TW396395B
(en)
*
|
1998-01-07 |
2000-07-01 |
Nikon Corp |
Exposure method and scanning-type aligner
|
ATE282590T1
(de)
|
1998-05-15 |
2004-12-15 |
Astrazeneca Ab |
Benzamid-derivate zur behandlung cytokin- vermittelter krankheiten
|
WO1999066542A1
(fr)
*
|
1998-06-17 |
1999-12-23 |
Nikon Corporation |
Procede et dispositif d'exposition
|
TW490596B
(en)
*
|
1999-03-08 |
2002-06-11 |
Asm Lithography Bv |
Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
|
US7116401B2
(en)
*
|
1999-03-08 |
2006-10-03 |
Asml Netherlands B.V. |
Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
|
US6924884B2
(en)
|
1999-03-08 |
2005-08-02 |
Asml Netherlands B.V. |
Off-axis leveling in lithographic projection apparatus
|
EP1037117A3
(de)
*
|
1999-03-08 |
2003-11-12 |
ASML Netherlands B.V. |
Ausseraxiale Nivellierung in einem lithographischen Projektionsapparat
|
JP2001015420A
(ja)
*
|
1999-06-30 |
2001-01-19 |
Toshiba Corp |
半導体ウエハのパターン露光方法およびパターン露光装置
|
JP2001160535A
(ja)
*
|
1999-09-20 |
2001-06-12 |
Nikon Corp |
露光装置、及び該装置を用いるデバイス製造方法
|
US6525802B1
(en)
*
|
1999-11-05 |
2003-02-25 |
Nikon Corporation |
Kinematic mounted reference mirror with provision for stable mounting of alignment optics
|
JP2001160530A
(ja)
|
1999-12-01 |
2001-06-12 |
Nikon Corp |
ステージ装置及び露光装置
|
JP2001332490A
(ja)
*
|
2000-03-14 |
2001-11-30 |
Nikon Corp |
位置合わせ方法、露光方法、露光装置、及びデバイス製造方法
|
US6717159B2
(en)
|
2000-10-18 |
2004-04-06 |
Nikon Corporation |
Low distortion kinematic reticle support
|
US6859260B2
(en)
*
|
2001-04-25 |
2005-02-22 |
Asml Holding N.V. |
Method and system for improving focus accuracy in a lithography system
|
DE10136387A1
(de)
*
|
2001-07-26 |
2003-02-13 |
Zeiss Carl |
Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
|
US6678038B2
(en)
|
2001-08-03 |
2004-01-13 |
Nikon Corporation |
Apparatus and methods for detecting tool-induced shift in microlithography apparatus
|
US6674512B2
(en)
|
2001-08-07 |
2004-01-06 |
Nikon Corporation |
Interferometer system for a semiconductor exposure system
|
US6785005B2
(en)
|
2001-09-21 |
2004-08-31 |
Nikon Corporation |
Switching type dual wafer stage
|
US6665054B2
(en)
|
2001-10-22 |
2003-12-16 |
Nikon Corporation |
Two stage method
|
JP3780221B2
(ja)
*
|
2002-03-26 |
2006-05-31 |
キヤノン株式会社 |
露光方法及び装置
|
DE10219514A1
(de)
*
|
2002-04-30 |
2003-11-13 |
Zeiss Carl Smt Ag |
Beleuchtungssystem, insbesondere für die EUV-Lithographie
|
US6757110B2
(en)
|
2002-05-29 |
2004-06-29 |
Asml Holding N.V. |
Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
|
US7170075B2
(en)
*
|
2002-07-18 |
2007-01-30 |
Rudolph Technologies, Inc. |
Inspection tool with a 3D point sensor to develop a focus map
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
JP4645027B2
(ja)
*
|
2002-12-10 |
2011-03-09 |
株式会社ニコン |
露光装置及び露光方法、デバイス製造方法
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
CN100429748C
(zh)
|
2002-12-10 |
2008-10-29 |
株式会社尼康 |
曝光装置和器件制造方法
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
EP3301511A1
(de)
|
2003-02-26 |
2018-04-04 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung der vorrichtung
|
SG123601A1
(en)
*
|
2003-03-10 |
2006-07-26 |
Asml Netherlands Bv |
Focus spot monitoring in a lithographic projectionapparatus
|
EP2270597B1
(de)
*
|
2003-04-09 |
2017-11-01 |
Nikon Corporation |
Belichtungsmethode und -apparat sowie Methode zur Herstellung einer Vorrichtung
|
KR101697896B1
(ko)
|
2003-04-11 |
2017-01-18 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
KR101324818B1
(ko)
*
|
2003-04-11 |
2013-11-01 |
가부시키가이샤 니콘 |
액침 리소그래피에 의한 광학기기의 세정방법
|
JPWO2004094940A1
(ja)
|
2003-04-23 |
2006-07-13 |
株式会社ニコン |
干渉計システム、干渉計システムにおける信号処理方法、該信号処理方法を用いるステージ
|
TWI237307B
(en)
*
|
2003-05-01 |
2005-08-01 |
Nikon Corp |
Optical projection system, light exposing apparatus and light exposing method
|
TWI295414B
(en)
*
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TW201806001A
(zh)
|
2003-05-23 |
2018-02-16 |
尼康股份有限公司 |
曝光裝置及元件製造方法
|
TWI463533B
(zh)
|
2003-05-23 |
2014-12-01 |
尼康股份有限公司 |
An exposure method, an exposure apparatus, and an element manufacturing method
|
KR20150036794A
(ko)
*
|
2003-05-28 |
2015-04-07 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치, 및 디바이스 제조 방법
|
TW200511388A
(en)
|
2003-06-13 |
2005-03-16 |
Nikon Corp |
Exposure method, substrate stage, exposure apparatus and method for manufacturing device
|
KR101475634B1
(ko)
|
2003-06-19 |
2014-12-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
ATE513309T1
(de)
*
|
2003-07-09 |
2011-07-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
WO2005006418A1
(ja)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
ATE489724T1
(de)
*
|
2003-07-09 |
2010-12-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementherstellung
|
US7196300B2
(en)
*
|
2003-07-18 |
2007-03-27 |
Rudolph Technologies, Inc. |
Dynamic focusing method and apparatus
|
EP1503244A1
(de)
*
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
|
CN102043350B
(zh)
|
2003-07-28 |
2014-01-29 |
株式会社尼康 |
曝光装置、器件制造方法、及曝光装置的控制方法
|
TW200513809A
(en)
*
|
2003-09-29 |
2005-04-16 |
Nippon Kogaku Kk |
Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method
|
KR101441840B1
(ko)
|
2003-09-29 |
2014-11-04 |
가부시키가이샤 니콘 |
노광장치, 노광방법 및 디바이스 제조방법
|
EP1670040B1
(de)
*
|
2003-09-29 |
2012-08-08 |
Nikon Corporation |
Projektions-belichtungseinrichtung, projektions-belichtungsverfahren und bauelement-herstellungsverfahren
|
JP4319188B2
(ja)
*
|
2003-10-08 |
2009-08-26 |
株式会社蔵王ニコン |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法
|
TW201738932A
(zh)
|
2003-10-09 |
2017-11-01 |
Nippon Kogaku Kk |
曝光裝置及曝光方法、元件製造方法
|
TWI569308B
(zh)
|
2003-10-28 |
2017-02-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
WO2005048325A1
(ja)
*
|
2003-11-17 |
2005-05-26 |
Nikon Corporation |
ステージ駆動方法及びステージ装置並びに露光装置
|
TWI385414B
(zh)
*
|
2003-11-20 |
2013-02-11 |
尼康股份有限公司 |
光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
|
TWI605315B
(zh)
|
2003-12-03 |
2017-11-11 |
Nippon Kogaku Kk |
Exposure device, exposure method, and device manufacturing method
|
US20050134865A1
(en)
*
|
2003-12-17 |
2005-06-23 |
Asml Netherlands B.V. |
Method for determining a map, device manufacturing method, and lithographic apparatus
|
US7265917B2
(en)
|
2003-12-23 |
2007-09-04 |
Carl Zeiss Smt Ag |
Replacement apparatus for an optical element
|
US6955074B2
(en)
*
|
2003-12-29 |
2005-10-18 |
Asml Netherlands, B.V. |
Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
|
WO2005067013A1
(ja)
|
2004-01-05 |
2005-07-21 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
CN1902733A
(zh)
*
|
2004-01-06 |
2007-01-24 |
株式会社尼康 |
曝光方法和装置以及器件制造方法
|
US7072024B2
(en)
*
|
2004-01-20 |
2006-07-04 |
Nikon Corporation |
Lithographic projection method and apparatus
|
US6980279B2
(en)
*
|
2004-01-22 |
2005-12-27 |
Nikon Corporation |
Interferometer system for measuring a height of wafer stage
|
JP4319189B2
(ja)
*
|
2004-01-26 |
2009-08-26 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
TWI395068B
(zh)
*
|
2004-01-27 |
2013-05-01 |
尼康股份有限公司 |
光學系統、曝光裝置以及曝光方法
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
KR101377815B1
(ko)
*
|
2004-02-03 |
2014-03-26 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US20070058146A1
(en)
*
|
2004-02-04 |
2007-03-15 |
Nikon Corporation |
Exposure apparatus, exposure method, position control method, and method for producing device
|
KR101579361B1
(ko)
|
2004-02-04 |
2015-12-21 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
TWI609410B
(zh)
|
2004-02-06 |
2017-12-21 |
尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法以及元件製造方法
|
KR101166007B1
(ko)
*
|
2004-02-10 |
2012-07-17 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법, 메인터넌스 방법 및노광 방법
|
US7113256B2
(en)
*
|
2004-02-18 |
2006-09-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method with feed-forward focus control
|
US20070030467A1
(en)
*
|
2004-02-19 |
2007-02-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device fabricating method
|
KR101106497B1
(ko)
*
|
2004-02-20 |
2012-01-20 |
가부시키가이샤 니콘 |
노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
|
US7130056B2
(en)
*
|
2004-02-20 |
2006-10-31 |
Agilent Technologies, Inc. |
System and method of using a side-mounted interferometer to acquire position information
|
US7362447B2
(en)
*
|
2004-02-20 |
2008-04-22 |
Agilent Technologies, Inc. |
Low walk-off interferometer
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
US6975407B1
(en)
*
|
2004-05-19 |
2005-12-13 |
Taiwan Semiconductor Manufacturing Co, Ltd. |
Method of wafer height mapping
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7158236B2
(en)
|
2004-05-21 |
2007-01-02 |
Agilent Technologies, Inc. |
Heterodyne laser interferometer for measuring wafer stage translation
|
US7796274B2
(en)
|
2004-06-04 |
2010-09-14 |
Carl Zeiss Smt Ag |
System for measuring the image quality of an optical imaging system
|
EP1768169B9
(de)
*
|
2004-06-04 |
2013-03-06 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung eines bauelementes
|
CN102290365B
(zh)
*
|
2004-06-09 |
2015-01-21 |
尼康股份有限公司 |
基板保持装置、具备其之曝光装置及方法、元件制造方法
|
KR101421915B1
(ko)
*
|
2004-06-09 |
2014-07-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8373843B2
(en)
*
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US8508713B2
(en)
*
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
KR101556454B1
(ko)
*
|
2004-06-10 |
2015-10-13 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US8717533B2
(en)
*
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
KR101505756B1
(ko)
*
|
2004-06-10 |
2015-03-26 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
US20080266037A1
(en)
*
|
2004-06-17 |
2008-10-30 |
Mark Williams |
Magnetic Levitation Lithography Apparatus and Method
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101433491B1
(ko)
*
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
ATE470235T1
(de)
|
2004-08-03 |
2010-06-15 |
Nikon Corp |
Belichtungsgeräte, belichtungsverfahren und bauelemente-herstellungsverfahren
|
TW200615716A
(en)
*
|
2004-08-05 |
2006-05-16 |
Nikon Corp |
Stage device and exposure device
|
US20060038972A1
(en)
*
|
2004-08-17 |
2006-02-23 |
Nikon Corporation |
Lithographic system with separated isolation structures
|
JP4983257B2
(ja)
*
|
2004-08-18 |
2012-07-25 |
株式会社ニコン |
露光装置、デバイス製造方法、計測部材、及び計測方法
|
US7706074B2
(en)
*
|
2004-09-13 |
2010-04-27 |
Nikon Corporation |
Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
|
KR101618493B1
(ko)
|
2004-09-17 |
2016-05-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
CN101032068B
(zh)
|
2004-10-01 |
2010-12-22 |
株式会社尼康 |
线性电机、载台装置和曝光装置
|
JP4613910B2
(ja)
*
|
2004-10-08 |
2011-01-19 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
TW200628995A
(en)
*
|
2004-10-13 |
2006-08-16 |
Nikon Corp |
Exposure device, exposure method, and device manufacturing method
|
WO2006041083A1
(ja)
*
|
2004-10-13 |
2006-04-20 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
US7456929B2
(en)
*
|
2004-10-15 |
2008-11-25 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
US20080151213A1
(en)
*
|
2004-10-18 |
2008-06-26 |
Dai Arai |
Bearing Device, Stage Device, and Exposure Apparatus
|
WO2006059634A1
(ja)
|
2004-12-01 |
2006-06-08 |
Nikon Corporation |
ステージ装置及び露光装置
|
TW200625026A
(en)
*
|
2004-12-06 |
2006-07-16 |
Nikon Corp |
Substrate processing method, method of exposure, exposure device and device manufacturing method
|
JP4752473B2
(ja)
*
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
US20060139595A1
(en)
*
|
2004-12-27 |
2006-06-29 |
Asml Netherlands B.V. |
Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
|
TW200923418A
(en)
*
|
2005-01-21 |
2009-06-01 |
Nikon Corp |
Exposure device, exposure method, fabricating method of device, exposure system, information collecting device, and measuring device
|
KR101427056B1
(ko)
|
2005-01-31 |
2014-08-05 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8692973B2
(en)
*
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
JP4738829B2
(ja)
*
|
2005-02-09 |
2011-08-03 |
キヤノン株式会社 |
位置決め装置
|
US20070258068A1
(en)
*
|
2005-02-17 |
2007-11-08 |
Hiroto Horikawa |
Exposure Apparatus, Exposure Method, and Device Fabricating Method
|
US7342641B2
(en)
*
|
2005-02-22 |
2008-03-11 |
Nikon Corporation |
Autofocus methods and devices for lithography
|
JP4946109B2
(ja)
*
|
2005-03-18 |
2012-06-06 |
株式会社ニコン |
露光方法、露光装置、及びデバイス製造方法
|
JP4844186B2
(ja)
|
2005-03-18 |
2011-12-28 |
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|
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(zh)
|
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2009-02-04 |
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|
JP4544303B2
(ja)
*
|
2005-03-30 |
2010-09-15 |
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|
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(ja)
*
|
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|
TW200644079A
(en)
*
|
2005-03-31 |
2006-12-16 |
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|
US20070132976A1
(en)
*
|
2005-03-31 |
2007-06-14 |
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|
US8089608B2
(en)
*
|
2005-04-18 |
2012-01-03 |
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|
US7349069B2
(en)
*
|
2005-04-20 |
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|
US7405811B2
(en)
*
|
2005-04-20 |
2008-07-29 |
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|
US8236467B2
(en)
*
|
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|
EP1876636A1
(de)
*
|
2005-04-28 |
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Belichtungsverfahren, belichtungsvorrichtung und verfahren zur herstellung von bauelementen
|
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(ja)
*
|
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|
US20070085989A1
(en)
*
|
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|
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(de)
|
2005-06-21 |
2011-04-27 |
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|
US7924416B2
(en)
*
|
2005-06-22 |
2011-04-12 |
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|
US8693006B2
(en)
*
|
2005-06-28 |
2014-04-08 |
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|
JPWO2007000995A1
(ja)
*
|
2005-06-28 |
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|
KR20080026082A
(ko)
*
|
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|
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(de)
*
|
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|
WO2007018127A1
(ja)
*
|
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|
US7355719B2
(en)
*
|
2005-08-16 |
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|
WO2007023813A1
(ja)
|
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|
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(ja)
|
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|
US8111374B2
(en)
*
|
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|
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(ja)
|
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|
US20070070323A1
(en)
*
|
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|
US7948675B2
(en)
*
|
2005-10-11 |
2011-05-24 |
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Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods
|
US8681314B2
(en)
*
|
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|
US20070095739A1
(en)
*
|
2005-10-24 |
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|
US20070127135A1
(en)
*
|
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|
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(de)
|
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2010-06-02 |
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|
US7878791B2
(en)
*
|
2005-11-04 |
2011-02-01 |
Asml Netherlands B.V. |
Imprint lithography
|
US8011915B2
(en)
|
2005-11-04 |
2011-09-06 |
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|
US20070127002A1
(en)
*
|
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|
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(ja)
|
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|
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(ja)
|
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|
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(ko)
|
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|
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(ja)
|
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|
EP1965414A4
(de)
*
|
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|
KR101704310B1
(ko)
*
|
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2017-02-07 |
가부시키가이샤 니콘 |
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|
US8411271B2
(en)
*
|
2005-12-28 |
2013-04-02 |
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|
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(zh)
|
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2015-09-30 |
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|
US7649611B2
(en)
*
|
2005-12-30 |
2010-01-19 |
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|
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(ja)
*
|
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|
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(en)
|
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|
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(en)
|
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|
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(de)
|
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2018-01-10 |
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|
US7253875B1
(en)
*
|
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|
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(ja)
|
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|
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(ja)
*
|
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|
US9478501B2
(en)
*
|
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|
EP1832933B1
(de)
*
|
2006-03-08 |
2008-10-01 |
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|
CN100590173C
(zh)
*
|
2006-03-24 |
2010-02-17 |
北京有色金属研究总院 |
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|
US7936443B2
(en)
*
|
2006-05-09 |
2011-05-03 |
Asml Netherlands B.V. |
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|
US20070267995A1
(en)
*
|
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2007-11-22 |
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Six Degree-of-Freedom Stage Apparatus
|
US7728462B2
(en)
*
|
2006-05-18 |
2010-06-01 |
Nikon Corporation |
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|
US20080024749A1
(en)
*
|
2006-05-18 |
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|
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(ja)
|
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|
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|
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|
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(de)
|
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2012-01-18 |
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|
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(de)
|
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|
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(ja)
|
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|
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(de)
*
|
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2014-07-02 |
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|
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(ko)
|
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|
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(de)
*
|
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2012-01-25 |
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|
US20080073563A1
(en)
|
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2008-03-27 |
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|
US7872730B2
(en)
*
|
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2011-01-18 |
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|
US8908144B2
(en)
*
|
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|
KR101391025B1
(ko)
*
|
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|
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(ko)
|
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|
US20080100575A1
(en)
*
|
2006-11-01 |
2008-05-01 |
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|
WO2008056735A1
(fr)
*
|
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2008-05-15 |
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|
WO2008059916A1
(fr)
*
|
2006-11-15 |
2008-05-22 |
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|
US20080158531A1
(en)
*
|
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|
US20080212047A1
(en)
*
|
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|
US8004651B2
(en)
*
|
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|
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(ja)
*
|
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|
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(ja)
*
|
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2010-06-03 |
株式会社ニコン |
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|
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(ko)
*
|
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가부시키가이샤 니콘 |
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|
US20080225261A1
(en)
*
|
2007-03-13 |
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|
US7830046B2
(en)
*
|
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2010-11-09 |
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|
US8497980B2
(en)
*
|
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2013-07-30 |
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|
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(en)
|
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2012-03-13 |
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|
US7903866B2
(en)
*
|
2007-03-29 |
2011-03-08 |
Asml Netherlands B.V. |
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|
US20080246941A1
(en)
*
|
2007-04-06 |
2008-10-09 |
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|
US8194322B2
(en)
*
|
2007-04-23 |
2012-06-05 |
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|
US20080266651A1
(en)
*
|
2007-04-24 |
2008-10-30 |
Katsuhiko Murakami |
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|
US8300207B2
(en)
*
|
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|
US20080285004A1
(en)
*
|
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|
US20090122282A1
(en)
*
|
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2009-05-14 |
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|
WO2008147175A1
(en)
*
|
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|
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(ko)
*
|
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가부시키가이샤 니콘 |
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|
US8164736B2
(en)
*
|
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2012-04-24 |
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|
US8098362B2
(en)
*
|
2007-05-30 |
2012-01-17 |
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|
WO2008149853A1
(ja)
*
|
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2008-12-11 |
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|
JP4968335B2
(ja)
*
|
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|
US8547527B2
(en)
*
|
2007-07-24 |
2013-10-01 |
Nikon Corporation |
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|
US8194232B2
(en)
|
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2012-06-05 |
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|
US8243257B2
(en)
|
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2012-08-14 |
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|
TWI526794B
(zh)
|
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2016-03-21 |
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|
US9025126B2
(en)
*
|
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2015-05-05 |
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|
US8237919B2
(en)
*
|
2007-08-24 |
2012-08-07 |
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|
US8218129B2
(en)
*
|
2007-08-24 |
2012-07-10 |
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|
US8023106B2
(en)
*
|
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2011-09-20 |
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|
US9304412B2
(en)
*
|
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2016-04-05 |
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|
US8867022B2
(en)
*
|
2007-08-24 |
2014-10-21 |
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|
US20090051895A1
(en)
*
|
2007-08-24 |
2009-02-26 |
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|
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(zh)
*
|
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|
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(en)
*
|
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2009-03-16 |
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|
US8421994B2
(en)
*
|
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2013-04-16 |
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|
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|
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2012-10-02 |
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|
US20090201484A1
(en)
*
|
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2009-08-13 |
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|
US9013681B2
(en)
*
|
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|
US9256140B2
(en)
*
|
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2016-02-09 |
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Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
|
CN101675500B
(zh)
*
|
2007-11-07 |
2011-05-18 |
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|
US8665455B2
(en)
*
|
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|
US8422015B2
(en)
|
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2013-04-16 |
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|
US20090147228A1
(en)
*
|
2007-12-11 |
2009-06-11 |
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|
SG185261A1
(en)
*
|
2007-12-11 |
2012-11-29 |
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|
US8964166B2
(en)
*
|
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|
KR20100102580A
(ko)
*
|
2007-12-17 |
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|
US20090174873A1
(en)
*
|
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Nikon Corporation |
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|
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(zh)
|
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|
US8269945B2
(en)
*
|
2007-12-28 |
2012-09-18 |
Nikon Corporation |
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|
US8451425B2
(en)
*
|
2007-12-28 |
2013-05-28 |
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|
JP5369443B2
(ja)
|
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2013-12-18 |
株式会社ニコン |
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|
JP5344180B2
(ja)
*
|
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2013-11-20 |
株式会社ニコン |
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|
US20090218743A1
(en)
*
|
2008-02-29 |
2009-09-03 |
Nikon Corporation |
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|
JP5256790B2
(ja)
*
|
2008-03-11 |
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固体撮像装置、固体撮像装置の製造方法、及びカメラモジュールの製造方法
|
US20100039628A1
(en)
*
|
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Nikon Corporation |
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|
US8233139B2
(en)
*
|
2008-03-27 |
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Nikon Corporation |
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|
DE102008000967B4
(de)
*
|
2008-04-03 |
2015-04-09 |
Carl Zeiss Smt Gmbh |
Projektionsbelichtungsanlage für die EUV-Mikrolithographie
|
JPWO2009125867A1
(ja)
*
|
2008-04-11 |
2011-08-04 |
株式会社ニコン |
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|
US8654306B2
(en)
*
|
2008-04-14 |
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|
KR20100135215A
(ko)
*
|
2008-04-30 |
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가부시키가이샤 니콘 |
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|
US8786829B2
(en)
*
|
2008-05-13 |
2014-07-22 |
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|
US8817236B2
(en)
|
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2014-08-26 |
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|
US8228482B2
(en)
*
|
2008-05-13 |
2012-07-24 |
Nikon Corporation |
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|
US7940374B2
(en)
*
|
2008-06-30 |
2011-05-10 |
Asml Holding N.V. |
Parallel process focus compensation
|
WO2010005081A1
(ja)
*
|
2008-07-10 |
2010-01-14 |
株式会社ニコン |
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|
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(ko)
|
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2010-03-12 |
(주)비노시스 |
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|
TW201009895A
(en)
*
|
2008-08-11 |
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|
JP5131094B2
(ja)
*
|
2008-08-29 |
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|
US8435723B2
(en)
*
|
2008-09-11 |
2013-05-07 |
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|
US20100302526A1
(en)
*
|
2008-11-13 |
2010-12-02 |
Nikon Corporation |
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|
US8599359B2
(en)
|
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2013-12-03 |
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|
US8773635B2
(en)
*
|
2008-12-19 |
2014-07-08 |
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|
US8902402B2
(en)
*
|
2008-12-19 |
2014-12-02 |
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|
US8760629B2
(en)
|
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2014-06-24 |
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|
US8896806B2
(en)
*
|
2008-12-29 |
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|
US20100196832A1
(en)
|
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|
EP2219077A1
(de)
|
2009-02-12 |
2010-08-18 |
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|
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(ja)
|
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|
US8739383B2
(en)
*
|
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2014-06-03 |
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|
US8953143B2
(en)
*
|
2009-04-24 |
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|
US8202671B2
(en)
|
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2012-06-19 |
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|
US20100296074A1
(en)
*
|
2009-04-30 |
2010-11-25 |
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|
US20110085152A1
(en)
*
|
2009-05-07 |
2011-04-14 |
Hideaki Nishino |
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|
US20100323303A1
(en)
*
|
2009-05-15 |
2010-12-23 |
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|
JPWO2010131490A1
(ja)
*
|
2009-05-15 |
2012-11-01 |
株式会社ニコン |
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|
US8792084B2
(en)
|
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|
US8970820B2
(en)
|
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2015-03-03 |
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|
US8619231B2
(en)
|
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2013-12-31 |
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|
US9312159B2
(en)
|
2009-06-09 |
2016-04-12 |
Nikon Corporation |
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|
NL2004735A
(en)
*
|
2009-07-06 |
2011-01-10 |
Asml Netherlands Bv |
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|
WO2011016255A1
(ja)
*
|
2009-08-07 |
2011-02-10 |
株式会社ニコン |
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|
TWI579659B
(zh)
*
|
2009-08-07 |
2017-04-21 |
尼康股份有限公司 |
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|
US20110037962A1
(en)
*
|
2009-08-17 |
2011-02-17 |
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|
US8514395B2
(en)
|
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|
US8488109B2
(en)
|
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2013-07-16 |
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|
US8493547B2
(en)
|
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2013-07-23 |
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|
US20110096306A1
(en)
*
|
2009-09-28 |
2011-04-28 |
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|
US20110199591A1
(en)
*
|
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|
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(ko)
|
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|
JP5783376B2
(ja)
*
|
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|
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(zh)
|
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|
US20110134400A1
(en)
|
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|
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(ko)
|
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|
US8488106B2
(en)
|
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2013-07-16 |
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|
WO2011083724A1
(ja)
|
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|
US8841065B2
(en)
*
|
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|
WO2011102109A1
(ja)
|
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|
US20110205519A1
(en)
*
|
2010-02-25 |
2011-08-25 |
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|
US20110222031A1
(en)
*
|
2010-03-12 |
2011-09-15 |
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|
US8937703B2
(en)
|
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2015-01-20 |
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|
US20120013864A1
(en)
|
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2012-01-19 |
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|
US20120013863A1
(en)
|
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|
US20120012191A1
(en)
|
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2012-01-19 |
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|
US20120019804A1
(en)
|
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|
US20120019802A1
(en)
|
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|
US20120019803A1
(en)
|
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|
US20120188521A1
(en)
|
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2012-07-26 |
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|
US20120162619A1
(en)
|
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2012-06-28 |
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|
US9746787B2
(en)
|
2011-02-22 |
2017-08-29 |
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|
CN102692195B
(zh)
*
|
2011-03-21 |
2015-05-13 |
上海微电子装备有限公司 |
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|
US20130016329A1
(en)
|
2011-07-12 |
2013-01-17 |
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|
US9329496B2
(en)
|
2011-07-21 |
2016-05-03 |
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|
US9256137B2
(en)
|
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2016-02-09 |
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|
US20130050666A1
(en)
|
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2013-02-28 |
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|
US20130135594A1
(en)
|
2011-11-25 |
2013-05-30 |
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|
US20130169944A1
(en)
|
2011-12-28 |
2013-07-04 |
Nikon Corporation |
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|
CN103197506B
(zh)
*
|
2012-01-10 |
2015-11-18 |
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|
DE102012201393A1
(de)
*
|
2012-02-01 |
2013-08-01 |
Dr. Johannes Heidenhain Gmbh |
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|
US9323160B2
(en)
|
2012-04-10 |
2016-04-26 |
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|
US9268231B2
(en)
|
2012-04-10 |
2016-02-23 |
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|
WO2013175835A1
(ja)
|
2012-05-21 |
2013-11-28 |
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|
US9823580B2
(en)
|
2012-07-20 |
2017-11-21 |
Nikon Corporation |
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|
US9494870B2
(en)
|
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2016-11-15 |
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|
US9568828B2
(en)
|
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2017-02-14 |
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|
EP3866184A1
(de)
|
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2021-08-18 |
Nikon Corporation |
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|
CN104956465B
(zh)
|
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2018-05-29 |
株式会社尼康 |
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|
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(ja)
|
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株式会社ニコン |
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|
US9651873B2
(en)
|
2012-12-27 |
2017-05-16 |
Nikon Corporation |
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|
US9720331B2
(en)
|
2012-12-27 |
2017-08-01 |
Nikon Corporation |
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|
US9352073B2
(en)
|
2013-01-22 |
2016-05-31 |
Niko Corporation |
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|
US9057955B2
(en)
|
2013-01-22 |
2015-06-16 |
Nikon Corporation |
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|
JP5979302B2
(ja)
|
2013-02-28 |
2016-08-24 |
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|
EP2998980A4
(de)
|
2013-05-09 |
2016-11-16 |
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|
WO2015001805A1
(ja)
|
2013-07-05 |
2015-01-08 |
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|
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(de)
|
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2018-11-21 |
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|
KR102411747B1
(ko)
|
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가부시키가이샤 니콘 |
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|
CN104777715B
(zh)
*
|
2014-01-10 |
2017-03-29 |
上海微电子装备有限公司 |
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|
KR101963012B1
(ko)
|
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|
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(zh)
|
2015-02-23 |
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株式会社尼康 |
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|
KR20240010551A
(ko)
*
|
2015-02-23 |
2024-01-23 |
가부시키가이샤 니콘 |
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|
EP3264179B1
(de)
|
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|
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(zh)
|
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|
WO2018038071A1
(ja)
|
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|
JP7081490B2
(ja)
|
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