EP1295348A1 - Led mit auskoppelstruktur - Google Patents
Led mit auskoppelstrukturInfo
- Publication number
- EP1295348A1 EP1295348A1 EP01943139A EP01943139A EP1295348A1 EP 1295348 A1 EP1295348 A1 EP 1295348A1 EP 01943139 A EP01943139 A EP 01943139A EP 01943139 A EP01943139 A EP 01943139A EP 1295348 A1 EP1295348 A1 EP 1295348A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coupling
- layer
- radiation
- led according
- led
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005855 radiation Effects 0.000 claims abstract description 24
- 239000004065 semiconductor Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000005253 cladding Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
Definitions
- the present invention relates to an LED with an outcoupling structure to increase the efficiency.
- the radiation-generating region generally extends as an active layer over an entire layer plane or a strip-shaped region of a layer plane.
- a connection contact (bondpad) for current injection is usually located on the front of the component.
- the counterelectrode can be applied to the back of the substrate as a full-area contact metallization or can be formed by a contact attached laterally to a radiation-generating strip on the front, which is connected to the underside of the active layer via suitably arranged, electrically conductively doped regions.
- a decoupling layer can be disposed on the front side, the coupling out the light from the chip improves.
- the radiation generated should be coupled out of the LED as directly as possible. Because the semiconductor material has a higher
- Refractive index (typically 3.5) than the surrounding air or another transparent material that adjoins the semiconductor material (e.g. a resin with a refractive index of typically 1.5) occurs when the radiation is not sufficiently steep the interface total reflection.
- the radiation is reflected several times in the interior of the semiconductor material and only leaves the LED after a significant reduction in the radiation power.
- a beam which does not strike the boundary surface within the limit angle of total reflection at approximately 25.38 ° in the numerical example given can strike at the opposite surface Interfaces are reflected several times at the same angle and are finally absorbed in the area of a contact or an active zone or in the substrate.
- the application of a thick semiconductor layer on the upper side of the LED provides a structure in which the radiation is more likely to strike the side surfaces (edges) of the component at an angle that is sufficiently steep for it to exit the semiconductor material.
- GB 2326023 A describes a radiation-generating semiconductor component in which the outer side surfaces form an oblique angle to the plane of the active layer. It is thereby achieved that the radiation generated is deflected in the case of a total reflection on the side surfaces in a beam direction which is largely perpendicular to the flat top of the component, so that the radiation can exit here. The majority of the radiation generated can therefore be coupled out of the LED after at most one total reflection, which increases the luminous efficacy.
- US Pat. No. 5,087,949 describes an LED with a semiconductor body with beveled edges.
- the n-type doped semiconductor body is transparent to the radiation and is provided on the back with a p-type doped layer.
- Current is injected into the pn junction via front and rear contacts.
- the rear-side contact borders the p-doped layer in a small central region and is otherwise separated from this layer by an insulation layer.
- the current path is thus limited to the central area of the diode.
- the radiation which is therefore only generated in this central region reaches the front of the LED and strikes the oblique flanks formed in the semiconductor body at very steep angles, which enable the radiation to be decoupled immediately from the semiconductor material.
- the object of the present invention is to provide an LED in which the coupling-out of radiation is improved.
- a structured coupling-out layer is present on an upper side.
- the lateral edges of the coupling-out layer form flanks which are aligned with the layer plane at an angle between 45 ° and 88 °, preferably between 60 ° and 88 °.
- the outcoupling regions can each be essentially circularly delimited and form flat truncated cones with flat upper and lower boundary surfaces of the outcoupling layer.
- the radiation-generating regions of the active layer are preferably limited to regions which, in a projection perpendicular to the layer plane, lie within the circular boundary of the coupling-out region concerned.
- flanks of the coupling-out layer preferably run at alternating acute and obtuse angles at the edges of the coupling-out regions or are provided with tapering tines or with bulges and indentations.
- Figure 1 shows an embodiment of the LED in a simplified sectional view
- Figure 2 shows another embodiment in supervision
- Figure 3 is a diagram showing the dependence of the coupling efficiency on the flank angle.
- an LED is shown, in which on a substrate 1, z. B. from GaAs, a layer structure is present, which in this example comprises a current limiting layer 2, a cladding layer 3, an active layer 4, a cover layer 5 and a coupling-out layer 6.
- a back contact 11 for current injection On the back of the substrate there is a back contact 11 for current injection; on the top of the coupling-out layer 6 there is a connection surface 9 with respective leads 8 to individual contacts 7 assigned to the respective coupling-out areas.
- the semiconductor material between these contacts 7 and the active layer 4 is doped for electrical conductivity of a first conductivity type, at least in the areas provided for the generation and coupling out of radiation; the semiconductor material between the active layer 4 and the rear-side contact 11 is doped for electrical conductivity of the opposite second conductivity type.
- the active layer 4 can be undoped or doped with either of the two conductivity types.
- the substrate 1 is e.g. B. n-type and the cover layer 5 at least in the coupling-out region 60 doped p-type.
- the cover layer 5 can be designed to be insulating outside the decoupling regions.
- a further passivation layer, not shown, can be applied to the surface of the LED laterally to the coupling-out areas on the cover layer.
- the cover layer 5 can also be omitted if the coupling-out layer 6 is provided as the upper boundary of the active layer 4.
- the coupling-out layer 6 can include all or part of the layers 2 to 5.
- the coupling-out layer 6 is doped highly for the first conductivity type (in the example p + -conducting), at least in the areas provided with the contacts 7, in order to
- surfaces of these truncated cones have an inclination between 45 ° and 88 °, preferably between 60 ° and 88 ° to the layer plane.
- the respective number of decoupling areas is not specified.
- a similar structure with a successively convex and concave rounded shape of the flanks can be present.
- the angle which the flank of the coupling-out layer forms with the layer plane is between 45 ° and 88 °, preferably between 60 ° and 88 °, and there are at least two coupling-out regions that are offset from one another.
- the structure of the LED can correspond to a conventional component; in particular, instead of a rear-side contact, a further contact can be attached to the top of the LED, which is connected in an electrically conductive manner to the cladding layer 3 or a corresponding layer.
- FIG. 3 shows the dependence of the coupling-out efficiency ⁇ on the angle which the flank of the coupling-out layer forms with the layer plane in the area between 90 ° and 70 °.
- the angle which the flank of the coupling-out layer forms with the layer plane is denoted by ⁇ in FIG. 3.
- Coupling efficiency is plotted in any units. ⁇ > o L ⁇
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10031821 | 2000-06-30 | ||
DE10031821A DE10031821B4 (de) | 2000-06-30 | 2000-06-30 | LED mit Auskoppelstruktur |
PCT/DE2001/001953 WO2002003478A1 (de) | 2000-06-30 | 2001-05-23 | Led mit auskoppelstruktur |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1295348A1 true EP1295348A1 (de) | 2003-03-26 |
Family
ID=7647300
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01943139A Withdrawn EP1295348A1 (de) | 2000-06-30 | 2001-05-23 | Led mit auskoppelstruktur |
Country Status (7)
Country | Link |
---|---|
US (1) | US6661033B2 (de) |
EP (1) | EP1295348A1 (de) |
JP (1) | JP2004503095A (de) |
CN (1) | CN1211868C (de) |
DE (1) | DE10031821B4 (de) |
TW (1) | TW502462B (de) |
WO (1) | WO2002003478A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100524855C (zh) * | 2004-03-31 | 2009-08-05 | 日亚化学工业株式会社 | 氮化物半导体发光元件 |
US20070108459A1 (en) * | 2005-04-15 | 2007-05-17 | Enfocus Engineering Corp | Methods of Manufacturing Light Emitting Devices |
KR100721150B1 (ko) * | 2005-11-24 | 2007-05-22 | 삼성전기주식회사 | 수직 구조 질화갈륨계 발광다이오드 소자 |
JP2008198650A (ja) * | 2007-02-08 | 2008-08-28 | Toshiba Discrete Technology Kk | 半導体発光素子及び半導体発光装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0554512A1 (de) * | 1992-02-07 | 1993-08-11 | Daimler-Benz Aerospace Aktiengesellschaft | Verfahren zur Erkennung eines Zieles |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2416098A1 (de) * | 1974-04-03 | 1975-10-09 | Siemens Ag | Optische halbleiterstrahlungsquelle mit domfoermig ausgebildeter oberflaeche |
DE2421590A1 (de) * | 1974-05-03 | 1975-11-13 | Siemens Ag | Optische halbleiterstrahlungsquelle, bei welcher mindestens einer der beiden halbleiterbereiche eine huegelige aeussere oberflaeche aufweist |
JPS51149784A (en) * | 1975-06-17 | 1976-12-22 | Matsushita Electric Ind Co Ltd | Solid state light emission device |
US4864370A (en) * | 1987-11-16 | 1989-09-05 | Motorola, Inc. | Electrical contact for an LED |
JPH0327578A (ja) * | 1989-06-23 | 1991-02-05 | Eastman Kodatsuku Japan Kk | 発光ダイオ―ドアレイ |
US5087949A (en) * | 1989-06-27 | 1992-02-11 | Hewlett-Packard Company | Light-emitting diode with diagonal faces |
JPH0442582A (ja) * | 1990-06-08 | 1992-02-13 | Eastman Kodak Japan Kk | 発光ダイオードアレイ |
JPH04264781A (ja) * | 1991-02-20 | 1992-09-21 | Eastman Kodak Japan Kk | 発光ダイオードアレイ |
JPH04343484A (ja) * | 1991-05-21 | 1992-11-30 | Eastman Kodak Japan Kk | 発光ダイオードアレイ |
US5309001A (en) * | 1991-11-25 | 1994-05-03 | Sharp Kabushiki Kaisha | Light-emitting diode having a surface electrode of a tree-like form |
JPH07202263A (ja) * | 1993-12-28 | 1995-08-04 | Ricoh Co Ltd | 端面発光型発光ダイオード、アレイ状光源、側面受光型受光素子、受発光素子、端面発光型発光ダイオードアレイ状光源 |
US5814839A (en) * | 1995-02-16 | 1998-09-29 | Sharp Kabushiki Kaisha | Semiconductor light-emitting device having a current adjusting layer and a uneven shape light emitting region, and method for producing same |
US6229160B1 (en) * | 1997-06-03 | 2001-05-08 | Lumileds Lighting, U.S., Llc | Light extraction from a semiconductor light-emitting device via chip shaping |
DE19727233A1 (de) * | 1997-06-26 | 1999-01-07 | Siemens Ag | Strahlungsemittierendes optoelektronisches Bauelement |
US6504180B1 (en) * | 1998-07-28 | 2003-01-07 | Imec Vzw And Vrije Universiteit | Method of manufacturing surface textured high-efficiency radiating devices and devices obtained therefrom |
RU2142661C1 (ru) * | 1998-12-29 | 1999-12-10 | Швейкин Василий Иванович | Инжекционный некогерентный излучатель |
DE19911717A1 (de) * | 1999-03-16 | 2000-09-28 | Osram Opto Semiconductors Gmbh | Monolithisches elektrolumineszierendes Bauelement und Verfahren zu dessen Herstellung |
-
2000
- 2000-06-30 DE DE10031821A patent/DE10031821B4/de not_active Expired - Fee Related
-
2001
- 2001-05-23 WO PCT/DE2001/001953 patent/WO2002003478A1/de active Application Filing
- 2001-05-23 CN CN01811993.XA patent/CN1211868C/zh not_active Expired - Fee Related
- 2001-05-23 JP JP2002507457A patent/JP2004503095A/ja active Pending
- 2001-05-23 EP EP01943139A patent/EP1295348A1/de not_active Withdrawn
- 2001-06-26 TW TW090115389A patent/TW502462B/zh not_active IP Right Cessation
-
2002
- 2002-12-30 US US10/331,924 patent/US6661033B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0554512A1 (de) * | 1992-02-07 | 1993-08-11 | Daimler-Benz Aerospace Aktiengesellschaft | Verfahren zur Erkennung eines Zieles |
Also Published As
Publication number | Publication date |
---|---|
US6661033B2 (en) | 2003-12-09 |
CN1439177A (zh) | 2003-08-27 |
CN1211868C (zh) | 2005-07-20 |
US20030122145A1 (en) | 2003-07-03 |
DE10031821B4 (de) | 2006-06-14 |
DE10031821A1 (de) | 2002-01-17 |
TW502462B (en) | 2002-09-11 |
WO2002003478A1 (de) | 2002-01-10 |
JP2004503095A (ja) | 2004-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20021202 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE CH DE FR GB LI |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: OSRAM OPTO SEMICONDUCTORS GMBH |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: OSRAM OPTO SEMICONDUCTORS GMBH |
|
17Q | First examination report despatched |
Effective date: 20091009 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20091201 |