DE69825327D1 - Prüfanordnung und Prüfverfahren - Google Patents

Prüfanordnung und Prüfverfahren

Info

Publication number
DE69825327D1
DE69825327D1 DE69825327T DE69825327T DE69825327D1 DE 69825327 D1 DE69825327 D1 DE 69825327D1 DE 69825327 T DE69825327 T DE 69825327T DE 69825327 T DE69825327 T DE 69825327T DE 69825327 D1 DE69825327 D1 DE 69825327D1
Authority
DE
Germany
Prior art keywords
test
arrangement
procedure
test procedure
test arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69825327T
Other languages
English (en)
Other versions
DE69825327T2 (de
Inventor
Shinji Iino
Haruhiko Yoshioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE69825327D1 publication Critical patent/DE69825327D1/de
Application granted granted Critical
Publication of DE69825327T2 publication Critical patent/DE69825327T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
DE69825327T 1997-05-08 1998-05-05 Prüfanordnung und Prüfverfahren Expired - Fee Related DE69825327T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13436597 1997-05-08
JP13436597 1997-05-08

Publications (2)

Publication Number Publication Date
DE69825327D1 true DE69825327D1 (de) 2004-09-02
DE69825327T2 DE69825327T2 (de) 2005-07-14

Family

ID=15126679

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69825327T Expired - Fee Related DE69825327T2 (de) 1997-05-08 1998-05-05 Prüfanordnung und Prüfverfahren
DE69810696T Expired - Fee Related DE69810696T2 (de) 1997-05-08 1998-05-05 Prüfanordnung und Prüfverfahren

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69810696T Expired - Fee Related DE69810696T2 (de) 1997-05-08 1998-05-05 Prüfanordnung und Prüfverfahren

Country Status (5)

Country Link
US (2) US6140828A (de)
EP (3) EP1258733A1 (de)
KR (1) KR100352941B1 (de)
DE (2) DE69825327T2 (de)
TW (1) TW399279B (de)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
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JP3356683B2 (ja) * 1998-04-04 2002-12-16 東京エレクトロン株式会社 プローブ装置
JP3066895B2 (ja) * 1998-12-10 2000-07-17 株式会社東京精密 顕微鏡チルト機構
JP4490521B2 (ja) * 1999-01-29 2010-06-30 東京エレクトロン株式会社 回転駆動機構及び被検査体の載置機構並びに検査装置
JP4054473B2 (ja) * 1999-02-22 2008-02-27 株式会社アドバンテスト 電子部品試験装置および電子部品の試験方法
JP2001284416A (ja) * 2000-03-30 2001-10-12 Nagase & Co Ltd 低温試験装置
JP2001358204A (ja) * 2000-06-15 2001-12-26 Tokyo Electron Ltd 検査ステージ
US6774621B2 (en) * 2000-06-15 2004-08-10 Tokyo Electron Limited Inspection stage having a plurality of Z axes
JP4721247B2 (ja) * 2001-03-16 2011-07-13 東京エレクトロン株式会社 プローブ方法及びプローブ装置
US7071714B2 (en) 2001-11-02 2006-07-04 Formfactor, Inc. Method and system for compensating for thermally induced motion of probe cards
US6972578B2 (en) * 2001-11-02 2005-12-06 Formfactor, Inc. Method and system for compensating thermally induced motion of probe cards
JP2003168707A (ja) * 2001-11-30 2003-06-13 Tokyo Electron Ltd プローブ装置
US6705095B2 (en) * 2002-03-08 2004-03-16 Kinetics Thermal Systems, Inc. Semiconductor process tool incorporating heat exchanger
US7554347B2 (en) * 2002-03-19 2009-06-30 Georgia Tech Research Corporation High input/output density optoelectronic probe card for wafer-level test of electrical and optical interconnect components, methods of fabrication, and methods of use
JP4357813B2 (ja) * 2002-08-23 2009-11-04 東京エレクトロン株式会社 プローブ装置及びプローブ方法
JP4659328B2 (ja) * 2002-10-21 2011-03-30 東京エレクトロン株式会社 被検査体を温度制御するプローブ装置
JP2004265895A (ja) * 2003-01-20 2004-09-24 Tokyo Electron Ltd 光学的測長器を備えたプローブ装置及びプローブ検査方法
US7218127B2 (en) * 2004-02-18 2007-05-15 Formfactor, Inc. Method and apparatus for probing an electronic device in which movement of probes and/or the electronic device includes a lateral component
KR100522975B1 (ko) * 2004-04-17 2005-10-19 (주)지오니스 자동정렬수단이 구비된 반도체 웨이퍼 분석용 프로버 시스템
US7148716B2 (en) 2004-06-10 2006-12-12 Texas Instruments Incorporated System and method for the probing of a wafer
EP1686387A1 (de) * 2005-01-27 2006-08-02 Capres A/S Verfahren und Vorrichtung zur Prüfung von elektrischen Eigenschaften.
KR100697273B1 (ko) * 2004-09-21 2007-03-21 삼성전자주식회사 설비 유지 보수에 소요되는 로스 타임을 줄일 수 있는반도체 설비의 유닛
JP4917017B2 (ja) 2005-03-07 2012-04-18 株式会社日本マイクロニクス 通電試験用プローブ及びこれを用いた電気的接続装置
US20070009034A1 (en) * 2005-07-05 2007-01-11 Jarno Tulkki Apparatuses, computer program product, and method for digital image processing
US20090045829A1 (en) * 2005-08-04 2009-02-19 Sumitomo Electric Industries, Ltd. Wafer holder for wafer prober and wafer prober equipped with same
US7368929B2 (en) 2006-01-18 2008-05-06 Electroglas, Inc. Methods and apparatuses for improved positioning in a probing system
US8311758B2 (en) 2006-01-18 2012-11-13 Formfactor, Inc. Methods and apparatuses for dynamic probe adjustment
US7546670B2 (en) * 2006-05-05 2009-06-16 International Business Machines Corporation Method for producing thermally matched probe assembly
KR100790817B1 (ko) * 2006-12-06 2008-01-03 삼성전자주식회사 반도체 제조관리 시스템
US7899917B2 (en) 2007-02-01 2011-03-01 Microsoft Corporation Synchronization framework for occasionally connected applications
JP4965273B2 (ja) * 2007-02-02 2012-07-04 東京エレクトロン株式会社 載置装置
WO2008114997A1 (en) * 2007-03-20 2008-09-25 Semics Inc. Apparatus of measuring pressure of chuck plate, correcting position of chuck plate and method thereof
JP4999615B2 (ja) 2007-08-31 2012-08-15 東京エレクトロン株式会社 検査装置及び検査方法
JP2009130114A (ja) * 2007-11-22 2009-06-11 Tokyo Electron Ltd 検査装置
JP5529605B2 (ja) * 2010-03-26 2014-06-25 東京エレクトロン株式会社 ウエハチャックの傾き補正方法及びプローブ装置
US20120139574A1 (en) * 2010-12-06 2012-06-07 International Business Machines Corporation Vertical probe tip rotational scrub and method
TWI474016B (zh) * 2013-07-05 2015-02-21 Hon Tech Inc Lightweight correction unit and its application equipment
KR101585182B1 (ko) * 2014-04-28 2016-01-14 황동원 반도체 소자 테스트용 소켓장치
CN104035022A (zh) * 2014-06-06 2014-09-10 胜宏科技（惠州）股份有限公司 一种自动化测试线路板的方法
JP7177324B2 (ja) * 2018-01-19 2022-11-24 セミックス インコーポレイテッド ウェハプローバ
CN110045269A (zh) * 2019-05-09 2019-07-23 肇庆学院 一种芯片测试装置及方法
US11204383B2 (en) * 2019-09-30 2021-12-21 Formfactor, Inc. Methods for maintaining gap spacing between an optical probe of a probe system and an optical device of a device under test, and probe systems that perform the methods
US11131709B2 (en) 2019-09-30 2021-09-28 Formfactor, Inc. Probe systems for optically probing a device under test and methods of operating the probe systems
JP7382888B2 (ja) * 2020-04-06 2023-11-17 東京エレクトロン株式会社 検査装置、及び、検査装置の制御方法
US11262401B2 (en) * 2020-04-22 2022-03-01 Mpi Corporation Wafer probe station
KR20220002101A (ko) * 2020-06-30 2022-01-06 도쿄엘렉트론가부시키가이샤 검사 장치 및 검사 방법
CN115236491B (zh) * 2022-07-26 2023-09-19 上海泽丰半导体科技有限公司 一种探针高速测试装置及测试系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3208734B2 (ja) * 1990-08-20 2001-09-17 東京エレクトロン株式会社 プローブ装置
US5321352A (en) * 1991-08-01 1994-06-14 Tokyo Electron Yamanashi Limited Probe apparatus and method of alignment for the same
US5404111A (en) * 1991-08-03 1995-04-04 Tokyo Electron Limited Probe apparatus with a swinging holder for an object of examination
US5321453A (en) * 1991-08-03 1994-06-14 Tokyo Electron Limited Probe apparatus for probing an object held above the probe card
JPH06124982A (ja) * 1992-01-14 1994-05-06 Mitsubishi Electric Corp 半導体試験装置
JP3219844B2 (ja) * 1992-06-01 2001-10-15 東京エレクトロン株式会社 プローブ装置
KR100248569B1 (ko) * 1993-12-22 2000-03-15 히가시 데쓰로 프로우브장치
US5510723A (en) * 1994-03-01 1996-04-23 Micron Custom Manufacturing, Inc. Usa Diced semiconductor device handler
EP0675366B1 (de) * 1994-03-31 2005-01-12 Tokyo Electron Limited Messfühlersystem und Messverfahren
JPH0883825A (ja) * 1994-09-09 1996-03-26 Tokyo Electron Ltd プローブ装置
JPH0933877A (ja) * 1995-07-14 1997-02-07 Tokyo Electron Ltd 検査装置
US6417683B1 (en) * 1999-07-09 2002-07-09 Electroglas, Inc. Apparatus for electrical testing of a substrate having a plurality of terminals

Also Published As

Publication number Publication date
TW399279B (en) 2000-07-21
US6850052B2 (en) 2005-02-01
EP0877258B1 (de) 2003-01-15
EP0877258A3 (de) 2000-09-06
EP1258733A1 (de) 2002-11-20
EP1160577A3 (de) 2002-08-07
EP0877258A2 (de) 1998-11-11
KR100352941B1 (ko) 2002-11-18
EP1160577B1 (de) 2004-07-28
DE69825327T2 (de) 2005-07-14
EP1160577A2 (de) 2001-12-05
US6140828A (en) 2000-10-31
US20030025495A1 (en) 2003-02-06
KR19980086871A (ko) 1998-12-05
DE69810696T2 (de) 2003-10-02
DE69810696D1 (de) 2003-02-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee