EP1298492A3 - Coating compositions for use with an overcoated photoresist - Google Patents
Coating compositions for use with an overcoated photoresist Download PDFInfo
- Publication number
- EP1298492A3 EP1298492A3 EP20020256723 EP02256723A EP1298492A3 EP 1298492 A3 EP1298492 A3 EP 1298492A3 EP 20020256723 EP20020256723 EP 20020256723 EP 02256723 A EP02256723 A EP 02256723A EP 1298492 A3 EP1298492 A3 EP 1298492A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating compositions
- overcoated photoresist
- contain
- resin component
- overcoated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/002—Priming paints
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32525401P | 2001-09-26 | 2001-09-26 | |
US325254P | 2001-09-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1298492A2 EP1298492A2 (en) | 2003-04-02 |
EP1298492A3 true EP1298492A3 (en) | 2004-08-18 |
Family
ID=23267093
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20020256723 Withdrawn EP1298492A3 (en) | 2001-09-26 | 2002-09-26 | Coating compositions for use with an overcoated photoresist |
EP02256724A Ceased EP1298493A3 (en) | 2001-09-26 | 2002-09-26 | Coating compositions for use with an overcoated photoresist |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02256724A Ceased EP1298493A3 (en) | 2001-09-26 | 2002-09-26 | Coating compositions for use with an overcoated photoresist |
Country Status (6)
Country | Link |
---|---|
US (4) | US6852421B2 (en) |
EP (2) | EP1298492A3 (en) |
JP (3) | JP4478379B2 (en) |
KR (4) | KR20030051190A (en) |
CN (2) | CN1326959C (en) |
TW (2) | TW591341B (en) |
Families Citing this family (104)
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US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
KR100804873B1 (en) * | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | Spin-on-glass anti-reflective coatings for photolithography |
WO2002086624A1 (en) * | 2001-04-10 | 2002-10-31 | Nissan Chemical Industries, Ltd. | Composition for forming antireflection film for lithography |
TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
CN1606713B (en) * | 2001-11-15 | 2011-07-06 | 霍尼韦尔国际公司 | Spincoating antireflection paint for photolithography |
US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
US8012670B2 (en) | 2002-04-11 | 2011-09-06 | Rohm And Haas Electronic Materials Llc | Photoresist systems |
US7244542B2 (en) * | 2002-05-30 | 2007-07-17 | Shipley Company, L.L.C. | Resins and photoresist compositions comprising same |
US20050173803A1 (en) * | 2002-09-20 | 2005-08-11 | Victor Lu | Interlayer adhesion promoter for low k materials |
US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
JP4171920B2 (en) | 2002-10-09 | 2008-10-29 | 日産化学工業株式会社 | Antireflection film forming composition for lithography |
EP1422566A1 (en) * | 2002-11-20 | 2004-05-26 | Shipley Company, L.L.C. | Multilayer photoresist systems |
KR20040044369A (en) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | Multilayer photoresist systems |
US7361447B2 (en) * | 2003-07-30 | 2008-04-22 | Hynix Semiconductor Inc. | Photoresist polymer and photoresist composition containing the same |
CN100537053C (en) | 2003-09-29 | 2009-09-09 | Hoya株式会社 | Mask blanks and method of producing the same |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
WO2005066240A1 (en) * | 2003-12-30 | 2005-07-21 | Rohm And Haas Electronic Materials Llc | Coating compositions |
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US7790356B2 (en) | 2004-04-09 | 2010-09-07 | Nissan Chemical Industries, Ltd. | Condensation type polymer-containing anti-reflective coating for semiconductor |
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JP4945091B2 (en) * | 2004-05-18 | 2012-06-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Coating composition for use with overcoated photoresist |
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US7461446B2 (en) * | 2005-10-24 | 2008-12-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for repairing photoresist layer defects using index matching overcoat |
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US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
EP1829942B1 (en) * | 2006-02-28 | 2012-09-26 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
US7563563B2 (en) * | 2006-04-18 | 2009-07-21 | International Business Machines Corporation | Wet developable bottom antireflective coating composition and method for use thereof |
US9196270B1 (en) | 2006-12-07 | 2015-11-24 | Western Digital (Fremont), Llc | Method for providing a magnetoresistive element having small critical dimensions |
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KR102288386B1 (en) | 2018-09-06 | 2021-08-10 | 삼성에스디아이 주식회사 | Resist underlayer composition, and method of forming patterns using the composition |
CN113126432A (en) * | 2019-12-31 | 2021-07-16 | 罗门哈斯电子材料韩国有限公司 | Coating composition for photoresist underlayer |
CN113402703B (en) * | 2021-06-21 | 2023-04-07 | 厦门恒坤新材料科技股份有限公司 | Bottom anti-reflection film resin and composition and pattern forming method |
KR20240039091A (en) * | 2021-07-30 | 2024-03-26 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | Resist auxiliary film composition and method of forming a pattern using the composition |
CN115808847B (en) * | 2023-01-18 | 2023-04-28 | 苏州润邦半导体材料科技有限公司 | Anti-reflection coating resin for photoresist bottom and preparation method and application thereof |
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Also Published As
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KR20100137397A (en) | 2010-12-30 |
US20030180559A1 (en) | 2003-09-25 |
US20120034562A1 (en) | 2012-02-09 |
EP1298492A2 (en) | 2003-04-02 |
KR20030051189A (en) | 2003-06-25 |
US8927681B2 (en) | 2015-01-06 |
TW591341B (en) | 2004-06-11 |
TW594418B (en) | 2004-06-21 |
CN1326960C (en) | 2007-07-18 |
JP2009104165A (en) | 2009-05-14 |
JP4386331B2 (en) | 2009-12-16 |
US6852421B2 (en) | 2005-02-08 |
CN1482191A (en) | 2004-03-17 |
KR101379219B1 (en) | 2014-03-31 |
JP2003233195A (en) | 2003-08-22 |
JP4667509B2 (en) | 2011-04-13 |
US20040209200A1 (en) | 2004-10-21 |
US7582360B2 (en) | 2009-09-01 |
US7163751B2 (en) | 2007-01-16 |
JP4478379B2 (en) | 2010-06-09 |
KR20030051190A (en) | 2003-06-25 |
KR100934436B1 (en) | 2009-12-29 |
JP2003177547A (en) | 2003-06-27 |
CN1482192A (en) | 2004-03-17 |
EP1298493A2 (en) | 2003-04-02 |
KR20130132717A (en) | 2013-12-05 |
US20070092746A1 (en) | 2007-04-26 |
CN1326959C (en) | 2007-07-18 |
EP1298493A3 (en) | 2004-08-18 |
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