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Publication numberUS20010009169 A1
Publication typeApplication
Application numberUS 09/808,046
Publication dateJul 26, 2001
Filing dateMar 15, 2001
Priority dateMar 22, 1996
Also published asUS6001195, US20030136481, US20040177904
Publication number09808046, 808046, US 2001/0009169 A1, US 2001/009169 A1, US 20010009169 A1, US 20010009169A1, US 2001009169 A1, US 2001009169A1, US-A1-20010009169, US-A1-2001009169, US2001/0009169A1, US2001/009169A1, US20010009169 A1, US20010009169A1, US2001009169 A1, US2001009169A1
InventorsSetsuo Kajiwara, Takehiko Kikuchi, Kazuyuki Ogawa, Shuichi Miyazaki, Takeshi Matsunaga
Original AssigneeSetsuo Kajiwara, Takehiko Kikuchi, Kazuyuki Ogawa, Shuichi Miyazaki, Takeshi Matsunaga
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Forming and distributing a nanometer-scale precipitate generating a coherent elastic strain in a parent phase by heat treatment of an amorphous titanium-nickel based alloy
US 20010009169 A1
Abstract
To remarkably improve shape-memory properties without the need for strictly controlling the composition, the present invention provides a TióNi-based shape-memory alloy having a titanium content within a range of from 50 to 55 atomic %, which comprises an amorphous alloy heat-treated at a temperature of from 600 to 800 K, in which subnanometric precipitates generating coherent elastic strains are formed and distributed in the bcc parent phase(B2).
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Claims(4)
What is claimed is:
1. A method of manufacturing a TióNi-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, which comprises the step of forming and distributing a nanometer-scale precipitate generating a coherent elastic strain in a mother phase through a heat treatment of an amorphous TióNi-based alloy at a temperature within a range of from 600 to 800 K.
2. The manufacturing method as claimed in
claim 1
, wherein said heat treatment is carried out in a single run.
3. The manufacturing method as claimed in
claim 1
, wherein said alloy is in a thin film shape.
4. The manufacturing method as claimed in
claim 2
, wherein said alloy is in a thin film shape.
Description

[0001] This is a divisional of Ser. No. 08/768,467, filed Dec. 18, 1996.

FIELD OF THE INVENTION

[0002] The present invention relates to a TióNi-based shape-memory alloy and a method of manufacturing same. More particularly, the present invention relates to a novel TióNi-based shape-memory alloy which is useful as an actuator for a micro-valve or a micro-machine without the need for a strict control of composition and which has a largely improved shape-memory property, and a method of manufacturing same.

PRIOR ART AND PROBLEMS

[0003] As an alloy having shape-memory properties, TióNi-based alloy has conventionally been known. A method of manufacturing this TióNi-based alloy into a thin-film alloy is also known.

[0004] The thin-film shape-memory alloy is expected to be applicable to various precision areas. In the case of TióNi-based shape-memory alloy thin film, a method for improving shape-memory properties such as shape recovering ability and recovery strain is known, which comprises crystallizing an amorphous alloy thin film vapor-deposited by sputtering, for example, by annealing the thin film at a temperature higher than the crystallization temperature, and then heat-treating the film at various temperatures.

[0005] However, the conventional technique has problems such that the improving effect of shape-memory properties is not sufficient, that the above-mentioned method for improving these properties requires strict control of the chemical composition of the TióNi-based alloy, and furthermore, that two-stage heat treatments are required. Under such circumstances, therefore, it is very difficult even to obtain a limited improvement of shape-memory properties and to reduce the manufacturing cost.

[0006] Therefore, the present invention has an object to provide a novel TióNi-based shape-memory alloy which overcomes these drawbacks in the conventional technology as described above and allows remarkable improvement of shape-memory properties by a simple means, and a method of manufacturing same.

SUMMARY OF THE INVENTION

[0007] As means to solve the above-mentioned problems, the present invention provides a TióNi-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, wherein subnanometric precipitates generating coherent elastic strains in the parent phase are distributed.

[0008] Further, the present invention provides also a method of manufacturing the above-mentioned alloy, which comprises the step of heat-treating an amorphous TióNi-based alloy at a temperature within a range of from 600 to 800 K.

BRIEF DESCRIPTION OF DRAWINGS

[0009]FIG. 1 shows a high-resolution electron photomicrograph illustrating the structure of an alloy thin film as an example of the present invention.

[0010]FIG. 2 shows an enlarged micrograph of the framed region of FIG. 1, revealing subnanometric plate precipitates and coherent elastic strains.

[0011]FIG. 3 shows various curves illustrating the results of thermal cycle tests under constant loads.

[0012]FIG. 4 shows a curve illustrating the relationship between maximum shape recovery strain and the heat treatment temperature.

[0013]FIG. 5 shows the relationship between a load (external stress) and shape recovery strain for various heat treatment temperature.

[0014]FIG. 6 shows the relationship between critical stress for slip and the heat treatment temperature.

DETAILED DESCRIPTION OF THE INTENTION

[0015] The present invention makes it possible to remarkably improve shape-memory properties such as shape recovering ability and recovery strain through the construction as described above.

[0016] As to the chemical composition itself of the alloy, other elements may be added or mixed as impurities to this alloy comprising Ti (titanium) and Ni (nickel), so far as these elements do not impair the shape-memory properties of the invention.

[0017] With a titanium content of under 50 atomic %, it becomes difficult to achieve the object of the invention, and it is also the case with a titanium content of over 66 atomic %.

[0018] In the target alloy, a special nanometer-scale precipitate is distributed in the parent phase thereof, and this precipitate produces a coherent elastic strain between the precipitate and the parent phase. The term ďcoherent elastic strainĒ as herein used means an elastic strain caused by connection of the slightly different crystal lattice of the precipitate with that of the parent phase. In the present invention, an alloy having such a feature is manufactured by applying a heat treatment to an amorphous alloy at a temperature within a range of from 600 to 800 K.

[0019] The heat treatment temperature is limited within the range of from 600 to 800 K, and the specimen must be heated directly from the amorphous state, in the present case, from the as-deposited state. Typical heat treatment conditions are, for example, as follows:

[0020] Time: 10 minutes to 3 hours

[0021] Atmosphere: Vacuum or an inert gas such as argon

[0022] Heating rate: 5 to 50 K/minute

[0023] Cooling: Rapid cooling.

[0024] Needless to mention, these conditions are not limitative. In the already crystallized TióNi-based alloy, generation and distribution of the above-mentioned precipitate are not observed by this heat treatment, and a remarkable improvement of properties is unavailable. With a temperature of over 800 K, an appropriate precipitate is not formed. With a temperature of under 600 K, diffusion of atoms becomes slower, and no precipitate is generated within a practicable period of time. In both cases, a remarkable improving effect of the properties is unavailable.

[0025] The amorphous TióNi-based alloy may be manufactured, for example, by the vapor deposition process into a thin film, or by any other appropriate method, and there is no particular limitation in this respect.

[0026] It should particularly be noted that the alloy of the invention in the form of a thin film is expected to be used in such applications as an actuator for a micro-valve or a micro-machine hereafter, and is therefore a very important material. The manufacturable thin film thickness covers a range from under 5 μm to 10 μm in general.

[0027] The alloy and the manufacturing method thereof of the present invention are now described further in detail by means of examples. The invention is not, however, limited by the following examples.

EXAMPLES

[0028] Using a TióNi target material, thin films of an amorphous TióNi alloy containing 48.2 atomic % Ni were formed on a glass substrate by argon ion sputtering. The thickness of the films was about 7 μm and its composition was determined by electron probe X-ray microanalysis.

[0029] A thin film heat-treated at 745 K for 1 hr was observed by means of a high-resolution electron microscope. FIG. 1 illustrates an example of electronmicrograph thereof. FIG. 2 is an enlarged micrograph thereof. As is known from the micrographs of FIGS. 1 and 2, a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the {100}bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm. The precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale. The precipitate was confirmed to be Ti-rich by EDS analysis of field emission electron microscope.

[0030] For a specimen heat-treated at 765 K for 1 hr, changes in elongation were evaluated through thermal cycles under various loads. This specimen contained the same kind of precipitates as mentioned above. FIG. 3 shows the result. As shown in this figure, there is no permanent strain under loads of up to 240 MPa, and a large shape recovery strain as 6% is available.

[0031]FIG. 4 illustrates the result of evaluation of the relationship between the heat-treatment temperature and the maximum shape recovery strain, indicating availability of a recovery strain of 5 to 6% through an annealing at a temperature within a range of from 700 to 800 K.

[0032]FIG. 5 shows the relationship between shape recovery strain and stress under load, various heat treatments.

[0033]FIG. 5 reveals that a recovery strain of at least 4.5% is obtained with a stress range of from 200 to 670 MPa. The maximum loadable stress is 670 MPa.

[0034]FIG. 6 illustrates the effect of the heat-treatment temperature on the maximum stress loadable within a range in which a permanent strain (slip deformation) is not introduced into the sample.

[0035] It is confirmed, from the example as described above, that the invention permits remarkable improvement of shape-memory properties as compared with the conventional process.

[0036] According to the present invention, shape-memory properties are remarkably improved through a heat-treatment at a temperature of from 600 to 800 K without the need for strictly controlling the composition or heat treatment. It is also possible to largely reduce the manufacturing cost.

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US8303222Nov 28, 2008Nov 6, 2012Tokai University Educational SystemFastening body structure
US8348990Jun 20, 2005Jan 8, 2013Advanced Bio Prosthetic Surfaces, Ltd.Implantable expandable medical devices having regions of differential mechanical properties and methods of making same
US8529616Jun 20, 2005Sep 10, 2013Advanced Bio Prosthetic Surfaces, Ltd., a wholly owned subsidary of Palmaz Scientific, Inc.Implantable expandable medical devices having regions of differential mechanical properties and methods of making same
US8715335 *Jan 5, 2010May 6, 2014Advanced Bio Prosthetic Surfaces, Ltd., A Wholly Owned Subsidiary Of Palmaz Scientific, Inc.Endoluminal implantable stent-grafts
US20100191317 *Jan 5, 2010Jul 29, 2010Advanced Bio Prosthetic Surfaces, Ltd., A Wholly Owned Subsidiary Of Palmaz Scientific, Inc.Endoluminal implantable stent-grafts
Classifications
U.S. Classification148/563
International ClassificationC22C19/03, C22F1/18, C22F1/10, C22C1/00, C22C45/10, C22C45/04, C22C14/00, C22F1/00
Cooperative ClassificationY10S977/891, C22C14/00, C22C45/04, C22F1/006, C22C45/10
European ClassificationC22C45/04, C22C45/10, C22C14/00, C22F1/00M