DE69940916D1 - Fotohärtbare flüssige Harzzusammensetzung - Google Patents

Fotohärtbare flüssige Harzzusammensetzung

Info

Publication number
DE69940916D1
DE69940916D1 DE69940916T DE69940916T DE69940916D1 DE 69940916 D1 DE69940916 D1 DE 69940916D1 DE 69940916 T DE69940916 T DE 69940916T DE 69940916 T DE69940916 T DE 69940916T DE 69940916 D1 DE69940916 D1 DE 69940916D1
Authority
DE
Germany
Prior art keywords
resin composition
liquid resin
photohardenable liquid
photohardenable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940916T
Other languages
English (en)
Inventor
Tetsuya Yamamura
Akira Takeuchi
Tsuyoshi Watanabe
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05272998A external-priority patent/JP3824286B2/ja
Priority claimed from JP05886298A external-priority patent/JP4017236B2/ja
Priority claimed from JP06209098A external-priority patent/JP4017238B2/ja
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM IP Assets BV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69940916D1 publication Critical patent/DE69940916D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE69940916T 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung Expired - Lifetime DE69940916D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP05272998A JP3824286B2 (ja) 1998-02-18 1998-02-18 光硬化性樹脂組成物
JP05886298A JP4017236B2 (ja) 1998-02-24 1998-02-24 光硬化性液状樹脂組成物
JP5886198 1998-02-24
JP06209098A JP4017238B2 (ja) 1998-02-24 1998-02-26 光硬化性液状樹脂組成物

Publications (1)

Publication Number Publication Date
DE69940916D1 true DE69940916D1 (de) 2009-07-09

Family

ID=27462810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940916T Expired - Lifetime DE69940916D1 (de) 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung

Country Status (3)

Country Link
US (2) US6287745B1 (de)
EP (1) EP0938026B1 (de)
DE (1) DE69940916D1 (de)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287745B1 (en) * 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6579917B1 (en) * 1999-02-24 2003-06-17 Sanyo Electric Co., Ltd. Surface treatment agent for model
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
WO2001012745A1 (fr) * 1999-08-12 2001-02-22 Mitsui Chemicals, Inc. Composition de resine photodurcissable pour materiau d'etancheite et procede correspondant
EE200200121A (et) * 1999-09-10 2003-04-15 Nagracard S.A. Meetod ja süsteem teadete edastamiseks andmebaasi
JP2001081438A (ja) * 1999-09-14 2001-03-27 Sony Chem Corp 接続材料
GB9921779D0 (en) * 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
AU7466201A (en) * 2000-06-09 2001-12-17 Dsm N.V. Resin composition and three-dimensional object
JP2002040632A (ja) * 2000-07-21 2002-02-06 Showa Denko Kk レジストインキ組成物
US6503689B2 (en) 2000-09-19 2003-01-07 Shipley Company, L.L.C. Antireflective composition
US6849333B2 (en) 2001-05-18 2005-02-01 Corning Incorporated Optical fiber with an improved primary coating composition
US6811937B2 (en) * 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US7060156B2 (en) * 2001-07-23 2006-06-13 Vrac, Llc Three-dimensional spacer fabric resin interlaminar infusion media process and vacuum-induced reinforcing composite laminate structures
US7048985B2 (en) * 2001-07-23 2006-05-23 Vrac, Llc Three-dimensional spacer fabric resin infusion media and reinforcing composite lamina
US6810187B2 (en) 2001-07-27 2004-10-26 Corning Incorporated Optical waveguide thermoplastic elastomer coating
CA2466611C (en) * 2001-12-06 2011-09-27 Vantico Ag Heat-curable resin composition
US6689463B2 (en) 2001-12-18 2004-02-10 Corning Incorporated Secondary coating composition for optical fibers
AU2003218051A1 (en) * 2002-03-08 2003-09-22 Rensselaer Polytechnic Institute Accelerators for cationic photopolymerization
US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
EP2466378B1 (de) 2002-05-03 2014-01-08 DSM IP Assets B.V. Strahlungshärtbare Harzzusammensetzung und rapides Prototyping-Verfahren damit
WO2004001507A1 (en) * 2002-06-20 2003-12-31 Dsm Ip Assets B.V. Compositions comprising a benzophenone photoinitiator
US6850681B2 (en) * 2002-08-22 2005-02-01 Addison Clear Wave, Llc Radiation-curable flame retardant optical fiber coatings
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
CN1297583C (zh) * 2002-11-06 2007-01-31 日本化药株式会社 液晶用密封材料和使用该材料的液晶显示单元
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
JP4211942B2 (ja) * 2003-04-08 2009-01-21 日本化薬株式会社 液晶シール剤およびそれを用いた液晶表示セル
JP4161850B2 (ja) * 2003-05-13 2008-10-08 コニカミノルタエムジー株式会社 感光性組成物、感光性平版印刷版、及びその画像形成方法
JP2005015627A (ja) * 2003-06-26 2005-01-20 Jsr Corp 光硬化性液状樹脂組成物
JP4551638B2 (ja) * 2003-08-01 2010-09-29 富士フイルム株式会社 固体撮像装置の製造方法
JP2005056998A (ja) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd 固体撮像装置およびその製造方法
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
CA2541160C (en) * 2003-11-06 2012-05-15 Huntsman Advanced Materials (Switzerland) Gmbh Photocurable composition for producing cured articles having high clarity and improved mechanical properties
EP1694769A4 (de) 2003-11-21 2007-08-29 Lord Corp Auf wafer aufgebrachte zweistufige underfills
JP2005153273A (ja) * 2003-11-25 2005-06-16 Nitto Denko Corp 樹脂シート、液晶セル基板、液晶表示装置、エレクトロルミネッセンス表示装置用基板、エレクトロルミネッセンス表示装置および太陽電池用基板
US7560519B2 (en) * 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
EP1720072B1 (de) 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen und Verfahren für Immersionslithografie
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
US7541391B2 (en) * 2005-09-02 2009-06-02 General Electric Company Self-forming polymer waveguide and waveguide material with reduced shrinkage
US20100152314A1 (en) * 2005-09-29 2010-06-17 Cmet Inc. Resin composition for stereolithography
EP1801142B1 (de) * 2005-12-16 2016-02-24 Canon Kabushiki Kaisha Harzzusammensetzung, gehärtetes Harzprodukt und Flüssigkeitsausstosskopf
EP2019975B1 (de) * 2006-05-01 2017-08-16 DSM IP Assets B.V. MIT STRAHLUNG AUSHÄRTBARE HARZZUSAMMENSETZUNG UND DIESE VERWENDENDER SCHNELLER DREIDIMENSIONALER ABBILDUNGSPROZEß
US9423638B2 (en) 2006-07-14 2016-08-23 Dexerials Corporation Resin composition and display unit
KR101310696B1 (ko) * 2006-09-29 2013-09-25 디아이씨 가부시끼가이샤 다분기 폴리에테르폴리올 함유의 양이온 중합성 수지조성물, 그것을 포함하는 접착제, 및 그것을 사용한 적층체및 편광판
CN102253596B (zh) 2006-10-30 2014-05-14 罗门哈斯电子材料有限公司 浸渍平版印刷用组合物和浸渍平版印刷方法
CN101809500A (zh) 2007-03-20 2010-08-18 帝斯曼知识产权资产管理有限公司 立体光刻树脂组合物以及由其制成的三维物品
CN101675461B (zh) 2007-04-09 2013-11-13 迪睿合电子材料有限公司 图像显示装置
JP5470735B2 (ja) 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
JP4973876B2 (ja) * 2007-08-22 2012-07-11 信越化学工業株式会社 パターン形成方法及びこれに用いるパターン表面コート材
CN101526737B (zh) 2007-11-05 2014-02-26 罗门哈斯电子材料有限公司 浸渍平版印刷用组合物和浸渍平版印刷方法
JP2009244421A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 平版印刷版の製版方法
EP2397533B1 (de) * 2009-02-16 2013-04-17 Soken Chemical & Engineering Co., Ltd. Strahlungshärtbare haftzusammensetzung für optische komponenten und optische haftkomponente
CN102272227B (zh) 2009-03-13 2014-03-12 帝斯曼知识产权资产管理有限公司 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法
JP5430345B2 (ja) * 2009-10-26 2014-02-26 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
KR20130106507A (ko) * 2012-03-20 2013-09-30 삼성디스플레이 주식회사 실링 조성물 및 이를 이용한 표시 패널의 제조방법
RU2015118591A (ru) * 2012-10-19 2016-12-10 ДАУ ГЛОБАЛ ТЕКНОЛОДЖИЗ ЭлЭлСи Дисперсии полимерных частиц с полиолами
CN104837920A (zh) * 2012-11-19 2015-08-12 惠普发展公司，有限责任合伙企业 用于三维(3d)打印的组合物
EP2868692B1 (de) 2013-11-05 2017-10-25 DSM IP Assets B.V. Stabilisierte matrixgefüllte flüssige strahlungshärtbare Harzzusammensetzungen zur Additivherstellung
JP2015225205A (ja) * 2014-05-28 2015-12-14 京セラドキュメントソリューションズ株式会社 光偏向器及び該光偏向器を備えた画像形成装置
US10683381B2 (en) 2014-12-23 2020-06-16 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
US10797013B2 (en) * 2015-02-16 2020-10-06 Panasonic Intellectual Property Management Co., Ltd. Acrylic resin composition for sealing, cured product of same, method for producing same, semiconductor device using said resin composition, and method for manufacturing said semiconductor device
US11097531B2 (en) 2015-12-17 2021-08-24 Bridgestone Americas Tire Operations, Llc Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
EP3429833B1 (de) * 2016-03-14 2022-04-13 Covestro (Netherlands) B.V. Strahlungshärtbare zusammensetzungen zur generativen fertigung mit verbesserter zähigkeit und hitzebeständigkeit
US11453161B2 (en) 2016-10-27 2022-09-27 Bridgestone Americas Tire Operations, Llc Processes for producing cured polymeric products by additive manufacturing
US20180229442A1 (en) * 2017-02-14 2018-08-16 Ut-Battelle, Llc Bonded permanent magnets produced by additive manufacturing

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4428807A (en) * 1978-06-30 1984-01-31 The Dow Chemical Company Composition containing polymerizable entities having oxirane groups and terminal olefinic unsaturation in combination with free-radical and cationic photopolymerizations means
US5002854A (en) 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using compositions containing core-shell polymers
US5545367A (en) 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
TW269017B (de) 1992-12-21 1996-01-21 Ciba Geigy Ag
US5453450A (en) * 1993-06-16 1995-09-26 Minnesota Mining And Manufacturing Company Stabilized curable adhesives
US6177488B1 (en) 1995-08-25 2001-01-23 Kansai Paint Company, Limited Aqueous colored base coating composition
JP3626275B2 (ja) * 1996-04-09 2005-03-02 Ｊｓｒ株式会社 光硬化性樹脂組成物
ES2144836T3 (es) * 1996-07-29 2000-06-16 Ciba Sc Holding Ag Composicion liquida reticulable por radiacion, en especial para estereolitografia.
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3844824B2 (ja) 1996-11-26 2006-11-15 株式会社Ａｄｅｋａ エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法
JP3626302B2 (ja) 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3650238B2 (ja) * 1996-12-10 2005-05-18 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
CA2296587A1 (en) * 1997-07-21 1999-02-04 Ciba Specialty Chemicals Holding Inc. Viscosity stabilization of radiation-curable compositions
US6287745B1 (en) * 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6100007A (en) * 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures

Also Published As

Publication number Publication date
US6727035B2 (en) 2004-04-27
EP0938026A1 (de) 1999-08-25
US6287745B1 (en) 2001-09-11
US20020048717A1 (en) 2002-04-25
EP0938026B1 (de) 2009-05-27

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