DE69840914D1 - Methode zur Herstellung eines elektrischen Kondensators - Google Patents

Methode zur Herstellung eines elektrischen Kondensators

Info

Publication number
DE69840914D1
DE69840914D1 DE69840914T DE69840914T DE69840914D1 DE 69840914 D1 DE69840914 D1 DE 69840914D1 DE 69840914 T DE69840914 T DE 69840914T DE 69840914 T DE69840914 T DE 69840914T DE 69840914 D1 DE69840914 D1 DE 69840914D1
Authority
DE
Germany
Prior art keywords
producing
electrical capacitor
droplets
depositing
drop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69840914T
Other languages
English (en)
Inventor
Stuart Speakman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Patterning Technologies Ltd
Original Assignee
Patterning Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB9721809A external-priority patent/GB2330331B/en
Priority claimed from GB9721808A external-priority patent/GB2330451B/en
Application filed by Patterning Technologies Ltd filed Critical Patterning Technologies Ltd
Application granted granted Critical
Publication of DE69840914D1 publication Critical patent/DE69840914D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y40/00Auxiliary operations or equipment, e.g. for material handling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00Products made by additive manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B41J3/4073Printing on three-dimensional objects not being in sheet or web form, e.g. spherical or cubic objects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4908Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0564Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
    • H01M10/0565Polymeric materials, e.g. gel-type or solid-type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M6/00Primary cells; Manufacture thereof
    • H01M6/14Cells with non-aqueous electrolyte
    • H01M6/18Cells with non-aqueous electrolyte with solid electrolyte
    • H01M6/188Processes of manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M6/00Primary cells; Manufacture thereof
    • H01M6/40Printed batteries, e.g. thin film batteries
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/102Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by bonding of conductive powder, i.e. metallic powder
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/01Manufacture or treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y40/00Auxiliary operations or equipment, e.g. for material handling
    • B33Y40/10Pre-treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/20Organic diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10Transparent electrodes, e.g. using graphene
    • H10K2102/101Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/10Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/20Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
DE69840914T 1997-10-14 1998-10-14 Methode zur Herstellung eines elektrischen Kondensators Expired - Fee Related DE69840914D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9721809A GB2330331B (en) 1997-10-14 1997-10-14 Method of forming a circuit element on a surface
GB9721808A GB2330451B (en) 1997-10-14 1997-10-14 Method of forming an electronic device
PCT/GB1998/003087 WO1999019900A2 (en) 1997-10-14 1998-10-14 Method of forming an electronic device

Publications (1)

Publication Number Publication Date
DE69840914D1 true DE69840914D1 (de) 2009-07-30

Family

ID=26312430

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69840914T Expired - Fee Related DE69840914D1 (de) 1997-10-14 1998-10-14 Methode zur Herstellung eines elektrischen Kondensators

Country Status (7)

Country Link
US (3) US6503831B2 (de)
EP (1) EP1027723B1 (de)
AT (1) ATE434259T1 (de)
AU (1) AU9451098A (de)
CA (1) CA2306384A1 (de)
DE (1) DE69840914D1 (de)
WO (1) WO1999019900A2 (de)

Families Citing this family (665)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7625420B1 (en) * 1997-02-24 2009-12-01 Cabot Corporation Copper powders methods for producing powders and devices fabricated from same
US6338809B1 (en) 1997-02-24 2002-01-15 Superior Micropowders Llc Aerosol method and apparatus, particulate products, and electronic devices made therefrom
US7476411B1 (en) 1997-02-24 2009-01-13 Cabot Corporation Direct-write deposition of phosphor powders
CA2306384A1 (en) 1997-10-14 1999-04-22 Patterning Technologies Limited Method of forming an electronic device
DE19826971C2 (de) * 1998-06-18 2002-03-14 Reiner Goetzen Verfahren zum mechanischen und elektrischen Verbinden von Systembauteilen
US20030148024A1 (en) * 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
US7938079B2 (en) * 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US7294366B2 (en) * 1998-09-30 2007-11-13 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
US7108894B2 (en) * 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US20040197493A1 (en) * 1998-09-30 2004-10-07 Optomec Design Company Apparatus, methods and precision spray processes for direct write and maskless mesoscale material deposition
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
US8110247B2 (en) * 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US7323634B2 (en) 1998-10-14 2008-01-29 Patterning Technologies Limited Method of forming an electronic device
US6958865B1 (en) * 1998-11-12 2005-10-25 California Institute Of Technology Microlicensing particles and applications
US6878312B1 (en) 1999-03-29 2005-04-12 Seiko Epson Corporation Composition, film manufacturing method, as well as functional device and manufacturing method therefore
JP2003506886A (ja) * 1999-05-27 2003-02-18 パターニング テクノロジーズ リミテッド 表面にマスキングパターンを形成する方法
GB2350321A (en) * 1999-05-27 2000-11-29 Patterning Technologies Ltd Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition
FR2795234B1 (fr) * 1999-06-15 2003-07-18 Gemplus Card Int Procede de fabrication de tout ou partie d'un dispositif electronique par jet de matiere
GB9914489D0 (en) * 1999-06-21 1999-08-25 Univ Cambridge Tech Transistors
WO2000079617A1 (en) 1999-06-21 2000-12-28 Cambridge University Technical Services Limited Aligned polymers for an organic tft
DE19935527A1 (de) * 1999-07-28 2001-02-08 Giesecke & Devrient Gmbh Aktive Folie für Chipkarten mit Display
KR20010103000A (ko) * 1999-11-29 2001-11-17 요트.게.아. 롤페즈 유기 전기발광 디바이스와 그 제조 방법
KR100940110B1 (ko) * 1999-12-21 2010-02-02 플라스틱 로직 리미티드 잉크젯으로 제조되는 집적회로 및 전자 디바이스 제조 방법
GB9930217D0 (en) * 1999-12-21 2000-02-09 Univ Cambridge Tech Solutiion processed transistors
US20040252867A1 (en) * 2000-01-05 2004-12-16 Je-Hsiung Lan Biometric sensor
AU2000225122A1 (en) * 2000-01-21 2001-07-31 Midwest Research Institute Method for forming thin-film conductors through the decomposition of metal-chelates in association with metal particles
US6998656B2 (en) * 2003-02-07 2006-02-14 Hewlett-Packard Development Company, L.P. Transparent double-injection field-effect transistor
HUP0101103A2 (hu) 2000-03-17 2001-11-28 Sony Corporation Eljárás és berendezés száraz tartalék akkumulátor gyártására
US6743395B2 (en) * 2000-03-22 2004-06-01 Ebara Corporation Composite metallic ultrafine particles and process for producing the same
JP4010091B2 (ja) * 2000-03-23 2007-11-21 セイコーエプソン株式会社 メモリデバイスおよびその製造方法
WO2001096050A2 (en) * 2000-06-13 2001-12-20 Element Six (Pty) Ltd Composite diamond compacts
WO2002003322A1 (de) * 2000-07-03 2002-01-10 Isa Conductive Microsystems Gmbh Verfahren zum herstellen eines kartenförmigen datenträgers und vorrichtung zur durchführung des verfahrens
GB0016660D0 (en) * 2000-07-06 2000-08-23 Cambridge Display Tech Ltd Method of producing an organic light-emitting device
DE10038895B4 (de) 2000-08-09 2006-04-06 Advanced Photonics Technologies Ag Verfahren und Verwendung einer Vorrichtung zur Herstellung eines halbleitenden und/oder Elektrolumineszenz zeigenden organischen Schichtaufbaus
US6301055B1 (en) * 2000-08-16 2001-10-09 California Institute Of Technology Solid immersion lens structures and methods for producing solid immersion lens structures
JP3805266B2 (ja) * 2002-02-27 2006-08-02 Uht株式会社 セラミック積層体の製造装置
WO2002103753A2 (en) * 2000-11-01 2002-12-27 Myrick James J Nanoelectronic interconnection and addressing
US6558753B1 (en) 2000-11-09 2003-05-06 3M Innovative Properties Company Inks and other compositions incorporating limited quantities of solvent advantageously used in ink jetting applications
JP2004514014A (ja) 2000-11-09 2004-05-13 スリーエム イノベイティブ プロパティズ カンパニー 屋外用途に特に適した耐候性でインクジェット可能な放射線硬化性流体組成物
DE10059498A1 (de) 2000-11-30 2002-06-13 Infineon Technologies Ag Substrat mit einer halbleitenden Schicht, elektronisches Bauelement mit diesem Substrat, elektronische Schaltung mit mindestens einem solchen elektronischen Bauelement, druckbare Zusammensetzung sowie Verfahren zur Herstellung eines Substrats
GB0030095D0 (en) * 2000-12-09 2001-01-24 Xaar Technology Ltd Method of ink jet printing
US6605314B2 (en) 2000-12-14 2003-08-12 Kemet Electronics Corporation Method of applying masking material
WO2002052617A1 (de) * 2000-12-23 2002-07-04 Aixtron Ag Verfahren und vorrichtung zur bearbeitung von halbleitersubstraten
US6513897B2 (en) 2000-12-29 2003-02-04 3M Innovative Properties Co. Multiple resolution fluid applicator and method
JP3958972B2 (ja) * 2001-01-19 2007-08-15 矢崎総業株式会社 回路体の製造方法及び回路体の製造装置
EP1227347A1 (de) * 2001-01-29 2002-07-31 Rolic AG Optische Vorrichtung und Verfahren zu deren Herstellung
US6602731B2 (en) * 2001-02-07 2003-08-05 Agfa Gevaert Manufacturing of a thin inorganic light emitting diode
CN1276518C (zh) 2001-05-07 2006-09-20 先进微装置公司 使用复合分子材料的浮置栅极存储装置
JP4731794B2 (ja) 2001-05-07 2011-07-27 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド メモリ効果を有するスイッチ素子及び該素子をスイッチングさせる方法
US6873540B2 (en) 2001-05-07 2005-03-29 Advanced Micro Devices, Inc. Molecular memory cell
US6781868B2 (en) 2001-05-07 2004-08-24 Advanced Micro Devices, Inc. Molecular memory device
US6844608B2 (en) 2001-05-07 2005-01-18 Advanced Micro Devices, Inc. Reversible field-programmable electric interconnects
JP3969698B2 (ja) * 2001-05-21 2007-09-05 株式会社半導体エネルギー研究所 発光装置の作製方法
KR20040024558A (ko) * 2001-06-01 2004-03-20 리트렉스 코오포레이션 압전 미세증착을 이용한 인쇄회로보드 구조물의 형성
US20020197393A1 (en) * 2001-06-08 2002-12-26 Hideaki Kuwabara Process of manufacturing luminescent device
US6670280B2 (en) * 2001-06-15 2003-12-30 University Of Southampton Methods of microstructuring ferroelectric materials
EP1271227A1 (de) * 2001-06-26 2003-01-02 Nanomat Limited Elektrochrome Anzeige mit hoher Auflösung und Verfahren zu deren Herstellung
TW541710B (en) * 2001-06-27 2003-07-11 Epistar Corp LED having transparent substrate and the manufacturing method thereof
US6958522B2 (en) * 2001-07-05 2005-10-25 International Business Machines Corporation Method to fabricate passive components using conductive polymer
DE10133273A1 (de) * 2001-07-09 2003-01-30 Bayer Cropscience Ag Vorrichtung und Verfahren zum Nachweis der Photosynthese-Hemmung
US6710366B1 (en) 2001-08-02 2004-03-23 Ultradots, Inc. Nanocomposite materials with engineered properties
US20030066998A1 (en) * 2001-08-02 2003-04-10 Lee Howard Wing Hoon Quantum dots of Group IV semiconductor materials
US6819845B2 (en) 2001-08-02 2004-11-16 Ultradots, Inc. Optical devices with engineered nonlinear nanocomposite materials
US6794265B2 (en) * 2001-08-02 2004-09-21 Ultradots, Inc. Methods of forming quantum dots of Group IV semiconductor materials
JP3634828B2 (ja) * 2001-08-09 2005-03-30 キヤノン株式会社 電子源の製造方法及び画像表示装置の製造方法
US6806526B2 (en) 2001-08-13 2004-10-19 Advanced Micro Devices, Inc. Memory device
EP1434232B1 (de) 2001-08-13 2007-09-19 Advanced Micro Devices, Inc. Speicherzelle
US6858481B2 (en) 2001-08-13 2005-02-22 Advanced Micro Devices, Inc. Memory device with active and passive layers
US6768157B2 (en) 2001-08-13 2004-07-27 Advanced Micro Devices, Inc. Memory device
US6838720B2 (en) 2001-08-13 2005-01-04 Advanced Micro Devices, Inc. Memory device with active passive layers
KR100438888B1 (ko) * 2001-09-07 2004-07-02 한국전자통신연구원 정공 수송/주입 능력이 있는 화합물과 이를 포함하는분자자기조립막을 갖춘 유기 전기발광 소자
GB2379414A (en) * 2001-09-10 2003-03-12 Seiko Epson Corp Method of forming a large flexible electronic display on a substrate using an inkjet head(s) disposed about a vacuum roller holding the substrate
GB2379415A (en) * 2001-09-10 2003-03-12 Seiko Epson Corp Monitoring the deposition of organic polymer droplets onto a substrate
US20030108664A1 (en) * 2001-10-05 2003-06-12 Kodas Toivo T. Methods and compositions for the formation of recessed electrical features on a substrate
US7524528B2 (en) * 2001-10-05 2009-04-28 Cabot Corporation Precursor compositions and methods for the deposition of passive electrical components on a substrate
US20060001726A1 (en) * 2001-10-05 2006-01-05 Cabot Corporation Printable conductive features and processes for making same
US7629017B2 (en) * 2001-10-05 2009-12-08 Cabot Corporation Methods for the deposition of conductive electronic features
JP4763237B2 (ja) * 2001-10-19 2011-08-31 キャボット コーポレイション 基板上に導電性電子部品を製造する方法
US7553512B2 (en) * 2001-11-02 2009-06-30 Cabot Corporation Method for fabricating an inorganic resistor
GB0127252D0 (en) * 2001-11-13 2002-01-02 Vantico Ag Production of composite articles composed of thin layers
FR2832941B1 (fr) 2001-11-30 2004-09-24 Gemplus Card Int Nettoyage de tetes de jet de matiere
GB2382798A (en) * 2001-12-04 2003-06-11 Qinetiq Ltd Inkjet printer which deposits at least two fluids on a substrate such that the fluids react chemically to form a product thereon
US6660564B2 (en) * 2002-01-25 2003-12-09 Sony Corporation Wafer-level through-wafer packaging process for MEMS and MEMS package produced thereby
US6874645B2 (en) * 2002-02-15 2005-04-05 David Lee Broderick Media disc storage and display device
FR2836263B1 (fr) * 2002-02-19 2005-02-04 Banque De France Document de securite a circuit integre
US20030169539A1 (en) * 2002-03-07 2003-09-11 International Business Machines Corporation Electrostatic discharge insensilive recording head with a high-resistance gap layer
US6950220B2 (en) * 2002-03-18 2005-09-27 E Ink Corporation Electro-optic displays, and methods for driving same
JP3805273B2 (ja) * 2002-03-29 2006-08-02 Uht株式会社 積層型電子部品の製造装置
JP4042497B2 (ja) * 2002-04-15 2008-02-06 セイコーエプソン株式会社 導電膜パターンの形成方法、配線基板、電子デバイス、電子機器、並びに非接触型カード媒体
JP3925283B2 (ja) * 2002-04-16 2007-06-06 セイコーエプソン株式会社 電子デバイスの製造方法、電子機器の製造方法
JP3578162B2 (ja) * 2002-04-16 2004-10-20 セイコーエプソン株式会社 パターンの形成方法、パターン形成装置、導電膜配線、デバイスの製造方法、電気光学装置、並びに電子機器
JP3603896B2 (ja) * 2002-04-19 2004-12-22 セイコーエプソン株式会社 デバイスの製造方法、デバイス製造装置、デバイス及び電子機器
US7118943B2 (en) * 2002-04-22 2006-10-10 Seiko Epson Corporation Production method of a thin film device, production method of a transistor, electro-optical apparatus and electronic equipment
JP4068883B2 (ja) * 2002-04-22 2008-03-26 セイコーエプソン株式会社 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法
DE10219120A1 (de) 2002-04-29 2003-11-20 Infineon Technologies Ag Oberflächenfunktionalisierte anorganische Halbleiterpartikel als elektrische Halbleiter für mikroelektronische Anwendungen
US6949389B2 (en) * 2002-05-02 2005-09-27 Osram Opto Semiconductors Gmbh Encapsulation for organic light emitting diodes devices
GB2388709A (en) * 2002-05-17 2003-11-19 Seiko Epson Corp Circuit fabrication method
US7259803B2 (en) * 2002-05-27 2007-08-21 Nitto Denko Corporation Resin sheet, liquid crystal cell substrate comprising the same
US7727777B2 (en) * 2002-05-31 2010-06-01 Ebrahim Andideh Forming ferroelectric polymer memories
US20040173144A1 (en) * 2002-05-31 2004-09-09 Edwards Charles O. Formation of printed circuit board structures using piezo microdeposition
US8294025B2 (en) * 2002-06-08 2012-10-23 Solarity, Llc Lateral collection photovoltaics
KR100878236B1 (ko) * 2002-06-12 2009-01-13 삼성전자주식회사 금속 패턴의 형성 방법 및 이를 이용한 박막 트랜지스터기판의 제조 방법
JP4010881B2 (ja) * 2002-06-13 2007-11-21 新光電気工業株式会社 半導体モジュール構造
US6673717B1 (en) * 2002-06-26 2004-01-06 Quantum Logic Devices, Inc. Methods for fabricating nanopores for single-electron devices
US6972261B2 (en) * 2002-06-27 2005-12-06 Xerox Corporation Method for fabricating fine features by jet-printing and surface treatment
US6780208B2 (en) * 2002-06-28 2004-08-24 Hewlett-Packard Development Company, L.P. Method of making printed battery structures
US20040009304A1 (en) * 2002-07-09 2004-01-15 Osram Opto Semiconductors Gmbh & Co. Ogh Process and tool with energy source for fabrication of organic electronic devices
US7420743B2 (en) * 2002-07-11 2008-09-02 Ophthonix, Inc. Optical elements and methods for making thereof
US8404376B2 (en) 2002-08-09 2013-03-26 Infinite Power Solutions, Inc. Metal film encapsulation
US8445130B2 (en) * 2002-08-09 2013-05-21 Infinite Power Solutions, Inc. Hybrid thin-film battery
US8236443B2 (en) * 2002-08-09 2012-08-07 Infinite Power Solutions, Inc. Metal film encapsulation
US8431264B2 (en) * 2002-08-09 2013-04-30 Infinite Power Solutions, Inc. Hybrid thin-film battery
US9793523B2 (en) 2002-08-09 2017-10-17 Sapurast Research Llc Electrochemical apparatus with barrier layer protected substrate
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
EP1388903B1 (de) * 2002-08-09 2016-03-16 Semiconductor Energy Laboratory Co., Ltd. Organische elektrolumineszente Vorrichtung
US8394522B2 (en) * 2002-08-09 2013-03-12 Infinite Power Solutions, Inc. Robust metal film encapsulation
US8021778B2 (en) * 2002-08-09 2011-09-20 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
JP2004081988A (ja) * 2002-08-27 2004-03-18 Seiko Epson Corp 製膜方法と製膜装置及びデバイス製造方法並びにデバイス製造装置
US7442997B2 (en) * 2002-08-28 2008-10-28 Guobiao Zhang Three-dimensional memory cells
US7247346B1 (en) * 2002-08-28 2007-07-24 Nanosolar, Inc. Combinatorial fabrication and high-throughput screening of optoelectronic devices
US7115969B1 (en) * 2002-09-13 2006-10-03 Xsilogy, Inc. Fixed parallel plate MEMS capacitor microsensor and microsensor array and method of making same
US6610353B1 (en) * 2002-09-23 2003-08-26 The Gillette Co. Method of applying adhesive to electrochemical cell components
JP4323257B2 (ja) * 2002-09-24 2009-09-02 コニカミノルタホールディングス株式会社 回路基板の製造方法、回路基板及び回路基板の製造装置
US6872321B2 (en) * 2002-09-25 2005-03-29 Lsi Logic Corporation Direct positive image photo-resist transfer of substrate design
JP3719431B2 (ja) * 2002-09-25 2005-11-24 セイコーエプソン株式会社 光学部品およびその製造方法、表示装置および撮像素子
US6922350B2 (en) * 2002-09-27 2005-07-26 Intel Corporation Reducing the effect of write disturbs in polymer memories
GB0225202D0 (en) 2002-10-30 2002-12-11 Hewlett Packard Co Electronic components
JP2004148784A (ja) * 2002-11-01 2004-05-27 Seiko Epson Corp 液滴吐出装置及び方法
DE60320588T2 (de) * 2002-11-12 2009-06-04 Objet Geometries Ltd. Verfahren und system zum drucken eines dreidimensionalen gegenstandes
US6835589B2 (en) * 2002-11-14 2004-12-28 International Business Machines Corporation Three-dimensional integrated CMOS-MEMS device and process for making the same
AU2003290929A1 (en) 2002-11-15 2004-06-15 Markem Corporation Radiation-curable inks
JP3801158B2 (ja) * 2002-11-19 2006-07-26 セイコーエプソン株式会社 多層配線基板の製造方法、多層配線基板、電子デバイス及び電子機器
US20040108504A1 (en) * 2002-11-20 2004-06-10 Charles Forbes Active matrix thin film transistor array backplane
JP2004191734A (ja) * 2002-12-12 2004-07-08 Sharp Corp プラスチック基板およびそれを備える液晶表示装置
US20040122475A1 (en) * 2002-12-18 2004-06-24 Myrick Andrew J. Electrochemical neuron systems
GB2412090B (en) * 2003-01-10 2006-10-11 Qinetiq Nanomaterials Ltd Improvements in and relating to deposited structures
AU2003900180A0 (en) * 2003-01-16 2003-01-30 Silverbrook Research Pty Ltd Method and apparatus (dam001)
JP2004219311A (ja) * 2003-01-16 2004-08-05 Omron Corp 静電容量センサ及び開閉体挟み込み検知装置
US7405033B2 (en) * 2003-01-17 2008-07-29 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing resist pattern and method for manufacturing semiconductor device
US7183146B2 (en) * 2003-01-17 2007-02-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US7191787B1 (en) 2003-02-03 2007-03-20 Lam Research Corporation Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid
WO2004070819A1 (ja) * 2003-02-05 2004-08-19 Semiconductor Energy Laboratory Co., Ltd. 表示装置の製造方法
CN100459060C (zh) * 2003-02-05 2009-02-04 株式会社半导体能源研究所 显示装置的制造方法
JP4114060B2 (ja) * 2003-02-06 2008-07-09 セイコーエプソン株式会社 受光素子の製造方法
KR101032338B1 (ko) * 2003-02-06 2011-05-06 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치의 제작방법
KR101186919B1 (ko) * 2003-02-06 2012-10-02 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치의 제조 방법
KR101193015B1 (ko) * 2003-02-06 2012-10-22 가부시키가이샤 한도오따이 에네루기 켄큐쇼 플라즈마 장치
US7250930B2 (en) 2003-02-07 2007-07-31 Hewlett-Packard Development Company, L.P. Transparent active-matrix display
US20050195318A1 (en) * 2003-02-07 2005-09-08 Takahiro Komatsu Organic information reading unit and information reading device using the same
US20090087348A1 (en) * 2007-02-16 2009-04-02 Richard Otto Claus Sensor applications
US20080213570A1 (en) * 2007-02-16 2008-09-04 Jennifer Hoyt Lalli Self-assembled conductive deformable films
US20080182099A1 (en) * 2006-11-17 2008-07-31 Jennifer Hoyt Lalli Robust electrodes for shape memory films
US20080261044A1 (en) * 2003-02-10 2008-10-23 Jennifer Hoyt Lalli Rapidly self-assembled thin films and functional decals
DE10305870A1 (de) * 2003-02-13 2004-08-26 BÄR, Hans Digital steuerbare Leuchtdioden für aktive Matrix-Displays
US6900876B2 (en) * 2003-02-13 2005-05-31 Eastman Kodak Company Process and structures for selective deposition of liquid-crystal emulsion
US7237564B1 (en) * 2003-02-20 2007-07-03 Lam Research Corporation Distribution of energy in a high frequency resonating wafer processing system
US7417782B2 (en) * 2005-02-23 2008-08-26 Pixtronix, Incorporated Methods and apparatus for spatial light modulation
KR100960456B1 (ko) * 2003-02-27 2010-05-28 엘지디스플레이 주식회사 액정표시소자의 배향막 형성장치 및 이를 이용한 배향막형성방법
GB0305581D0 (en) * 2003-03-11 2003-04-16 Dallas Burston Ltd Dispensing devices
WO2004086487A1 (ja) 2003-03-26 2004-10-07 Semiconductor Energy Laboratory Co. Ltd. 半導体装置およびその作製方法
TWM240050U (en) * 2003-04-02 2004-08-01 Elan Microelectronics Corp Capacitor touch panel with integrated keyboard and handwriting function
JP4731913B2 (ja) * 2003-04-25 2011-07-27 株式会社半導体エネルギー研究所 パターンの形成方法および半導体装置の製造方法
EP1631439B1 (de) 2003-05-01 2007-08-22 Objet Geometries Ltd. Rapid-prototyping-vorrichtung
EP3527351B1 (de) * 2003-05-01 2020-10-07 Stratasys Ltd. Vorrichtung zur herstellung eines gegenstands durch nacheinander auftragen von schichten aus konstruktionsmaterial
US7521932B2 (en) * 2003-05-06 2009-04-21 The Penn State Research Foundation Method and system for adjusting the fundamental symmetric mode of coupled high temperature superconductor coils
JP2004363560A (ja) * 2003-05-09 2004-12-24 Seiko Epson Corp 基板、デバイス、デバイス製造方法、アクティブマトリクス基板の製造方法及び電気光学装置並びに電子機器
US20040253520A1 (en) * 2003-05-13 2004-12-16 Wensley C. Glen Polyimide matrix electrolyte and improved batteries therefrom
US6936377B2 (en) * 2003-05-13 2005-08-30 C. Glen Wensley Card with embedded IC and electrochemical cell
US20040229127A1 (en) 2003-05-13 2004-11-18 Wensley C. Glen Polyimide matrix electrolyte
US7192859B2 (en) * 2003-05-16 2007-03-20 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device and display device
JP4103830B2 (ja) * 2003-05-16 2008-06-18 セイコーエプソン株式会社 パターンの形成方法及びパターン形成装置、デバイスの製造方法、アクティブマトリクス基板の製造方法
AU2003241509A1 (en) * 2003-05-20 2005-01-21 The University Of Akron Solid state gas sensors based on tunnel junction geometry
KR100637131B1 (ko) * 2003-05-20 2006-10-20 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그 제조방법
US8728285B2 (en) 2003-05-23 2014-05-20 Demaray, Llc Transparent conductive oxides
JP3788467B2 (ja) * 2003-05-28 2006-06-21 セイコーエプソン株式会社 パターン形成方法、デバイス及びデバイスの製造方法、電気光学装置、電子機器並びにアクティブマトリクス基板の製造方法
US20040241395A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method of modifying a surface of a substrate and articles therefrom
US20040241396A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method of modifying a surface of a substrate and articles therefrom
US20040241323A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method for applying adhesive to a substrate
US6969166B2 (en) * 2003-05-29 2005-11-29 3M Innovative Properties Company Method for modifying the surface of a substrate
EP1631992A2 (de) * 2003-06-12 2006-03-08 Patterning Technologies Limited Transparente leitende strukturen und verfahren zu ihrer herstellung
US6949403B2 (en) * 2003-07-22 2005-09-27 Organic Vision Inc. Non-vacuum methods for the fabrication of organic semiconductor devices
US7390336B2 (en) * 2003-07-29 2008-06-24 Solicore, Inc. Polyimide-based lithium metal battery
JP2005047207A (ja) * 2003-07-31 2005-02-24 Shinko Electric Ind Co Ltd インクジェット方式の印刷機
JP4491417B2 (ja) * 2003-08-04 2010-06-30 エモリー・ユニバーシティ ナノ化学種が埋め込まれた多孔質材料、その製造方法、およびその使用方法
KR101214179B1 (ko) 2003-08-06 2013-01-10 더 프록터 앤드 갬블 컴퍼니 표적 물질 검출용 가교 부재
US7042649B2 (en) * 2003-08-11 2006-05-09 California Institute Of Technology Microfabricated rubber microscope using soft solid immersion lenses
US7354808B2 (en) * 2003-08-15 2008-04-08 Semiconductor Energy Laboratory Co., Ltd. Resist composition and method for manufacturing semiconductor device using the same
US7964237B2 (en) * 2003-08-21 2011-06-21 International Business Machines Corporation Fully automated paste dispense process for dispensing small dots and lines
US7012240B2 (en) * 2003-08-21 2006-03-14 Taiwan Semiconductor Manufacturing Co., Ltd. Image sensor with guard rings and method for forming the same
JP2005072528A (ja) * 2003-08-28 2005-03-17 Shin Etsu Chem Co Ltd 薄層電界効果トランジスター及びその製造方法
DE10340609A1 (de) * 2003-08-29 2005-04-07 Infineon Technologies Ag Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht
DE10340608A1 (de) * 2003-08-29 2005-03-24 Infineon Technologies Ag Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht
US20050263903A1 (en) * 2003-08-30 2005-12-01 Visible Tech-Knowledgy, Inc. Method for pattern metalization of substrates
US7106208B2 (en) * 2003-09-05 2006-09-12 Hewlett-Packard Development Company, L.P. Printed sensor having opposed areas of nonvisible conductive ink
AT500259B1 (de) * 2003-09-09 2007-08-15 Austria Tech & System Tech Dünnschichtanordnung und verfahren zum herstellen einer solchen dünnschichtanordnung
JP2005081335A (ja) * 2003-09-11 2005-03-31 Seiko Epson Corp パターン形成方法、導電性薄膜、電気光学装置、電子機器
JP4023422B2 (ja) * 2003-09-11 2007-12-19 セイコーエプソン株式会社 パターン形成方法
GB0323462D0 (en) * 2003-10-07 2003-11-05 Fujifilm Electronic Imaging Providing a surface layer or structure on a substrate
US7219970B2 (en) * 2003-10-14 2007-05-22 Hewlett-Packard Development Company, L.P. Method and a system for single ligament fluid dispensing
JP3958735B2 (ja) * 2003-10-24 2007-08-15 オリンパス株式会社 被検体内導入装置
JP4689159B2 (ja) * 2003-10-28 2011-05-25 株式会社半導体エネルギー研究所 液滴吐出システム
CN100464429C (zh) * 2003-10-28 2009-02-25 株式会社半导体能源研究所 液晶显示设备及其制造方法,以及液晶电视接收机
WO2005041280A1 (en) 2003-10-28 2005-05-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
CA2797598A1 (en) * 2003-11-03 2005-05-03 Intelligent Devices Inc. Method of producing medium-to thin-film pressure and humidity sensors by flexographic printing
JP4233433B2 (ja) * 2003-11-06 2009-03-04 シャープ株式会社 表示装置の製造方法
KR100575951B1 (ko) * 2003-11-11 2006-05-02 삼성전자주식회사 광 인쇄회로기판 집적형 광연결 패키징 장치
US7112463B2 (en) * 2003-11-13 2006-09-26 Honeywell International Inc. Method for making devices using ink jet printing
US7157897B2 (en) * 2003-11-25 2007-01-02 Northwestern University Method and system for electronic detection of mechanical perturbations using BIMOS readouts
US7759924B2 (en) * 2003-11-25 2010-07-20 Northwestern University Cascaded MOSFET embedded multi-input microcantilever
EP1538424B1 (de) * 2003-12-04 2007-09-26 Festo AG & Co Mikrowellenwegmesssystem für elektrodynamischen Direktantrieb
US7767998B2 (en) * 2003-12-04 2010-08-03 Alcatel-Lucent Usa Inc. OFETs with active channels formed of densified layers
US7033667B2 (en) * 2003-12-18 2006-04-25 3M Innovative Properties Company Printed circuits on shrink film
US7134197B2 (en) * 2003-12-18 2006-11-14 Honeywell International Inc. Plastic lead frames utilizing reel-to-reel processing
US20070123027A1 (en) * 2003-12-22 2007-05-31 Michinori Shinkai Wiring forming method, wiring forming apparatus, and wiring board
US7035140B2 (en) * 2004-01-16 2006-04-25 Hewlett-Packard Development Company, L.P. Organic-polymer memory element
US7273773B2 (en) * 2004-01-26 2007-09-25 Semiconductor Energy Laboratory Co., Ltd. Display device, method for manufacturing thereof, and television device
CA2554825A1 (en) * 2004-01-28 2005-08-11 The Regents Of The University Of Michigan Osteoblast factor(s) that regulates human prostate cancer migration to and invasion of bone
JP4100351B2 (ja) * 2004-02-09 2008-06-11 セイコーエプソン株式会社 薄膜トランジスタの製造方法
DE102004009601B4 (de) * 2004-02-27 2008-03-20 Qimonda Ag Verfahren zur Herstellung eines Feldeffekttransistors
EP1728072A1 (de) * 2004-03-03 2006-12-06 Koninklijke Philips Electronics N.V. Nachweis von no mit einer halbleiterverbindung und einem sensor sowie vorrichtung zum nachweis von no
US7462514B2 (en) 2004-03-03 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television
JP4281584B2 (ja) * 2004-03-04 2009-06-17 セイコーエプソン株式会社 半導体装置の製造方法
US20050195142A1 (en) * 2004-03-08 2005-09-08 Solid State Display Disruptive display device and methods of fabricating same
US20050211973A1 (en) * 2004-03-23 2005-09-29 Kiyotaka Mori Stressed organic semiconductor
US7642038B2 (en) * 2004-03-24 2010-01-05 Semiconductor Energy Laboratory Co., Ltd. Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
US20050224812A1 (en) * 2004-03-31 2005-10-13 Yu-Chuan Liu Light-emitting device and manufacturing process of the light-emitting device
DE102004016155B3 (de) * 2004-04-01 2006-05-24 Infineon Technologies Ag Kraftsensor mit organischen Feldeffekttransistoren, darauf beruhender Drucksensor, Positionssensor und Fingerabdrucksensor
US7250632B2 (en) * 2004-04-06 2007-07-31 E. I. Du Pont De Nemours And Company Electronic devices having a layer overlying an edge of a different layer and a process for forming the same
TWI230426B (en) * 2004-04-07 2005-04-01 Optimum Care Int Tech Inc Packaging method of integrated circuit
US8325159B2 (en) * 2004-04-14 2012-12-04 Elo Touch Solutions, Inc. Acoustic touch sensor
US7470557B2 (en) * 2004-04-19 2008-12-30 Hewlett-Packard Development Company, L.P. Self-aligned coating on released MEMS
DE102004023420A1 (de) * 2004-05-12 2005-12-08 Lisa Dräxlmaier GmbH Verfahren zum Herstellen einer kombinierten Piezo-/Leuchtfolie und Betätigungselement mit einer derartigen Piezo-/Leuchtfolie
US7757631B2 (en) * 2004-05-26 2010-07-20 Hewlett-Packard Development Company, L.P. Apparatus for forming a circuit
US7336515B2 (en) * 2004-05-26 2008-02-26 International Business Machines Corporation Method of manipulating a quantum system comprising a magnetic moment
CN1960811A (zh) * 2004-05-27 2007-05-09 亚利桑那西格玛实验室公司 大面积电致发光光发射设备
JP4911722B2 (ja) * 2004-06-07 2012-04-04 フルイディグム コーポレイション 微小流体素子のための光学レンズシステムおよび方法
US20050276910A1 (en) * 2004-06-09 2005-12-15 Osram Opto Semiconductors Gmbh Post processing of films to improve film quality
US7494923B2 (en) * 2004-06-14 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of wiring substrate and semiconductor device
US20050274772A1 (en) * 2004-06-14 2005-12-15 Nelson Curtis L Treating an area to increase affinity for a fluid
US20050276933A1 (en) * 2004-06-14 2005-12-15 Ravi Prasad Method to form a conductive structure
US20050276911A1 (en) * 2004-06-15 2005-12-15 Qiong Chen Printing of organometallic compounds to form conductive traces
US20070178658A1 (en) * 2004-06-21 2007-08-02 Kelley Tommie W Patterning and aligning semiconducting nanoparticles
US7285503B2 (en) * 2004-06-21 2007-10-23 Applied Materials, Inc. Hermetic cap layers formed on low-k films by plasma enhanced chemical vapor deposition
US7575979B2 (en) * 2004-06-22 2009-08-18 Hewlett-Packard Development Company, L.P. Method to form a film
US7351606B2 (en) * 2004-06-24 2008-04-01 Palo Alto Research Center Incorporated Method for forming a bottom gate thin film transistor using a blend solution to form a semiconducting layer and an insulating layer
US7300861B2 (en) * 2004-06-24 2007-11-27 Palo Alto Research Center Incorporated Method for interconnecting electronic components using a blend solution to form a conducting layer and an insulating layer
US8158517B2 (en) * 2004-06-28 2012-04-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing wiring substrate, thin film transistor, display device and television device
WO2006004929A2 (en) * 2004-06-28 2006-01-12 Boise State University Electrochemical deposition method utilizing microdroplets of solution
US7597925B2 (en) * 2004-06-28 2009-10-06 Palo Alto Research Center Incorporated Method of confining droplets of display fluid
US7547647B2 (en) * 2004-07-06 2009-06-16 Hewlett-Packard Development Company, L.P. Method of making a structure
EP3176857A1 (de) 2004-07-22 2017-06-07 BrightVolt, Inc. Verbesserter batterielaschen- und verpackungsentwurf
US7203036B2 (en) * 2004-07-30 2007-04-10 Hitachi Global Storage Technologies Netherlands B.V. Planar extraordinary magnetoresistance sensor
JP4052295B2 (ja) * 2004-08-25 2008-02-27 セイコーエプソン株式会社 多層配線基板の製造方法、電子デバイス及び電子機器
GB2417687A (en) * 2004-09-03 2006-03-08 Guy Simmons Apparatus for delivering therapeutic fluids comprising an ink-jet type head.
US20060073337A1 (en) * 2004-10-01 2006-04-06 Krzysztof Nauka Conductive path made of metallic nanoparticles and conductive organic material
JP4389747B2 (ja) * 2004-10-12 2009-12-24 セイコーエプソン株式会社 パターン形成方法および配線形成方法
US20060280866A1 (en) * 2004-10-13 2006-12-14 Optomec Design Company Method and apparatus for mesoscale deposition of biological materials and biomaterials
JP2006154169A (ja) * 2004-11-29 2006-06-15 Seiko Epson Corp 電気光学素子の製造方法、電気光学装置
US7288469B2 (en) * 2004-12-03 2007-10-30 Eastman Kodak Company Methods and apparatuses for forming an article
WO2006060707A2 (en) * 2004-12-03 2006-06-08 E.I. Dupont De Nemours And Company Matual decoupling of excitation and receive coils of a nuclear quadrupole resonance detection system
DE602005017512D1 (de) * 2004-12-08 2009-12-17 Symmorphix Inc Abscheidung von licoo2
US7959769B2 (en) * 2004-12-08 2011-06-14 Infinite Power Solutions, Inc. Deposition of LiCoO2
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US7938341B2 (en) * 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US20080013299A1 (en) * 2004-12-13 2008-01-17 Optomec, Inc. Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array
US20060132028A1 (en) * 2004-12-16 2006-06-22 Lexmark International, Inc. Electroluminescent display construction using printing technology
JP4734912B2 (ja) * 2004-12-17 2011-07-27 日産自動車株式会社 リチウムイオン電池およびその製造方法
US20060146079A1 (en) * 2004-12-30 2006-07-06 Macpherson Charles D Process and apparatus for forming an electronic device
US7025607B1 (en) * 2005-01-10 2006-04-11 Endicott Interconnect Technologies, Inc. Capacitor material with metal component for use in circuitized substrates, circuitized substrate utilizing same, method of making said circuitized substrate, and information handling system utilizing said circuitized substrate
WO2006076609A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Printable electronic features on non-uniform substrate and processes for making same
WO2006076611A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Production of metal nanoparticles
WO2006076603A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Printable electrical conductors
JP2008526575A (ja) * 2005-01-14 2008-07-24 キャボット コーポレイション セキュリティ機構とその使用及びその製造方法
US8383014B2 (en) 2010-06-15 2013-02-26 Cabot Corporation Metal nanoparticle compositions
US20060190917A1 (en) * 2005-01-14 2006-08-24 Cabot Corporation System and process for manufacturing application specific printable circuits (ASPC'S) and other custom electronic devices
WO2006076615A1 (en) * 2005-01-14 2006-07-20 Cabot Corporation Ink-jet printing of compositionally no-uniform features
WO2006076610A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Controlling ink migration during the formation of printable electronic features
WO2006076606A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation Optimized multi-layer printing of electronics and displays
US7824466B2 (en) 2005-01-14 2010-11-02 Cabot Corporation Production of metal nanoparticles
WO2006076608A2 (en) * 2005-01-14 2006-07-20 Cabot Corporation A system and process for manufacturing custom electronics by combining traditional electronics with printable electronics
JP4111195B2 (ja) * 2005-01-26 2008-07-02 セイコーエプソン株式会社 デバイスとその製造方法及び電気光学装置とその製造方法並びに電子機器
KR100672994B1 (ko) * 2005-01-28 2007-01-24 삼성전자주식회사 이미지 센서 및 그 제조 방법
JP4604743B2 (ja) * 2005-02-01 2011-01-05 セイコーエプソン株式会社 機能性基板の製造方法、機能性基板、微細パターンの形成方法、導電膜配線、電子光学装置および電子機器
US7354794B2 (en) * 2005-02-18 2008-04-08 Lexmark International, Inc. Printed conductive connectors
US7999994B2 (en) 2005-02-23 2011-08-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US9082353B2 (en) 2010-01-05 2015-07-14 Pixtronix, Inc. Circuits for controlling display apparatus
US9158106B2 (en) 2005-02-23 2015-10-13 Pixtronix, Inc. Display methods and apparatus
US7675665B2 (en) 2005-02-23 2010-03-09 Pixtronix, Incorporated Methods and apparatus for actuating displays
US9229222B2 (en) * 2005-02-23 2016-01-05 Pixtronix, Inc. Alignment methods in fluid-filled MEMS displays
US9261694B2 (en) 2005-02-23 2016-02-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US7742016B2 (en) 2005-02-23 2010-06-22 Pixtronix, Incorporated Display methods and apparatus
US7755582B2 (en) 2005-02-23 2010-07-13 Pixtronix, Incorporated Display methods and apparatus
US8310442B2 (en) 2005-02-23 2012-11-13 Pixtronix, Inc. Circuits for controlling display apparatus
US8159428B2 (en) 2005-02-23 2012-04-17 Pixtronix, Inc. Display methods and apparatus
US7616368B2 (en) * 2005-02-23 2009-11-10 Pixtronix, Inc. Light concentrating reflective display methods and apparatus
US20070205969A1 (en) 2005-02-23 2007-09-06 Pixtronix, Incorporated Direct-view MEMS display devices and methods for generating images thereon
US8519945B2 (en) 2006-01-06 2013-08-27 Pixtronix, Inc. Circuits for controlling display apparatus
US7746529B2 (en) 2005-02-23 2010-06-29 Pixtronix, Inc. MEMS display apparatus
US8482496B2 (en) 2006-01-06 2013-07-09 Pixtronix, Inc. Circuits for controlling MEMS display apparatus on a transparent substrate
TWI304234B (en) * 2005-03-04 2008-12-11 Int Rectifier Corp Semiconductor package fabrication
US20060266407A1 (en) * 2005-03-10 2006-11-30 Lichy Joseph I Apparatus and method for electrically connecting photovoltaic cells in a photovoltaic device
US8860635B2 (en) * 2005-04-04 2014-10-14 The Invention Science Fund I, Llc Self assembling display with substrate
US9153163B2 (en) * 2005-03-11 2015-10-06 The Invention Science Fund I, Llc Self assembly of elements for displays
US20060202944A1 (en) * 2005-03-11 2006-09-14 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Elements for self assembling displays
US8300007B2 (en) * 2005-03-11 2012-10-30 The Invention Science Fund I, Llc Self assembling display with substrate
US8711063B2 (en) 2005-03-11 2014-04-29 The Invention Science Fund I, Llc Self assembly of elements for displays
US7990349B2 (en) * 2005-04-22 2011-08-02 The Invention Science Fund I, Llc Superimposed displays
US7977130B2 (en) 2006-08-03 2011-07-12 The Invention Science Fund I, Llc Method of assembling displays on substrates
US8390537B2 (en) * 2005-03-11 2013-03-05 The Invention Science Fund I, Llc Method of assembling displays on substrates
US8334819B2 (en) * 2005-03-11 2012-12-18 The Invention Science Fund I, Llc Superimposed displays
US7662008B2 (en) * 2005-04-04 2010-02-16 Searete Llc Method of assembling displays on substrates
TWI258848B (en) * 2005-03-18 2006-07-21 Delta Electronics Inc Packaging structure and relative manufacturing method for passive component
US7572655B2 (en) * 2005-03-23 2009-08-11 E. I. Du Pont De Nemours And Company Electronic devices having a layer overlying an edge of a different layer and a process for forming the same
KR100678419B1 (ko) * 2005-04-01 2007-02-02 삼성전기주식회사 기판의 표면처리방법, 배선형성방법 및 배선기판
US20070020589A1 (en) * 2005-04-06 2007-01-25 Ethan Smith Electrothermal refreshable Braille cell and method for actuating same
US7674564B2 (en) * 2005-04-11 2010-03-09 Hewlett-Packard Development Company, L.P. Color filter
US7906722B2 (en) * 2005-04-19 2011-03-15 Palo Alto Research Center Incorporated Concentrating solar collector with solid optical element
KR100719346B1 (ko) * 2005-04-19 2007-05-17 삼성전자주식회사 저항 메모리 셀, 그 형성 방법 및 이를 이용한 저항 메모리배열
WO2006116054A2 (en) * 2005-04-21 2006-11-02 The Regents Of The University Of California Highly efficienct polymer light-emitting diodes
AU2005202167B2 (en) * 2005-05-19 2010-12-16 Canon Kabushiki Kaisha Method of forming structures using drop-on-demand printing
US7470544B2 (en) * 2005-05-26 2008-12-30 Hewlett-Packard Development Company, L.P. Sensor array using sail
US7373843B2 (en) * 2005-06-02 2008-05-20 Fidelica Microsystems Flexible imaging pressure sensor
US7476603B2 (en) * 2005-06-07 2009-01-13 Hewlett-Packard Development Company, L.P. Printing conductive patterns using LEP
US7842347B2 (en) * 2005-06-09 2010-11-30 Lexmark International, Inc. Inkjet printing of layers
FR2886880B1 (fr) 2005-06-14 2008-10-03 Mgi France Sa Machine numerique a jet pour depose d'un revetement sur un substrat
KR20060131551A (ko) * 2005-06-16 2006-12-20 엘지.필립스 엘시디 주식회사 플렉시블 디스플레이의 전극구조 및 그 제조방법
KR100618903B1 (ko) 2005-06-18 2006-09-01 삼성전자주식회사 독립된 전원 장치를 구비하는 반도체 집적 회로와 반도체집적 회로를 구비하는 반도체 시스템 및 반도체 집적 회로형성 방법
US8147903B2 (en) * 2005-06-22 2012-04-03 Canon Kabushiki Kaisha Circuit pattern forming method, circuit pattern forming device and printed circuit board
US7829135B2 (en) * 2005-06-22 2010-11-09 Canon Kabushiki Kaisha Method and apparatus for forming multi-layered circuit pattern
JP4379386B2 (ja) * 2005-06-23 2009-12-09 セイコーエプソン株式会社 多層構造形成方法
US7695998B2 (en) * 2005-07-02 2010-04-13 Hewlett-Packard Development Company, L.P. Methods for making and using high-mobility inorganic semiconductive films
US7730746B1 (en) 2005-07-14 2010-06-08 Imaging Systems Technology Apparatus to prepare discrete hollow microsphere droplets
US7462513B2 (en) * 2005-08-22 2008-12-09 Lexmark International, Inc. Methods for making printed fuse devices
JP4914589B2 (ja) 2005-08-26 2012-04-11 三菱電機株式会社 半導体製造装置、半導体製造方法および半導体装置
JP4425246B2 (ja) * 2005-08-31 2010-03-03 三洋電機株式会社 光起電力装置および光起電力装置の製造方法
DE102005042166A1 (de) * 2005-09-06 2007-03-15 Polyic Gmbh & Co.Kg Organisches Bauelement und ein solches umfassende elektrische Schaltung
JP2007103349A (ja) * 2005-09-08 2007-04-19 Seiko Epson Corp 膜パターンの形成方法、有機el装置の製造方法、カラーフィルタ基板の製造方法、液晶表示装置の製造方法
US7348656B2 (en) * 2005-09-22 2008-03-25 International Rectifier Corp. Power semiconductor device with integrated passive component
TWI287854B (en) * 2005-09-30 2007-10-01 Ind Tech Res Inst Semiconductor device with transistors and fabricating method thereof
US20070090869A1 (en) * 2005-10-26 2007-04-26 Motorola, Inc. Combined power source and printed transistor circuit apparatus and method
US20070107773A1 (en) 2005-11-17 2007-05-17 Palo Alto Research Center Incorporated Bifacial cell with extruded gridline metallization
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
US7765949B2 (en) * 2005-11-17 2010-08-03 Palo Alto Research Center Incorporated Extrusion/dispensing systems and methods
US7799371B2 (en) * 2005-11-17 2010-09-21 Palo Alto Research Center Incorporated Extruding/dispensing multiple materials to form high-aspect ratio extruded structures
US8679587B2 (en) * 2005-11-29 2014-03-25 State of Oregon acting by and through the State Board of Higher Education action on Behalf of Oregon State University Solution deposition of inorganic materials and electronic devices made comprising the inorganic materials
KR100676813B1 (ko) * 2005-12-07 2007-02-01 삼성전자주식회사 표시장치의 제조방법, 이에 의한 표시장치 및 이에사용되는 제조장치
US20070154634A1 (en) * 2005-12-15 2007-07-05 Optomec Design Company Method and Apparatus for Low-Temperature Plasma Sintering
US7679162B2 (en) * 2005-12-19 2010-03-16 Silicon Laboratories Inc. Integrated current sensor package
US7706165B2 (en) * 2005-12-20 2010-04-27 Agfa-Gevaert Nv Ferroelectric passive memory cell, device and method of manufacture thereof
US7658831B2 (en) * 2005-12-21 2010-02-09 Formfactor, Inc Three dimensional microstructures and methods for making three dimensional microstructures
TWI279008B (en) * 2005-12-26 2007-04-11 Ind Tech Res Inst Thin film transistor, device electrode thereof and method of forming the same
US20090119914A1 (en) * 2005-12-27 2009-05-14 Clark Roger F Process for Forming Electrical Contacts on a Semiconductor Wafer Using a Phase Changing Ink
US7514710B2 (en) * 2005-12-28 2009-04-07 3M Innovative Properties Company Bottom gate thin film transistors
US20070152290A1 (en) * 2005-12-30 2007-07-05 Lexmark International, Inc Thin film light-activated power switches, photovoltaic devices and methods for making micro-fluid ejected electronic devices
FR2895986B1 (fr) * 2006-01-06 2008-09-05 Centre Nat Rech Scient Preparation de microcomposants multicouches par la methode de la couche epaisse sacrificielle
KR100658970B1 (ko) * 2006-01-09 2006-12-19 주식회사 메디아나전자 복합 파장의 광을 발생시키는 발광 다이오드 소자
IL173121A (en) * 2006-01-12 2011-07-31 Dina Katsir Electrodes, membranes, printing plate precursors and other articles including multi-strata porous coatings
EP1993675A4 (de) 2006-01-12 2013-02-27 Univ Arkansas Technology Dev Foundation Tio2-nanostrukturen, -membranen und -folien sowie deren anwendung
WO2007095061A2 (en) * 2006-02-09 2007-08-23 Qd Vision, Inc. Device including semiconductor nanocrystals and a layer including a doped organic material and methods
US20070197922A1 (en) * 2006-02-17 2007-08-23 Honeywell International Inc. Disposable pressure sensor systems and packages therefor
US7353621B2 (en) * 2006-02-22 2008-04-08 M-I L.L.C. Cleaning apparatus for vertical separator
US8526096B2 (en) 2006-02-23 2013-09-03 Pixtronix, Inc. Mechanical light modulators with stressed beams
US20090140212A1 (en) * 2006-02-24 2009-06-04 Friedman Joel M Electron Transfer Through Glassy Matrices
US20080030352A1 (en) * 2006-02-27 2008-02-07 Thorn Security Limited Methods and systems for gas detection
US20070215883A1 (en) * 2006-03-20 2007-09-20 Dixon Michael J Electroluminescent Devices, Subassemblies for use in Making Electroluminescent Devices, and Dielectric Materials, Conductive Inks and Substrates Related Thereto
DE102006015117A1 (de) * 2006-03-31 2007-10-04 Osram Opto Semiconductors Gmbh Optoelektronischer Scheinwerfer, Verfahren zum Herstellen eines optoelektronischen Scheinwerfers und Lumineszenzdiodenchip
FR2900052B1 (fr) * 2006-04-19 2011-02-18 Galderma Sa Composition comprenant au moins une phase aqueuse et au moins une phase grasse comprenant de l'ivermectine
US7855335B2 (en) * 2006-04-26 2010-12-21 Palo Alto Research Center Incorporated Beam integration for concentrating solar collector
US7638708B2 (en) * 2006-05-05 2009-12-29 Palo Alto Research Center Incorporated Laminated solar concentrating photovoltaic device
US7851693B2 (en) * 2006-05-05 2010-12-14 Palo Alto Research Center Incorporated Passively cooled solar concentrating photovoltaic device
US20070256725A1 (en) * 2006-05-05 2007-11-08 Palo Alto Research Center Incorporated Solar Concentrating Photovoltaic Device With Resilient Cell Package Assembly
US7625637B2 (en) * 2006-05-31 2009-12-01 Cabot Corporation Production of metal nanoparticles from precursors having low reduction potentials
US8105643B2 (en) 2006-05-31 2012-01-31 Cabot Corporation Process for printing features with smaller dimensions
US20070281091A1 (en) * 2006-05-31 2007-12-06 Cabot Corporation Polyimide insulative layers in multi-layered printed electronic features
US7876489B2 (en) 2006-06-05 2011-01-25 Pixtronix, Inc. Display apparatus with optical cavities
US20070279334A1 (en) * 2006-06-05 2007-12-06 Blaise Laurent Mouttet Crosswire radiation emitter
DE102006026981A1 (de) * 2006-06-10 2007-12-13 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Herstellung einer strukturierten Schicht auf einem Trägersubstrat
US7990132B2 (en) * 2006-06-30 2011-08-02 Silicon Laboratories Inc. Current sensor including an integrated circuit die including a first and second coil
DE102006030581B3 (de) * 2006-07-03 2008-02-21 Infineon Technologies Ag Verfahren zum Herstellen eines Bauelements
US7545621B2 (en) * 2006-07-24 2009-06-09 Yt Acquisition Corporation Electrostatic discharge structure for a biometric sensor
KR20090035014A (ko) * 2006-08-01 2009-04-08 클레이 포 딘져 에이치. 개선된 건조 시스템
US20080171418A1 (en) * 2006-08-04 2008-07-17 International Business Machines Corporation Method to Fabricate Passive Components Using Conductive Polymer
US7709307B2 (en) * 2006-08-24 2010-05-04 Kovio, Inc. Printed non-volatile memory
WO2008039471A2 (en) * 2006-09-29 2008-04-03 Infinite Power Solutions, Inc. Masking of and material constraint for depositing battery layers on flexible substrates
EP2080045A1 (de) 2006-10-20 2009-07-22 Pixtronix Inc. Lichtleiter und rücklichtsysteme mit lichtumlenkern bei variierenden dichten
US8733274B2 (en) * 2006-10-20 2014-05-27 Hewlett-Packard Development Company, L.P. Tube mounted inkjet printhead die
US20080101994A1 (en) * 2006-10-28 2008-05-01 Shabnam Virji Polyaniline Nanofiber Hydrogen Sensors
GB0621738D0 (en) * 2006-10-31 2006-12-13 Nanotecture Ltd Electrochemical cell for use in smart cards
US8226391B2 (en) 2006-11-01 2012-07-24 Solarworld Innovations Gmbh Micro-extrusion printhead nozzle with tapered cross-section
US8322025B2 (en) * 2006-11-01 2012-12-04 Solarworld Innovations Gmbh Apparatus for forming a plurality of high-aspect ratio gridline structures
US7780812B2 (en) 2006-11-01 2010-08-24 Palo Alto Research Center Incorporated Extrusion head with planarized edge surface
US7922471B2 (en) 2006-11-01 2011-04-12 Palo Alto Research Center Incorporated Extruded structure with equilibrium shape
JP2008117997A (ja) * 2006-11-07 2008-05-22 Seiko Epson Corp 電子基板の製造方法
US8197781B2 (en) * 2006-11-07 2012-06-12 Infinite Power Solutions, Inc. Sputtering target of Li3PO4 and method for producing same
US20080119011A1 (en) * 2006-11-20 2008-05-22 Industrial Technology Research Institute Method of film coating and device manufactured thereby
EP1931158B1 (de) * 2006-12-08 2013-04-10 Samsung Electronics Co., Ltd. Vorrichtung und Verfahren zur Auswahl der Rahmenstruktur in einem Kommunikationssystem mit drahtlosem Multihop-Relaisbreitbandzugang
US7928015B2 (en) * 2006-12-12 2011-04-19 Palo Alto Research Center Incorporated Solar cell fabrication using extruded dopant-bearing materials
US7638438B2 (en) 2006-12-12 2009-12-29 Palo Alto Research Center Incorporated Solar cell fabrication using extrusion mask
US7524015B2 (en) * 2006-12-20 2009-04-28 Palo Alto Research Center Incorporated Method of printing smooth micro-scale features
US20080161827A1 (en) * 2006-12-29 2008-07-03 Frost Ricky A System and method for a selectively visible medical marker
WO2008085933A1 (en) * 2007-01-08 2008-07-17 Plextronics, Inc. Quantum dot photovoltaic device
CN101689567A (zh) * 2007-01-10 2010-03-31 索拉里蒂股份有限公司 横向收集光伏
WO2008088588A2 (en) * 2007-01-12 2008-07-24 University Of Arkansas Technology Development Foundation Biocompatible scaffold for sensing proteins
CN101646401B (zh) * 2007-01-12 2012-05-23 阿肯色州大学理事会 用于自动检测蛋白质的生物兼容支架材料
US7852546B2 (en) * 2007-10-19 2010-12-14 Pixtronix, Inc. Spacers for maintaining display apparatus alignment
US9176318B2 (en) 2007-05-18 2015-11-03 Pixtronix, Inc. Methods for manufacturing fluid-filled MEMS displays
US20080185039A1 (en) 2007-02-02 2008-08-07 Hing Wah Chan Conductor fabrication for optical element
US20080206550A1 (en) * 2007-02-26 2008-08-28 Michael Jeremiah Borlner Hydrophobic surface
US20080226813A1 (en) * 2007-03-16 2008-09-18 Xerox Corporation Method and System for A Composite Polymer for Printed MEMS
EP2137456A4 (de) * 2007-03-21 2011-03-16 Ntera Inc Dünne, gedruckte farbanzeige
US20090035513A1 (en) * 2007-03-28 2009-02-05 Michael Jeremiah Bortner Tethered nanorods
US8222061B2 (en) * 2007-03-30 2012-07-17 The Penn State Research Foundation Mist fabrication of quantum dot devices
US20080245413A1 (en) * 2007-04-04 2008-10-09 Hang Ruan Self assembled photovoltaic devices
DE102007018259A1 (de) * 2007-04-13 2008-10-16 Varta Microbattery Gmbh Knopfzelle mit beschichteter Außenseite
US20100310630A1 (en) * 2007-04-27 2010-12-09 Technische Universitat Braunschweig Coated surface for cell culture
US8530589B2 (en) * 2007-05-04 2013-09-10 Kovio, Inc. Print processing for patterned conductor, semiconductor and dielectric materials
US7954449B2 (en) * 2007-05-08 2011-06-07 Palo Alto Research Center Incorporated Wiring-free, plumbing-free, cooled, vacuum chuck
KR101408510B1 (ko) * 2007-05-18 2014-06-17 삼성전자주식회사 표시소자용 연성기판 및 이를 이용한 디스플레이 소자
WO2008146047A2 (en) 2007-06-01 2008-12-04 Bae Systems Plc Improvements relating to direct write and additive manufacturing processes
GB2449885A (en) * 2007-06-06 2008-12-10 Avx Ltd Method for forming conductive material layers in electronic components
US7858513B2 (en) * 2007-06-18 2010-12-28 Organicid, Inc. Fabrication of self-aligned via holes in polymer thin films
US8058195B2 (en) 2007-06-19 2011-11-15 Cabot Corporation Nanoglass and flame spray processes for producing nanoglass
WO2009003150A2 (en) * 2007-06-26 2008-12-31 Solarity, Inc. Lateral collection photovoltaics
GB0712861D0 (en) * 2007-07-03 2007-08-08 Eastman Kodak Co Continuous ink jet printing of encapsulated droplets
GB0712862D0 (en) 2007-07-03 2007-08-08 Eastman Kodak Co A method of continuous ink jet printing
DE102007043920A1 (de) * 2007-07-17 2009-01-22 Merck Patent Gmbh Funktionelles Material für gedruckte elektronische Bauteile
TWI482662B (zh) 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) * 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
TW200918325A (en) * 2007-08-31 2009-05-01 Optomec Inc AEROSOL JET® printing system for photovoltaic applications
CN101802694B (zh) * 2007-09-05 2012-07-11 日立化成工业株式会社 液晶显示装置用间隔物的制造方法、间隔物形成用油墨、以及液晶显示装置及其制造方法
US20090065792A1 (en) 2007-09-07 2009-03-12 3M Innovative Properties Company Method of making an led device having a dome lens
EP2201096A1 (de) * 2007-09-10 2010-06-30 The Ohio State University Vorrichtung und verfahren zur messung eines ph-wertes in einem weiten druckbereich
JP2010541255A (ja) * 2007-10-01 2010-12-24 コヴィオ インコーポレイテッド 輪郭設計された薄膜デバイス及び構造体
GB0719374D0 (en) * 2007-10-04 2007-11-14 Eastman Kodak Co Continuous inkjet printing
KR100927598B1 (ko) * 2007-10-05 2009-11-23 한국전자통신연구원 광 게이팅 스위치 시스템
US8887658B2 (en) * 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
US20090104438A1 (en) * 2007-10-17 2009-04-23 Jennifer Hoyt Lalli Abrasion resistant coatings
GB0720268D0 (en) * 2007-10-17 2007-11-28 Pilkington Group Ltd Glazing
US20090104434A1 (en) * 2007-10-17 2009-04-23 Jennifer Hoyt Lalli Conformal multifunctional coatings
KR101368249B1 (ko) * 2007-10-24 2014-03-05 삼성전자주식회사 선로구조물 및 그 제조방법
EP2232572A4 (de) * 2007-12-07 2012-10-17 Alion Inc Fokussiertes akustisches bedrucken von strukturierten photovoltaikmaterialien
US8101231B2 (en) 2007-12-07 2012-01-24 Cabot Corporation Processes for forming photovoltaic conductive features from multiple inks
TWI441937B (zh) * 2007-12-21 2014-06-21 Infinite Power Solutions Inc 形成用於電解質薄膜之濺鍍靶材的方法
US8268488B2 (en) 2007-12-21 2012-09-18 Infinite Power Solutions, Inc. Thin film electrolyte for thin film batteries
KR101606183B1 (ko) 2008-01-11 2016-03-25 사푸라스트 리써치 엘엘씨 박막 배터리 및 기타 소자를 위한 박막 캡슐화
US7990241B2 (en) * 2008-01-22 2011-08-02 Thermo Fisher Scientific, Inc. Encapsulated switches employing mercury substitute and methods of manufacture thereof
CN101983438B (zh) * 2008-02-05 2014-10-29 摩根先进陶瓷有限公司 用于减少颗粒脱落的封装涂层
JP5305429B2 (ja) * 2008-02-29 2013-10-02 株式会社ミマキエンジニアリング 印刷システム、インクジェットプリンタ、及び印刷方法
JP5280073B2 (ja) * 2008-03-13 2013-09-04 株式会社ミマキエンジニアリング 印刷システム、インクジェットプリンタ、及び印刷方法
KR101672254B1 (ko) * 2008-04-02 2016-11-08 사푸라스트 리써치 엘엘씨 에너지 수확과 관련된 에너지 저장 장치를 위한 수동적인 과전압/부족전압 제어 및 보호
US20090252933A1 (en) * 2008-04-04 2009-10-08 3M Innovative Properties Company Method for digitally printing electroluminescent lamps
KR101035629B1 (ko) * 2008-04-09 2011-05-19 가부시키가이샤 미마키 엔지니어링 인쇄 시스템, 잉크젯 프린터, 및 인쇄방법
JP2009248495A (ja) * 2008-04-09 2009-10-29 Mimaki Engineering Co Ltd 印刷システム、インクジェットプリンタ、及び印刷方法
US8248560B2 (en) 2008-04-18 2012-08-21 Pixtronix, Inc. Light guides and backlight systems incorporating prismatic structures and light redirectors
GB2459505A (en) * 2008-04-25 2009-10-28 Dublin Inst Of Technology Optical component fabrication by depositing a polymerisation activator pattern
US8017514B2 (en) * 2008-05-05 2011-09-13 International Business Machines Corporation Optically transparent wires for secure circuits and methods of making same
US7728578B2 (en) * 2008-05-15 2010-06-01 Silicon Laboratories Inc. Method and apparatus for high current measurement
TW201005813A (en) 2008-05-15 2010-02-01 Du Pont Process for forming an electroactive layer
GB0814174D0 (en) * 2008-08-02 2008-09-10 Eastman Kodak Co A method of making solar cells by dry powder printing
US8520285B2 (en) * 2008-08-04 2013-08-27 Pixtronix, Inc. Methods for manufacturing cold seal fluid-filled display apparatus
CN102119454B (zh) 2008-08-11 2014-07-30 无穷动力解决方案股份有限公司 具有用于电磁能量收集的一体收集器表面的能量设备及其方法
US20100032654A1 (en) * 2008-08-11 2010-02-11 Motorola, Inc. Semiconductor Device Having Silane Treated Interface
US7999175B2 (en) 2008-09-09 2011-08-16 Palo Alto Research Center Incorporated Interdigitated back contact silicon solar cells with laser ablated grooves
US8110699B2 (en) * 2008-09-12 2012-02-07 University Of South Florida Cobalt-catalyzed asymmetric cyclopropanation of alkenes with α-nitrodiazoacetates
KR101613671B1 (ko) * 2008-09-12 2016-04-19 사푸라스트 리써치 엘엘씨 전자기 에너지에 의해 데이터 통신을 하는 통합 도전성 표면을 가진 에너지 장치 및 그 통신 방법
TWI385828B (zh) * 2008-09-16 2013-02-11 Chen Hsu 具有光調變功能之半導體發光元件及其製造方法
US8062693B2 (en) * 2008-09-22 2011-11-22 Sunpower Corporation Generation of contact masks for inkjet printing on solar cell substrates
US9296158B2 (en) 2008-09-22 2016-03-29 Johnson & Johnson Vision Care, Inc. Binder of energized components in an ophthalmic lens
DE102008049215A1 (de) * 2008-09-27 2010-04-01 Hotset Heizpatronen U. Zubehör Gmbh Elektrisches Heizelement für technische Zwecke
US20100077602A1 (en) * 2008-09-27 2010-04-01 Wolfgang Kollenberg Method of making an electrical heater
US8508193B2 (en) * 2008-10-08 2013-08-13 Infinite Power Solutions, Inc. Environmentally-powered wireless sensor module
US20100096470A1 (en) * 2008-10-17 2010-04-22 Molecular Imprints, Inc. Drop volume reduction
WO2010045606A1 (en) * 2008-10-17 2010-04-22 Bloominescence, Inc. Transparent polarized light-emitting device
US8637331B2 (en) 2008-10-17 2014-01-28 Bloominescence, Llc Transparent polarized light-emitting device
US8169679B2 (en) 2008-10-27 2012-05-01 Pixtronix, Inc. MEMS anchors
US20100117254A1 (en) * 2008-11-07 2010-05-13 Palo Alto Research Center Incorporated Micro-Extrusion System With Airjet Assisted Bead Deflection
US8117983B2 (en) 2008-11-07 2012-02-21 Solarworld Innovations Gmbh Directional extruded bead control
US8080729B2 (en) 2008-11-24 2011-12-20 Palo Alto Research Center Incorporated Melt planarization of solar cell bus bars
US8960120B2 (en) 2008-12-09 2015-02-24 Palo Alto Research Center Incorporated Micro-extrusion printhead with nozzle valves
US20100163861A1 (en) * 2008-12-29 2010-07-01 Motorola, Inc. Method and apparatus for optically transparent transistor
US20100184244A1 (en) * 2009-01-20 2010-07-22 SunPrint, Inc. Systems and methods for depositing patterned materials for solar panel production
US8409911B2 (en) * 2009-02-24 2013-04-02 Sunpower Corporation Methods for metallization of solar cells
EP2404315A4 (de) 2009-03-06 2012-08-08 Du Pont Verfahren zur formung einer elektroaktiven schicht
KR20110134461A (ko) 2009-03-09 2011-12-14 이 아이 듀폰 디 네모아 앤드 캄파니 전기활성 층을 형성하기 위한 방법
US9208942B2 (en) 2009-03-09 2015-12-08 Nucurrent, Inc. Multi-layer-multi-turn structure for high efficiency wireless communication
US9300046B2 (en) 2009-03-09 2016-03-29 Nucurrent, Inc. Method for manufacture of multi-layer-multi-turn high efficiency inductors
US9232893B2 (en) 2009-03-09 2016-01-12 Nucurrent, Inc. Method of operation of a multi-layer-multi-turn structure for high efficiency wireless communication
US9439287B2 (en) 2009-03-09 2016-09-06 Nucurrent, Inc. Multi-layer wire structure for high efficiency wireless communication
US9444213B2 (en) 2009-03-09 2016-09-13 Nucurrent, Inc. Method for manufacture of multi-layer wire structure for high efficiency wireless communication
US11476566B2 (en) 2009-03-09 2022-10-18 Nucurrent, Inc. Multi-layer-multi-turn structure for high efficiency wireless communication
EP2406813A4 (de) 2009-03-09 2012-07-25 Du Pont Verfahren zur formung einer elektroaktiven schicht
US9306358B2 (en) 2009-03-09 2016-04-05 Nucurrent, Inc. Method for manufacture of multi-layer wire structure for high efficiency wireless communication
WO2010104569A1 (en) 2009-03-09 2010-09-16 Neurds Inc. System and method for wireless power transfer in implantable medical devices
US7862220B2 (en) * 2009-03-10 2011-01-04 International Automotive Components Group North America, Inc Integration of light emitting devices and printed electronics into vehicle trim components
US8982051B2 (en) * 2009-03-30 2015-03-17 Microsoft Technology Licensing, Llc Detecting touch on a surface
US9317140B2 (en) * 2009-03-30 2016-04-19 Microsoft Technology Licensing, Llc Method of making a multi-touch input device for detecting touch on a curved surface
CN102439778B (zh) * 2009-05-20 2016-02-10 萨普拉斯特研究有限责任公司 用于将电化学器件集成到固定设施之内或之上的方法
TWI387140B (zh) * 2009-05-22 2013-02-21 Univ Shu Te 發光二極體
US9276336B2 (en) 2009-05-28 2016-03-01 Hsio Technologies, Llc Metalized pad to electrical contact interface
WO2010138493A1 (en) 2009-05-28 2010-12-02 Hsio Technologies, Llc High performance surface mount electrical interconnect
WO2010147939A1 (en) 2009-06-17 2010-12-23 Hsio Technologies, Llc Semiconductor socket
US9536815B2 (en) 2009-05-28 2017-01-03 Hsio Technologies, Llc Semiconductor socket with direct selective metalization
WO2011153298A1 (en) 2010-06-03 2011-12-08 Hsio Technologies, Llc Electrical connector insulator housing
US8955216B2 (en) 2009-06-02 2015-02-17 Hsio Technologies, Llc Method of making a compliant printed circuit peripheral lead semiconductor package
US8988093B2 (en) 2009-06-02 2015-03-24 Hsio Technologies, Llc Bumped semiconductor wafer or die level electrical interconnect
US9930775B2 (en) 2009-06-02 2018-03-27 Hsio Technologies, Llc Copper pillar full metal via electrical circuit structure
WO2012078493A1 (en) 2010-12-06 2012-06-14 Hsio Technologies, Llc Electrical interconnect ic device socket
US9184145B2 (en) 2009-06-02 2015-11-10 Hsio Technologies, Llc Semiconductor device package adapter
WO2011002709A1 (en) * 2009-06-29 2011-01-06 Hsio Technologies, Llc Compliant printed circuit semiconductor tester interface
US9276339B2 (en) 2009-06-02 2016-03-01 Hsio Technologies, Llc Electrical interconnect IC device socket
US8928344B2 (en) 2009-06-02 2015-01-06 Hsio Technologies, Llc Compliant printed circuit socket diagnostic tool
WO2010147934A1 (en) 2009-06-16 2010-12-23 Hsio Technologies, Llc Semiconductor die terminal
US8610265B2 (en) 2009-06-02 2013-12-17 Hsio Technologies, Llc Compliant core peripheral lead semiconductor test socket
WO2010141316A1 (en) 2009-06-02 2010-12-09 Hsio Technologies, Llc Compliant printed circuit wafer probe diagnostic tool
US8987886B2 (en) 2009-06-02 2015-03-24 Hsio Technologies, Llc Copper pillar full metal via electrical circuit structure
US9093767B2 (en) 2009-06-02 2015-07-28 Hsio Technologies, Llc High performance surface mount electrical interconnect
US9414500B2 (en) 2009-06-02 2016-08-09 Hsio Technologies, Llc Compliant printed flexible circuit
WO2010141311A1 (en) 2009-06-02 2010-12-09 Hsio Technologies, Llc Compliant printed circuit area array semiconductor device package
WO2010141296A1 (en) 2009-06-02 2010-12-09 Hsio Technologies, Llc Compliant printed circuit semiconductor package
WO2013036565A1 (en) 2011-09-08 2013-03-14 Hsio Technologies, Llc Direct metalization of electrical circuit structures
US9136196B2 (en) 2009-06-02 2015-09-15 Hsio Technologies, Llc Compliant printed circuit wafer level semiconductor package
WO2010141264A1 (en) * 2009-06-03 2010-12-09 Hsio Technologies, Llc Compliant wafer level probe assembly
US8789272B2 (en) 2009-06-02 2014-07-29 Hsio Technologies, Llc Method of making a compliant printed circuit peripheral lead semiconductor test socket
WO2010141303A1 (en) 2009-06-02 2010-12-09 Hsio Technologies, Llc Resilient conductive electrical interconnect
US9196980B2 (en) 2009-06-02 2015-11-24 Hsio Technologies, Llc High performance surface mount electrical interconnect with external biased normal force loading
US8525346B2 (en) 2009-06-02 2013-09-03 Hsio Technologies, Llc Compliant conductive nano-particle electrical interconnect
WO2010141298A1 (en) 2009-06-02 2010-12-09 Hsio Technologies, Llc Composite polymer-metal electrical contacts
US9232654B2 (en) 2009-06-02 2016-01-05 Hsio Technologies, Llc High performance electrical circuit structure
US9318862B2 (en) 2009-06-02 2016-04-19 Hsio Technologies, Llc Method of making an electronic interconnect
WO2014011226A1 (en) 2012-07-10 2014-01-16 Hsio Technologies, Llc Hybrid printed circuit assembly with low density main core and embedded high density circuit regions
US9613841B2 (en) 2009-06-02 2017-04-04 Hsio Technologies, Llc Area array semiconductor device package interconnect structure with optional package-to-package or flexible circuit to package connection
WO2011002712A1 (en) 2009-06-29 2011-01-06 Hsio Technologies, Llc Singulated semiconductor device separable electrical interconnect
US8981568B2 (en) 2009-06-16 2015-03-17 Hsio Technologies, Llc Simulated wirebond semiconductor package
TWI364122B (en) * 2009-07-06 2012-05-11 Led package structure for increasing light-emitting efficiency and controlling light-projecting angle and method for manufacturing the same
US20110048505A1 (en) * 2009-08-27 2011-03-03 Gabriela Bunea Module Level Solution to Solar Cell Polarization Using an Encapsulant with Opened UV Transmission Curve
US8599572B2 (en) * 2009-09-01 2013-12-03 Infinite Power Solutions, Inc. Printed circuit board with integrated thin film battery
US20110058770A1 (en) * 2009-09-10 2011-03-10 E. I. Du Pont De Nemours And Company Sub-surface engraving of oled substrates for improved optical outcoupling
FR2950982B1 (fr) * 2009-10-06 2017-05-19 Thales Sa Equipement de vision comportant une lampe optique a coefficient de transmission lumineuse commandee
US20110100418A1 (en) * 2009-11-03 2011-05-05 Palo Alto Research Center Incorporated Solid Linear Solar Concentrator Optical System With Micro-Faceted Mirror Array
JP5423414B2 (ja) * 2010-01-15 2014-02-19 株式会社リコー 電気機械変換膜の製造方法、電気機械変換膜、電気機械変換膜群、電気機械変換素子の製造方法、電気機械変換素子、電気機械変換素子群、液体吐出ヘッド、液体吐出装置、画像形成装置
BR112012019383A2 (pt) 2010-02-02 2017-09-12 Pixtronix Inc Circuitos para controlar aparelho de exibição
ES2928766T3 (es) 2010-02-22 2022-11-22 Swiss Tech Enterprise Gmbh Procedimiento para producir un módulo semiconductor
US20110241601A1 (en) * 2010-04-05 2011-10-06 Sheng-Chun Lin Recharging device which illuminates by solar energy
FR2958561B1 (fr) * 2010-04-08 2012-05-04 Commissariat Energie Atomique Procede de fabrication de deux zones adjacentes en materiaux differents
US20110255850A1 (en) * 2010-04-19 2011-10-20 Richard Hung Minh Dinh Electronic subassemblies for electronic devices
US9689897B2 (en) 2010-06-03 2017-06-27 Hsio Technologies, Llc Performance enhanced semiconductor socket
US9350093B2 (en) 2010-06-03 2016-05-24 Hsio Technologies, Llc Selective metalization of electrical connector or socket housing
US8758067B2 (en) 2010-06-03 2014-06-24 Hsio Technologies, Llc Selective metalization of electrical connector or socket housing
US10159154B2 (en) 2010-06-03 2018-12-18 Hsio Technologies, Llc Fusion bonded liquid crystal polymer circuit structure
US20110300432A1 (en) 2010-06-07 2011-12-08 Snyder Shawn W Rechargeable, High-Density Electrochemical Device
WO2011156095A2 (en) 2010-06-10 2011-12-15 The Regents Of The University Of California Textile-based printable electrodes for electrochemical sensing
US8377738B2 (en) 2010-07-01 2013-02-19 Sunpower Corporation Fabrication of solar cells with counter doping prevention
JP5499364B2 (ja) * 2010-08-26 2014-05-21 独立行政法人産業技術総合研究所 メモリ素子の駆動方法及びメモリ素子を備える記憶装置
CN102448264A (zh) * 2010-10-14 2012-05-09 鸿富锦精密工业(深圳)有限公司 光致发光薄膜、壳体及壳体的制作方法
US9784708B2 (en) 2010-11-24 2017-10-10 Spec Sensors, Llc Printed gas sensor
US8040609B1 (en) 2010-11-29 2011-10-18 Palo Alto Research Center Incorporated Self-adjusting solar light transmission apparatus
US8884156B2 (en) 2010-11-29 2014-11-11 Palo Alto Research Center Incorporated Solar energy harvesting device using stimuli-responsive material
TW201306337A (zh) * 2011-04-08 2013-02-01 Sonavation Inc 用於在壓電陣列上沈積材料之系統及方法
EP2699406B1 (de) 2011-04-17 2020-02-19 Stratasys Ltd. System und verfahren zur generativen herstellung eines objekts
WO2013016528A1 (en) * 2011-07-28 2013-01-31 The Board Of Trustees Of The University Of Illinois Electron emission device
KR20130026062A (ko) * 2011-09-05 2013-03-13 삼성전자주식회사 인쇄회로기판 조립체 및 그 제조방법
US20130068499A1 (en) * 2011-09-15 2013-03-21 Nucurrent Inc. Method for Operation of Multi-Layer Wire Structure for High Efficiency Wireless Communication
WO2013044224A2 (en) 2011-09-22 2013-03-28 Blue Spark Technologies, Inc. Cell attachment method
US20120175667A1 (en) * 2011-10-03 2012-07-12 Golle Aaron J Led light disposed on a flexible substrate and connected with a printed 3d conductor
TWI442587B (zh) * 2011-11-11 2014-06-21 Hon Hai Prec Ind Co Ltd 外殼面板及使用該外殼面板的電子設備
WO2014025430A2 (en) 2012-05-10 2014-02-13 The Regents Of The University Of California Wearable electrochemical sensors
RU2516731C2 (ru) * 2012-05-17 2014-05-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный нефтяной технический университет" Способ формования массы активатора анодных заземлителей и устройство для его осуществления
US8752380B2 (en) 2012-05-22 2014-06-17 Palo Alto Research Center Incorporated Collapsible solar-thermal concentrator for renewable, sustainable expeditionary power generator system
US9211185B2 (en) 2012-06-13 2015-12-15 Elwha Llc Breast implant with analyte sensors and internal power source
US8808373B2 (en) 2012-06-13 2014-08-19 Elwha Llc Breast implant with regionalized analyte sensors responsive to external power source
US8790400B2 (en) 2012-06-13 2014-07-29 Elwha Llc Breast implant with covering and analyte sensors responsive to external power source
US8795359B2 (en) 2012-06-13 2014-08-05 Elwha Llc Breast implant with regionalized analyte sensors and internal power source
US9144488B2 (en) 2012-06-13 2015-09-29 Elwha Llc Breast implant with analyte sensors responsive to external power source
US9144489B2 (en) 2012-06-13 2015-09-29 Elwha Llc Breast implant with covering, analyte sensors and internal power source
US9761520B2 (en) 2012-07-10 2017-09-12 Hsio Technologies, Llc Method of making an electrical connector having electrodeposited terminals
US9812590B2 (en) 2012-10-25 2017-11-07 Sunpower Corporation Bifacial solar cell module with backside reflector
US9035172B2 (en) 2012-11-26 2015-05-19 Sunpower Corporation Crack resistant solar cell modules
US9276147B2 (en) 2012-12-13 2016-03-01 First Solar, Inc. Methods of fabricating a photovoltaic module, and related system
US8796061B2 (en) 2012-12-21 2014-08-05 Sunpower Corporation Module assembly for thin solar cells
US9398697B2 (en) * 2013-03-13 2016-07-19 Mycronic AB Methods and devices for jetting viscous medium on workpiece
US9134552B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus with narrow gap electrostatic actuators
US9429769B2 (en) * 2013-05-09 2016-08-30 Johnson & Johnson Vision Care, Inc. Ophthalmic device with thin film nanocrystal integrated circuits
US8975121B2 (en) * 2013-05-09 2015-03-10 Johnson & Johnson Vision Care, Inc. Methods and apparatus to form thin film nanocrystal integrated circuits on ophthalmic devices
US9245202B2 (en) 2013-06-06 2016-01-26 International Business Machines Corporation Tamper detection with microcaspule rupture
KR20160023874A (ko) 2013-06-24 2016-03-03 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 프린트된 3차원(3d) 기능 부품 및 이것의 제작 방법
US10667410B2 (en) 2013-07-11 2020-05-26 Hsio Technologies, Llc Method of making a fusion bonded circuit structure
US10506722B2 (en) 2013-07-11 2019-12-10 Hsio Technologies, Llc Fusion bonded liquid crystal polymer electrical circuit structure
US9685571B2 (en) 2013-08-14 2017-06-20 Sunpower Corporation Solar cell module with high electric susceptibility layer
JP6076870B2 (ja) * 2013-09-13 2017-02-08 株式会社日立産機システム 帯電制御型インクジェットプリンタ及び印字方法
WO2015081347A1 (en) 2013-11-29 2015-06-04 Michael Knox Apparatus and method for the manufacturing of printed wiring boards and component attachment
US10548231B2 (en) 2013-11-29 2020-01-28 Botfactory Inc. Apparatus for depositing conductive and nonconductive material to form a printed circuit
KR101762778B1 (ko) 2014-03-04 2017-07-28 엘지이노텍 주식회사 무선 충전 및 통신 기판 그리고 무선 충전 및 통신 장치
GB2527271A (en) 2014-04-07 2015-12-23 Ujett D P Ltd Coated optical substrates
HUE059012T2 (hu) * 2014-05-20 2022-09-28 Hoffmann La Roche Eljárás sterilizált szubkután hozzáférési eszköz elõállítására és sterilizált szubkután hozzáférési eszköz
US10119932B2 (en) * 2014-05-28 2018-11-06 Honeywell International Inc. Electrochemical gas sensor
US9802373B2 (en) 2014-06-11 2017-10-31 Applied Nanostructured Solutions, Llc Methods for processing three-dimensional printed objects using microwave radiation
US10399322B2 (en) * 2014-06-11 2019-09-03 Applied Nanostructured Solutions, Llc Three-dimensional printing using carbon nanostructures
US9884437B2 (en) * 2014-06-20 2018-02-06 Palo Alto Research Center Incorporated Integral vasculature
DE102014010643A1 (de) * 2014-07-17 2016-01-21 Forschungszentrum Jülich GmbH Tintenstrahldruckverfahren sowie Anordnung zur Durchführung des Verfahrens
WO2016014563A1 (en) * 2014-07-21 2016-01-28 Chapoy L Lawrence Dr A novel manufacturing process for toric contact lenses and other specialty lenses utilizing a 3-dimensional printer
EP3191834A4 (de) 2014-09-12 2018-10-10 Spec Sensors LLC Atemprobeahmevorrichtungen und verfahren zur atemprobenahme unter verwendung von sensoren
WO2016090189A1 (en) 2014-12-03 2016-06-09 The Regents Of The University Of California Non-invasive and wearable chemical sensors and biosensors
FR3030903B1 (fr) * 2014-12-18 2018-04-20 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de realisation d'un dispositif de communication radio frequence
US10994473B2 (en) 2015-02-10 2021-05-04 Optomec, Inc. Fabrication of three dimensional structures by in-flight curing of aerosols
US9755335B2 (en) 2015-03-18 2017-09-05 Hsio Technologies, Llc Low profile electrical interconnect with fusion bonded contact retention and solder wick reduction
DE102015104299A1 (de) 2015-03-23 2016-09-29 International Automotive Components Group Gmbh Innenverkleidungsteil für ein Kraftfahrzeug
US11389828B2 (en) * 2015-03-24 2022-07-19 Gm Global Technology Operations, Llc Additive energy director and method of formation
JP6753395B2 (ja) * 2015-05-15 2020-09-09 ソニー株式会社 光造形物の製造方法
GB2538522B (en) 2015-05-19 2019-03-06 Dst Innovations Ltd Electronic circuit and component construction
WO2016191552A1 (en) 2015-05-26 2016-12-01 Spec Sensors, Llc Wireless near-field gas sensor system and methods of manufacturing the same
US20170291261A1 (en) * 2015-06-12 2017-10-12 Ashok Chand Mathur Method And Apparatus Of Very Much Faster 3D Printer
US9976975B2 (en) * 2015-07-24 2018-05-22 King Abdulaziz University Method of making thin film humidity sensors
US11205848B2 (en) 2015-08-07 2021-12-21 Nucurrent, Inc. Method of providing a single structure multi mode antenna having a unitary body construction for wireless power transmission using magnetic field coupling
US9960628B2 (en) 2015-08-07 2018-05-01 Nucurrent, Inc. Single structure multi mode antenna having a single layer structure with coils on opposing sides for wireless power transmission using magnetic field coupling
US9948129B2 (en) 2015-08-07 2018-04-17 Nucurrent, Inc. Single structure multi mode antenna for wireless power transmission using magnetic field coupling having an internal switch circuit
US9941729B2 (en) 2015-08-07 2018-04-10 Nucurrent, Inc. Single layer multi mode antenna for wireless power transmission using magnetic field coupling
US9941590B2 (en) 2015-08-07 2018-04-10 Nucurrent, Inc. Single structure multi mode antenna for wireless power transmission using magnetic field coupling having magnetic shielding
US10658847B2 (en) 2015-08-07 2020-05-19 Nucurrent, Inc. Method of providing a single structure multi mode antenna for wireless power transmission using magnetic field coupling
US9941743B2 (en) 2015-08-07 2018-04-10 Nucurrent, Inc. Single structure multi mode antenna having a unitary body construction for wireless power transmission using magnetic field coupling
US10636563B2 (en) 2015-08-07 2020-04-28 Nucurrent, Inc. Method of fabricating a single structure multi mode antenna for wireless power transmission using magnetic field coupling
US10063100B2 (en) 2015-08-07 2018-08-28 Nucurrent, Inc. Electrical system incorporating a single structure multimode antenna for wireless power transmission using magnetic field coupling
US9960629B2 (en) 2015-08-07 2018-05-01 Nucurrent, Inc. Method of operating a single structure multi mode antenna for wireless power transmission using magnetic field coupling
WO2017031348A1 (en) 2015-08-19 2017-02-23 Nucurrent, Inc. Multi-mode wireless antenna configurations
DE102016002052A1 (de) * 2015-12-18 2017-06-22 Liebherr-Components Biberach Gmbh Schaltschrank sowie Verfahren zu dessen Herstellung
US10879704B2 (en) 2016-08-26 2020-12-29 Nucurrent, Inc. Wireless connector receiver module
US10432031B2 (en) 2016-12-09 2019-10-01 Nucurrent, Inc. Antenna having a substrate configured to facilitate through-metal energy transfer via near field magnetic coupling
US11112394B2 (en) * 2016-12-23 2021-09-07 The Johns Hopkins University Ethylenic compound sensor including an organic semiconductor
US11223234B2 (en) 2017-02-13 2022-01-11 Nucurrent, Inc. Method of operating a wireless electrical energy transmission base
DE102017003721A1 (de) 2017-03-01 2018-09-06 Docter Optics Se Verfahren zum Herstellen eines Mikroprojektors für ein Projektionsdisplay
DE102017004562A1 (de) 2017-05-14 2018-11-15 Docter Optics Se Verfahren zum Herstellen eines Mikroprojektors und eines Projektionsdisplays
US11283296B2 (en) 2017-05-26 2022-03-22 Nucurrent, Inc. Crossover inductor coil and assembly for wireless transmission
EP3678856A1 (de) * 2017-09-07 2020-07-15 Transitions Optical, Ltd. Beschichtungssystem zur beschichtung eines optischen substrats, verfahren dafür und beschichtetes optisches substrat
DE102017009563A1 (de) 2017-10-12 2019-04-18 Docter Optics Se Verfahren zurn Herstellen eines Mikroprojektors für ein Projektionsdisplay
CN111655382B (zh) 2017-11-13 2022-05-31 奥普托美克公司 气溶胶流的阻挡
US10923244B2 (en) * 2017-11-30 2021-02-16 Elbit Systems Of America, Llc Phosphor screen for MEMS image intensifiers
US11465360B2 (en) 2018-04-30 2022-10-11 Hewlett-Packard Development Company, L.P. Additive manufactured resistivity
MX2020012076A (es) 2018-05-11 2021-03-25 Matthews Int Corp Estructuras de electrodos para microvalvulas para su uso en ensambles de chorros.
WO2019215674A1 (en) 2018-05-11 2019-11-14 Matthews International Corporation Systems and methods for sealing micro-valves for use in jetting assemblies
WO2019215671A2 (en) 2018-05-11 2019-11-14 Matthews International Corporation Methods of fabricating micro-valves and jetting assemblies including such micro-valves
WO2019215668A1 (en) 2018-05-11 2019-11-14 Matthews International Corporation Micro-valves for use in jetting assemblies
WO2019215672A1 (en) 2018-05-11 2019-11-14 Matthews International Corporation Systems and methods for controlling operation of micro-valves for use in jetting assemblies
CN108887766B (zh) * 2018-06-27 2020-08-18 广东省建言智能系统有限公司 一种可感知塑身压力的智能塑身衣及其制造工艺
CN109639073B (zh) * 2019-01-01 2023-09-29 广东顺德三合工业自动化设备股份有限公司 一种转盘式电机装配生产线的霍尔板安装机构
CN109980089A (zh) * 2019-03-08 2019-07-05 华南师范大学 一种有机太阳能电池及其制备方法
US11271430B2 (en) 2019-07-19 2022-03-08 Nucurrent, Inc. Wireless power transfer system with extended wireless charging range
US11227712B2 (en) 2019-07-19 2022-01-18 Nucurrent, Inc. Preemptive thermal mitigation for wireless power systems
DE102019211001A1 (de) * 2019-07-24 2021-01-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur digitalen Erzeugung eines optischen Elements mit integrierten Funktionalitäten und derart hergestelltes optisches Element
WO2021053682A1 (en) * 2019-09-22 2021-03-25 Technion Research & Development Foundation Limited Superconductor composites and devices comprising same
EP4051931A4 (de) * 2019-11-01 2024-03-13 Matthews Int Corp Kontaktlose abscheidungssysteme mit düsenaggregaten
US11056922B1 (en) 2020-01-03 2021-07-06 Nucurrent, Inc. Wireless power transfer system for simultaneous transfer to multiple devices
WO2021176498A1 (ja) * 2020-03-02 2021-09-10 株式会社Fuji 配線形成方法
CN113540959B (zh) * 2020-04-21 2022-06-10 山东华光光电子股份有限公司 一种边发射半导体激光器封装结构及其制作方法
US11283303B2 (en) 2020-07-24 2022-03-22 Nucurrent, Inc. Area-apportioned wireless power antenna for maximized charging volume
DK4048152T3 (da) 2020-07-29 2024-03-11 Biolinq Incorporated System til kontinuerlig analytovervågning med mikronålsindretning
US11876386B2 (en) 2020-12-22 2024-01-16 Nucurrent, Inc. Detection of foreign objects in large charging volume applications
US11881716B2 (en) 2020-12-22 2024-01-23 Nucurrent, Inc. Ruggedized communication for wireless power systems in multi-device environments
CN112909215B (zh) * 2021-01-29 2021-12-28 中国科学院长春光学精密机械与物理研究所 量子点色转换阵列的制备方法
US11695302B2 (en) 2021-02-01 2023-07-04 Nucurrent, Inc. Segmented shielding for wide area wireless power transmitter
KR102279897B1 (ko) * 2021-02-18 2021-07-21 주식회사 에프에스티 다액형 경화성 조성물의 도포 방법
CN113109705B (zh) * 2021-04-14 2022-05-27 华北电力大学(保定) 一种基于不同谐振点灵敏度分析的gis机械谐振谱分析方法
EP4153276A4 (de) 2021-05-08 2023-11-08 Biolinq, Inc. Fehlererkennung für eine auf mikronadelarray basierende kontinuierliche analytüberwachungsvorrichtung
KR20240026936A (ko) * 2021-06-01 2024-02-29 티코나 엘엘씨 자성 중합체 조성물
US11831174B2 (en) 2022-03-01 2023-11-28 Nucurrent, Inc. Cross talk and interference mitigation in dual wireless power transmitter
CN114260571B (zh) * 2022-03-03 2022-05-24 深圳市艾贝特电子科技有限公司 一种液态喷焊方法、设备及其使用方法
EP4243043A3 (de) * 2022-03-09 2023-11-08 Ricoh Company, Ltd. Elektrode, elektrochemisches element, vorrichtung zur herstellung der elektrode und verfahren zur herstellung der elektrode

Family Cites Families (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3795443A (en) 1968-08-26 1974-03-05 Xerox Corp Xerographic development
JPS5316861B2 (de) 1973-05-02 1978-06-03
DE2624778C3 (de) * 1975-06-03 1980-07-03 Ricoh Co., Ltd., Tokio Tintenausstoßkopf
CA1080781A (en) * 1975-10-28 1980-07-01 Kenneth H. Fischbeck Coincidence ink jet
US4268597A (en) 1976-04-13 1981-05-19 Philip A. Hunt Chemical Corp. Method, apparatus and compositions for liquid development of electrostatic images
JPS5918803B2 (ja) * 1976-07-30 1984-05-01 松下電工株式会社 コンデンサ抵抗複合部品材料
GB1566113A (en) 1976-08-31 1980-04-30 Philips Electronic Associated Providing a layer on a substrate
JPS5715975A (en) 1980-07-04 1982-01-27 Hitachi Ltd Ink jet recorder
US4523199A (en) * 1982-09-29 1985-06-11 Exxon Research & Engineering Co. High stability demand ink jet apparatus and method of operating same
GB2163596B (en) 1984-08-24 1988-02-03 Philips Electronic Associated A thermal imaging device and a method of manufacturing a thermal imaging device
GB2183500B (en) 1985-10-04 1989-09-27 Robillard Jean J A A method for the preparation of a thin semiconductor film
JPH0797696B2 (ja) * 1986-07-05 1995-10-18 株式会社豊田自動織機製作所 ハイブリツドic基板と回路パタ−ン形成方法
GB2196650A (en) 1986-10-27 1988-05-05 Prutec Ltd Cadmium sulphide solar cells
US4751530A (en) 1986-12-19 1988-06-14 Xerox Corporation Acoustic lens arrays for ink printing
FR2611043B1 (fr) 1987-02-16 1989-08-04 Crouzet Sa Capteur de pression a jauges piezoresistives
DE3728337A1 (de) 1987-08-25 1989-03-16 Goerlitz Computerbau Gmbh Verfahren zur herstellung von geaetzten leiterplatten
DE3740149A1 (de) 1987-11-26 1989-06-08 Herbert Dr Strohwald Verfahren zum herstellen eines leitermusters auf einem substrat
DK648187D0 (da) 1987-12-09 1987-12-09 Linkease Test Systems A S Fremgangsmaade og apparat til fremstilling af kredsloebsdel
US5459174A (en) 1988-05-27 1995-10-17 Merrill; Natalie A. Radiation curable isoolefin copolymers
US5132248A (en) * 1988-05-31 1992-07-21 The United States Of America As Represented By The United States Department Of Energy Direct write with microelectronic circuit fabrication
GB2233928B (en) * 1989-05-23 1992-12-23 Brother Ind Ltd Apparatus and method for forming three-dimensional article
JPH0336019A (ja) * 1989-07-03 1991-02-15 Brother Ind Ltd 三次元成形方法およびその装置
JP2699563B2 (ja) 1989-07-25 1998-01-19 ブラザー工業株式会社 3次元成形装置
US5182571A (en) * 1990-02-26 1993-01-26 Spectra, Inc. Hot melt ink jet transparency
US5250439A (en) 1990-07-19 1993-10-05 Miles Inc. Use of conductive sensors in diagnostic assays
JPH0499646A (ja) 1990-08-17 1992-03-31 Nec Corp インクジェットヘッド
DE4035080A1 (de) 1990-11-05 1992-05-07 Abb Patent Gmbh Verfahren und einrichtung zur herstellung von partiellen metallischen schichten
EP0563251A1 (de) 1990-12-20 1993-10-06 Exxon Chemical Patents Inc. Durch uv-/elektronenstrahlen härtbare butylcopolymere für anwendungen in der lithographie und als korrosionsbeständige beschichtungen
US5512122A (en) 1991-10-17 1996-04-30 Luminart Inc. Printing method
US5279678A (en) * 1992-01-13 1994-01-18 Photon Energy, Inc. Photovoltaic cell with thin CS layer
JPH05235388A (ja) 1992-02-24 1993-09-10 Mitsubishi Electric Corp 低抵抗線状パターンの形成方法及び形成装置並びに太陽電池
CN1064357A (zh) * 1992-02-25 1992-09-09 中国科学院上海技术物理研究所 光晶体管
US5510066A (en) * 1992-08-14 1996-04-23 Guild Associates, Inc. Method for free-formation of a free-standing, three-dimensional body
US5231450A (en) 1992-08-27 1993-07-27 Daniels John J Three-dimensional color image printer
JPH06143581A (ja) 1992-11-05 1994-05-24 Xerox Corp インクジェット印字ヘッド
US5380769A (en) 1993-01-19 1995-01-10 Tektronix Inc. Reactive ink compositions and systems
US5539100A (en) * 1993-07-01 1996-07-23 The United States Of America As Represented By The United States Department Of Energy Organic solid state switches incorporating porphyrin compounds and method for producing organic solid state optical switches
DE69429004T2 (de) 1993-08-26 2002-07-11 Solidscape Inc Vorrichtung zur herstellung von dreidimensionalen modellen
GB9403682D0 (en) 1994-02-25 1994-04-13 Univ Edinburgh Direct printing of etch masks under computer control
CA2116875C (en) 1994-03-01 2002-10-22 Barrie Peter Keyworth Method and apparatus for making optical components by direct dispensing of curable liquid
FR2717420B3 (fr) 1994-03-16 1996-06-28 Guy Reynaud Procédé d'impression en relief, notamment de caractères Braille.
US5502307A (en) 1994-04-18 1996-03-26 Servo Corporation Of America Spun cast IR detector arrays and method of making the same
US5609919A (en) 1994-04-21 1997-03-11 Altamat Inc. Method for producing droplets
JP3171015B2 (ja) 1994-08-15 2001-05-28 松下電器産業株式会社 クリーニング方法及びクリーニング装置
EP0683405A1 (de) 1994-05-18 1995-11-22 Xerox Corporation Akustische Herstellung von Farbfiltern
JPH085828A (ja) * 1994-06-15 1996-01-12 Toppan Printing Co Ltd タイトル表示形成方法
JP3246189B2 (ja) * 1994-06-28 2002-01-15 株式会社日立製作所 半導体表示装置
US5595689A (en) * 1994-07-21 1997-01-21 Americhem, Inc. Highly conductive polymer blends with intrinsically conductive polymers
US5560543A (en) 1994-09-19 1996-10-01 Board Of Regents, The University Of Texas System Heat-resistant broad-bandwidth liquid droplet generators
JP2865578B2 (ja) 1994-10-25 1999-03-08 富士通株式会社 レジストパターンの作成方法、その方法により得られるプリント配線板及びその作成装置
US5685491A (en) * 1995-01-11 1997-11-11 Amtx, Inc. Electroformed multilayer spray director and a process for the preparation thereof
US5598200A (en) 1995-01-26 1997-01-28 Gore; David W. Method and apparatus for producing a discrete droplet of high temperature liquid
EP0807014B1 (de) 1995-02-01 2002-05-02 3D Systems, Inc. Schnelles glättungsverfahren für schichtweise hergestellte dreidimensionale gegenstände
US5627578A (en) 1995-02-02 1997-05-06 Thermotek, Inc. Desk top printing of raised text, graphics, and braille
JP3529476B2 (ja) 1995-03-02 2004-05-24 株式会社東芝 カラーフィルタ及び液晶表示装置の製造方法
JP3033069B2 (ja) 1995-04-04 2000-04-17 富士ゼロックス株式会社 インクジェット記録用インクおよびインクジェット記録方法
US5649480A (en) 1995-06-07 1997-07-22 Yim; Joan Marilyn Touch-readable product and associated process
US6120588A (en) * 1996-07-19 2000-09-19 E Ink Corporation Electronically addressable microencapsulated ink and display thereof
GB2304812A (en) 1995-08-26 1997-03-26 Ford Motor Co Pressure sensing spark plug
JPH0966603A (ja) * 1995-08-31 1997-03-11 Brother Ind Ltd インク噴射装置の駆動方法
JP2967052B2 (ja) 1995-09-08 1999-10-25 キヤノン株式会社 カラーフィルタの製造方法及び製造装置
US5740287A (en) 1995-12-07 1998-04-14 The United States Of America As Represented By The Secretary Of The Army Optical switch that utilizes one-dimensional, nonlinear, multilayer dielectric stacks
JPH09219019A (ja) 1996-02-13 1997-08-19 Nippon Sheet Glass Co Ltd 磁気ディスクにおけるテクスチャーの形成方法
US6053596A (en) 1996-03-22 2000-04-25 Ricoh Company, Ltd. Ink-jet printing device and driving circuit used in the ink-jet printing device
DE19712233C2 (de) * 1996-03-26 2003-12-11 Lg Philips Lcd Co Flüssigkristallanzeige und Herstellungsverfahren dafür
US5930117A (en) 1996-05-07 1999-07-27 Sheldahl, Inc. Heat sink structure comprising a microarray of thermal metal heat channels or vias in a polymeric or film layer
EP1450412A3 (de) 1996-05-15 2005-03-09 Seiko Epson Corporation Dünnschichtbauelement und Herstellungsverfahren
US6596224B1 (en) * 1996-05-24 2003-07-22 Massachusetts Institute Of Technology Jetting layers of powder and the formation of fine powder beds thereby
GB9611582D0 (en) * 1996-06-04 1996-08-07 Thin Film Technology Consultan 3D printing and forming of structures
JP3899566B2 (ja) 1996-11-25 2007-03-28 セイコーエプソン株式会社 有機el表示装置の製造方法
DE19654828C1 (de) 1996-12-23 1998-01-15 Fraunhofer Ges Forschung Verfahren zur Herstellung eines fotoelektronischen Mikrochips, der eine lichtundurchlässige Schicht aufweist
US6094676A (en) 1997-05-30 2000-07-25 Hilgraeve Incorporated Method and apparatus for peer-to-peer communication
CA2306384A1 (en) 1997-10-14 1999-04-22 Patterning Technologies Limited Method of forming an electronic device
US6153001A (en) 1997-12-18 2000-11-28 Fuji Xerox Co., Ltd. Ink jet recording ink, method for producing the same, and ink jet recording method
US6023464A (en) 1997-12-23 2000-02-08 Mediaone Group, Inc. Auto-provisioning of user equipment
JP4003273B2 (ja) 1998-01-19 2007-11-07 セイコーエプソン株式会社 パターン形成方法および基板製造装置
US6087196A (en) 1998-01-30 2000-07-11 The Trustees Of Princeton University Fabrication of organic semiconductor devices using ink jet printing
US6049826A (en) 1998-02-04 2000-04-11 3Com Corporation Method and system for cable modem initialization using dynamic servers
AU4186699A (en) 1998-05-20 1999-12-06 Intermec Ip Corp. Method and apparatus for making electrical traces, circuits and devices
JP2003506886A (ja) 1999-05-27 2003-02-18 パターニング テクノロジーズ リミテッド 表面にマスキングパターンを形成する方法
US6292838B1 (en) 1999-08-23 2001-09-18 3Com Corporation Technique for automatic remote media access control (MAC) layer address resolution
US6994894B2 (en) 2000-04-20 2006-02-07 Vanderbilt University Method and system for thick-film deposition of ceramic materials

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US6503831B2 (en) 2003-01-07
US7129166B2 (en) 2006-10-31
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