DE69926753D1 - Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung - Google Patents

Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung

Info

Publication number
DE69926753D1
DE69926753D1 DE69926753T DE69926753T DE69926753D1 DE 69926753 D1 DE69926753 D1 DE 69926753D1 DE 69926753 T DE69926753 T DE 69926753T DE 69926753 T DE69926753 T DE 69926753T DE 69926753 D1 DE69926753 D1 DE 69926753D1
Authority
DE
Germany
Prior art keywords
fixed part
static pressure
movable part
gas
bearing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69926753T
Other languages
English (en)
Other versions
DE69926753T2 (de
Inventor
Shinobu Tokushima
Yukiharu Okubo
Toshimasa Shimoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69926753D1 publication Critical patent/DE69926753D1/de
Application granted granted Critical
Publication of DE69926753T2 publication Critical patent/DE69926753T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/72—Sealings
    • F16C33/74—Sealings of sliding-contact bearings
    • F16C33/741—Sealings of sliding-contact bearings by means of a fluid
    • F16C33/748—Sealings of sliding-contact bearings by means of a fluid flowing to or from the sealing gap, e.g. vacuum seals with differential exhaust
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions
DE69926753T 1998-06-17 1999-06-09 Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung Expired - Lifetime DE69926753T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP16969798 1998-06-17
JP16969798 1998-06-17
PCT/JP1999/003077 WO1999066221A1 (fr) 1998-06-17 1999-06-09 Palier a gaz sous pression statique, etage mettant en oeuvre ce palier, et dispositif optique dote de cet etage

Publications (2)

Publication Number Publication Date
DE69926753D1 true DE69926753D1 (de) 2005-09-22
DE69926753T2 DE69926753T2 (de) 2006-01-19

Family

ID=15891218

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69926753T Expired - Lifetime DE69926753T2 (de) 1998-06-17 1999-06-09 Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung

Country Status (7)

Country Link
US (1) US6328473B1 (de)
EP (1) EP1089001B1 (de)
JP (1) JP4144179B2 (de)
AT (1) ATE302356T1 (de)
AU (1) AU4061199A (de)
DE (1) DE69926753T2 (de)
WO (1) WO1999066221A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6499880B2 (en) * 1999-02-19 2002-12-31 Nikon Corporation Static pressure air bearing
EP1052552A3 (de) * 1999-04-19 2003-03-12 ASML Netherlands B.V. Gaslager zur Verwendung mit Vakuumkammern und deren Anwendung in lithographischen Projektionsapparaten
TWI242111B (en) 1999-04-19 2005-10-21 Asml Netherlands Bv Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
NL1015738C2 (nl) 1999-07-28 2002-10-15 Kyocera Corp Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m.
US6514344B2 (en) * 1999-12-16 2003-02-04 Tokyo Electron Limited Film forming unit
US6583597B2 (en) 2000-07-07 2003-06-24 Nikon Corporation Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same
JP2002252166A (ja) * 2001-02-27 2002-09-06 Canon Inc ステージ装置、露光装置およびデバイス製造方法ならびに移動案内方法
JP4031252B2 (ja) * 2002-01-31 2008-01-09 キヤノン株式会社 排気装置及びその制御方法並びに真空内静圧軸受
KR100534140B1 (ko) * 2004-06-23 2005-12-08 삼성전자주식회사 스테이지장치
JP2008511138A (ja) 2004-08-18 2008-04-10 ニュー ウエイ マシーン コンポーネント インコーポレイティッド 空気軸受と段差ポンプ溝を備えた移動真空チャンバステージ
US20060124864A1 (en) * 2004-12-14 2006-06-15 Nikon Corporation Air bearing compatible with operation in a vacuum
NL2002935A1 (nl) * 2008-06-27 2009-12-29 Asml Netherlands Bv Object support positioning device and lithographic apparatus.
CN102672695B (zh) * 2011-12-25 2018-12-25 河南科技大学 一种精密工作台
WO2016158229A1 (ja) * 2015-03-31 2016-10-06 住友重機械工業株式会社 アクチュエータ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2449297A (en) * 1941-03-26 1948-09-14 James M Degnan Automatic fluid pressure balancing system
US4272216A (en) * 1978-12-20 1981-06-09 Kearney & Trecker Corporation Machine tool lubrication system
US4191385A (en) 1979-05-15 1980-03-04 Fox Wayne L Vacuum-sealed gas-bearing assembly
JPS585523A (ja) * 1981-06-30 1983-01-12 Matsushita Electric Ind Co Ltd 静圧流体スライド装置
US4425508A (en) 1982-05-07 1984-01-10 Gca Corporation Electron beam lithographic apparatus
US4653408A (en) * 1984-09-05 1987-03-31 Citizen Watch Co., Ltd. Table mechanism for controlling table attitude
US4969169A (en) 1986-04-15 1990-11-06 Hampshire Instruments, Inc. X-ray lithography system
US5218896A (en) 1986-11-06 1993-06-15 Canon Kabushiki Kaisha Driving mechanism with gas bearing
EP0304090B1 (de) * 1987-08-20 1994-07-27 Toyoda Koki Kabushiki Kaisha Hydrostatische Lagerung für Gleitschiene
JPH0530547A (ja) 1991-07-25 1993-02-05 Fujitsu Ltd 障害加入者カードの自動切替方式
JP2602783Y2 (ja) * 1991-09-30 2000-01-24 京セラ株式会社 Ｘ−ｙテーブル
JP3128709B2 (ja) * 1992-08-04 2001-01-29 株式会社新川 非接触型移動テーブル
JP3709896B2 (ja) * 1995-06-15 2005-10-26 株式会社ニコン ステージ装置
US5784925A (en) * 1996-12-13 1998-07-28 Etec Systems, Inc. Vacuum compatible linear motion device

Also Published As

Publication number Publication date
DE69926753T2 (de) 2006-01-19
ATE302356T1 (de) 2005-09-15
EP1089001B1 (de) 2005-08-17
EP1089001A1 (de) 2001-04-04
WO1999066221A1 (fr) 1999-12-23
EP1089001A4 (de) 2003-02-05
US6328473B1 (en) 2001-12-11
JP4144179B2 (ja) 2008-09-03
AU4061199A (en) 2000-01-05

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