DE69827801D1 - Feldemitterherstellung durch elektrochemischen lift off mit offenem schaltkreis - Google Patents
Feldemitterherstellung durch elektrochemischen lift off mit offenem schaltkreisInfo
- Publication number
- DE69827801D1 DE69827801D1 DE69827801T DE69827801T DE69827801D1 DE 69827801 D1 DE69827801 D1 DE 69827801D1 DE 69827801 T DE69827801 T DE 69827801T DE 69827801 T DE69827801 T DE 69827801T DE 69827801 D1 DE69827801 D1 DE 69827801D1
- Authority
- DE
- Germany
- Prior art keywords
- open circuit
- field emitter
- emitter manufacturing
- electrochemical
- lift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/848,338 US5863233A (en) | 1996-03-05 | 1997-04-30 | Field emitter fabrication using open circuit electrochemical lift off |
US848338 | 1997-04-30 | ||
PCT/US1998/002525 WO1998049376A1 (en) | 1997-04-30 | 1998-02-10 | Field emitter fabrication using open circuit electrochemical lift off |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69827801D1 true DE69827801D1 (de) | 2004-12-30 |
DE69827801T2 DE69827801T2 (de) | 2005-11-03 |
Family
ID=25303008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69827801T Expired - Lifetime DE69827801T2 (de) | 1997-04-30 | 1998-02-10 | Feldemitterherstellung durch elektrochemischen lift off mit offenem schaltkreis |
Country Status (7)
Country | Link |
---|---|
US (1) | US5863233A (de) |
EP (1) | EP0998597B1 (de) |
JP (1) | JP4130233B2 (de) |
KR (1) | KR100393333B1 (de) |
DE (1) | DE69827801T2 (de) |
HK (1) | HK1024513A1 (de) |
WO (1) | WO1998049376A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6027632A (en) * | 1996-03-05 | 2000-02-22 | Candescent Technologies Corporation | Multi-step removal of excess emitter material in fabricating electron-emitting device |
US6120674A (en) * | 1997-06-30 | 2000-09-19 | Candescent Technologies Corporation | Electrochemical removal of material in electron-emitting device |
US6103095A (en) * | 1998-02-27 | 2000-08-15 | Candescent Technologies Corporation | Non-hazardous wet etching method |
JP2000294122A (ja) * | 1999-04-08 | 2000-10-20 | Nec Corp | 電界放出型冷陰極及び平面ディスプレイの製造方法 |
US7148148B2 (en) * | 2001-12-06 | 2006-12-12 | Seiko Epson Corporation | Mask forming and removing method, and semiconductor device, an electric circuit, a display module, a color filter and an emissive device manufactured by the same method |
US6670629B1 (en) * | 2002-09-06 | 2003-12-30 | Ge Medical Systems Global Technology Company, Llc | Insulated gate field emitter array |
US6750470B1 (en) | 2002-12-12 | 2004-06-15 | General Electric Company | Robust field emitter array design |
US20040113178A1 (en) * | 2002-12-12 | 2004-06-17 | Colin Wilson | Fused gate field emitter |
US7256540B2 (en) * | 2003-11-28 | 2007-08-14 | Samsung Sdi Co., Ltd | Electron emission device with a grid electrode |
JP4175298B2 (ja) * | 2004-07-07 | 2008-11-05 | セイコーエプソン株式会社 | カラーフィルタとその製造方法及び電気光学装置並びに電子機器 |
JP4803998B2 (ja) * | 2004-12-08 | 2011-10-26 | ソニー株式会社 | 電界放出型電子放出素子の製造方法 |
TWI437615B (zh) * | 2011-06-07 | 2014-05-11 | Au Optronics Corp | 場發射顯示元件之製作方法及應用於製作場發射顯示元件之電化學系統 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5129982A (en) * | 1991-03-15 | 1992-07-14 | General Motors Corporation | Selective electrochemical etching |
JP2833519B2 (ja) * | 1994-09-27 | 1998-12-09 | 日本電気株式会社 | 絶縁膜上の半導体膜の薄膜化方法および薄膜化装置 |
US5578900A (en) * | 1995-11-01 | 1996-11-26 | Industrial Technology Research Institute | Built in ion pump for field emission display |
US5766446A (en) * | 1996-03-05 | 1998-06-16 | Candescent Technologies Corporation | Electrochemical removal of material, particularly excess emitter material in electron-emitting device |
-
1997
- 1997-04-30 US US08/848,338 patent/US5863233A/en not_active Expired - Lifetime
-
1998
- 1998-02-10 KR KR10-1999-7009995A patent/KR100393333B1/ko not_active IP Right Cessation
- 1998-02-10 EP EP98906269A patent/EP0998597B1/de not_active Expired - Lifetime
- 1998-02-10 DE DE69827801T patent/DE69827801T2/de not_active Expired - Lifetime
- 1998-02-10 WO PCT/US1998/002525 patent/WO1998049376A1/en active IP Right Grant
- 1998-02-10 JP JP54694598A patent/JP4130233B2/ja not_active Expired - Fee Related
-
2000
- 2000-06-21 HK HK00103749A patent/HK1024513A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0998597A1 (de) | 2000-05-10 |
HK1024513A1 (en) | 2000-10-13 |
KR100393333B1 (ko) | 2003-08-02 |
DE69827801T2 (de) | 2005-11-03 |
KR20010020373A (ko) | 2001-03-15 |
EP0998597B1 (de) | 2004-11-24 |
JP2002511182A (ja) | 2002-04-09 |
WO1998049376A1 (en) | 1998-11-05 |
US5863233A (en) | 1999-01-26 |
EP0998597A4 (de) | 2000-05-10 |
JP4130233B2 (ja) | 2008-08-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: CANON K.K., TOKYO, JP |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: BOEHMERT & BOEHMERT, 28209 BREMEN |