肥工业大学 基于石英音叉的三维谐振触发测头及三维谐振触发定位方法
CN102538657B (zh) * 2011-12-30 2014-12-03 合肥工业大学 基于pvdf的三维谐振触发测头及三维谐振触发定位方法
DE102012108707A1 (de) * 2012-09-17 2014-05-28 Breitmeier Messtechnik Gmbh Oberflächenprofil- und/oder Rauheitsmessgerät
KR101415053B1 (ko) * 2012-12-31 2014-07-04 한국기계연구원 저온 mrfm의 프로브 장치
KR20140147589A (ko) 2013-06-20 2014-12-30 삼성전자주식회사 주사 탐침 현미경 및 그의 구동 방법
US20180321276A1 (en) * 2015-11-03 2018-11-08 Board Of Regents, The University Of Texas System Metrology devices and methods for independently controlling a plurality of sensing probes
WO2017079374A1 (en) 2015-11-03 2017-05-11 Board Of Regents, The University Of Texas System Metrology devices for rapid specimen setup
KR20230127379A (ko) * 2016-12-22 2023-08-31 매직 립, 인코포레이티드 섬유 스캐닝 디스플레이에 대한 다중-엘리먼트 링키지를 위한 방법들 및 시스템들
CN110550942B (zh) * 2019-09-16 2022-03-08 陕西理工大学 纳米孪晶二氧化硅压电材料的制备方法
KR102267767B1 (ko) * 2020-02-12 2021-06-21 서울대학교산학협력단 라만분석시스템
CN111982266B (zh) * 2020-06-24 2022-06-28 北京航空航天大学 一种扫描电子显微镜电子枪灯丝枪尖振动位移激光测量方法

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Publication number Priority date Publication date Assignee Title
JPS64401A (en) * 1987-05-29 1989-01-05 Agency Of Ind Science & Technol Mechanism for attaching and detaching fine adjustment element for stm
JPH02297003A (ja) * 1989-05-12 1990-12-07 Canon Inc 検出部位置決機構、圧電素子微動機構およびこれらを用いた走査型トンネル顕微鏡
JPH05180616A (ja) * 1992-01-08 1993-07-23 Canon Inc プローブ保持機構
US5376790A (en) * 1992-03-13 1994-12-27 Park Scientific Instruments Scanning probe microscope
JP3131517B2 (ja) * 1992-12-25 2001-02-05 オリンパス光学工業株式会社 走査型プローブ顕微鏡装置
JPH07167933A (ja) * 1993-12-15 1995-07-04 Nikon Corp 磁気偏光顕微鏡
JP3471882B2 (ja) * 1994-03-08 2003-12-02 キヤノン株式会社 走査型原子間力顕微鏡
GB2289759B (en) * 1994-05-11 1996-05-22 Khaled Karrau Coupled oscillator scanning imager
JP3581421B2 (ja) * 1995-02-23 2004-10-27 キヤノン株式会社 情報処理装置
JPH08248082A (ja) * 1995-03-08 1996-09-27 Nippon Telegr & Teleph Corp <Ntt> 電位分布測定方法および走査型顕微鏡
DE19524907A1 (de) 1995-07-08 1997-01-09 Frieder Mugele Rastersondenmikroskop
US5705814A (en) * 1995-08-30 1998-01-06 Digital Instruments, Inc. Scanning probe microscope having automatic probe exchange and alignment
JPH0982771A (ja) * 1995-09-19 1997-03-28 Toshiba Corp 半導体材料の評価方法およびその装置
JP2934739B2 (ja) * 1996-02-20 1999-08-16 セイコーインスツルメンツ株式会社 走査型近視野原子間力顕微鏡
JPH10283972A (ja) * 1997-04-10 1998-10-23 Seiko Instr Inc 走査型プローブ顕微鏡を用いた加工、記録、再生装置

Also Published As

Publication number Publication date
JPH10282121A (ja) 1998-10-23
JP3202646B2 (ja) 2001-08-27
EP0871006A1 (de) 1998-10-14
KR19980081247A (ko) 1998-11-25
TW371717B (en) 1999-10-11
CA2231310A1 (en) 1998-10-09
DE69824909T2 (de) 2005-08-25
EP0871006B1 (de) 2004-07-07
US6201227B1 (en) 2001-03-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SII NANO TECHNOLOGY INC., CHIBA, JP